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1. 发明授权

US09091666B2 Extended defect sizing range for wafer inspection 有权
标题翻译：晶圆检查扩展缺陷尺寸范围
公开(公告)号：US09091666B2
公开(公告)日：2015-07-28
申请号：US13369294
申请日：2012-02-09
申请人： Zhongping Cai , Yury Yuditsky , Anatoly Romanovsky , Alexander Slobodov
发明人： Zhongping Cai , Yury Yuditsky , Anatoly Romanovsky , Alexander Slobodov
IPC分类号： G01N21/88 , G01N21/95
CPC分类号： G01N21/9501
摘要： Various embodiments for extended defect sizing range for wafer inspection are provided. One inspection system includes an illumination subsystem configured to direct light to the wafer. The system also includes an image sensor configured to detect light scattered from wafer defects and to generate output responsive to the scattered light. The image sensor is also configured to not have an anti-blooming feature such that when a pixel in the image sensor reaches full well capacity, excess charge flows from the pixel to one or more neighboring pixels in the image sensor. The system further includes a computer subsystem configured to detect the defects on the wafer using the output and to determine a size of the defects on the wafer using the output generated by a pixel and any neighboring pixels of the pixel to which the excess charge flows.
摘要翻译：提供了用于晶片检查的扩展缺陷尺寸范围的各种实施例。一个检查系统包括配置成将光引导到晶片的照明子系统。该系统还包括图像传感器，其被配置为检测从晶片缺陷散射的光并且响应于散射光产生输出。图像传感器还被配置为不具有防喷射特征，使得当图像传感器中的像素达到满井容量时，过量电荷从图像传感器中的像素流向一个或多个相邻像素。该系统还包括被配置为使用输出来检测晶片上的缺陷的计算机子系统，并且使用由像素和多余电荷流过的像素的任何相邻像素产生的输出来确定晶片上的缺陷的尺寸。

2. 发明申请

US20130208269A1 Extended Defect Sizing Range for Wafer Inspection 有权
标题翻译：晶圆检查的扩展缺陷尺寸范围
公开(公告)号：US20130208269A1
公开(公告)日：2013-08-15
申请号：US13369294
申请日：2012-02-09
申请人： Zhongping Cai , Yury Yuditsky , Anatoly Romanovsky , Alexander Slobodov
发明人： Zhongping Cai , Yury Yuditsky , Anatoly Romanovsky , Alexander Slobodov
IPC分类号： G01N21/88
CPC分类号： G01N21/9501
摘要： Various embodiments for extended defect sizing range for wafer inspection are provided.
摘要翻译：提供了用于晶片检查的扩展缺陷尺寸范围的各种实施例。

3. 发明授权

US07746462B2 Inspection systems and methods for extending the detection range of an inspection system by forcing the photodetector into the non-linear range 有权
标题翻译：用于通过强制光电探测器进入非线性范围来扩展检查系统的检测范围的检查系统和方法
公开(公告)号：US07746462B2
公开(公告)日：2010-06-29
申请号：US11751293
申请日：2007-05-21
申请人： Zhongping Cai , Alexander Slobodov , Anatoly Romanovsky , Christian H. Wolters
发明人： Zhongping Cai , Alexander Slobodov , Anatoly Romanovsky , Christian H. Wolters
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/8851 , G01N2201/1241 , G01N2201/12769 , H01J43/18 , H01J43/30
摘要： An inspection system and method is provided herein for increasing the detection range of the inspection system. According to one embodiment, the inspection system may include a photodetector having a plurality of stages, which are adapted to convert light scattered from a specimen into an output signal, and a voltage divider network coupled for extending the detection range of the photodetector (and thus, the detection range of the inspection system) by saturating at least one of the stages. This forces the photodetector to operate in a non-linear manner. However, measurement inaccuracies are avoided by calibrating the photodetector output to remove any non-linear effects that may be created by intentionally saturating the at least one of the stages. In one example, a table of values may be generated during a calibration phase to convert the photodetector output into an actual amount of scattered light.
摘要翻译：本文提供了一种用于增加检查系统的检测范围的检查系统和方法。根据一个实施例，检查系统可以包括具有多个级的光电检测器，其适于将从样本散射的光转换成输出信号，以及耦合的用于扩展光电检测器的检测范围的分压器网络，检查系统的检测范围）通过饱和至少一个级。这迫使光电探测器以非线性方式工作。然而，通过校准光电检测器输出以消除可能通过故意饱和至少一个级而产生的任何非线性效应来避免测量不准确。在一个示例中，可以在校准阶段期间生成值表，以将光电检测器输出转换成实际的散射光量。

4. 发明申请

US20080291454A1 Inspection Systems and Methods for Extending the Detection Range of an Inspection System by Forcing the Photodetector into the Non-Linear Range 有权
标题翻译：检测系统和方法通过强制光检测器进入非线性范围来扩展检测系统的检测范围
公开(公告)号：US20080291454A1
公开(公告)日：2008-11-27
申请号：US11751293
申请日：2007-05-21
申请人： Zhongping Cai , Alexander Slobodov , Anatoly Romanovsky , Christian H. Wolters
发明人： Zhongping Cai , Alexander Slobodov , Anatoly Romanovsky , Christian H. Wolters
IPC分类号： G01N21/55
CPC分类号： G01N21/9501 , G01N21/8851 , G01N2201/1241 , G01N2201/12769 , H01J43/18 , H01J43/30
摘要： An inspection system and method is provided herein for increasing the detection range of the inspection system. According to one embodiment, the inspection system may include a photodetector having a plurality of stages, which are adapted to convert light scattered from a specimen into an output signal, and a voltage divider network coupled for extending the detection range of the photodetector (and thus, the detection range of the inspection system) by saturating at least one of the stages. This forces the photodetector to operate in a non-linear manner. However, measurement inaccuracies are avoided by calibrating the photodetector output to remove any non-linear effects that may be created by intentionally saturating the at least one of the stages. In one example, a table of values may be generated during a calibration phase to convert the photodetector output into an actual amount of scattered light.
摘要翻译：本文提供了一种用于增加检查系统的检测范围的检查系统和方法。根据一个实施例，检查系统可以包括具有多个级的光电检测器，其适于将从样本散射的光转换成输出信号，以及耦合的用于扩展光电检测器的检测范围的分压器网络，检查系统的检测范围）通过饱和至少一个级。这迫使光电探测器以非线性方式工作。然而，通过校准光电检测器输出以消除可能通过故意饱和至少一个级而产生的任何非线性效应来避免测量不准确。在一个示例中，可以在校准阶段期间生成值表，以将光电检测器输出转换成实际的散射光量。

5. 发明授权

US09279774B2 Wafer inspection 有权
标题翻译：晶圆检查
公开(公告)号：US09279774B2
公开(公告)日：2016-03-08
申请号：US13544954
申请日：2012-07-09
申请人： Anatoly Romanovsky , Ivan Maleev , Daniel Kavaldjiev , Yury Yuditsky , Dirk Woll , Stephen Biellak , Mehdi Vaez-Iravani , Guoheng Zhao
发明人： Anatoly Romanovsky , Ivan Maleev , Daniel Kavaldjiev , Yury Yuditsky , Dirk Woll , Stephen Biellak , Mehdi Vaez-Iravani , Guoheng Zhao
IPC分类号： G01N21/00 , G01N21/95 , G01N21/47 , G01N21/956
CPC分类号： G01N21/9501 , G01N21/47 , G01N21/8806 , G01N21/8851 , G01N21/956
摘要： Systems configured to inspect a wafer are provided. One system includes an illumination subsystem configured to simultaneously form multiple illumination areas on the wafer with substantially no illumination flux between each of the areas. The system also includes a scanning subsystem configured to scan the multiple illumination areas across the wafer. In addition, the system includes a collection subsystem configured to simultaneously and separately image light scattered from each of the areas onto two or more sensors. Characteristics of the two or more sensors are selected such that the scattered light is not imaged into gaps between the two or more sensors. The two or more sensors generate output responsive to the scattered light. The system further includes a computer subsystem configured to detect defects on the wafer using the output of the two or more sensors.
摘要翻译：提供了配置用于检查晶片的系统。一个系统包括照明子系统，该照明子系统配置成在晶片上同时形成多个照明区域，其中每个区域之间基本上没有照明通量。该系统还包括扫描子系统，被配置为扫描晶片上的多个照明区域。另外，该系统包括一个收集子系统，该收集子系统配置成同时并分别将从每个区域散射的光分别映射到两个或更多个传感器上。选择两个或更多个传感器的特征，使得散射光不被成像到两个或更多个传感器之间的间隙中。两个或多个传感器响应散射光产生输出。该系统还包括被配置为使用两个或更多个传感器的输出来检测晶片上的缺陷的计算机子系统。

6. 发明申请

US20130016346A1 Wafer Inspection 有权
标题翻译：晶圆检验
公开(公告)号：US20130016346A1
公开(公告)日：2013-01-17
申请号：US13544954
申请日：2012-07-09
申请人： Anatoly Romanovsky , Ivan Maleev , Daniel Kavaldjiev , Yury Yuditsky , Dirk Woll , Stephen Biellak
发明人： Anatoly Romanovsky , Ivan Maleev , Daniel Kavaldjiev , Yury Yuditsky , Dirk Woll , Stephen Biellak
IPC分类号： G01N21/956
CPC分类号： G01N21/9501 , G01N21/47 , G01N21/8806 , G01N21/8851 , G01N21/956
摘要： Systems configured to inspect a wafer are provided.
摘要翻译：提供了配置用于检查晶片的系统。

7. 发明授权

US07423250B2 Systems, circuits and methods for extending the detection range of an inspection system by avoiding circuit saturation 有权
标题翻译：通过避免电路饱和来延长检查系统的检测范围的系统，电路和方法
公开(公告)号：US07423250B2
公开(公告)日：2008-09-09
申请号：US11181237
申请日：2005-07-14
申请人： Christian H. Wolters , Anatoly Romanovsky , Alexander Slobodov
发明人： Christian H. Wolters , Anatoly Romanovsky , Alexander Slobodov
IPC分类号： H03F3/08
CPC分类号： H03F3/08
摘要： Inspection systems, circuits and methods are provided to enhance defect detection by addressing saturation levels of the amplifier and analog-digital circuitry as a limiting factor of the measurement detection range of an inspection system. In accordance with one embodiment of the invention, a method for inspecting a specimen includes directing light to the specimen and detecting light scattered from the specimen. However, the step of detecting may use only one photodetector for detecting the light scattered from the specimen and for converting the light into an electrical signal. The step of detecting also includes generating a first signal and a second signal in response to the electrical signal, where the second signal differs from the first. For example, the first signal may be generated to have a higher resolution than the second signal for detecting substantially lower levels of the scattered light. In most cases, the method may use the first signal for detecting features, defects or light scattering properties of the specimen until the first signal reaches a predetermined threshold value. Once the predetermined threshold value is reached, however, the method may use the second signal for said detecting.
摘要翻译：提供了检查系统，电路和方法，以通过解决放大器和模拟数字电路的饱和电平作为检查系统的测量检测范围的限制因素来增强缺陷检测。根据本发明的一个实施例，用于检查样本的方法包括将光引导到样本并检测从样本散射的光。然而，检测步骤可以仅使用一个光电检测器来检测从样本散射的光并将光转换成电信号。检测步骤还包括响应于电信号产生第一信号和第二信号，其中第二信号与第一信号不同。例如，可以产生第一信号以具有比用于检测基本上较低级别的散射光的第二信号更高的分辨率。在大多数情况下，该方法可以使用第一信号来检测样本的特征，缺陷或光散射性质，直到第一信号达到预定阈值。然而，一旦达到预定阈值，该方法可以使用第二信号进行所述检测。

8. 发明授权

US09068952B2 Method and apparatus for producing and measuring dynamically focussed, steered, and shaped oblique laser illumination for spinning wafer inspection system 有权
标题翻译：用于旋转晶片检测系统的动态聚焦，转向和成形斜激光照明的生产和测量方法和装置
公开(公告)号：US09068952B2
公开(公告)日：2015-06-30
申请号：US12584294
申请日：2009-09-02
申请人： Aleksey Petrenko , Christian Wolters , Zhongping Cai , Anatoly Romanovsky , Bret Whiteside
发明人： Aleksey Petrenko , Christian Wolters , Zhongping Cai , Anatoly Romanovsky , Bret Whiteside
IPC分类号： G01N21/88 , G01N21/95 , G02B27/09
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2201/06113 , G01N2201/0633 , G02B27/0972
摘要： A method and apparatus for producing high frequency dynamically focused oblique laser illumination for a spinning wafer inspection system. The focus is changed by changing the beam direction incidence angle so as to bring focal spot onto the wafer surface.Disclosed herein is a system and method for automatic beam shaping (i.e., spot size) and steering (i.e., position) for a spinning wafer inspection system, combined into a single module. Also disclosed is a method and system for measuring the beam position/size/shape and angle with sufficient resolution to make corrections using feedback from the monitor.
摘要翻译：一种用于生产用于旋转晶片检测系统的高频动态聚焦倾斜激光照明的方法和装置。通过改变光束方向入射角来改变焦点，以便将焦斑引入晶片表面。本文公开了一种用于旋转晶片检查系统的自动光束成形（即光点尺寸）和转向（即，位置）的系统和方法，其组合成单个模块。还公开了一种用于以足够的分辨率测量光束位置/尺寸/形状和角度以使用来自监视器的反馈进行校正的方法和系统。

9. 发明授权

US07777875B2 Systems, circuits and methods for extending the detection range of an inspection system by avoiding detector saturation 有权
标题翻译：用于通过避免检测器饱和来扩展检测系统的检测范围的系统，电路和方法
公开(公告)号：US07777875B2
公开(公告)日：2010-08-17
申请号：US12193469
申请日：2008-08-18
申请人： Christian H. Wolters , Anatoly Romanovsky , Alexander Slobodov
发明人： Christian H. Wolters , Anatoly Romanovsky , Alexander Slobodov
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/21 , G01N21/47 , G01N21/95607 , H01J43/30
摘要： Inspection systems, circuits and methods are provided to enhance defect detection by addressing anode saturation as a limiting factor of the measurement detection range of a photomultiplier tube (PMT) detector. In accordance with one embodiment of the invention, a method for inspecting a specimen includes directing light to the specimen and detecting light scattered from the specimen. The step of detecting may include monitoring an anode current of the PMT detector, and detecting features, defects or light scattering properties of the specimen using the anode current until the anode current reaches a predetermined threshold. Thereafter, the method may use a dynode current of the PMT for detecting the features, defects or light scattering properties of the specimen.
摘要翻译：提供检测系统，电路和方法，以通过寻址阳极饱和度作为光电倍增管（PMT）检测器的测量检测范围的限制因素来增强缺陷检测。根据本发明的一个实施例，用于检查样本的方法包括将光引导到样本并检测从样本散射的光。检测步骤可以包括监测PMT检测器的阳极电流，并且使用阳极电流检测样品的特征，缺陷或光散射特性，直到阳极电流达到预定阈值。此后，该方法可以使用PMT的倍增电流来检测样品的特征，缺陷或光散射性质。

10. 发明申请

US20090040511A1 SYSTEMS, CIRCUITS AND METHODS FOR EXTENDING THE DETECTION RANGE OF AN INSPECTION SYSTEM BY AVOIDING DETECTOR SATURATION 有权
标题翻译：用于通过避免检测器饱和度来扩展检测系统的检测范围的系统，电路和方法
公开(公告)号：US20090040511A1
公开(公告)日：2009-02-12
申请号：US12193469
申请日：2008-08-18
申请人： Christian H. Wolters , Anatoly Romanovsky , Alexander Slobodov
发明人： Christian H. Wolters , Anatoly Romanovsky , Alexander Slobodov
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/21 , G01N21/47 , G01N21/95607 , H01J43/30
摘要： Inspection systems, circuits and methods are provided to enhance defect detection by addressing anode saturation as a limiting factor of the measurement detection range of a photomultiplier tube (PMT) detector. In accordance with one embodiment of the invention, a method for inspecting a specimen includes directing light to the specimen and detecting light scattered from the specimen. The step of detecting may include monitoring an anode current of the PMT detector, and detecting features, defects or light scattering properties of the specimen using the anode current until the anode current reaches a predetermined threshold. Thereafter, the method may use a dynode current of the PMT for detecting the features, defects or light scattering properties of the specimen.
摘要翻译：提供检测系统，电路和方法，以通过寻址阳极饱和度作为光电倍增管（PMT）检测器的测量检测范围的限制因素来增强缺陷检测。根据本发明的一个实施例，用于检查样本的方法包括将光引导到样本并检测从样本散射的光。检测步骤可以包括监测PMT检测器的阳极电流，并且使用阳极电流检测样品的特征，缺陷或光散射特性，直到阳极电流达到预定阈值。此后，该方法可以使用PMT的倍增电流来检测样品的特征，缺陷或光散射性质。

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