专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08815490B2 Radiation-sensitive resin composition, polymer, and method for forming resist pattern 有权
标题翻译：辐射敏感性树脂组合物，聚合物和形成抗蚀剂图案的方法
公开(公告)号：US08815490B2
公开(公告)日：2014-08-26
申请号：US13309573
申请日：2011-12-02
申请人： Yasuhiko Matsuda , Tomohisa Fujisawa , Yukari Hama , Takanori Kawakami
发明人： Yasuhiko Matsuda , Tomohisa Fujisawa , Yukari Hama , Takanori Kawakami
IPC分类号： G03F7/004 , G03F7/20 , C08F12/20 , C08F18/20 , C08F14/18
CPC分类号： C08F20/26 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group. R2 represents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. R3 represents a hydrogen atom or a monovalent organic group.
摘要翻译：辐射敏感性树脂组合物包括第一聚合物，第二聚合物和辐射敏感性酸产生剂。第一聚合物包括由式（1）表示的重复单元。第二聚合物包括酸不稳定基团，并且通过酸的作用解离，使得碱溶解度通过所述酸不稳定基团的解离而给出。 R1表示氢原子，甲基或三氟甲基。 R2表示具有1-20个碳原子的单键或二价直链，支链或环状，饱和或不饱和的烃基。 X表示氟原子取代的亚甲基或具有2-20个碳原子的直链或支链的氟代亚烷基。 R3表示氢原子或一价有机基团。

2. 发明申请

US20110212401A1 RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD 审中-公开
标题翻译：辐射敏感性树脂组合物和耐蚀图案形成方法
公开(公告)号：US20110212401A1
公开(公告)日：2011-09-01
申请号：US13045962
申请日：2011-03-11
申请人： Yukio NISHIMURA , Yasuhiko Matsuda , Hiroki Nakagawa , Tomohisa Fujisawa , Yukari Hama , Kazuki Kasahara
发明人： Yukio NISHIMURA , Yasuhiko Matsuda , Hiroki Nakagawa , Tomohisa Fujisawa , Yukari Hama , Kazuki Kasahara
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/2041
摘要： A radiation-sensitive resin composition includes a resin, a photoacid generator, a fluorine-containing resin, and a lactone compound. The resin does not include a first fluorine-containing repeating unit. The resin includes a first repeating unit that becomes alkali-soluble due to an acid. The fluorine-containing resin includes a second fluorine-containing repeating unit and a second repeating unit that becomes alkali-soluble due to an acid. A content of the lactone compound in the radiation-sensitive resin composition is about 31 to about 200 parts by mass based on 100 parts by mass of the resin.
摘要翻译：辐射敏感性树脂组合物包括树脂，光致酸产生剂，含氟树脂和内酯化合物。该树脂不包含第一含氟重复单元。树脂包括由于酸而变成碱溶性的第一重复单元。含氟树脂包括第二含氟重复单元和由于酸而变成碱溶性的第二重复单元。辐射敏感性树脂组合物中的内酯化合物的含量相对于100质量份的树脂为约31〜约200质量份。

3. 发明申请

US20120237875A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND 有权
标题翻译：辐射敏感性树脂组合物，形成耐蚀图案的方法，聚合物和聚合物
公开(公告)号：US20120237875A1
公开(公告)日：2012-09-20
申请号：US13420618
申请日：2012-03-15
申请人： Yuusuke ASANO , Mitsuo Satou , Hiromitsu Nakashima , Kazuki Kasahara , Yoshifumi Oizumi , Masafumi Hori , Takanori Kawakami , Yasuhiko Matsuda , Kazuo Nakahara
发明人： Yuusuke ASANO , Mitsuo Satou , Hiromitsu Nakashima , Kazuki Kasahara , Yoshifumi Oizumi , Masafumi Hori , Takanori Kawakami , Yasuhiko Matsuda , Kazuo Nakahara
IPC分类号： C08F222/14 , G03F7/20 , C08F122/18 , C08F226/06 , C07C69/593 , C08F220/22 , C08F224/00 , C07C69/618 , C07C69/75 , C07D209/48 , G03F7/004 , C08F222/18
CPC分类号： G03F7/0392 , C08F20/22 , G03F7/0046 , G03F7/038 , G03F7/0388 , G03F7/039 , G03F7/20 , G03F7/2041 , G03F7/30 , G03F7/32
摘要： A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR′—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R′ represents a hydrogen atom or an alkali-labile group, and “#” and “##” indicates a bonding hand bonded to R1. -A-R1 (x)
摘要翻译：辐射敏感性树脂组合物包括包含酸不稳定基团的第一聚合物，暴露于辐射时产生酸的酸产生剂和包含氟原子的第二聚合物和由通式（x）表示的官能团。第二聚合物的氟原子含量高于第一聚合物的氟原子含量。 R1表示碱不稳定基团。 A表示氧原子，-NR' - ， - CO-O - 或-SO 2 -O - ，其中由A表示的氧原子不是直接与芳环键合的氧原子，羰基或亚砜基，R'表示氢原子或碱不稳定基团，“＃”和“##”表示与R1键合的键。 -A-R1（x）

4. 发明授权

US09104102B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US09104102B2
公开(公告)日：2015-08-11
申请号：US13560987
申请日：2012-07-27
申请人： Yasuhiko Matsuda , Takanori Kawakami , Kazuki Kasahara , Ken Maruyama
发明人： Yasuhiko Matsuda , Takanori Kawakami , Kazuki Kasahara , Ken Maruyama
IPC分类号： G03F7/004 , G03F7/039 , G03F7/11 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： A radiation-sensitive resin composition includes a compound represented by a following formula (1), and a first polymer that serves as a base resin. R1 represents a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or the like. The M+ represents a monovalent cation. The first polymer (B) is preferably insoluble or hardly soluble in alkali, the polymer including a structure unit represented by a formula (5) or a structure unit represented by a formula (6), and a structure unit represented by a formula (7).
摘要翻译：辐射敏感性树脂组合物包含由下式（1）表示的化合物和作为基础树脂的第一聚合物。 R1表示碳原子数3〜20的一价脂环式烃基等。 M +表示一价阳离子。第一聚合物（B）优选不溶于或几乎不溶于碱，该聚合物包括由式（5）表示的结构单元或由式（6）表示的结构单元，和由式（7）表示的结构单元）。

5. 发明授权

US08728706B2 Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound 有权
标题翻译：辐射敏感树脂组合物，抗蚀剂图案形成方法，聚合物和可聚合化合物
公开(公告)号：US08728706B2
公开(公告)日：2014-05-20
申请号：US13420618
申请日：2012-03-15
申请人： Yuusuke Asano , Mitsuo Satou , Hiromitsu Nakashima , Kazuki Kasahara , Yoshifumi Oizumi , Masafumi Hori , Takanori Kawakami , Yasuhiko Matsuda , Kazuo Nakahara
发明人： Yuusuke Asano , Mitsuo Satou , Hiromitsu Nakashima , Kazuki Kasahara , Yoshifumi Oizumi , Masafumi Hori , Takanori Kawakami , Yasuhiko Matsuda , Kazuo Nakahara
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0392 , C08F20/22 , G03F7/0046 , G03F7/038 , G03F7/0388 , G03F7/039 , G03F7/20 , G03F7/2041 , G03F7/30 , G03F7/32
摘要： A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR′—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R′ represents a hydrogen atom or an alkali-labile group, and “#” and “##” indicates a bonding hand bonded to R1. -A-R1 (x)
摘要翻译：辐射敏感性树脂组合物包括包含酸不稳定基团的第一聚合物，暴露于辐射时产生酸的酸产生剂和包含氟原子的第二聚合物和由通式（x）表示的官能团。第二聚合物的氟原子含量高于第一聚合物的氟原子含量。 R1表示碱不稳定基团。 A表示氧原子，-NR' - ， - CO-O - 或-SO 2 -O - ，其中由A表示的氧原子不是直接与芳环键合的氧原子，羰基或亚砜基，R'表示氢原子或碱不稳定基团，“＃”和“##”表示与R1键合的键。 -A-R1（x）

6. 发明申请

US20110223537A1 RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER 审中-公开
标题翻译：辐射敏感性树脂组合物和聚合物
公开(公告)号：US20110223537A1
公开(公告)日：2011-09-15
申请号：US13044573
申请日：2011-03-10
申请人： Takuma Ebata , Hiroki Nakagawa , Yasuhiko Matsuda , Kazuki Kasahara , Kenji Hoshiko , Hiromitsu Nakashima , Norihiko Ikeda , Kaori Sakai , Saki Harada
发明人： Takuma Ebata , Hiroki Nakagawa , Yasuhiko Matsuda , Kazuki Kasahara , Kenji Hoshiko , Hiromitsu Nakashima , Norihiko Ikeda , Kaori Sakai , Saki Harada
IPC分类号： G03F7/004 , C08F34/02
CPC分类号： C08F20/28 , C08F220/18 , C08F220/28 , G03F7/0397 , G03F7/2041
摘要： A radiation-sensitive resin composition includes a polymer, a photoacid generator, and an acid diffusion controller. The polymer includes a first repeating unit shown by a following formula (a-1). The acid diffusion controller includes at least one of a base shown by a following formula (C-1) and a photodegradable base, wherein each R1 represents a hydrogen atom or the like, R represents a monovalent group shown by an above formula (a′), each R19 represents a chain hydrocarbon group having 1 to 5 carbon atoms or the like, A represents a divalent chain hydrocarbon group having 1 to 30 carbon atoms or the like, and m and n are integers from 0 to 3 (m+n=1 to 3), wherein each of R2 and R3 represents a monovalent chain hydrocarbon group having 1 to 20 carbon atoms or the like.
摘要翻译：辐射敏感性树脂组合物包括聚合物，光致酸发生剂和酸扩散控制剂。聚合物包括由下式（a-1）表示的第一重复单元。酸扩散控制器包括由下式（C-1）表示的碱和可光降解碱中的至少一种，其中每个R 1表示氢原子等，R表示由上式（a' ），各R 19表示碳原子数为1〜5的链状烃基等，A表示碳原子数1〜30的二价链状烃基等，m和n为0〜3的整数（m + n = 1至3），其中R 2和R 3各自表示具有1至20个碳原子的一价链烃基等。

7. 发明授权

US4974305A Method of attaching fastener elements to fastener tape 失效
标题翻译：将紧固件连接到拉链带的方法
公开(公告)号：US4974305A
公开(公告)日：1990-12-04
申请号：US456381
申请日：1989-12-26
申请人： Yasuhiko Matsuda
发明人： Yasuhiko Matsuda
IPC分类号： A44B19/44 , A44B19/46
CPC分类号： A44B19/46 , Y10T29/49782 , Y10T29/53304
摘要： A fastener tape is intermittently transferred under tension longitudinally thereof. A discrete fastener element is fed to astraddle one longitudinal beaded edge of the fastener tape. Then, the coupling head of the fastener element is pressed at its both sides substantially perpendicularly to the plane of the fastener tape to bring the fastener element into alignment with the plane of the fastener tape. The coupling head is pressed at its distal end against the longitudinal beaded edge of the fastener tape to keep the discrete fastener element from getting detached from the longitudinal beaded edge of the fastener tape. Finally, the diverging legs of the fastener element are pressed at their respective outer sides toward each other to clamp the diverging legs to the longitudinal beaded edge of the fastener tape.

8. 发明授权

US4665603A Method and apparatus for forming a row of zigzag coupling elements for slide fasteners 失效
标题翻译：用于形成用于滑动紧固件的一排之字形联接元件的方法和装置
公开(公告)号：US4665603A
公开(公告)日：1987-05-19
申请号：US845518
申请日：1986-03-28
申请人： Yasuhiko Matsuda
发明人： Yasuhiko Matsuda
IPC分类号： A44B19/42 , A44B19/44 , B29D5/04 , B21D53/52 , A41H37/06 , B29D5/00
CPC分类号： B29D5/04 , Y10S425/814 , Y10T29/49785 , Y10T29/5101 , Y10T29/53304
摘要： In a method and apparatus for forming a row of zigzag coupling elements, the entire rotating die wheel is heated by a built-in interior heater so as to remain at a temperature slightly lower than the temperature at which a monofilament of thermoplastic synthetic resin is deformable, the monofilament being folded in an annular peripheral groove of the die wheel into a row of U-shaped coupling element blanks. Then, immediately before coupling heads are shaped, the monofilament in the form of U-shaped coupling element blanks received in the annular peripheral groove is additionally heated locally by an exterior heater outside of the die wheel such that its temperature rises to a heat setting temperature.
摘要翻译：在用于形成一排锯齿形联接元件的方法和装置中，整个旋转模轮被内置的内部加热器加热，以便保持在比可热塑性合成树脂单丝可变形的温度稍低的温度，单丝在模轮的环形周向槽中折叠成一排U形联接元件坯件。然后，在联接头部成形之前，容纳在环形周向槽中的U形联接元件坯料形式的单丝通过模具轮外部的外部加热器被局部加热，使得其温度升高到热定形温度。

9. 发明授权

US4615288A Mechanism for drawing an elongated sewn product from a sewing machine 失效
标题翻译：从缝纫机上拉出细长的缝制品的机构
公开(公告)号：US4615288A
公开(公告)日：1986-10-07
申请号：US709653
申请日：1985-03-08
申请人： Yasuhiko Matsuda
发明人： Yasuhiko Matsuda
IPC分类号： D05B33/00 , D05B39/00 , D05B41/00 , B65H29/10
CPC分类号： D05B33/00 , D05B41/00 , D10B2501/0631
摘要： A mechanism, for drawing an elongated sewn product from a sewing machine, has at least one gripper disposed downstream of the sewing machine for gripping a leading end of the sewn product. The gripper is reciprocable on a horizontal rail between a retracted or upstream position and an advanced or downward position. In the advanced position, the gripper is pivotally movable downwardly from the horizontal rail through a predetermined angle.
摘要翻译：用于从缝纫机拉伸细长缝制产品的机构具有设置在缝纫机下游的至少一个夹持器，用于夹持缝制产品的前端。夹具可在缩回或上游位置与高级或向下位置之间的水平轨道上往复运动。在先进位置，夹持器可从水平轨道向下枢转运动预定角度。

10. 发明授权

US4572088A Device for guiding concealed slide fastener stringers to a sewing machine 失效
标题翻译：用于将隐形拉链条引导到缝纫机的装置
公开(公告)号：US4572088A
公开(公告)日：1986-02-25
申请号：US708852
申请日：1985-03-06
申请人： Yasuhiko Matsuda
发明人： Yasuhiko Matsuda
IPC分类号： A41H37/06 , A44B19/42 , D05B35/06 , D05B3/12 , D05B33/02
CPC分类号： A44B19/42 , A41H37/06 , D05B35/064
摘要： A device for guiding a concealed slide fastener to a sewing machine includes a pair of spaced track bodies mounted on a slanted guide plate and each comprising a block fixedly mounted on the guide plate and a cover member movably mounted on said block. The block and the cover member jointly define a guide channel for guiding an element assembly of the slide fastener therethrough while the slide fastener is fed down the guide plate toward a sewing position on the sewing machine. The guide channel includes a recess for accommodating coupling heads of the element assembly at an inlet end thereof, the recess being shaped for automatically erecting the element assembly from a horizontal position to a vertical position as the element assembly is moved progressively through the guide channel. The guide plate supports a means for sensing an end of the concealed slide fastener.
摘要翻译：用于将隐形拉链引导到缝纫机的装置包括安装在倾斜导向板上的一对隔开的轨道体，每一个包括固定地安装在引导板上的块和可移动地安装在所述块上的盖构件。所述块体和所述盖部件共同地限定用于在将所述拉链沿着所述引导板向缝纫机上的缝合位置向下引导的情况下引导所述拉链的元件组件的引导通道。引导通道包括用于在其入口端处容纳元件组件的联接头的凹部，该凹部成形为当元件组件逐渐通过引导通道移动时，将元件组件从水平位置自动竖立到垂直位置。引导板支撑用于感测隐形拉链的一端的装置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式