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1. 发明申请

US20120237875A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND 有权
标题翻译：辐射敏感性树脂组合物，形成耐蚀图案的方法，聚合物和聚合物
公开(公告)号：US20120237875A1
公开(公告)日：2012-09-20
申请号：US13420618
申请日：2012-03-15
申请人： Yuusuke ASANO , Mitsuo Satou , Hiromitsu Nakashima , Kazuki Kasahara , Yoshifumi Oizumi , Masafumi Hori , Takanori Kawakami , Yasuhiko Matsuda , Kazuo Nakahara
发明人： Yuusuke ASANO , Mitsuo Satou , Hiromitsu Nakashima , Kazuki Kasahara , Yoshifumi Oizumi , Masafumi Hori , Takanori Kawakami , Yasuhiko Matsuda , Kazuo Nakahara
IPC分类号： C08F222/14 , G03F7/20 , C08F122/18 , C08F226/06 , C07C69/593 , C08F220/22 , C08F224/00 , C07C69/618 , C07C69/75 , C07D209/48 , G03F7/004 , C08F222/18
CPC分类号： G03F7/0392 , C08F20/22 , G03F7/0046 , G03F7/038 , G03F7/0388 , G03F7/039 , G03F7/20 , G03F7/2041 , G03F7/30 , G03F7/32
摘要： A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR′—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R′ represents a hydrogen atom or an alkali-labile group, and “#” and “##” indicates a bonding hand bonded to R1. -A-R1 (x)
摘要翻译：辐射敏感性树脂组合物包括包含酸不稳定基团的第一聚合物，暴露于辐射时产生酸的酸产生剂和包含氟原子的第二聚合物和由通式（x）表示的官能团。第二聚合物的氟原子含量高于第一聚合物的氟原子含量。 R1表示碱不稳定基团。 A表示氧原子，-NR' - ， - CO-O - 或-SO 2 -O - ，其中由A表示的氧原子不是直接与芳环键合的氧原子，羰基或亚砜基，R'表示氢原子或碱不稳定基团，“＃”和“##”表示与R1键合的键。 -A-R1（x）

2. 发明授权

US08728706B2 Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound 有权
标题翻译：辐射敏感树脂组合物，抗蚀剂图案形成方法，聚合物和可聚合化合物
公开(公告)号：US08728706B2
公开(公告)日：2014-05-20
申请号：US13420618
申请日：2012-03-15
申请人： Yuusuke Asano , Mitsuo Satou , Hiromitsu Nakashima , Kazuki Kasahara , Yoshifumi Oizumi , Masafumi Hori , Takanori Kawakami , Yasuhiko Matsuda , Kazuo Nakahara
发明人： Yuusuke Asano , Mitsuo Satou , Hiromitsu Nakashima , Kazuki Kasahara , Yoshifumi Oizumi , Masafumi Hori , Takanori Kawakami , Yasuhiko Matsuda , Kazuo Nakahara
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0392 , C08F20/22 , G03F7/0046 , G03F7/038 , G03F7/0388 , G03F7/039 , G03F7/20 , G03F7/2041 , G03F7/30 , G03F7/32
摘要： A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR′—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R′ represents a hydrogen atom or an alkali-labile group, and “#” and “##” indicates a bonding hand bonded to R1. -A-R1 (x)
摘要翻译：辐射敏感性树脂组合物包括包含酸不稳定基团的第一聚合物，暴露于辐射时产生酸的酸产生剂和包含氟原子的第二聚合物和由通式（x）表示的官能团。第二聚合物的氟原子含量高于第一聚合物的氟原子含量。 R1表示碱不稳定基团。 A表示氧原子，-NR' - ， - CO-O - 或-SO 2 -O - ，其中由A表示的氧原子不是直接与芳环键合的氧原子，羰基或亚砜基，R'表示氢原子或碱不稳定基团，“＃”和“##”表示与R1键合的键。 -A-R1（x）

3. 发明申请

US20120295198A1 RADIATION-SENSITIVE RESIN COMPOSITION 有权
标题翻译：辐射敏感性树脂组合物
公开(公告)号：US20120295198A1
公开(公告)日：2012-11-22
申请号：US13560987
申请日：2012-07-27
申请人： Yasuhiko MATSUDA , Takanori Kawakami , Kazuki Kasahara , Ken Maruyama
发明人： Yasuhiko MATSUDA , Takanori Kawakami , Kazuki Kasahara , Ken Maruyama
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： A radiation-sensitive resin composition includes a compound represented by a following formula (1), and a first polymer that serves as a base resin. R1 represents a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or the like. The M+ represents a monovalent cation. The first polymer (B) is preferably insoluble or hardly soluble in alkali, the polymer including a structure unit represented by a formula (5) or a structure unit represented by a formula (6), and a structure unit represented by a formula (7).
摘要翻译：辐射敏感性树脂组合物包含由下式（1）表示的化合物和作为基础树脂的第一聚合物。 R1表示碳原子数3〜20的一价脂环式烃基等。 M +表示一价阳离子。第一聚合物（B）优选不溶于或几乎不溶于碱，该聚合物包括由式（5）表示的结构单元或由式（6）表示的结构单元，和由式（7）表示的结构单元）。

4. 发明授权

US09104102B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US09104102B2
公开(公告)日：2015-08-11
申请号：US13560987
申请日：2012-07-27
申请人： Yasuhiko Matsuda , Takanori Kawakami , Kazuki Kasahara , Ken Maruyama
发明人： Yasuhiko Matsuda , Takanori Kawakami , Kazuki Kasahara , Ken Maruyama
IPC分类号： G03F7/004 , G03F7/039 , G03F7/11 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： A radiation-sensitive resin composition includes a compound represented by a following formula (1), and a first polymer that serves as a base resin. R1 represents a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or the like. The M+ represents a monovalent cation. The first polymer (B) is preferably insoluble or hardly soluble in alkali, the polymer including a structure unit represented by a formula (5) or a structure unit represented by a formula (6), and a structure unit represented by a formula (7).
摘要翻译：辐射敏感性树脂组合物包含由下式（1）表示的化合物和作为基础树脂的第一聚合物。 R1表示碳原子数3〜20的一价脂环式烃基等。 M +表示一价阳离子。第一聚合物（B）优选不溶于或几乎不溶于碱，该聚合物包括由式（5）表示的结构单元或由式（6）表示的结构单元，和由式（7）表示的结构单元）。

5. 发明授权

US08535871B2 Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer 有权
标题翻译：辐射敏感性树脂组合物，形成抗蚀剂图案的方法，化合物和聚合物
公开(公告)号：US08535871B2
公开(公告)日：2013-09-17
申请号：US13325056
申请日：2011-12-14
申请人： Yuusuke Asano , Takanori Kawakami
发明人： Yuusuke Asano , Takanori Kawakami
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： C08F20/22 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A radiation-sensitive resin composition includes a first polymer that includes a repeating unit having an acid-labile group and becomes alkali-soluble upon dissociation of the acid-labile group, and a radiation-sensitive acid-generating agent. The acid-labile group has a structure shown by a general formula (1). R1 represents a methyl group or the like, R2 represents a hydrocarbon group that forms a cyclic structure, R3 represents a fluorine atom or the like, R4 represents a carbon atom, and n1 is an integer from 1 to 7.
摘要翻译：辐射敏感性树脂组合物包括第一聚合物，其包含具有酸不稳定基团的重复单元，并且在酸不稳定基团解离时变得碱溶性，并且具有辐射敏感性的酸产生剂。酸不稳定基具有通式（1）所示的结构。 R1表示甲基等，R2表示形成环状结构的烃基，R3表示氟原子等，R4表示碳原子，n1表示1〜7的整数。

6. 发明授权

US09598520B2 Radiation-sensitive resin composition, polymer and method for forming a resist pattern 有权
公开(公告)号：US09598520B2
公开(公告)日：2017-03-21
申请号：US13473957
申请日：2012-05-17
申请人： Yuko Kiridoshi , Takehiko Naruoka , Yukio Nishimura , Yusuke Asano , Takanori Kawakami , Hiromitsu Nakashima
发明人： Yuko Kiridoshi , Takehiko Naruoka , Yukio Nishimura , Yusuke Asano , Takanori Kawakami , Hiromitsu Nakashima
IPC分类号： G03F7/004 , G03F7/38 , C08F220/24 , C08F228/00 , C08F220/22 , C08L33/14 , G03F7/039 , G03F7/11 , G03F7/20
CPC分类号： C08F220/22 , C08F220/24 , C08F228/00 , C08L33/14 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , C08L101/00
摘要： A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer has a structure unit represented by a following formula (1-1), a structure unit represented by a following formula (1-2), or both thereof, and has a content of fluorine atoms of no less than 5% by mass to a total mass of the first polymer. The second polymer has an acid-dissociable group, and has a content of fluorine atoms of less than 5% by mass to a total mass of the second polymer.

7. 发明授权

US08815490B2 Radiation-sensitive resin composition, polymer, and method for forming resist pattern 有权
标题翻译：辐射敏感性树脂组合物，聚合物和形成抗蚀剂图案的方法
公开(公告)号：US08815490B2
公开(公告)日：2014-08-26
申请号：US13309573
申请日：2011-12-02
申请人： Yasuhiko Matsuda , Tomohisa Fujisawa , Yukari Hama , Takanori Kawakami
发明人： Yasuhiko Matsuda , Tomohisa Fujisawa , Yukari Hama , Takanori Kawakami
IPC分类号： G03F7/004 , G03F7/20 , C08F12/20 , C08F18/20 , C08F14/18
CPC分类号： C08F20/26 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group. R2 represents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. R3 represents a hydrogen atom or a monovalent organic group.
摘要翻译：辐射敏感性树脂组合物包括第一聚合物，第二聚合物和辐射敏感性酸产生剂。第一聚合物包括由式（1）表示的重复单元。第二聚合物包括酸不稳定基团，并且通过酸的作用解离，使得碱溶解度通过所述酸不稳定基团的解离而给出。 R1表示氢原子，甲基或三氟甲基。 R2表示具有1-20个碳原子的单键或二价直链，支链或环状，饱和或不饱和的烃基。 X表示氟原子取代的亚甲基或具有2-20个碳原子的直链或支链的氟代亚烷基。 R3表示氢原子或一价有机基团。

8. 发明申请

US20130244185A9 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT 审中-公开
标题翻译：辐射敏感性树脂组合物，形成抗性图案的方法，有机酸和酸产生剂
公开(公告)号：US20130244185A9
公开(公告)日：2013-09-19
申请号：US13615842
申请日：2012-09-14
申请人： Yasuhiko MATSUDA , Takanori Kawakami
发明人： Yasuhiko MATSUDA , Takanori Kawakami
IPC分类号： C07C321/10 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R1 represents an alkanediyl group, wherein a part or all of hydrogen atoms of the alkanediyl group represented by R1 are optionally substituted by a fluorine atom. X represents a single bond, O, OCO, COO, CO, SO3 or SO2. R2 represents a cyclic hydrocarbon group. R3 represents a monovalent organic group having a functional group represented by a following formula (x). n is an integer of 1 to 3. Z—R1—X—R2—(R3)n (I) —R31-G-R13 (x)
摘要翻译：辐射敏感性树脂组合物包括通过用放射线照射产生有机酸的酸产生剂。有机酸具有环状烃基和包含可被酸或碱裂解以产生极性基团的键的有机基团。有机酸优选由下式（I）表示。 Z表示有机酸基。 R1表示烷二基，其中由R1表示的烷二基的一部分或全部氢原子任选被氟原子取代。 X表示单键O，OCO，COO，CO，SO 3或SO 2。 R2表示环状烃基。 R3表示具有由下式（x）表示的官能团的一价有机基团。 n为1〜3的整数。Z-R1-X-R2-（R3）n（I）-R31-G-R13（x）

9. 发明申请

US20130065186A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT 审中-公开
标题翻译：辐射敏感性树脂组合物，形成抗性图案的方法，有机酸和酸产生剂
公开(公告)号：US20130065186A1
公开(公告)日：2013-03-14
申请号：US13615842
申请日：2012-09-14
申请人： Yasuhiko MATSUDA , Takanori Kawakami
发明人： Yasuhiko MATSUDA , Takanori Kawakami
IPC分类号： C07C321/10 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R2 represents an alkanediyl group, wherein a part or all of hydrogen atoms of the alkanediyl group represented by R1 are optionally substituted by a fluorine atom. X represents a single bond, O, OCO, COO, CO, SO3 or SO2. R2 represents a cyclic hydrocarbon group. R3 represents a monovalent organic group having a functional group represented by a following formula (x). n is an integer of 1 to 3. Z—R1—X—R2—(R3)n (I) —R31-G-R13 (x)
摘要翻译：辐射敏感性树脂组合物包括通过用放射线照射产生有机酸的酸产生剂。有机酸具有环状烃基和包含可被酸或碱裂解以产生极性基团的键的有机基团。有机酸优选由下式（I）表示。 Z表示有机酸基。 R2表示烷二基，其中由R1表示的烷二基的一部分或全部氢原子任选被氟原子取代。 X表示单键O，OCO，COO，CO，SO 3或SO 2。 R2表示环状烃基。 R3表示具有由下式（x）表示的官能团的一价有机基团。 n为1〜3的整数。Z-R1-X-R2-（R3）n（I）-R31-G-R13（x）

10. 发明授权

US07420782B2 Rotating disk storage device 失效
标题翻译：旋转磁盘存储设备
公开(公告)号：US07420782B2
公开(公告)日：2008-09-02
申请号：US10893070
申请日：2004-07-16
申请人： Takanori Kawakami , Shinichi Kimura , Hiroki Kitahori , Hiroshi Matsuda
发明人： Takanori Kawakami , Shinichi Kimura , Hiroki Kitahori , Hiroshi Matsuda
IPC分类号： G11B5/55
CPC分类号： G11B5/5569
摘要： Embodiments of the present invention provide a rotating disk storage device adopting a thin yoke structure. In one embodiment, the yoke structure of a voice coil motor includes a base of a casing formed from a ferromagnetic material; an auxiliary yoke disposed so as to be magnetically coupled to the base; a magnet disposed so as to be magnetically coupled to a front surface of the auxiliary yoke; and a main yoke provided with yoke legs magnetically coupled to the auxiliary yoke and an opposing surface that confronts a front surface of the magnet. In addition, a yoke gap is defined between the opposing surface and the front surface of the magnet. The base and the auxiliary yoke form a magnetic path, which allows a dedicated yoke on a lower portion to be eliminated.
摘要翻译：本发明的实施例提供一种采用薄轭结构的旋转盘存储装置。在一个实施例中，音圈电机的轭结构包括由铁磁材料形成的壳体的底座; 辅助轭被设置为磁耦合到基座; 设置成磁耦合到辅助轭的前表面的磁体; 以及主轭，其具有磁耦合到辅助轭的轭脚和面对磁体前表面的相对表面。此外，在磁体的相对表面和前表面之间限定磁轭间隙。基座和辅助磁轭形成磁路，可以消除下部的专用磁轭。

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