专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08747092B2 Fast nanoimprinting apparatus using deformale mold 有权
标题翻译：使用变形模具的快速纳米压印装置
公开(公告)号：US08747092B2
公开(公告)日：2014-06-10
申请号：US13011844
申请日：2011-01-21
申请人： Wei Zhang , Hua Tan , Lin Hu , Stephen Y. Chou
发明人： Wei Zhang , Hua Tan , Lin Hu , Stephen Y. Chou
IPC分类号： B29C59/16 , B29C70/44 , B29C35/08 , B29C43/10
CPC分类号： B29C59/02 , B29L2007/001 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The invention disclosed apparatuses and methods to do nanoimprint lithography using a deformable mold. Generally, the apparatus has a chamber with a transparent section on its top wall, which is capable of vacuuming and pressurizing. The deformable mold fixed firmly onto a hollow mold holder around its full periphery is attached to top inner surface of the chamber and positioned underneath the transparent section. The central area of the mold is freely accessible from underneath through the opening of the mold holder. An enclosed volume referring to mold mini-chamber is formed between the mold/holder and top wall of the chamber. Inside chamber, a stage assembly is installed. A chuck to vacuumly hold a substrate is mounted on top of the stage assembly. At beginning of the imprinting, the substrate with a layer of resist is positioned underneath the mold at a predetermined gap between them. Then, the substrate is moved up to contact with the mold either under vacuum or under atmosphere. The substrate and mold may be pressed further by introducing higher pressure inside the chamber. After consolidating the resist, the substrate is separated from the mold by either direct pull-down enabled by stage movement or deforming the mold enabled by differential pressure between the mold mini-chamber and the bulk volume of the chamber, or mixing of both.
摘要翻译：本发明公开了使用可变形模具进行纳米压印光刻的装置和方法。通常，该装置具有在其顶壁上具有透明部分的室，其能够进行抽真空和加压。可变形模具牢固地固定在围绕其整个周边的中空模具架上，附接到室的顶部内表面并且定位在透明部分下方。模具的中心区域可以通过模具夹具的开口从下面自由进入。在模具/保持器和腔室的顶壁之间形成涉及模具小室的封闭体积。内腔，安装了一个舞台组件。用于真空地保持基板的卡盘安装在平台组件的顶部上。在刻印开始时，具有抗蚀剂层的基板位于模具下面，处于它们之间的预定间隙。然后，在真空或大气下，将基板向上移动以与模具接触。可以通过在室内引入更高的压力来进一步压制基底和模具。在固化抗蚀剂之后，通过在模具微型室和室的体积之间的差压或通过两者的混合的阶段移动或使模具变形来实现直接下拉，衬底与模具分离。

2. 发明授权

US08377361B2 Imprint lithography with improved substrate/mold separation 有权
标题翻译：印刷光刻与改进的基板/模具分离
公开(公告)号：US08377361B2
公开(公告)日：2013-02-19
申请号：US11945033
申请日：2007-11-26
申请人： Wei Zhang , Hua Tan , Lin Hu , Stephen Y. Chou
发明人： Wei Zhang , Hua Tan , Lin Hu , Stephen Y. Chou
IPC分类号： B29C33/44
CPC分类号： B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： In imprint lithography, a mold having a pattern of projecting and recessed regions is pressed into a moldable surface on a substrate. The thus-imprinted moldable surface is permitted to at least partially harden to retain the imprint, and the substrate and mold are separated. In accordance with the invention, the substrate is separated from the mold by bending laterally distal regions (regions away from the center toward the edges) of the mold transversely away from the interface and transversely restraining the substrate. The mold can then be easily separated from the substrate by transverse displacement. The separation can be facilitated by providing a mold having a lateral dimension that on at least two sides extends beyond the corresponding lateral dimension of the substrate. Alternatively, the substrate can have a greater lateral extent than the mold, and the mold can be restrained. The distal regions of the substrate can be bent in the transverse direction. Apparatus for effecting such separation is also described.
摘要翻译：在压印光刻中，将具有突出和凹陷区域的图案的模具压入基板上的可模制表面中。允许这样印制的可模塑表面至少部分地硬化以保持印记，并且分离基底和模具。根据本发明，通过将模具的横向远离区域（远离中心朝向边缘的区域）横向远离界面弯曲并横向限制基底，将基底与模具分离。然后可以通过横向位移容易地将模具与基底分离。可以通过提供具有在至少两侧上延伸超过衬底的相应横向尺寸的横向尺寸的模具来促进分离。或者，基板可以具有比模具更大的横向延伸，并且可以限制模具。基板的远端区域可以在横向方向上弯曲。还描述了用于实现这种分离的装置。

3. 发明申请

US20100289184A1 Die Imprint By Double Side Force-Balanced Press For Step-And-Repeat Imprint Lithography 审中-公开
标题翻译：双面力平衡压印机用于步进重复压印平版印刷
公开(公告)号：US20100289184A1
公开(公告)日：2010-11-18
申请号：US12844622
申请日：2010-07-27
申请人： Wei Zhang , Hua Tan , Lin Hu , Stephen Y. Chou
发明人： Wei Zhang , Hua Tan , Lin Hu , Stephen Y. Chou
IPC分类号： B28B11/08
CPC分类号： B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/887
摘要： In accordance with the invention, step-and-repeat imprint lithography is effected by applying balanced pressing forces from both sides of a substrate. The pressing forces are substantially equal in amplitude and opposite in direction. With the pressing forces thus balanced, the fixture that steps and holds the substrate does not bear the load of imprinting. The balance allows use of a high resolution aligning stage to carry the substrate and to maintain high accuracy of positioning without being shifted by change of load. With this method, sufficient imprint pressure can be used to obtain high quality patterning, a thin and uniform residual layer, and a high fidelity pattern.
摘要翻译：根据本发明，通过从衬底的两侧施加平衡的压力来实现步进重复压印光刻。按压力在幅度上基本相等并且在方向上相反。由于如此平衡的按压力，步进并保持基板的夹具不承受压印的载荷。平衡允许使用高分辨率对准台承载基板并且保持高精度的定位而不会因负载变化而偏移。通过这种方法，可以使用足够的压印压力来获得高质量图案，薄而均匀的残留层和高保真图案。

4. 发明申请

US20080213418A1 ALIGN-TRANSFER-IMPRINT SYSTEM FOR IMPRINT LITHOGRPHY 审中-公开
标题翻译：用于绘制光刻的对准传输印刷系统
公开(公告)号：US20080213418A1
公开(公告)日：2008-09-04
申请号：US11931280
申请日：2007-10-31
申请人： Hua Tan , Wei Zhang , He Gao , Linshu Kong , Lin Hu , Colby Steere , Stephen Y. Chou
发明人： Hua Tan , Wei Zhang , He Gao , Linshu Kong , Lin Hu , Colby Steere , Stephen Y. Chou
IPC分类号： H01L21/304
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7042
摘要： An imprint system for imprint lithography comprises an alignment subsystem and an imprint subsystem. The mask (mold) and the wafer for imprinting (substrate) are align on the alignment subsystem and contacted to each other to form a mask/wafer set. The mask/wafer set is then transferred onto the imprint subsystem while alignment is maintained. The mask/wafer set is then imprinted on the imprint subsystem. During transfer, the mask/wafer set can be held in alignment by surface. The surface adhesion can be enhanced by local pressing, local heating, or both. Alternatively, the mask/wafer set can be held in alignment by clamping. Advantageously, the imprinting is effected by fluid pressure imprinting.
摘要翻译：用于压印光刻的压印系统包括对准子系统和压印子系统。掩模（模具）和用于压印的晶片（衬底）在对准子系统上对准并且彼此接触以形成掩模/晶片组。然后将掩模/晶片组转移到压印子系统上，同时保持对准。然后将掩模/晶片组印在压印子系统上。在传送期间，掩模/晶片组可以通过表面保持对准。表面粘合可通过局部加压，局部加热或两者增强。或者，掩模/晶片组可以通过夹持保持对准。有利地，压印通过流体压力印迹来实现。

5. 发明申请

US20080122138A1 DIE IMPRINT BY DOUBLE SIDE FORCE-BALANCED PRESS FOR STEP-AND-REPEAT IMPRINT LITHOGRAPHY 有权
标题翻译：双面平衡压印机用于步进和重复印刷机的印刷
公开(公告)号：US20080122138A1
公开(公告)日：2008-05-29
申请号：US11945407
申请日：2007-11-27
申请人： Wei Zhang , Hua Tan , Lin Hu , Stephen Y. Chou
发明人： Wei Zhang , Hua Tan , Lin Hu , Stephen Y. Chou
IPC分类号： B29C59/02 , B41F1/18
CPC分类号： B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/887
摘要： In accordance with the invention, step-and-repeat imprint lithography is effected by applying balanced pressing forces from both sides of a substrate. The pressing forces are substantially equal in amplitude and opposite in direction. With the pressing forces thus balanced, the fixture that steps and holds the substrate does not bear the load of imprinting. The balance allows use of a high resolution aligning stage to carry the substrate and to maintain high accuracy of positioning without being shifted by change of load. With this method, sufficient imprint pressure can be used to obtain high quality patterning, a thin and uniform residual layer, and a high fidelity pattern.
摘要翻译：根据本发明，通过从衬底的两侧施加平衡的压力来实现步进重复压印光刻。按压力在幅度上基本相等并且在方向上相反。由于如此平衡的按压力，步进并保持基板的夹具不承受压印的载荷。平衡允许使用高分辨率对准台承载基板并且保持高精度的定位而不会因负载变化而偏移。通过这种方法，可以使用足够的压印压力来获得高质量图案，薄而均匀的残留层和高保真图案。

6. 发明申请

US20100119641A1 IMPRINT LITHOGRAPHY WITH IMPROVED SUBSTRATE/MOLD SEPARATION 有权
标题翻译：具有改进的基板/模具分离的印刷图
公开(公告)号：US20100119641A1
公开(公告)日：2010-05-13
申请号：US12691202
申请日：2010-01-21
申请人： Wei Zhang , Hua Tan , Lin Hu , Stephen Y. Chou
发明人： Wei Zhang , Hua Tan , Lin Hu , Stephen Y. Chou
IPC分类号： B29C59/02 , B28B7/10
CPC分类号： B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： In imprint lithography, a mold having a pattern of projecting and recessed regions is pressed into a moldable surface on a substrate. The thus-imprinted moldable surface is permitted to at least partially harden to retain the imprint, and the substrate and mold are separated. In accordance with the invention, the substrate is separated from the mold by bending laterally distal regions (regions away from the center toward the edges) of the mold transversely away from the interface and transversely restraining the substrate. The mold can then be easily separated from the substrate by transverse displacement. The separation can be facilitated by providing a mold having a lateral dimension that on at least two sides extends beyond the corresponding lateral dimension of the substrate. Alternatively, the substrate can have a greater lateral extent than the mold, and the mold can be restrained. The distal regions of the substrate can be bent in the transverse direction. Apparatus for effecting such separation is also described.
摘要翻译：在压印光刻中，将具有突出和凹陷区域的图案的模具压入基板上的可模制表面中。允许这样印制的可模塑表面至少部分地硬化以保持印记，并且分离基底和模具。根据本发明，通过将模具的横向远离区域（远离中心朝向边缘的区域）横向远离界面弯曲并横向限制基底，将基底与模具分离。然后可以通过横向位移容易地将模具与基底分离。可以通过提供具有在至少两侧上延伸超过衬底的相应横向尺寸的横向尺寸的模具来促进分离。或者，基板可以具有比模具更大的横向延伸，并且可以限制模具。基板的远端区域可以在横向方向上弯曲。还描述了用于实现这种分离的装置。

7. 发明申请

US20080131623A1 METHOD AND APPARATUS TO APPLY SURFACE RELEASE COATING FOR IMPRINT MOLD 有权
标题翻译：应用表面释放涂料进行印模的方法和装置
公开(公告)号：US20080131623A1
公开(公告)日：2008-06-05
申请号：US11945470
申请日：2007-11-27
申请人： Wei Zhang , Lin Hu , Hua Tan , He Gao , Linshu Kong , Stephen Y. Chou
发明人： Wei Zhang , Lin Hu , Hua Tan , He Gao , Linshu Kong , Stephen Y. Chou
IPC分类号： C23C16/00 , B28B7/38 , H05H1/24
CPC分类号： H01J37/32431 , B82Y10/00 , B82Y40/00 , C23C14/12 , G03F7/0002 , H01J2237/3355
摘要： In imprint lithography, the mold is coated with a surface release layer for a non-sticking separation. Bonding strength of the release layer to the mold depends on the cleanness of the surface and the process of release layer deposition. In accordance with the invention, the mold is disposed in an evacuable chamber, cleaned to remove surface organic contamination and coated with the surface release layer in a chamber, all without relocation or undesired time delay. The chamber encloses a support chuck for the mold or substrate, a surface cleaner unit adjacent the support, a heating source adjacent the support, and advantageously, sensors of measuring chamber pressure, vapor partial pressure and moisture concentration. A vapor source connected to the chamber supplies release surfactant vapor. The mold is cleaned, and the cleaning is followed by vapor phase deposition of the surfactant. The mold is advantageously heated. Typical ways of cleaning include exposure to ozone or plasma ion etch. Surfactant vapor may be generated by liquid surface vaporization, liquid injection or spray vaporization. A surface adhesion promoter can be coated on the substrate by a similar method with the same apparatus.
摘要翻译：在压印光刻中，模具涂有用于不粘分离的表面剥离层。脱模层与模具的粘合强度取决于表面的清洁度和剥离层沉积过程。根据本发明，模具设置在可抽空的室中，被清洁以除去表面有机污染物并且涂覆在室中的表面释放层，全部不需要重新定位或不期望的时间延迟。腔室包围用于模具或基底的支撑卡盘，与支撑件相邻的表面清洁器单元，邻近支撑件的加热源，有利地是测量室压力，蒸气分压和水分浓度的传感器。连接到室的蒸气源提供表面活性剂蒸气。模具被清洁，清洁之后是表面活性剂的气相沉积。有利地加热模具。典型的清洁方法包括暴露于臭氧或等离子体离子蚀刻。表面活性剂蒸气可以通过液体表面蒸发，液体注入或喷雾蒸发来产生。表面粘合促进剂可以通过类似的方法用相同的装置涂覆在基材上。

8. 发明授权

US08337959B2 Method and apparatus to apply surface release coating for imprint mold 有权
标题翻译：表面剥离涂层用于压印模具的方法和装置
公开(公告)号：US08337959B2
公开(公告)日：2012-12-25
申请号：US11945470
申请日：2007-11-27
申请人： Wei Zhang , Lin Hu , Hua Tan , He Gao , Linshu Kong , Stephen Y. Chou
发明人： Wei Zhang , Lin Hu , Hua Tan , He Gao , Linshu Kong , Stephen Y. Chou
IPC分类号： H05H1/24 , C23C16/00 , B05D3/00 , B05D3/02
CPC分类号： H01J37/32431 , B82Y10/00 , B82Y40/00 , C23C14/12 , G03F7/0002 , H01J2237/3355
摘要： In imprint lithography, the mold is coated with a surface release layer for a non-sticking separation. Bonding strength of the release layer to the mold depends on the cleanness of the surface and the process of release layer deposition. In accordance with the invention, the mold is disposed in an evacuable chamber, cleaned to remove surface organic contamination and coated with the surface release layer in a chamber, all without relocation or undesired time delay. The chamber encloses a support chuck for the mold or substrate, a surface cleaner unit adjacent the support, a heating source adjacent the support, and advantageously, sensors of measuring chamber pressure, vapor partial pressure and moisture concentration. A vapor source connected to the chamber supplies release surfactant vapor. The mold is cleaned, and the cleaning is followed by vapor phase deposition of the surfactant. The mold is advantageously heated. Typical ways of cleaning include exposure to ozone or plasma ion etch. Surfactant vapor may be generated by liquid surface vaporization, liquid injection or spray vaporization. A surface adhesion promoter can be coated on the substrate by a similar method with the same apparatus.
摘要翻译：在压印光刻中，模具涂有用于不粘分离的表面剥离层。脱模层与模具的粘合强度取决于表面的清洁度和剥离层沉积过程。根据本发明，模具设置在可抽空的室中，被清洁以除去表面有机污染物并且涂覆在室中的表面释放层，全部不需要重新定位或不期望的时间延迟。腔室包围用于模具或基底的支撑卡盘，与支撑件相邻的表面清洁器单元，邻近支撑件的加热源，有利地是测量室压力，蒸气分压和水分浓度的传感器。连接到室的蒸气源提供表面活性剂蒸气。模具被清洁，清洁之后是表面活性剂的气相沉积。有利地加热模具。典型的清洁方法包括暴露于臭氧或等离子体离子蚀刻。表面活性剂蒸气可以通过液体表面蒸发，液体注入或喷雾蒸发来产生。表面粘合促进剂可以通过类似的方法用相同的装置涂覆在基材上。

9. 发明申请

US20110180965A1 FAST NANOIMPRINTING APPARATUS USING DEFORMALE MOLD 有权
标题翻译：使用变形模具的快速纳米装置
公开(公告)号：US20110180965A1
公开(公告)日：2011-07-28
申请号：US13011844
申请日：2011-01-21
申请人： Wei Zhang , Hua Tan , Lin Hu , Stephen Y. Chou
发明人： Wei Zhang , Hua Tan , Lin Hu , Stephen Y. Chou
IPC分类号： B28B11/08 , B29C35/08 , B28B21/42 , B28B17/00
CPC分类号： B29C59/02 , B29L2007/001 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The invention disclosed apparatuses and methods to do nanoimprint lithography using a deformable mold. Generally, the apparatus has a chamber with a transparent section on its top wall, which is capable of vacuuming and pressurizing. The deformable mold fixed firmly onto a hollow mold holder around its full periphery is attached to top inner surface of the chamber and positioned underneath the transparent section. The central area of the mold is freely accessible from underneath through the opening of the mold holder. An enclosed volume referring to mold mini-chamber is formed between the mold/holder and top wall of the chamber. Inside chamber, a stage assembly is installed. A chuck to vacuumly hold a substrate is mounted on top of the stage assembly. At beginning of the imprinting, the substrate with a layer of resist is positioned underneath the mold at a predetermined gap between them. Then, the substrate is moved up to contact with the mold either under vacuum or under atmosphere. The substrate and mold may be pressed further by introducing higher pressure inside the chamber. After consolidating the resist, the substrate is separated from the mold by either direct pull-down enabled by stage movement or deforming the mold enabled by differential pressure between the mold mini-chamber and the bulk volume of the chamber, or mixing of both.
摘要翻译：本发明公开了使用可变形模具进行纳米压印光刻的装置和方法。通常，该装置具有在其顶壁上具有透明部分的室，其能够进行抽真空和加压。可变形模具牢固地固定在围绕其整个周边的中空模具架上，附接到室的顶部内表面并且定位在透明部分下方。模具的中心区域可以通过模具夹具的开口从下面自由进入。在模具/保持器和腔室的顶壁之间形成涉及模具小室的封闭体积。内腔，安装了一个舞台组件。用于真空地保持基板的卡盘安装在平台组件的顶部上。在刻印开始时，具有抗蚀剂层的基板位于模具下面，处于它们之间的预定间隙。然后，在真空或大气下，将基板向上移动以与模具接触。可以通过在室内引入更高的压力来进一步压制基底和模具。在固化抗蚀剂之后，通过在模具微型室和室的体积之间的差压或通过两者的混合的阶段移动或使模具变形来实现直接下拉，衬底与模具分离。

10. 发明申请

US20110155060A1 Method And Apparatus To Apply Surface Release Coating For Imprint Mold 审中-公开
标题翻译：用于印刷模具的表面剥离涂层的方法和装置
公开(公告)号：US20110155060A1
公开(公告)日：2011-06-30
申请号：US13027530
申请日：2011-02-15
申请人： Wei Zhang , Lin Hu , Hua Tan , Linshu Kong , Stephen Y. Chou
发明人： Wei Zhang , Lin Hu , Hua Tan , Linshu Kong , Stephen Y. Chou
IPC分类号： C23C16/513
CPC分类号： H01J37/32431 , B82Y10/00 , B82Y40/00 , C23C14/12 , G03F7/0002 , H01J2237/3355
摘要： A surface coating apparatus for preparing a work piece having a working surface for imprint lithography, wherein the work piece comprises either a mold or a substrate. The apparatus includes a vacuum chamber and a generator to produce chemical reaction radicals for cleaning the working surface. The generator may be located inside said vacuum chamber and connected to an inner surface of said vacuum chamber or external to the vacuum chamber and connected thereto via suitable couplings. A fixture within the vacuum chamber is configured to hold the work piece with the working surface accessible by the chemical reaction radicals, and a means is provided for depositing a molecular layer of surfactant on the working surface inside the vacuum chamber.
摘要翻译：一种用于制备具有用于压印光刻的工作表面的工件的表面涂覆装置，其中所述工件包括模具或基板。该装置包括一个真空室和发生器，以产生用于清洁工作表面的化学反应基团。发生器可以位于所述真空室内并且连接到所述真空室的内表面或者在真空室的外部，并通过适当的联接与其连接。真空室内的固定装置构造成保持工件与化学反应基团可接近的工作表面，并提供一种用于在真空室内的工作表面上沉积表面活性剂分子的装置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式