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    • 3. 发明申请
    • IMPRINT LITHOGRAPHY WITH IMPROVED SUBSTRATE/MOLD SEPARATION
    • 具有改进的基板/模具分离的印刷图
    • WO2008067394A3
    • 2008-08-14
    • PCT/US2007085783
    • 2007-11-28
    • NANONEX CORPZHANG WEITAN HUAHU LINCHOU STEPHEN Y
    • ZHANG WEITAN HUAHU LINCHOU STEPHEN Y
    • G03F7/00
    • B29C59/022B29C2035/0827B29C2059/023B82Y10/00B82Y40/00G03F7/0002
    • In imprint lithography, a mold (300) having a pattern of projecting and recessed regions is pressed into a moldable surface (302) on a substrate (301) The thus-imprinted moldable surface (302) is permitted to at least partially harden to retain the Imprint, and the substrate (301) and mold (300) are separated. In accordance with the invention, the substrate (301) is separated from the mold (300) by bending laterally distal regions (300A and 300B) (regions away from the center toward the edges) of the mold (300) transversely away from the interface and transversely restraining the substrate (301) The mold (300) can then be easily separated from the substrate (301) by transverse displacement (300) Apparatus for effecting such separation is also described (e. g. Figs 5 and 6).
    • 在压印光刻中,具有突出和凹陷区域的图案的模具(300)被压入基底(301)上的可模制表面(302)中。这样压印的可模制表面(302)被允许至少部分硬化以保持 印记和基板(301)和模具(300)分离。 根据本发明,通过将模具(300)的横向远离界面的横向远端区域(300A和300B)(远离中心朝向边缘的区域)弯曲,将基底(301)与模具(300)分离。 并且横向地限制基板(301)然后可以通过横向位移容易地将模具(300)与基板(301)分离(300)。还描述了用于实现这种分离的装置(例如图5和图6)。
    • 4. 发明申请
    • IMPRINT LITHOGRAPHY WITH IMPROVED SUBSTRATE/MOLD SEPARATION
    • 具有改进的基板/模具分离的印刷图
    • WO2008067394A2
    • 2008-06-05
    • PCT/US2007/085783
    • 2007-11-28
    • NANONEX CORPORATIONZHANG, WeiTAN, HuaHU, LinCHOU, Stephen Y
    • ZHANG, WeiTAN, HuaHU, LinCHOU, Stephen Y
    • B29C33/44B29C59/02B41F1/18
    • B29C59/022B29C2035/0827B29C2059/023B82Y10/00B82Y40/00G03F7/0002
    • In imprint lithography, a mold (300) having a pattern of projecting and recessed regions is pressed into a moldable surface (302) on a substrate (301 ). The thus-imprinted moldabie surface (302) is permitted to at least partially harden to retain the imprint, and the substrate (301 ) and mold (300) are separated. In accordance with the invention, the substrate (301 ) is separated from the mold (300) by bending laterally distal regions (300A and 300B) (regions away from the center toward the edges) of the mold (300) transversely away from the interface and transversely restraining the substrate (301 ). The mold (300) can then be easily separated from the substrate (301 ) by transverse displacement (300). The separation can be facilitated by providing a mold (300) having a lateral dimension that on at least two sides extends beyond the corresponding lateral dimension of the substrate (301 ). Alternatively, the substrate (301 ) can have a greater lateral extent than the mold (300), and the mold (300) can be restrained. The distal regions of the substrate (301 ) can be bent in the transverse direction. Apparatus for effecting such separation is also described (e.g. Figs. 5 and 6).
    • 在压印光刻中,将具有突出和凹陷区域的图案的模具(300)压入基板(301)上的可模制表面(302)中。 允许如此印刷的模具表面(302)至少部分地硬化以保持压印,并且基板(3​​01)和模具(300)被分离。 根据本发明,通过将模具(300)的横向远离界面的横向远端区域(300A和300B)(远离中心朝向边缘的区域)弯曲,将基底(301)与模具(300)分离。 并横向限制衬底(301)。 然后可以通过横向位移(300)容易地将模具(300)与基板(301)分离。 可以通过提供具有在至少两个侧面上延伸超过衬底(301)的相应横向尺寸的横向尺寸的模具(300)来促进分离。 或者,基板(301)可以具有比模具(300)更大的横向延伸,并且可以限制模具(300)。 基板(301)的远端区域可以在横向方向上弯曲。 还描述了用于实现这种分离的装置(例如,图5和图6)。