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1. 发明申请

WO2014145826A2 SYSTEM AND METHODS OF MOLD/SUBSTRATE SEPARATION FOR IMPRINT LITHOGRAPHY 审中-公开
标题翻译：用于印刷图的模具/基板分离的系统和方法
公开(公告)号：WO2014145826A2
公开(公告)日：2014-09-18
申请号：PCT/US2014/030655
申请日：2014-03-17
申请人： NANONEX CORPORATION
发明人： TAN, Hua , HU, Lin , CHOU, Stephen Y
IPC分类号： B29C33/56
CPC分类号： B29C59/022 , B29C43/50 , B29C43/56 , B29C43/58 , B29C59/026 , B29C2043/563 , B29C2043/5808 , B29C2043/5833 , B29C2043/5891 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A nanoimprint system and methods for separating imprinted substrates with nano-scale patterns from mold for manufacturing. Generally, the system includes means to create, monitor, and control relative movement between the mold and substrate for separation. It is capable of controlling where and when the separation happens and finishes. The relative movement may be generated by motion stages, springs, stage driven flexures, inflatable O-rings, gas flow, and other mechanical means. It may be monitored by separation force, overhead camera, and vacuum/pressures in different area of the system. The relative movement may be any combination of stages movements and movement sequences. The separation speed, direction, and force can be well controlled in the system to achieve fast and reliable separation between mold and substrate, and at the same time maintain the pattern shape and details on the consolidated imprint resist.
摘要翻译：一种纳米压印系统和用于从用于制造的模具中分离具有纳米尺度图案的印迹基板的方法。通常，该系统包括用于创建，监测和控制模具和基板之间用于分离的相对运动的装置。它能够控制分离发生和何时完成。相对运动可以由运动台，弹簧，平台驱动的弯曲，可充气的O形圈，气流和其它机械装置产生。它可以通过分离力，架空照相机和系统不同区域中的真空/压力进行监测。相对运动可以是阶段运动和运动序列的任何组合。在系统中可以很好地控制分离速度，方向和力，以实现模具和基材之间的快速可靠的分离，同时在固化的抗蚀剂上保持图案形状和细节。

2. 发明申请

WO2008067394A2 IMPRINT LITHOGRAPHY WITH IMPROVED SUBSTRATE/MOLD SEPARATION 审中-公开
标题翻译：具有改进的基板/模具分离的印刷图
公开(公告)号：WO2008067394A2
公开(公告)日：2008-06-05
申请号：PCT/US2007/085783
申请日：2007-11-28
申请人： NANONEX CORPORATION , ZHANG, Wei , TAN, Hua , HU, Lin , CHOU, Stephen Y
发明人： ZHANG, Wei , TAN, Hua , HU, Lin , CHOU, Stephen Y
IPC分类号： B29C33/44 , B29C59/02 , B41F1/18
CPC分类号： B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： In imprint lithography, a mold (300) having a pattern of projecting and recessed regions is pressed into a moldable surface (302) on a substrate (301 ). The thus-imprinted moldabie surface (302) is permitted to at least partially harden to retain the imprint, and the substrate (301 ) and mold (300) are separated. In accordance with the invention, the substrate (301 ) is separated from the mold (300) by bending laterally distal regions (300A and 300B) (regions away from the center toward the edges) of the mold (300) transversely away from the interface and transversely restraining the substrate (301 ). The mold (300) can then be easily separated from the substrate (301 ) by transverse displacement (300). The separation can be facilitated by providing a mold (300) having a lateral dimension that on at least two sides extends beyond the corresponding lateral dimension of the substrate (301 ). Alternatively, the substrate (301 ) can have a greater lateral extent than the mold (300), and the mold (300) can be restrained. The distal regions of the substrate (301 ) can be bent in the transverse direction. Apparatus for effecting such separation is also described (e.g. Figs. 5 and 6).
摘要翻译：在压印光刻中，将具有突出和凹陷区域的图案的模具（300）压入基板（301）上的可模制表面（302）中。允许如此印刷的模具表面（302）至少部分地硬化以保持压印，并且基板（301）和模具（300）被分离。根据本发明，通过将模具（300）的横向远离界面的横向远端区域（300A和300B）（远离中心朝向边缘的区域）弯曲，将基底（301）与模具（300）分离。并横向限制衬底（301）。然后可以通过横向位移（300）容易地将模具（300）与基板（301）分离。可以通过提供具有在至少两个侧面上延伸超过衬底（301）的相应横向尺寸的横向尺寸的模具（300）来促进分离。或者，基板（301）可以具有比模具（300）更大的横向延伸，并且可以限制模具（300）。基板（301）的远端区域可以在横向方向上弯曲。还描述了用于实现这种分离的装置（例如，图5和图6）。

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