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1. 发明授权

US08580480B2 Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound 有权
标题翻译：辐射敏感树脂组合物，抗蚀剂图案形成方法，聚合物和化合物
公开(公告)号：US08580480B2
公开(公告)日：2013-11-12
申请号：US13191416
申请日：2011-07-26
申请人： Yusuke Asano , Mitsuo Sato
发明人： Yusuke Asano , Mitsuo Sato
IPC分类号： G03F7/00 , C08F20/10 , C07C69/017
CPC分类号： C08F214/18 , C07C69/653 , C08F220/18 , C08F220/22 , C08F220/28 , C08F220/30 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： A radiation-sensitive resin composition includes (A) a fluorine-containing compound that includes a group shown by the following formula (1), and (B) a photoacid generator. wherein RC represents a (p+1)-valent aromatic ring group, Q represents a linking group obtained by removing one hydrogen atom from a monovalent hydrophilic group, RE represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms, p is an integer from 1 to 5, provided that a plurality of Q and a plurality of RE may respectively be either the same or different when p is an integer from 2 to 5, and “*” indicates a bonding hand.
摘要翻译：辐射敏感性树脂组合物包含（A）包含下式（1）所示基团的含氟化合物和（B）光酸产生剂。其中RC表示（p + 1）价芳族环基，Q表示通过从一价亲水基除去一个氢原子得到的连接基，RE表示氢原子或碳原子数1〜10的烃基，p表示 1至5的整数，条件是当p为2至5的整数时，多个Q和多个RE可以分别相同或不同，“*”表示键合手。

2. 发明授权

US08765355B2 Radiation sensitive resin composition, method for forming a pattern, polymer and compound 有权
标题翻译：辐射敏感性树脂组合物，形成图案的方法，聚合物和化合物
公开(公告)号：US08765355B2
公开(公告)日：2014-07-01
申请号：US13459023
申请日：2012-04-27
申请人： Takakazu Kimoto , Mitsuo Sato , Yusuke Asano , Tomohiro Kakizawa
发明人： Takakazu Kimoto , Mitsuo Sato , Yusuke Asano , Tomohiro Kakizawa
IPC分类号： G03F7/039 , G03F7/30 , C08F12/20
CPC分类号： C08K5/375 , C08K5/205 , C08L101/02 , G03F7/0046 , G03F7/039 , G03F7/0392 , G03F7/0397 , G03F7/2041 , G03F7/38 , H01L21/027
摘要： A radiation sensitive resin composition includes a first polymer having a group represented by a following formula (1), and a radiation sensitive acid generator. n is an integer of 2 to 4. X represents a single bond or a bivalent organic group. A represents a (n+1) valent linking group. Each Q independently represents a group that includes an alkali-dissociable group.
摘要翻译：辐射敏感性树脂组合物包括具有由下式（1）表示的基团的第一聚合物和辐射敏感性酸发生剂。 n为2〜4的整数.X表示单键或二价有机基团。 A表示（n + 1）价连接基团。每个Q独立地表示包括碱解离基团的基团。

3. 发明申请

US20120276482A1 RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A PATTERN, POLYMER AND COMPOUND 有权
标题翻译：辐射敏感性树脂组合物，形成图案，聚合物和化合物的方法
公开(公告)号：US20120276482A1
公开(公告)日：2012-11-01
申请号：US13459023
申请日：2012-04-27
申请人： Takakazu Kimoto , Mitsuo Sato , Yusuke Asano , Tomohiro Kakizawa
发明人： Takakazu Kimoto , Mitsuo Sato , Yusuke Asano , Tomohiro Kakizawa
IPC分类号： C07C69/604 , G03F7/20 , C07D307/93 , C07C69/753 , C07C69/54 , G03F7/004 , C08F214/18
CPC分类号： C08K5/375 , C08K5/205 , C08L101/02 , G03F7/0046 , G03F7/039 , G03F7/0392 , G03F7/0397 , G03F7/2041 , G03F7/38 , H01L21/027
摘要： A radiation sensitive resin composition includes a first polymer having a group represented by a following formula (1), and a radiation sensitive acid generator. n is an integer of 2 to 4. X represents a single bond or a bivalent organic group. A represents a (n+1) valent linking group. Each Q independently represents a group that includes an alkali-dissociable group.
摘要翻译：辐射敏感性树脂组合物包括具有由下式（1）表示的基团的第一聚合物和辐射敏感性酸发生剂。 n为2〜4的整数.X表示单键或二价有机基团。 A表示（n + 1）价连接基团。每个Q独立地表示包括碱解离基团的基团。

4. 发明申请

US20120082934A1 RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND 有权
标题翻译：辐射敏感性树脂组合物，聚合物和化合物
公开(公告)号：US20120082934A1
公开(公告)日：2012-04-05
申请号：US13243046
申请日：2011-09-23
申请人： Kazuo Nakahara , Mitsuo Sato , Yusuke Asano
发明人： Kazuo Nakahara , Mitsuo Sato , Yusuke Asano
IPC分类号： G03F7/004 , C08F20/24 , C07C69/54 , C07C255/23 , C07C69/675 , C07C69/604 , C08F20/22 , C07C255/20
CPC分类号： C07C255/20 , C07C205/52 , C08F220/18 , C08F220/30 , C08F220/42 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： [Problem] To reduce the time required for a film to exhibit decreased hydrophobicity after liquid immersion lithography while allowing the surface of a film to exhibit high hydrophobicity during liquid immersion lithography.[Solution] A radiation-sensitive resin composition including (A) a polymer that includes a repeating unit (a1) and a fluorine atom, and (B) a photoacid generator, the repeating unit (a1) including a group shown by any of the following formulas (1-1) to (1-3).
摘要翻译： [问题]为了减少在液浸光刻之后薄膜表现出降低的疏水性所需的时间，同时允许膜的表面在液浸光刻期间表现出高的疏水性。 [解决方案]包含（A）包含重复单元（a1）和氟原子的聚合物的辐射敏感性树脂组合物和（B）光酸产生剂，所述重复单元（a1）包括任何以下式（1-1）〜（1-3）。

5. 发明授权

US09040221B2 Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound 有权
标题翻译：辐射敏感性树脂组合物，抗蚀剂图案形成方法，聚合物和化合物
公开(公告)号：US09040221B2
公开(公告)日：2015-05-26
申请号：US13699007
申请日：2011-05-19
申请人： Hitoshi Osaki , Yusuke Asano , Mitsuo Sato , Tomoki Nagai
发明人： Hitoshi Osaki , Yusuke Asano , Mitsuo Sato , Tomoki Nagai
IPC分类号： G03F7/004 , C08F22/18 , C08F220/26 , G03F7/038 , G03F7/039 , G03F7/20 , C07C69/653 , C07C69/753 , C07D307/93 , C08F24/00 , C08F220/24
CPC分类号： G03F7/004 , C07C69/653 , C07C69/753 , C07D307/93 , C08F22/18 , C08F24/00 , C08F220/24 , C08F220/26 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/2041
摘要： A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator.
摘要翻译：提供了一种在液浸光刻工艺中提供抗蚀剂涂膜的辐射敏感性树脂组合物，该曝光敏感性树脂组合物能够在曝光期间表现出很大的动态接触角，由此抗蚀剂涂膜的表面可呈现出排水性优异，并且能够导致显影期间动态接触角显着降低的放射线敏感性树脂组合物，从而可以抑制显影缺陷的产生，并且进一步缩短动态变化所需的时间段接触角启用。一种辐射敏感性树脂组合物，其包含（A）具有由下式（1）表示的基团的结构单元（I）的含氟聚合物和（B）辐射敏感性酸发生剂。

6. 发明授权

US08603726B2 Radiation-sensitive resin composition, polymer and compound 有权
标题翻译：辐射敏感性树脂组合物，聚合物和化合物
公开(公告)号：US08603726B2
公开(公告)日：2013-12-10
申请号：US13243046
申请日：2011-09-23
申请人： Kazuo Nakahara , Mitsuo Sato , Yusuke Asano
发明人： Kazuo Nakahara , Mitsuo Sato , Yusuke Asano
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028
CPC分类号： C07C255/20 , C07C205/52 , C08F220/18 , C08F220/30 , C08F220/42 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A radiation-sensitive resin composition including (A) a polymer that includes a repeating unit (a1) and a fluorine atom, and (B) a photoacid generator, the repeating unit (a1) including a group shown by any of the following formulas (1-1) to (1-3).
摘要翻译：一种辐射敏感性树脂组合物，其包含（A）包含重复单元（a1）和氟原子的聚合物和（B）光酸产生剂，所述重复单元（a1）包括由下式 1-1）〜（1-3）。

7. 发明申请

US20130122426A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND 有权
标题翻译：辐射敏感性树脂组合物，形成耐火图案的方法和聚合物和化合物
公开(公告)号：US20130122426A1
公开(公告)日：2013-05-16
申请号：US13699007
申请日：2011-05-19
申请人： Hitoshi Osaki , Yusuke Asano , Mitsuo Sato , Tomoki Nagai
发明人： Hitoshi Osaki , Yusuke Asano , Mitsuo Sato , Tomoki Nagai
IPC分类号： G03F7/004 , C08F22/18 , G03F7/20 , C07C69/753 , C08F24/00 , C07C69/653 , C07D307/93
CPC分类号： G03F7/004 , C07C69/653 , C07C69/753 , C07D307/93 , C08F22/18 , C08F24/00 , C08F220/24 , C08F220/26 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/2041
摘要： A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator.
摘要翻译：提供了一种在液浸光刻工艺中提供抗蚀剂涂膜的辐射敏感性树脂组合物，该曝光敏感性树脂组合物能够在曝光期间表现出很大的动态接触角，由此抗蚀剂涂膜的表面可呈现出排水性优异，并且能够导致显影期间动态接触角显着降低的放射线敏感性树脂组合物，从而可以抑制显影缺陷的产生，并且进一步缩短动态变化所需的时间段接触角启用。一种辐射敏感性树脂组合物，其包含（A）具有由下式（1）表示的基团的结构单元（I）的含氟聚合物和（B）辐射敏感性酸发生剂。

8. 发明申请

US20120028189A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND 有权
标题翻译：辐射敏感性树脂组合物，形成耐火图案的方法，聚合物和化合物
公开(公告)号：US20120028189A1
公开(公告)日：2012-02-02
申请号：US13191416
申请日：2011-07-26
申请人： Yusuke Asano , Mitsuo Sato
发明人： Yusuke Asano , Mitsuo Sato
IPC分类号： G03F7/20 , C08F214/18 , C07C69/653 , G03F7/004
CPC分类号： C08F214/18 , C07C69/653 , C08F220/18 , C08F220/22 , C08F220/28 , C08F220/30 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： A radiation-sensitive resin composition includes (A) a fluorine-containing compound that includes a group shown by the following formula (1), and (B) a photoacid generator. wherein RC represents a (p+1)-valent aromatic ring group, Q represents a linking group obtained by removing one hydrogen atom from a monovalent hydrophilic group, RE represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms, p is an integer from 1 to 5, provided that a plurality of Q and a plurality of RE may respectively be either the same or different when p is an integer from 2 to 5, and “*” indicates a bonding hand.
摘要翻译：辐射敏感性树脂组合物包含（A）包含下式（1）所示基团的含氟化合物和（B）光酸产生剂。其中RC表示（p + 1）价芳族环基，Q表示通过从一价亲水基除去一个氢原子得到的连接基，RE表示氢原子或碳原子数1〜10的烃基，p表示 1至5的整数，条件是当p为2至5的整数时，多个Q和多个RE可以分别相同或不同，“*”表示键合手。

9. 发明申请

US20080134913A1 STENCIL PRINTING APPARATUS 审中-公开
标题翻译： STENCIL打印设备
公开(公告)号：US20080134913A1
公开(公告)日：2008-06-12
申请号：US11849762
申请日：2007-09-04
申请人： Mitsuo Sato
发明人： Mitsuo Sato
IPC分类号： B41L13/04
CPC分类号： B41L13/06 , B41L23/20
摘要： A stencil printing apparatus allows printing on coated paper as in ordinary paper (uncoated paper), and can make a contribution to the diversification of printing needs. The stencil printing apparatus comprises a printing apparatus body comprising a printing drum having UV curable ink, and an UV irradiation device connected to a paper output unit of the printing apparatus body. When the paper type is recognized as coated paper on the basis of a signal from paper type input means or the like, control means controls a master-making energy supplied to a thermal head serving as master-making means, to be larger than a master-making energy supplied in the case of uncoated paper. The paper onto which an ink image corresponding to the characteristics of coated paper has been transferred is then fed into the UV irradiation device, where the ink is dried and cured.
摘要翻译：模版印刷设备允许在普通纸（未涂布纸）上在涂布纸上进行印刷，并且可以对印刷需求的多样化做出贡献。模版印刷装置包括：印刷装置主体，包括具有UV固化油墨的印刷滚筒和连接到打印装置主体的纸张输出单元的UV照射装置。当基于来自纸张类型输入装置等的信号将纸张类型识别为涂布纸时，控制装置控制提供给用作主制造装置的热敏头的主制造能量大于主装置在未涂布纸的情况下供应的能量。然后将与涂布纸的特性对应的油墨图像转印到纸上的纸张进料到干燥和固化油墨的UV照射装置中。

10. 发明申请

US20050217520A1 Image forming apparatus 失效
标题翻译：图像形成装置
公开(公告)号：US20050217520A1
公开(公告)日：2005-10-06
申请号：US11048170
申请日：2005-02-02
申请人： Mitsuo Sato
发明人： Mitsuo Sato
IPC分类号： B41J3/54 , B41C1/14 , B41L13/04 , B41L13/06
CPC分类号： B41L13/06
摘要： An image forming apparatus of the present invention includes a stencil printer section and a non-stencil printer section and can form a stencil image and a non-stencil image on a single sheet. A first and a second adjusting section respectively adjusts the position of the stencil image and that of the non-stencil image relative to the sheet in the direction of sheet conveyance and the widthwise direction of the sheet perpendicular to the direction of sheet conveyance. A first shift display section displays an amount of shift of the position adjusted by the first adjusting section. A first moving mechanism shifts the position of the stencil image in accordance with the operation of the first adjusting section. A second shift display section displays an amount of shift of the position adjusted by the second adjusting section. A second moving mechanism shifts the position of the non-stencil image in accordance with the operation of the second adjusting section.
摘要翻译：本发明的图像形成装置包括模版印刷机部分和非模板印刷机部分，并且可以在单张纸上形成模板图像和非模板图像。第一调节部分和第二调节部分分别在纸张传送的方向和垂直于纸张传送方向的纸张的宽度方向上分别调整模板图像和非蜡纸图像相对于纸张的位置。第一移位显示部分显示由第一调整部分调整的位置的移动量。第一移动机构根据第一调整部的动作移动模板图像的位置。第二移位显示部分显示由第二调节部分调整的位置的偏移量。第二移动机构根据第二调节部分的操作移动非模板图像的位置。

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