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1. 发明申请

WO2014145826A2 SYSTEM AND METHODS OF MOLD/SUBSTRATE SEPARATION FOR IMPRINT LITHOGRAPHY 审中-公开
标题翻译：用于印刷图的模具/基板分离的系统和方法
公开(公告)号：WO2014145826A2
公开(公告)日：2014-09-18
申请号：PCT/US2014/030655
申请日：2014-03-17
申请人： NANONEX CORPORATION
发明人： TAN, Hua , HU, Lin , CHOU, Stephen Y
IPC分类号： B29C33/56
CPC分类号： B29C59/022 , B29C43/50 , B29C43/56 , B29C43/58 , B29C59/026 , B29C2043/563 , B29C2043/5808 , B29C2043/5833 , B29C2043/5891 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A nanoimprint system and methods for separating imprinted substrates with nano-scale patterns from mold for manufacturing. Generally, the system includes means to create, monitor, and control relative movement between the mold and substrate for separation. It is capable of controlling where and when the separation happens and finishes. The relative movement may be generated by motion stages, springs, stage driven flexures, inflatable O-rings, gas flow, and other mechanical means. It may be monitored by separation force, overhead camera, and vacuum/pressures in different area of the system. The relative movement may be any combination of stages movements and movement sequences. The separation speed, direction, and force can be well controlled in the system to achieve fast and reliable separation between mold and substrate, and at the same time maintain the pattern shape and details on the consolidated imprint resist.
摘要翻译：一种纳米压印系统和用于从用于制造的模具中分离具有纳米尺度图案的印迹基板的方法。通常，该系统包括用于创建，监测和控制模具和基板之间用于分离的相对运动的装置。它能够控制分离发生和何时完成。相对运动可以由运动台，弹簧，平台驱动的弯曲，可充气的O形圈，气流和其它机械装置产生。它可以通过分离力，架空照相机和系统不同区域中的真空/压力进行监测。相对运动可以是阶段运动和运动序列的任何组合。在系统中可以很好地控制分离速度，方向和力，以实现模具和基材之间的快速可靠的分离，同时在固化的抗蚀剂上保持图案形状和细节。

2. 发明申请

WO2014145360A1 IMPRINT LITHOGRAPHY SYSTEM AND METHOD FOR MANUFACTURING 审中-公开
公开(公告)号：WO2014145360A1
公开(公告)日：2014-09-18
申请号：PCT/US2014/030106
申请日：2014-03-16
申请人： NANONEX CORPORATION
发明人： TAN, Hua , HU, Lin , ZHANG, Wei , CHOU, Stephen Y.
IPC分类号： B29C39/08 , B29C43/04 , B29C59/16
CPC分类号： B29C43/58 , B29C39/026 , B29C43/021 , B29C59/02 , B29C59/022 , B29C2043/5833 , B29L2009/00 , G03F7/0002
摘要： A nanoimprint lithography system and method for manufacturing substrates with nano-scale patterns, having a process chamber with transparent sections on both top and side walls, a robot for automatic molds and substrates loading and unloading, and optical and stage apparatuses to obtain the desired spatial relationship between the mold and substrate, with an enclosed volume referring to mold mini-chamber being formed between the mold/holder and top wall of the chamber and with the process chamber and mini-chamber being capable of both vacuuming and pressurizing, and inside the chamber, a ring shape seal assembly is installed and a mold support assembly can be installed that aids in imprinting all the way to the edge of the substrate with various embodiments for carrying out fluid pressure imprinting, separation, measurement and control of mold and substrate gap, substrate thickness, and system axial force.
摘要翻译：一种用于制造具有纳米尺度图案的衬底的纳米压印光刻系统和方法，具有在顶壁和侧壁上具有透明部分的处理室，用于自动模具和衬底装载和卸载的机器人，以及获得期望空间的光学和平台装置模具和基板之间的关系，具有封闭的体积，参考在模具/保持器和室的顶壁之间形成的模具小室，并且处理室和小室能够同时进行真空和加压，并且在室，安装环形密封组件，并且可以安装模具支撑组件，其可以通过用于执行流体压力压印，分离，测量和控制模具和衬底间隙的各种实施方式一直保持到衬底的边缘，基板厚度和系统轴向力。

3. 发明申请

WO2008067394A2 IMPRINT LITHOGRAPHY WITH IMPROVED SUBSTRATE/MOLD SEPARATION 审中-公开
标题翻译：具有改进的基板/模具分离的印刷图
公开(公告)号：WO2008067394A2
公开(公告)日：2008-06-05
申请号：PCT/US2007/085783
申请日：2007-11-28
申请人： NANONEX CORPORATION , ZHANG, Wei , TAN, Hua , HU, Lin , CHOU, Stephen Y
发明人： ZHANG, Wei , TAN, Hua , HU, Lin , CHOU, Stephen Y
IPC分类号： B29C33/44 , B29C59/02 , B41F1/18
CPC分类号： B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： In imprint lithography, a mold (300) having a pattern of projecting and recessed regions is pressed into a moldable surface (302) on a substrate (301 ). The thus-imprinted moldabie surface (302) is permitted to at least partially harden to retain the imprint, and the substrate (301 ) and mold (300) are separated. In accordance with the invention, the substrate (301 ) is separated from the mold (300) by bending laterally distal regions (300A and 300B) (regions away from the center toward the edges) of the mold (300) transversely away from the interface and transversely restraining the substrate (301 ). The mold (300) can then be easily separated from the substrate (301 ) by transverse displacement (300). The separation can be facilitated by providing a mold (300) having a lateral dimension that on at least two sides extends beyond the corresponding lateral dimension of the substrate (301 ). Alternatively, the substrate (301 ) can have a greater lateral extent than the mold (300), and the mold (300) can be restrained. The distal regions of the substrate (301 ) can be bent in the transverse direction. Apparatus for effecting such separation is also described (e.g. Figs. 5 and 6).
摘要翻译：在压印光刻中，将具有突出和凹陷区域的图案的模具（300）压入基板（301）上的可模制表面（302）中。允许如此印刷的模具表面（302）至少部分地硬化以保持压印，并且基板（301）和模具（300）被分离。根据本发明，通过将模具（300）的横向远离界面的横向远端区域（300A和300B）（远离中心朝向边缘的区域）弯曲，将基底（301）与模具（300）分离。并横向限制衬底（301）。然后可以通过横向位移（300）容易地将模具（300）与基板（301）分离。可以通过提供具有在至少两个侧面上延伸超过衬底（301）的相应横向尺寸的横向尺寸的模具（300）来促进分离。或者，基板（301）可以具有比模具（300）更大的横向延伸，并且可以限制模具（300）。基板（301）的远端区域可以在横向方向上弯曲。还描述了用于实现这种分离的装置（例如，图5和图6）。

4. 发明公开

EP1325513A1 FLUID PRESSURE IMPRINT LITHOGRAPHY 审中-公开
标题翻译：液压 - 压印光刻
公开(公告)号：EP1325513A1
公开(公告)日：2003-07-09
申请号：EP01952377.8
申请日：2001-07-02
申请人： Nanonex Corporation , Chou, Stephen Y.
发明人： CHOU, Stephen, Y.
IPC分类号： H01L21/302 , H01L21/461 , H01L21/311
CPC分类号： B29C43/021 , B29C43/003 , B29C59/022 , B29C2043/025 , B29C2043/3233 , B29C2043/3238 , B29C2043/566 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L51/0004 , Y10S438/945
摘要： An improved method of imprint lithography involves using direct fluid pressure to press the mold into a substrate-supported film (A). Advantageously the mold and/or substrate are sufficiently flexible to provide wide area contact under the fluid pressure (C). Fluid pressing can be accomplished by sealing the mold against the film and disposing the resulting assembly in a pressurized chamber. It can also be accomplished by subjecting the mold to jets of pressurized fluid. The result of this fluid pressing is enhanced resolution and high uniformity over an enlarged area.

5. 发明授权

US11105791B2 Electronic detectors inside nanofluidic channels for detection, analysis, and manipulation of molecules, small particles, and small samples of material 有权
公开(公告)号：US11105791B2
公开(公告)日：2021-08-31
申请号：US15727911
申请日：2017-10-09
申请人： Nanonex Corporation
发明人： Stephen Y. Chou , Xiaogan Liang
IPC分类号： G01N33/487 , B01L3/00 , B82Y35/00 , C12Q1/68
摘要： The present invention provides methods and apparatus that can manipulate, detect, and/or analyze single molecules, single small particles or single small samples of matter passing through a nanoscale gap within a nanofluidic channel of a detector.

6. 发明授权

US08747092B2 Fast nanoimprinting apparatus using deformale mold 有权
标题翻译：使用变形模具的快速纳米压印装置
公开(公告)号：US08747092B2
公开(公告)日：2014-06-10
申请号：US13011844
申请日：2011-01-21
申请人： Wei Zhang , Hua Tan , Lin Hu , Stephen Y. Chou
发明人： Wei Zhang , Hua Tan , Lin Hu , Stephen Y. Chou
IPC分类号： B29C59/16 , B29C70/44 , B29C35/08 , B29C43/10
CPC分类号： B29C59/02 , B29L2007/001 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The invention disclosed apparatuses and methods to do nanoimprint lithography using a deformable mold. Generally, the apparatus has a chamber with a transparent section on its top wall, which is capable of vacuuming and pressurizing. The deformable mold fixed firmly onto a hollow mold holder around its full periphery is attached to top inner surface of the chamber and positioned underneath the transparent section. The central area of the mold is freely accessible from underneath through the opening of the mold holder. An enclosed volume referring to mold mini-chamber is formed between the mold/holder and top wall of the chamber. Inside chamber, a stage assembly is installed. A chuck to vacuumly hold a substrate is mounted on top of the stage assembly. At beginning of the imprinting, the substrate with a layer of resist is positioned underneath the mold at a predetermined gap between them. Then, the substrate is moved up to contact with the mold either under vacuum or under atmosphere. The substrate and mold may be pressed further by introducing higher pressure inside the chamber. After consolidating the resist, the substrate is separated from the mold by either direct pull-down enabled by stage movement or deforming the mold enabled by differential pressure between the mold mini-chamber and the bulk volume of the chamber, or mixing of both.
摘要翻译：本发明公开了使用可变形模具进行纳米压印光刻的装置和方法。通常，该装置具有在其顶壁上具有透明部分的室，其能够进行抽真空和加压。可变形模具牢固地固定在围绕其整个周边的中空模具架上，附接到室的顶部内表面并且定位在透明部分下方。模具的中心区域可以通过模具夹具的开口从下面自由进入。在模具/保持器和腔室的顶壁之间形成涉及模具小室的封闭体积。内腔，安装了一个舞台组件。用于真空地保持基板的卡盘安装在平台组件的顶部上。在刻印开始时，具有抗蚀剂层的基板位于模具下面，处于它们之间的预定间隙。然后，在真空或大气下，将基板向上移动以与模具接触。可以通过在室内引入更高的压力来进一步压制基底和模具。在固化抗蚀剂之后，通过在模具微型室和室的体积之间的差压或通过两者的混合的阶段移动或使模具变形来实现直接下拉，衬底与模具分离。

7. 发明申请

US20180231520A1 ELECTRONIC DETECTORS INSIDE NANOFLUIDIC CHANNELS FOR DETECTION, ANALYSIS, AND MANIPULATION OF MOLECULES, SMALL PARTICLES, AND SMALL SAMPLES OF MATERIAL 审中-公开
公开(公告)号：US20180231520A1
公开(公告)日：2018-08-16
申请号：US15727911
申请日：2017-10-09
申请人： Nanonex Corporation
发明人： Stephen Y. Chou , Xiaogan Liang
IPC分类号： G01N33/487 , B01L3/00 , B82Y35/00 , C12Q1/68
CPC分类号： G01N33/48721 , B01L3/502707 , B01L3/502761 , B01L2200/0663 , B01L2300/0877 , B82Y35/00 , C12Q1/68 , Y10T436/143333 , C12Q2565/631
摘要： The present invention provides methods and apparatus that can manipulate, detect, and/or analyze single molecules, single small particles or single small samples of matter passing through a nanoscale gap within a nanofluidic channel of a detector.

8. 发明授权

US09533445B2 Fast nanoimprinting methods using deformable mold 有权
标题翻译：使用可变形模具的快速纳米压印方法
公开(公告)号：US09533445B2
公开(公告)日：2017-01-03
申请号：US14301101
申请日：2014-06-10
申请人： Nanonex Corporation
发明人： Wei Zhang , Hua Tan , Lin Hu , Stephen Y. Chou
IPC分类号： B29C59/02 , B82Y10/00 , B82Y40/00 , G03F7/00 , B29L7/00
CPC分类号： B29C59/02 , B29L2007/001 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Methods for nanoimprint lithography using a deformable mold. Generally, the method includes a deformable mold fixed firmly onto a hollow mold holder around its full periphery is attached to top inner surface of the chamber and positioned underneath the transparent section. The central area of the mold is freely accessible from underneath through the opening of the mold holder. At beginning of the imprinting, the substrate with a layer of resist is positioned underneath the mold at a predetermined gap between them and a substrate is moved up to contact with the mold either under vacuum or under atmosphere. After consolidating the resist, the substrate is separated from the mold by either direct pull-down enabled by stage movement or deforming the mold enabled by differential pressure between the mold mini-chamber and the bulk volume of the chamber, or mixing of both.
摘要翻译：使用可变形模具进行纳米压印光刻的方法。通常，该方法包括一个可变形的模具，其牢固地固定在围绕其整个周边的空心模具架上，附着到腔室的顶部内表面并且位于透明部分下方。模具的中心区域可以通过模具夹具的开口从下面自由进入。在刻印开始时，具有抗蚀剂层的基板位于模具下方的预定间隙处，并且在真空下或在大气压下将基板向上移动以与模具接触。在固化抗蚀剂之后，通过在模具微型室和室的体积之间的差压或通过两者的混合的阶段移动或使模具变形来实现直接下拉，衬底与模具分离。

9. 发明申请

US20140239529A1 System and Methods For Nano-Scale Manufacturing 审中-公开
标题翻译：纳米级制造系统与方法
公开(公告)号：US20140239529A1
公开(公告)日：2014-08-28
申请号：US14042618
申请日：2013-09-30
申请人： Nanonex Corporation
发明人： Hua Tan , Lin Hu , Yi Yao , Stephen Y. Chou
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , G03F9/703
摘要： A system and method for patterning a substrate includes a mold holding fixture for holding a mold with nanostructures and a substrate holding fixture for holding a substrate having a molding surface, a stage assembly has two or more independent axis movements for moving either the mold or the substrate therein, a contact force sensor sensing a contact force between the mold surface and the molding surface, a chamber for holding the mold and substrate and for the applying of a pressure inside that is higher or lower than atmospheric pressure, a pressure regulator and a manifold for changing the pressure inside the chamber, a door on the chamber housing provides for selectively allowing the substrate and the mold to pass there through, and means to divide the chamber into two fluidly separate sub-chambers.
摘要翻译：用于图案化基板的系统和方法包括用于保持具有纳米结构的模具的模具保持固定件和用于保持具有模制表面的基板的基板保持夹具，台架组件具有两个或更多个独立的轴线运动，用于移动模具或基板，其中感测模具表面和模制表面之间的接触力的接触力传感器，用于保持模具和基板并用于施加高于或低于大气压力的压力的室，压力调节器和用于改变腔室内的压力的歧管，腔室壳体上的门提供选择性地允许衬底和模具通过其中，以及将腔室分成两个流体分离的子室的手段。

10. 发明授权

US06946360B2 Fluid pressure bonding 有权
标题翻译：流体压力粘合
公开(公告)号：US06946360B2
公开(公告)日：2005-09-20
申请号：US10161776
申请日：2002-06-04
申请人： Stephen Y. Chou
发明人： Stephen Y. Chou
IPC分类号： H01L21/027 , B29C59/02 , G03F7/00 , H01L51/40 , H01L21/30 , B65C3/26 , C03C27/00 , H01L21/46
CPC分类号： B29C43/021 , B29C43/003 , B29C59/022 , B29C2043/025 , B29C2043/3233 , B29C2043/3238 , B29C2043/566 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L51/0004 , Y10S438/945
摘要： An improved method of bonding involves using direct fluid pressure to press together the layers to be bonded. Advantageously one or more of the layers are sufficiently flexible to provide wide area contact under the fluid pressure. Fluid pressing can be accomplished by sealing an assembly of layers to be bonded and disposing the assembly in a pressurized chamber. It can also be accomplished by subjecting the assembly to jets of pressurized fluid. The result of this fluid pressing is reduction of voids and enhanced uniformity over an enlarged area.
摘要翻译：改进的粘合方法包括使用直接流体压力将待粘合的层压在一起。有利地，一个或多个层具有足够的柔性以在流体压力下提供广泛的面积接触。流体压制可以通过密封要结合的层的组件并将组件设置在加压室中来实现。也可以通过使组件经受加压流体的喷射来实现。这种流体压制的结果是在扩大的面积上减小了空隙并提高了均匀性。

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