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1. 发明申请

US20120082934A1 RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND 有权
标题翻译：辐射敏感性树脂组合物，聚合物和化合物
公开(公告)号：US20120082934A1
公开(公告)日：2012-04-05
申请号：US13243046
申请日：2011-09-23
申请人： Kazuo Nakahara , Mitsuo Sato , Yusuke Asano
发明人： Kazuo Nakahara , Mitsuo Sato , Yusuke Asano
IPC分类号： G03F7/004 , C08F20/24 , C07C69/54 , C07C255/23 , C07C69/675 , C07C69/604 , C08F20/22 , C07C255/20
CPC分类号： C07C255/20 , C07C205/52 , C08F220/18 , C08F220/30 , C08F220/42 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： [Problem] To reduce the time required for a film to exhibit decreased hydrophobicity after liquid immersion lithography while allowing the surface of a film to exhibit high hydrophobicity during liquid immersion lithography.[Solution] A radiation-sensitive resin composition including (A) a polymer that includes a repeating unit (a1) and a fluorine atom, and (B) a photoacid generator, the repeating unit (a1) including a group shown by any of the following formulas (1-1) to (1-3).
摘要翻译： [问题]为了减少在液浸光刻之后薄膜表现出降低的疏水性所需的时间，同时允许膜的表面在液浸光刻期间表现出高的疏水性。 [解决方案]包含（A）包含重复单元（a1）和氟原子的聚合物的辐射敏感性树脂组合物和（B）光酸产生剂，所述重复单元（a1）包括任何以下式（1-1）〜（1-3）。

2. 发明授权

US08603726B2 Radiation-sensitive resin composition, polymer and compound 有权
标题翻译：辐射敏感性树脂组合物，聚合物和化合物
公开(公告)号：US08603726B2
公开(公告)日：2013-12-10
申请号：US13243046
申请日：2011-09-23
申请人： Kazuo Nakahara , Mitsuo Sato , Yusuke Asano
发明人： Kazuo Nakahara , Mitsuo Sato , Yusuke Asano
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028
CPC分类号： C07C255/20 , C07C205/52 , C08F220/18 , C08F220/30 , C08F220/42 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A radiation-sensitive resin composition including (A) a polymer that includes a repeating unit (a1) and a fluorine atom, and (B) a photoacid generator, the repeating unit (a1) including a group shown by any of the following formulas (1-1) to (1-3).
摘要翻译：一种辐射敏感性树脂组合物，其包含（A）包含重复单元（a1）和氟原子的聚合物和（B）光酸产生剂，所述重复单元（a1）包括由下式 1-1）〜（1-3）。

3. 发明授权

US08580480B2 Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound 有权
标题翻译：辐射敏感树脂组合物，抗蚀剂图案形成方法，聚合物和化合物
公开(公告)号：US08580480B2
公开(公告)日：2013-11-12
申请号：US13191416
申请日：2011-07-26
申请人： Yusuke Asano , Mitsuo Sato
发明人： Yusuke Asano , Mitsuo Sato
IPC分类号： G03F7/00 , C08F20/10 , C07C69/017
CPC分类号： C08F214/18 , C07C69/653 , C08F220/18 , C08F220/22 , C08F220/28 , C08F220/30 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： A radiation-sensitive resin composition includes (A) a fluorine-containing compound that includes a group shown by the following formula (1), and (B) a photoacid generator. wherein RC represents a (p+1)-valent aromatic ring group, Q represents a linking group obtained by removing one hydrogen atom from a monovalent hydrophilic group, RE represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms, p is an integer from 1 to 5, provided that a plurality of Q and a plurality of RE may respectively be either the same or different when p is an integer from 2 to 5, and “*” indicates a bonding hand.
摘要翻译：辐射敏感性树脂组合物包含（A）包含下式（1）所示基团的含氟化合物和（B）光酸产生剂。其中RC表示（p + 1）价芳族环基，Q表示通过从一价亲水基除去一个氢原子得到的连接基，RE表示氢原子或碳原子数1〜10的烃基，p表示 1至5的整数，条件是当p为2至5的整数时，多个Q和多个RE可以分别相同或不同，“*”表示键合手。

4. 发明授权

US08895223B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US08895223B2
公开(公告)日：2014-11-25
申请号：US13427952
申请日：2012-03-23
申请人： Mitsuo Sato , Kazuo Nakahara , Hiromitsu Nakashima
发明人： Mitsuo Sato , Kazuo Nakahara , Hiromitsu Nakashima
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0397 , G03F7/0045
摘要： The radiation-sensitive resin composition includes a compound represented by a following formula (1), and a resin. The resin has an acid-dissociable group, is insoluble or hardly soluble in an alkali, and turns to be soluble in an alkali when the acid-dissociable group is dissociated. R represents a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms, R1 represents a hydrocarbon group having 1 to 20 carbon atoms or the like, R2 to R5 each independently represent an alkyl group having 1 to 4 carbon atoms, an alicyclic hydrocarbon group having 4 to 20 carbon atoms, or the like, and R6 represents a halogen atom or the like.
摘要翻译：辐射敏感性树脂组合物包括由下式（1）表示的化合物和树脂。该树脂具有酸解离基团，在碱中不溶或几乎不溶，当酸解离基团解离时，其变成可溶于碱。 R表示氢原子或碳原子数1〜20的烃基，R1表示碳原子数1〜20的烃基等，R2〜R5各自独立地表示碳原子数1〜4的烷基，脂环式烃具有4〜20个碳原子的基团等，R6表示卤素原子等。

5. 发明授权

US08273521B2 Radiation-sensitive resin composition and compound 有权
标题翻译：辐射敏感性树脂组合物和化合物
公开(公告)号：US08273521B2
公开(公告)日：2012-09-25
申请号：US12846836
申请日：2010-07-30
申请人： Mitsuo Sato , Kazuo Nakahara , Hiromitsu Nakashima , Takanori Nakano , Makoto Sugiura
发明人： Mitsuo Sato , Kazuo Nakahara , Hiromitsu Nakashima , Takanori Nakano , Makoto Sugiura
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028
CPC分类号： C07D211/48 , G03F7/0045 , G03F7/0392 , G03F7/0397
摘要： A radiation-sensitive resin composition includes a compound shown by a formula (1) in which R1 represents a divalent hydrocarbon group having 1 to 20 carbon atoms and R2 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms, or R1 and R2 form a heterocyclic structure having 4 to 20 carbon atoms, R3 represents a monovalent acid-dissociable group, n is an integer from 1 to 6, each of R4A, R4B, and R4C represents one of an alkyl group having 1 to 4 carbon atoms and a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or R4A represents one of an alkyl group having 1 to 4 carbon atoms and a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms and R4B and R4C form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms.
摘要翻译：辐射敏感性树脂组合物包括式（1）所示的化合物，其中R1表示碳原子数1〜20的二价烃基，R2表示氢原子或碳原子数1〜20的一价烃基，R1 R2表示碳原子数为4〜20的杂环结构，R3表示一价酸解离基，n表示1〜6的整数，R4A，R4B，R4C各自表示碳原子数为1〜4的烷基原子和碳原子数为4〜20的一价脂环式烃基，或者R4A表示碳原子数1〜4的烷基和碳原子数4〜20的一价脂环式烃基，R4B和R4C形成二价脂环式烃基具有4至20个碳原子。

6. 发明授权

US08765355B2 Radiation sensitive resin composition, method for forming a pattern, polymer and compound 有权
标题翻译：辐射敏感性树脂组合物，形成图案的方法，聚合物和化合物
公开(公告)号：US08765355B2
公开(公告)日：2014-07-01
申请号：US13459023
申请日：2012-04-27
申请人： Takakazu Kimoto , Mitsuo Sato , Yusuke Asano , Tomohiro Kakizawa
发明人： Takakazu Kimoto , Mitsuo Sato , Yusuke Asano , Tomohiro Kakizawa
IPC分类号： G03F7/039 , G03F7/30 , C08F12/20
CPC分类号： C08K5/375 , C08K5/205 , C08L101/02 , G03F7/0046 , G03F7/039 , G03F7/0392 , G03F7/0397 , G03F7/2041 , G03F7/38 , H01L21/027
摘要： A radiation sensitive resin composition includes a first polymer having a group represented by a following formula (1), and a radiation sensitive acid generator. n is an integer of 2 to 4. X represents a single bond or a bivalent organic group. A represents a (n+1) valent linking group. Each Q independently represents a group that includes an alkali-dissociable group.
摘要翻译：辐射敏感性树脂组合物包括具有由下式（1）表示的基团的第一聚合物和辐射敏感性酸发生剂。 n为2〜4的整数.X表示单键或二价有机基团。 A表示（n + 1）价连接基团。每个Q独立地表示包括碱解离基团的基团。

7. 发明授权

US08697335B2 Radiation-sensitive resin composition and compound 有权
标题翻译：辐射敏感性树脂组合物和化合物
公开(公告)号：US08697335B2
公开(公告)日：2014-04-15
申请号：US13351586
申请日：2012-01-17
申请人： Kazuo Nakahara , Mitsuo Sato
发明人： Kazuo Nakahara , Mitsuo Sato
IPC分类号： G03F7/039 , G03F7/004 , C07D211/44 , H01L21/027
CPC分类号： C07D211/44 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A radiation-sensitive resin composition includes a compound, a resin and a radiation-sensitive acid generator. The compound has a structure in which a group represented by a following formula (1) is bound to a nitrogen atom. The resin has an acid-dissociative dissolution-controlling group and has a property such that alkali solubility of the resin increases by an action of an acid. In the formula (1), Y is a monovalent group having 5 to 20 carbon atoms, and “*” represents a bonding hand with the nitrogen atom. In the formula (i), R1, R2 and R3 each independently represent a linear or branched alkyl group having 1 to 4 carbon atoms or a monovalent alicyclic hydrocarbon group having 4 to 12 carbon atoms, or R1 and R2 are linked with each other to form a bivalent alicyclic hydrocarbon group, and “*” represents a bonding hand with the oxygen atom.
摘要翻译：辐射敏感性树脂组合物包括化合物，树脂和辐射敏感性酸产生剂。该化合物具有其中由下式（1）表示的基团与氮原子结合的结构。该树脂具有酸解离溶解控制基团，并且具有通过酸的作用使树脂的碱溶性增加的性质。式（1）中，Y为碳原子数为5〜20的一价基团，“*”表示与氮原子的键合键。式（i）中，R 1，R 2和R 3各自独立地表示碳原子数1〜4的直链或支链烷基或碳原子数4〜12的1价脂环式烃基，或者，形成二价脂环烃基，“*”表示与氧原子的键合。

8. 发明申请

US20120276482A1 RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A PATTERN, POLYMER AND COMPOUND 有权
标题翻译：辐射敏感性树脂组合物，形成图案，聚合物和化合物的方法
公开(公告)号：US20120276482A1
公开(公告)日：2012-11-01
申请号：US13459023
申请日：2012-04-27
申请人： Takakazu Kimoto , Mitsuo Sato , Yusuke Asano , Tomohiro Kakizawa
发明人： Takakazu Kimoto , Mitsuo Sato , Yusuke Asano , Tomohiro Kakizawa
IPC分类号： C07C69/604 , G03F7/20 , C07D307/93 , C07C69/753 , C07C69/54 , G03F7/004 , C08F214/18
CPC分类号： C08K5/375 , C08K5/205 , C08L101/02 , G03F7/0046 , G03F7/039 , G03F7/0392 , G03F7/0397 , G03F7/2041 , G03F7/38 , H01L21/027
摘要： A radiation sensitive resin composition includes a first polymer having a group represented by a following formula (1), and a radiation sensitive acid generator. n is an integer of 2 to 4. X represents a single bond or a bivalent organic group. A represents a (n+1) valent linking group. Each Q independently represents a group that includes an alkali-dissociable group.
摘要翻译：辐射敏感性树脂组合物包括具有由下式（1）表示的基团的第一聚合物和辐射敏感性酸发生剂。 n为2〜4的整数.X表示单键或二价有机基团。 A表示（n + 1）价连接基团。每个Q独立地表示包括碱解离基团的基团。

9. 发明授权

US09040221B2 Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound 有权
标题翻译：辐射敏感性树脂组合物，抗蚀剂图案形成方法，聚合物和化合物
公开(公告)号：US09040221B2
公开(公告)日：2015-05-26
申请号：US13699007
申请日：2011-05-19
申请人： Hitoshi Osaki , Yusuke Asano , Mitsuo Sato , Tomoki Nagai
发明人： Hitoshi Osaki , Yusuke Asano , Mitsuo Sato , Tomoki Nagai
IPC分类号： G03F7/004 , C08F22/18 , C08F220/26 , G03F7/038 , G03F7/039 , G03F7/20 , C07C69/653 , C07C69/753 , C07D307/93 , C08F24/00 , C08F220/24
CPC分类号： G03F7/004 , C07C69/653 , C07C69/753 , C07D307/93 , C08F22/18 , C08F24/00 , C08F220/24 , C08F220/26 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/2041
摘要： A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator.
摘要翻译：提供了一种在液浸光刻工艺中提供抗蚀剂涂膜的辐射敏感性树脂组合物，该曝光敏感性树脂组合物能够在曝光期间表现出很大的动态接触角，由此抗蚀剂涂膜的表面可呈现出排水性优异，并且能够导致显影期间动态接触角显着降低的放射线敏感性树脂组合物，从而可以抑制显影缺陷的产生，并且进一步缩短动态变化所需的时间段接触角启用。一种辐射敏感性树脂组合物，其包含（A）具有由下式（1）表示的基团的结构单元（I）的含氟聚合物和（B）辐射敏感性酸发生剂。

10. 发明申请

US20130122426A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND 有权
标题翻译：辐射敏感性树脂组合物，形成耐火图案的方法和聚合物和化合物
公开(公告)号：US20130122426A1
公开(公告)日：2013-05-16
申请号：US13699007
申请日：2011-05-19
申请人： Hitoshi Osaki , Yusuke Asano , Mitsuo Sato , Tomoki Nagai
发明人： Hitoshi Osaki , Yusuke Asano , Mitsuo Sato , Tomoki Nagai
IPC分类号： G03F7/004 , C08F22/18 , G03F7/20 , C07C69/753 , C08F24/00 , C07C69/653 , C07D307/93
CPC分类号： G03F7/004 , C07C69/653 , C07C69/753 , C07D307/93 , C08F22/18 , C08F24/00 , C08F220/24 , C08F220/26 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/2041
摘要： A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator.
摘要翻译：提供了一种在液浸光刻工艺中提供抗蚀剂涂膜的辐射敏感性树脂组合物，该曝光敏感性树脂组合物能够在曝光期间表现出很大的动态接触角，由此抗蚀剂涂膜的表面可呈现出排水性优异，并且能够导致显影期间动态接触角显着降低的放射线敏感性树脂组合物，从而可以抑制显影缺陷的产生，并且进一步缩短动态变化所需的时间段接触角启用。一种辐射敏感性树脂组合物，其包含（A）具有由下式（1）表示的基团的结构单元（I）的含氟聚合物和（B）辐射敏感性酸发生剂。

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