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1. 发明专利

JP2003061550A Gravitational animal trap 审中-公开
标题翻译：革命动物圈
公开(公告)号：JP2003061550A
公开(公告)日：2003-03-04
申请号：JP2002059978
申请日：2002-03-06
申请人： Huan Fu Kao , Shu Hsin Kao , Shu Lin Kao , Shu Yin Kao , インカオ,シュー , シンカオ,シュー , リンカオ,シュー , フーカオ,ホアン
发明人： KAO HUAN FU , KAO SHU HSIN , KAO SHU YIN , KAO SHU LIN
IPC分类号： A01M23/16 , A01M23/18
CPC分类号： A01M23/16 , A01M23/18
摘要： PROBLEM TO BE SOLVED: To provide a gravitational animal trap utilizing gravity, capable of surely trapping by closing a front door when a target animal enters a trapping cage. Gravitational, GRAVITY TYPE, gravity type.
SOLUTION: This animal trap is obtained by freely openably having a door 27 at the front side of a trapping cage 21 and setting a floorboard 22 on the bottom of the cage. The floorboard 22 is freely turned like a seesaw around a supporting point 220 and the floorboard 22 is balanced with the front end down and the rear end up. When a catch (wanted animal) attracted by bait set at a back upper side enters into the trapping cage 21 and passes through the supporting point 220, balance of the floorboard is changed into the state of the rear end down and the door 27 is closed through a connected detector 23, a dumping device 24, a U-shape handle 270, and an elastic element 28 and the catch is captured in the trapping cage 21.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供利用重力的重力动物捕集器，当目标动物进入捕集笼时，能够通过关闭前门确保捕获。重力，重力型，重力型。解决方案：该动物捕获器通过在捕获笼21的前侧可自由地打开地具有门27并将底板22设置在保持架的底部上而获得。地板22围绕支撑点220自由地转动成跷跷板，并且地板22与前端向下和后端向上平衡。当被设置在后面上侧的诱饵吸引的捕获物（想要的动物）进入捕集笼21并通过支撑点220时，地板块的平衡被改变为后端的状态并且门27被关闭通过连接的检测器23，倾倒装置24，U形手柄270和弹性元件28，捕获器被捕获在捕获笼21中。

2. 发明授权

US6126527A Seal for polishing belt center support having a single movable sealed cavity 失效
标题翻译：用于抛光带中心支撑件的密封件具有单个可移动密封腔
公开(公告)号：US6126527A
公开(公告)日：2000-10-03
申请号：US113540
申请日：1998-07-10
申请人： Shu-Hsin Kao , William F. Lapson , Charles J. Regan , David E. Weldon
发明人： Shu-Hsin Kao , William F. Lapson , Charles J. Regan , David E. Weldon
IPC分类号： B24B21/06 , B24B37/04 , B24B49/16 , B24B21/00
CPC分类号： B24B49/16 , B24B21/06 , B24B37/04
摘要： A polishing tool uses a seal cavity containing a fluid that supports polishing pads against an object being polished. The boundaries of the cavity include a support structure, a portion of a polishing material, and a seal between the support structure and the polishing material. The polishing material moves relative to the support structure and seal. A variety of seal configurations can maintain the fluid within the cavity. In one embodiment the seal mechanism is a labyrinth seal including multiple ridges. In one embodiment, the seal mechanism is a face-sealing seal which includes a jacket with a u-shaped cross section with a compressible element positioned within it. The face-sealing seal is in a groove positioned outside of the cavity. Alternatively, the face-sealing seal forms the outer edge of the cavity. In a further embodiment, the seal is an o-ring seal positioned within a double dove-tailed groove.
摘要翻译：抛光工具使用包含支撑抛光垫的流体的密封腔，该抛光垫抵靠被抛光的物体。空腔的边界包括支撑结构，抛光材料的一部分以及支撑结构和抛光材料之间的密封。抛光材料相对于支撑结构移动并进行密封。各种密封构造可以将流体保持在空腔内。在一个实施例中，密封机构是包括多个脊的迷宫式密封件。在一个实施例中，密封机构是面密封，其包括具有U形横截面的夹套，其中可压缩元件位于其内。面密封处于位于空腔外部的槽中。或者，面密封形成空腔的外边缘。在另一个实施例中，密封件是位于双鸽尾槽内的O形圈密封件。

3. 发明授权

US6062959A Polishing system including a hydrostatic fluid bearing support 失效
公开(公告)号：US6062959A
公开(公告)日：2000-05-16
申请号：US964773
申请日：1997-11-05
申请人： David E. Weldon , Shu-Hsin Kao , Tim H. Huynh
发明人： David E. Weldon , Shu-Hsin Kao , Tim H. Huynh
IPC分类号： B24B21/04 , B24B21/10 , B24B37/04 , B24B41/04 , F16C32/06 , H01L21/302 , B24B21/00
CPC分类号： F16C32/06 , B24B21/10 , B24B37/04 , B24B37/042 , B24B41/04 , B24B41/042 , H01L21/302
摘要： A polishing system such as a chemical mechanical belt polisher includes a hydrostatic fluid bearing that supports polishing pads and incorporates one or more of the following novel aspects. One aspect uses compliant surfaces surrounding fluid inlets in an array of inlets to extend areas of elevated support pressure around the inlets. Another aspect modulates or reverses fluid flow in the bearing to reduce deviations in the time averaged support pressure and to induce vibrations in the polishing pads to improve polishing performance. Another aspect provides a hydrostatic bearing with a cavity having a lateral extent greater than that of an object being polished. The depth and bottom contour of cavity can be adjusted to provide nearly uniform support pressure across an area that is surrounded by a retaining ring support. Changing fluid pressure to the retaining ring support adjusts the fluid film thickness of the bearing. Yet another aspect of the invention provides a hydrostatic bearing with spiral or partial cardiod drain grooves. This bearing has a non-uniform support pressure profile but provides a uniform average pressure to a wafer that is rotated relative to the center of the bearing. Another aspect of the invention provides a hydrostatic bearing with constant fluid pressure at inlets but a support pressure profile that is adjustable by changing the relative heights of fluid inlets to alter local fluid film thicknesses in the hydrostatic bearing.

4. 发明授权

US06875085B2 Polishing system including a hydrostatic fluid bearing support 失效
标题翻译：抛光系统包括静液压轴承支架
公开(公告)号：US06875085B2
公开(公告)日：2005-04-05
申请号：US10253738
申请日：2002-09-23
申请人： David E. Weldon , Shu-Hsin Kao , Tim H. Huynh
发明人： David E. Weldon , Shu-Hsin Kao , Tim H. Huynh
IPC分类号： B24B21/10 , B24B37/04 , B24B41/04 , B24B1/00
CPC分类号： B24B37/042 , B24B21/10 , B24B37/04 , B24B41/042
摘要： A polishing system such as a chemical mechanical belt polisher includes a hydrostatic fluid bearing that supports polishing pads and incorporates one or more of the following novel aspects. One aspect uses compliant surfaces surrounding fluid inlets in an array of inlets to extend areas of elevated support pressure around the inlets. Another aspect modulates or reverses fluid flow in the bearing to reduce deviations in the time averaged support pressure and to induce vibrations in the polishing pads to improve polishing performance. Another aspect provides a hydrostatic bearing with a cavity having a lateral extent greater than that of an object being polished. The depth and bottom contour of cavity can be adjusted to provide nearly uniform support pressure across an area that is surrounded by a retaining ring support. Changing fluid pressure to the retaining ring support adjusts the fluid film thickness of the bearing. Yet another aspect of the invention provides a hydrostatic bearing with spiral or partial cardiod drain grooves. This bearing has a non-uniform support pressure profile but provides a uniform average pressure to a wafer that is rotated relative to the center of the bearing. Another aspect of the invention provides a hydrostatic bearing with constant fluid pressure at inlets but a support pressure profile that is adjustable by changing the relative heights of fluid inlets to alter local fluid film thicknesses in the hydrostatic bearing.
摘要翻译：诸如化学机械带抛光机的抛光系统包括支撑抛光垫并且包含以下新颖方面中的一个或多个的静压流体轴承。一个方面使用围绕入口阵列的流体入口周围的顺应性表面来延伸围绕入口的升高的支撑压力的区域。另一方面调节或反转轴承中的流体流动，以减少时间平均支撑压力的偏差并且引起抛光垫中的振动以改善抛光性能。另一方面提供一种具有空腔的静压轴承，该空腔的横向范围大于被抛光物体的横向范围。可以调节空腔的深度和底部轮廓，以在由保持环支撑件包围的区域上提供几乎均匀的支撑压力。将流体压力改变到保持环支架可调节轴承的流体膜厚度。本发明的另一方面提供一种具有螺旋或部分心碘排泄槽的静压轴承。该轴承具有不均匀的支撑压力分布，但是相对于轴承的中心旋转的晶片提供均匀的平均压力。本发明的另一方面提供了一种静压轴承，其在入口处具有恒定的流体压力，但是支撑压力分布可通过改变流体入口的相对高度来调节，以改变静压轴承中的局部流体膜厚度。

5. 发明授权

US06244945B1 Polishing system including a hydrostatic fluid bearing support 失效
标题翻译：抛光系统包括静液压轴承支架
公开(公告)号：US06244945B1
公开(公告)日：2001-06-12
申请号：US09586474
申请日：2000-06-01
申请人： David E. Weldon , Shu-Hsin Kao , Tim H. Huynh
发明人： David E. Weldon , Shu-Hsin Kao , Tim H. Huynh
IPC分类号： B24B2100
CPC分类号： F16C32/06 , B24B21/10 , B24B37/04 , B24B37/042 , B24B41/04 , B24B41/042 , H01L21/302
摘要： A polishing system such as a chemical mechanical belt polisher includes a hydrostatic fluid bearing that supports polishing pads and incorporates one or more of the following novel aspects. One aspect uses compliant surfaces surrounding fluid inlets in an array of inlets to extend areas of elevated support pressure around the inlets. Another aspect of the invention provides a hydrostatic bearing with spiral or partial cardiod drain grooves. This bearing has a non-uniform support pressure profile but provides a uniform average pressure to a wafer that is rotated relative to the center of the bearing.
摘要翻译：诸如化学机械带抛光机的抛光系统包括支撑抛光垫并且包含以下新颖方面中的一个或多个的静压流体轴承。一个方面使用围绕入口阵列的流体入口周围的顺应性表面来延伸围绕入口的升高的支撑压力的区域。本发明的另一方面提供一种具有螺旋或部分心碘排泄槽的静压轴承。该轴承具有不均匀的支撑压力分布，但是相对于轴承的中心旋转的晶片提供均匀的平均压力。

6. 发明授权

US6086456A Polishing method using a hydrostatic fluid bearing support having fluctuating fluid flow 失效
标题翻译：使用具有波动的流体流动的静液压轴承支架的抛光方法
公开(公告)号：US6086456A
公开(公告)日：2000-07-11
申请号：US187532
申请日：1998-11-06
申请人： David E. Weldon , Shu-Hsin Kao , Tim H. Huynh
发明人： David E. Weldon , Shu-Hsin Kao , Tim H. Huynh
IPC分类号： B24B21/04 , B24B21/10 , B24B37/04 , B24B41/04 , F16C32/06 , H01L21/302 , B24B21/00
CPC分类号： F16C32/06 , B24B21/10 , B24B37/04 , B24B37/042 , B24B41/04 , B24B41/042 , H01L21/302
摘要： A polishing system such as a chemical mechanical belt polisher includes a hydrostatic fluid bearing that supports polishing pads and incorporates one or more of the following novel aspects. One aspect uses compliant surfaces surrounding fluid inlets in an array of inlets to extend areas of elevated support pressure around the inlets. Another aspect modulates or reverses fluid flow in the bearing to reduce deviations in the time averaged support pressure and to induce vibrations in the polishing pads to improve polishing performance. Another aspect provides a hydrostatic bearing with a cavity having a lateral extent greater than that of an object being polished. The depth and bottom contour of cavity can be adjusted to provide nearly uniform support pressure across an area that is surrounded by a retaining ring support. Changing fluid pressure to the retaining ring support adjusts the fluid film thickness of the bearing. Yet another aspect of the invention provides a hydrostatic bearing with spiral or partial cardiod drain grooves. This bearing has a non-uniform support pressure profile but provides a uniform average pressure to a wafer that is rotated relative to the center of the bearing. Another aspect of the invention provides a hydrostatic bearing with constant fluid pressure at inlets but a support pressure profile that is adjustable by changing the relative heights of fluid inlets to alter local fluid film thicknesses in the hydrostatic bearing.
摘要翻译：诸如化学机械带抛光机的抛光系统包括支撑抛光垫并且包含以下新颖方面中的一个或多个的静压流体轴承。一个方面使用围绕入口阵列的流体入口周围的顺应性表面来延伸围绕入口的升高的支撑压力的区域。另一方面调节或反转轴承中的流体流动，以减少时间平均支撑压力的偏差并且引起抛光垫中的振动以改善抛光性能。另一方面提供一种具有空腔的静压轴承，该空腔的横向范围大于被抛光物体的横向范围。可以调节空腔的深度和底部轮廓，以在由保持环支撑件包围的区域上提供几乎均匀的支撑压力。将流体压力改变到保持环支架可调节轴承的流体膜厚度。本发明的另一方面提供一种具有螺旋或部分心碘排泄槽的静压轴承。该轴承具有不均匀的支撑压力分布，但是相对于轴承的中心旋转的晶片提供均匀的平均压力。本发明的另一方面提供了一种静压轴承，其在入口处具有恒定的流体压力，但是支撑压力分布可通过改变流体入口的相对高度来调节，以改变静压轴承中的局部流体膜厚度。

7. 发明授权

US6000997A Temperature regulation in a CMP process 失效
标题翻译： CMP工艺中的温度调节
公开(公告)号：US6000997A
公开(公告)日：1999-12-14
申请号：US113450
申请日：1998-07-10
申请人： Shu-Hsin Kao , Shou-sung Chang , Huey M. Tzeng , Gregory C. Lee , Greg Simon , Harry Lee , David E. Weldon , Garry Kwong , William F. Lapson , Gregory A. Appel , Peter Mok
发明人： Shu-Hsin Kao , Shou-sung Chang , Huey M. Tzeng , Gregory C. Lee , Greg Simon , Harry Lee , David E. Weldon , Garry Kwong , William F. Lapson , Gregory A. Appel , Peter Mok
IPC分类号： B24B21/04 , B24B37/015 , B24B49/14
CPC分类号： B24B37/015 , B24B21/04
摘要： Heat is transferred between a linear CMP belt and an adjacent heat transfer source, providing a predetermined lateral temperature distribution across the belt. Temperature sensors generate feedback signals to control the heat transfer sources. Alternatively, process monitoring sensors provide feedback signals. The heat transfer source can include multiple selectively controllable individual heat transfer sources having differing temperatures, which can be above or below ambient temperature. The mechanism of heat transfer can include one or more of convection, conduction, and radiation. The configuration provides substantial flexibility to establish and maintain selective non-uniform temperature distributions across the polishing belt. This in turn permits precise control and stability of the polishing process. Heat transfer sources can include pulleys, slurry dispensers, polishing pad conditioners or conditioner back supports, fluid nozzles, and sealed fluid cavity belt supports.
摘要翻译：热量在线性CMP带和相邻的传热源之间传递，从而提供穿过带的预定横向温度分布。温度传感器产生反馈信号来控制传热源。或者，过程监控传感器提供反馈信号。传热源可以包括具有不同温度的多个选择性可控的单个热传递源，其可以高于或低于环境温度。传热的机理可以包括一个或多个对流，传导和辐射。该配置提供了大量灵活性，以建立和保持穿过抛光带的选择性不均匀的温度分布。这又允许精确的控制和抛光过程的稳定性。传热源可以包括滑轮，浆液分配器，抛光垫调节器或调节器背部支撑件，流体喷嘴和密封的流体腔体带支撑件。

8. 发明授权

US5980368A Polishing tool having a sealed fluid chamber for support of polishing pad 失效
标题翻译：抛光工具具有用于支撑抛光垫的密封流体室
公开(公告)号：US5980368A
公开(公告)日：1999-11-09
申请号：US964774
申请日：1997-11-05
申请人： Shou-sung Chang , Shu-Hsin Kao , David E. Weldon
发明人： Shou-sung Chang , Shu-Hsin Kao , David E. Weldon
IPC分类号： B24B21/04 , B24B37/16 , B24B49/16 , B24B57/02 , H01L21/306 , B24B21/00
CPC分类号： B24B57/02 , B24B21/04 , B24B37/16 , B24B49/16
摘要： A polishing tool uses a seal cavity containing a fluid that supports polishing pads against an object being polished. In one embodiment, the boundaries of the cavity include a support structure, a portion of a polishing material, and a seal between the support structure and the polishing material. The polishing material moves relative to the support structure and seal. A variety of seal configuration can maintain the fluid within the cavity. One seal includes an o-ring that the force of a spring, a magnet, or air pressure presses against the polishing material. A gas flow from outside the cavity or from an inlet inside the cavity can form a gas pocket in the cavity, adjacent the o-ring, to prevent leakage of the fluid past the o-ring. Another seal is formed by an aerostatic bearing. The fluid pressure in the cavity can be varied temporally to create vibrations in the polishing material to enhance polishing performance or can be varied spatially to change the pressure profile. One embodiment of the invention includes one or more fluid inlet/outlets to the cavity, one or more pressure regulators, and a controller that operates the pressure regulators to control the pressure in the cavity. In polishers with or without a sealed fluid cavity, the support structure can include actuators that control the orientation of the support structure relative to polishing material. Sensors and a feedback control system positions the support structure for polishing.
摘要翻译：抛光工具使用包含支撑抛光垫的流体的密封腔，该抛光垫抵靠被抛光的物体。在一个实施例中，空腔的边界包括支撑结构，抛光材料的一部分以及支撑结构和抛光材料之间的密封。抛光材料相对于支撑结构移动并进行密封。各种密封配置可以保持腔内的流体。一个密封件包括一个O形环，弹簧的力，磁体或空气压力压在抛光材料上。从空腔外部或从空腔内的入口流出的气流可以在空腔中形成邻近O形环的气穴，以防止流体经过O形环的泄漏。另一个密封由空气静力轴承形成。空腔中的流体压力可以在时间上变化以在抛光材料中产生振动以增强抛光性能，或者可以在空间上改变以改变压力分布。本发明的一个实施例包括到空腔的一个或多个流体入口/出口，一个或多个压力调节器以及操作压力调节器以控制空腔中的压力的控制器。在具有或不具有密封流体腔的抛光机中，支撑结构可以包括控制支撑结构相对于抛光材料的取向的致动器。传感器和反馈控制系统定位用于抛光的支撑结构。

9. 发明授权

US06454641B1 Hydrostatic fluid bearing support with adjustable inlet heights 失效
标题翻译：静压流体轴承支架，可调入口高度
公开(公告)号：US06454641B1
公开(公告)日：2002-09-24
申请号：US09708219
申请日：2000-11-07
申请人： David E. Weldon , Shu-Hsin Kao , Tim H. Huynh
发明人： David E. Weldon , Shu-Hsin Kao , Tim H. Huynh
IPC分类号： B24B2100
CPC分类号： F16C32/06 , B24B21/10 , B24B37/04 , B24B37/042 , B24B41/04 , B24B41/042 , H01L21/302
摘要： A polishing system such as a chemical mechanical belt polisher includes a hydrostatic fluid bearing that supports polishing pads and incorporates one or more of the following novel aspects. One aspect uses compliant surfaces surrounding fluid inlets in an array of inlets to extend areas of elevated support pressure around the inlets. Another aspect modulates or reverses fluid flow in the bearing to reduce deviations in the time averaged support pressure and to induce vibrations in the polishing pads to improve polishing performance. Another aspect provides a hydrostatic bearing with a cavity having a lateral extent greater than that of an object being polished. The depth and bottom contour of cavity can be adjusted to provide nearly uniform support pressure across an area that is surrounded by a retaining ring support. Changing fluid pressure to the retaining ring support adjusts the fluid film thickness of the bearing. Yet another aspect of the invention provides a hydrostatic bearing with spiral or partial cardiod drain grooves. This bearing has a non-uniform support pressure profile but provides a uniform average pressure to a wafer that is rotated relative to the center of the bearing. Another aspect of the invention provides a hydrostatic bearing with constant fluid pressure at inlets but a support pressure profile that is adjustable by changing the relative heights of fluid inlets to alter local fluid film thicknesses in the hydrostatic bearing.
摘要翻译：诸如化学机械带抛光机的抛光系统包括支撑抛光垫并且包含以下新颖方面中的一个或多个的静压流体轴承。一个方面使用围绕入口阵列的流体入口周围的顺应性表面来延伸围绕入口的升高的支撑压力的区域。另一方面调节或反转轴承中的流体流动，以减少时间平均支撑压力的偏差并且引起抛光垫中的振动以改善抛光性能。另一方面提供一种具有空腔的静压轴承，该空腔的横向范围大于被抛光物体的横向范围。可以调节空腔的深度和底部轮廓，以在由保持环支撑件包围的区域上提供几乎均匀的支撑压力。将流体压力改变到保持环支架可调节轴承的流体膜厚度。本发明的另一方面提供一种具有螺旋或部分心碘排泄槽的静压轴承。该轴承具有不均匀的支撑压力分布，但是相对于轴承的中心旋转的晶片提供均匀的平均压力。本发明的另一方面提供了一种静压轴承，其在入口处具有恒定的流体压力，但是支撑压力分布可通过改变流体入口的相对高度来调节，以改变静压轴承中的局部流体膜厚度。

10. 发明授权

US06588139B2 Gravitational animal trap 失效
标题翻译：重力动物陷阱
公开(公告)号：US06588139B2
公开(公告)日：2003-07-08
申请号：US10035170
申请日：2002-01-04
申请人： Huan Fu Kao , Shu Hsin Kao , Shu Yin Kao , Shu Lin Kao
发明人： Huan Fu Kao , Shu Hsin Kao , Shu Yin Kao , Shu Lin Kao
IPC分类号： A01M2318
CPC分类号： A01M23/16 , A01M23/18
摘要： A gravitational animal trap. The trap includes a trap cage having a movable door, an unturned plate that can be adjusted in terms of different fulcrums thereof, and a sensing device that is pivotally jointed with the upturned plate to activate the door switch. When the prey enters the trap cage and steps on the upturned plate, causing the upturned plate to alter the state of equilibrium due to the gravitational force of the prey, the sensing device is activated to shut the movable door, thus achieving the object of entrapping the prey. A weight-adjusting balance device can be further installed with the present invention to effectively improve upon the sensitivity and timing for the shutting of the movable door of the gravitational animal trap.
摘要翻译：引力动物陷阱该捕集器包括具有可移动门的收集笼，能够根据其不同支点进行调节的非转动板，以及与上翻板枢转地接合以激活门开关的感测装置。当猎物进入陷阱笼并踏上向上的平板时，由于上翘的板由于猎物的重力而改变平衡状态，所以感应装置被激活以关闭活动门，从而达到捕获的目的猎物。根据本发明，可以进一步安装调重平衡装置，以有效地提高关闭重力动物捕集器的活动门的灵敏度和时间。

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