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1. 发明授权

US08501385B2 Positive-type radiation-sensitive composition, and resist pattern formation method 有权
标题翻译：正型辐射敏感组合物和抗蚀剂图案形成方法
公开(公告)号：US08501385B2
公开(公告)日：2013-08-06
申请号：US13005536
申请日：2011-01-13
申请人： Yusuke Anno , Kouichi Fujiwara , Makoto Sugiura , Gouji Wakamatsu
发明人： Yusuke Anno , Kouichi Fujiwara , Makoto Sugiura , Gouji Wakamatsu
IPC分类号： G03C1/00 , G03F1/00
CPC分类号： H01L21/0273 , C08F220/18 , C08F220/28 , C08F220/32 , C08F220/34 , C08F220/36 , G03F7/0035 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/40 , C08F220/22
摘要： A positive-tone radiation-sensitive composition is used in a resist pattern-forming method as a first positive-tone radiation-sensitive composition. A positive-tone radiation-sensitive composition includes a polymer, a photoacid generator, and a solvent. The polymer includes an acid-labile group and a crosslinkable group. The resist pattern-forming method includes providing the first positive-tone radiation-sensitive composition on a substrate to form a first resist pattern on the substrate. The first resist pattern is made to be inactive to light or heat so that the first resist pattern is insoluble in a second positive-tone radiation-sensitive composition. The second positive-tone radiation-sensitive composition is provided on the substrate to form a second resist pattern on the substrate on which the first resist pattern is formed.
摘要翻译：作为第一正色调辐射敏感性组合物的抗蚀剂图案形成方法中使用正性辐射敏感性组合物。正音辐射敏感组合物包括聚合物，光致酸产生剂和溶剂。聚合物包括酸不稳定基团和可交联基团。抗蚀剂图案形成方法包括在基板上提供第一正色散辐射敏感性组合物以在基板上形成第一抗蚀剂图案。使第一抗蚀剂图案对光或热不起作用，使得第一抗蚀剂图案不溶于第二正色辐射敏感组合物。第二正色辐射敏感组合物设置在基板上以在其上形成有第一抗蚀剂图案的基板上形成第二抗蚀剂图案。

2. 发明申请

US20110104612A1 POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD 有权
标题翻译：积极型辐射敏感性组合物和抗性图案形成方法
公开(公告)号：US20110104612A1
公开(公告)日：2011-05-05
申请号：US13005536
申请日：2011-01-13
申请人： Yusuke ANNO , Kouichi Fujiwara , Makoto Sugiura , Gouji Wakamatsu
发明人： Yusuke ANNO , Kouichi Fujiwara , Makoto Sugiura , Gouji Wakamatsu
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： H01L21/0273 , C08F220/18 , C08F220/28 , C08F220/32 , C08F220/34 , C08F220/36 , G03F7/0035 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/40 , C08F220/22
摘要： A positive-tone radiation-sensitive composition is used in a resist pattern-forming method as a first positive-tone radiation-sensitive composition. A positive-tone radiation-sensitive composition includes a polymer, a photoacid generator, and a solvent. The polymer includes an acid-labile group and a crosslinkable group. The resist pattern-forming method includes providing the first positive-tone radiation-sensitive composition on a substrate to form a first resist pattern on the substrate. The first resist pattern is made to be inactive to light or heat so that the first resist pattern is insoluble in a second positive-tone radiation-sensitive composition. The second positive-tone radiation-sensitive composition is provided on the substrate to form a second resist pattern on the substrate on which the first resist pattern is formed.
摘要翻译：作为第一正色调辐射敏感性组合物的抗蚀剂图案形成方法中使用正性辐射敏感性组合物。正音辐射敏感组合物包括聚合物，光致酸产生剂和溶剂。聚合物包括酸不稳定基团和可交联基团。抗蚀剂图案形成方法包括在基板上提供第一正色散辐射敏感性组合物以在基板上形成第一抗蚀剂图案。使第一抗蚀剂图案对光或热不起作用，使得第一抗蚀剂图案不溶于第二正色辐射敏感组合物。第二正色辐射敏感组合物设置在基板上以在其上形成有第一抗蚀剂图案的基板上形成第二抗蚀剂图案。

3. 发明授权

US08877429B2 Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same 有权
标题翻译：用于制造抗蚀剂图案的树脂组合物不溶性，以及通过使用它们形成抗蚀剂图案的方法
公开(公告)号：US08877429B2
公开(公告)日：2014-11-04
申请号：US13004898
申请日：2011-01-12
申请人： Gouji Wakamatsu , Masafumi Hori , Kouichi Fujiwara , Makoto Sugiura
发明人： Gouji Wakamatsu , Masafumi Hori , Kouichi Fujiwara , Makoto Sugiura
IPC分类号： G03F7/095 , G03F7/26 , G03F7/004 , G03F7/00 , H01L21/027 , G03F7/039
CPC分类号： G03F7/40 , G03F7/0035 , G03F7/0046 , G03F7/0397 , G03F7/2024 , H01L21/0273
摘要： A resist pattern-insolubilizing resin composition is used in a resist pattern-forming method. The resist pattern-insolubilizing resin composition includes solvent and a resin. The resin includes a first repeating unit that includes a hydroxyl group in its side chain and at least one of a second repeating unit derived from a monomer shown by a following formula (1-1) and a third repeating unit derived from a monomer shown by a following formula (1-2), wherein for example, R1 represents a hydrogen atom, A represents a methylene group, R2 represents a group shown by a following formula (2-1) or a group shown by a following formula (2-2), R3 represents a methylene group, R4 represents a hydrogen atom, and n is 0 or 1, wherein each of R34 represents at least one of a hydrogen atom and a linear or branched alkyl group having 1 to 10 carbon atoms.
摘要翻译：抗蚀剂图案不溶化树脂组合物用于抗蚀剂图案形成方法。抗蚀剂图案不溶化树脂组合物包括溶剂和树脂。树脂包括在其侧链中包含羟基的第一重复单元和由下式（1-1）所示的单体衍生的第二重复单元和由下式表示的单体衍生的第三重复单元中的至少一种：下述式（1-2）表示的基团，其中，例如，R1表示氢原子，A表示亚甲基，R2表示下述式（2-1）所示的基团或下述式（2- 2）中，R3表示亚甲基，R4表示氢原子，n表示0或1，R34表示氢原子和碳原子数1〜10的直链或支链烷基中的至少一种。

4. 发明申请

US20110111349A1 RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD FOR FORMATION OF RESIST PATTERN BY USING THE SAME 有权
标题翻译：用于制造耐腐蚀图案的树脂组合物，以及使用它们形成耐力图案的方法
公开(公告)号：US20110111349A1
公开(公告)日：2011-05-12
申请号：US13004898
申请日：2011-01-12
申请人： Gouji WAKAMATSU , Masafumi Hori , Kouichi Fujiwara , Makoto Sugiura
发明人： Gouji WAKAMATSU , Masafumi Hori , Kouichi Fujiwara , Makoto Sugiura
IPC分类号： G03F7/20 , C08L37/00
CPC分类号： G03F7/40 , G03F7/0035 , G03F7/0046 , G03F7/0397 , G03F7/2024 , H01L21/0273
摘要： A resist pattern-insolubilizing resin composition is used in a resist pattern-forming method. The resist pattern-insolubilizing resin composition includes solvent and a resin. The resin includes a first repeating unit that includes a hydroxyl group in its side chain and at least one of a second repeating unit derived from a monomer shown by a following formula (1-1) and a third repeating unit derived from a monomer shown by a following formula (1-2), wherein for example, R1 represents a hydrogen atom, A represents a methylene group, R2 represents a group shown by a following formula (2-1) or a group shown by a following formula (2-2), R3 represents a methylene group, R4 represents a hydrogen atom, and n is 0 or 1, wherein each of R34 represents at least one of a hydrogen atom and a linear or branched alkyl group having 1 to 10 carbon atoms.
摘要翻译：抗蚀剂图案不溶化树脂组合物用于抗蚀剂图案形成方法。抗蚀剂图案不溶化树脂组合物包括溶剂和树脂。树脂包括在其侧链中包含羟基的第一重复单元和由下式（1-1）所示的单体衍生的第二重复单元和由下式表示的单体衍生的第三重复单元中的至少一种：下述式（1-2）表示的基团，其中，例如，R1表示氢原子，A表示亚甲基，R2表示下述式（2-1）所示的基团或下述式（2- 2）中，R3表示亚甲基，R4表示氢原子，n表示0或1，R34表示氢原子和碳原子数1〜10的直链或支链烷基中的至少一种。

5. 发明授权

US08431332B2 Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern 有权
标题翻译：用于形成用于浸渍曝光的上层膜的组合物，用于浸渍曝光的上层膜，以及形成光致抗蚀剂图案的方法
公开(公告)号：US08431332B2
公开(公告)日：2013-04-30
申请号：US12680200
申请日：2008-09-10
申请人： Daita Kouno , Norihiko Sugie , Gouji Wakamatsu , Norihiro Natsume , Yukio Nishimura , Makoto Sugiura
发明人： Daita Kouno , Norihiko Sugie , Gouji Wakamatsu , Norihiro Natsume , Yukio Nishimura , Makoto Sugiura
IPC分类号： G03F7/11 , G03F7/09 , G03F7/38
CPC分类号： G03F7/11 , G03F7/2041
摘要： The object of the invention is to provide a composition for forming an upper layer film for immersion exposure capable of forming an upper layer film effectively inhibited from developing defects through an immersion exposure process, such as a watermark defect and dissolution residue defect. Also provided are an upper layer film for immersion exposure and a method of forming a resist pattern. The composition for forming an upper layer film includes a resin ingredient and a solvent. The resin ingredient includes a resin (A) having at least one kind of repeating units selected among those represented by the formulae (1-1) to (1-3) and at least either of the two kinds of repeating units represented by the formulae (2-1) and (2-2). (1-1) (1-2) (1-3) (2-1) (2-2) [In the formulae, R1 represents hydrogen or methyl; R2 and R3 each represents methylene, linear or branched C2-6 alkylene, or alicyclic C4-12 alkylene; R4 represents hydrogen or methyl; and R5 represents a single bond, methylene, or linear or branched C2-6 alkylene.].
摘要翻译：本发明的目的是提供一种用于形成用于浸渍曝光的上层膜的组合物，其能够通过诸如水印缺陷和溶解残留缺陷的浸渍曝光工艺有效地防止显影缺陷的形成。还提供了用于浸渍曝光的上层膜和形成抗蚀剂图案的方法。用于形成上层膜的组合物包括树脂成分和溶剂。树脂成分包括具有选自由式（1-1）〜（1-3）表示的重复单元中的至少一种重复单元的树脂（A）和由式（2-1）和（2-2）。（1-1）（1-2）（1-3）（2-1）（2-2）[式中，R1表示氢或甲基; R2和R3各自表示亚甲基，直链或支链C 2-6亚烷基或脂环族C 4-12亚烷基; R4代表氢或甲基; 并且R 5表示单键，亚甲基或直链或支链C 2-6亚烷基。

6. 发明申请

US20100255416A1 COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UPPER LAYER FILM FOR IMMERSION EXPOSURE, AND METHOD OF FORMING PHOTORESIST PATTERN 有权
标题翻译：用于形成上层暴露的上层膜的组合物，用于浸没曝光的上层膜和形成光电子图案的方法
公开(公告)号：US20100255416A1
公开(公告)日：2010-10-07
申请号：US12680200
申请日：2008-09-10
申请人： Daita Kouno , Norihiko Sugie , Gouji Wakamatsu , Norihiro Natsume , Yukio Nishimura , Makoto Sugiura
发明人： Daita Kouno , Norihiko Sugie , Gouji Wakamatsu , Norihiro Natsume , Yukio Nishimura , Makoto Sugiura
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/11 , G03F7/2041
摘要： The object of the invention is to provide a composition for forming an upper layer film for immersion exposure capable of forming an upper layer film effectively inhibited from developing defects through an immersion exposure process, such as a watermark defect and dissolution residue defect. Also provided are an upper layer film for immersion exposure and a method of forming a resist pattern. The composition for forming an upper layer film includes a resin ingredient and a solvent. The resin ingredient includes a resin (A) having at least one kind of repeating units selected among those represented by the formulae (1-1) to (1-3) and at least either of the two kinds of repeating units represented by the formulae (2-1) and (2-2). (1-1) (1-2) (1-3) (2-1) (2-2) [In the formulae, R1 represents hydrogen or methyl; R2 and R3 each represents methylene, linear or branched C2-6 alkylene, or alicyclic C4-12 alkylene; R4 represents hydrogen or methyl; and R5 represents a single bond, methylene, or linear or branched C2-6 alkylene.].
摘要翻译：本发明的目的是提供一种用于形成用于浸渍曝光的上层膜的组合物，其能够通过诸如水印缺陷和溶解残留缺陷的浸渍曝光工艺有效地防止显影缺陷的形成。还提供了用于浸渍曝光的上层膜和形成抗蚀剂图案的方法。用于形成上层膜的组合物包括树脂成分和溶剂。树脂成分包括具有选自由式（1-1）〜（1-3）表示的重复单元中的至少一种重复单元的树脂（A）和由式（2-1）和（2-2）。（1-1）（1-2）（1-3）（2-1）（2-2）[式中，R1表示氢或甲基; R2和R3各自表示亚甲基，直链或支链C 2-6亚烷基或脂环族C 4-12亚烷基; R4代表氢或甲基; 并且R 5表示单键，亚甲基或直链或支链C 2-6亚烷基。

7. 发明申请

US20100068650A1 POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION 审中-公开
标题翻译：积极工作的辐射敏感性组合物和使用组合物形成抗蚀剂图案的方法
公开(公告)号：US20100068650A1
公开(公告)日：2010-03-18
申请号：US12529341
申请日：2008-03-17
申请人： Yukio Nishimura , Kaori Sakai , Nobuji Matsumura , Makoto Sugiura , Atsushi Nakamura , Gouji Wakamatsu , Yuusuke Anno
发明人： Yukio Nishimura , Kaori Sakai , Nobuji Matsumura , Makoto Sugiura , Atsushi Nakamura , Gouji Wakamatsu , Yuusuke Anno
IPC分类号： G03F7/039 , G03F7/40
CPC分类号： G03F7/0035 , G03F7/0397 , G03F7/2024 , G03F7/2041 , G03F7/40
摘要： A method of patterning using double exposure patterning in a liquid immersion lithographic process is provided. The patterning method comprises a step of forming a first pattern on a substrate using a first resist layer forming composition, a step of making the first pattern inactive, a step of forming a second pattern on a substrate on which a pattern has been formed using a second resist layer forming composition and exposing the second resist layer to radiation, and a step of developing the exposed resist layer to form a second pattern in the space area of the first pattern. The first resist layer forming composition contains a cross-linking agent which accelerates conversion of the first layer from positive-working to negative-working.
摘要翻译：提供了一种在液浸光刻工艺中使用双曝光图案化的图案化方法。图案化方法包括使用第一抗蚀剂层形成组合物在基板上形成第一图案的步骤，使第一图案无效的步骤，在其上已经形成图案的基板上形成第二图案的步骤，使用第二抗蚀剂层形成组合物并将第二抗蚀剂层暴露于辐射，以及在第一图案的空间区域中显影曝光的抗蚀剂层以形成第二图案的步骤。第一抗蚀剂层形成组合物含有交联剂，其加速第一层从正性转变为负性转化。

8. 发明授权

US08716884B2 Vehicle controller 有权
标题翻译：车辆控制器
公开(公告)号：US08716884B2
公开(公告)日：2014-05-06
申请号：US12299937
申请日：2007-01-26
申请人： Minoru Ikemoto , Hideo Okayama , Hidetoshi Kitanaka , Hidetoshi Sumita , Yoshinobu Koji , Kiyonobu Ueda , Yasuhisa Adachi , Makoto Sugiura
发明人： Minoru Ikemoto , Hideo Okayama , Hidetoshi Kitanaka , Hidetoshi Sumita , Yoshinobu Koji , Kiyonobu Ueda , Yasuhisa Adachi , Makoto Sugiura
IPC分类号： B60L1/00 , B60L3/00 , H05K7/00 , H05K5/00
CPC分类号： B61C17/00 , B60L1/003 , B60L15/007 , B60L2200/26 , Y02T10/645
摘要： There is provided a vehicle controller that is mounted in a box-shaped manner beneath the floor or on the roof of a vehicle so as to supply electric power to vehicle apparatuses. The vehicle controller is configured with a plurality of functional modules 4; each of the functional modules 4 has at one side thereof an interface side 22 in which a first interface region 5 where signal-line terminals are arranged and a second interface region 6 where power-line terminals are arranged are separated; in each of the interface sides 22, the first interface region 5 is disposed in the vicinity of one and the same end and the second interface region 6 is disposed in the vicinity of the other and the same end; the plurality of functional modules includes a monitoring circuit, an overvoltage protection circuit, and an inverter.
摘要翻译：提供了一种车辆控制器，该车辆控制器以车厢形式安装在地板或车顶上，以向车辆设备供电。车辆控制器配置有多个功能模块4; 每个功能模块4的一侧具有接口侧22，其中布置信号线端子的第一接口区域5和布置电力线端子的第二接口区域6分离; 在每个界面22中，第一界面区域5设置在同一端附近，并且第二界面区域6设置在另一端和同一端附近; 多个功能模块包括监控电路，过电压保护电路和逆变器。

9. 发明申请

US20100203447A1 RADIATION-SENSITIVE RESIN COMPOSITION 有权
标题翻译：辐射敏感性树脂组合物
公开(公告)号：US20100203447A1
公开(公告)日：2010-08-12
申请号：US12701592
申请日：2010-02-07
申请人： Noboru Otsuka , Takanori Kawakami , Yukio Nishimura , Makoto Sugiura
发明人： Noboru Otsuka , Takanori Kawakami , Yukio Nishimura , Makoto Sugiura
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： C08F220/12 , G03F7/0397 , G03F7/2041
摘要： A radiation-sensitive resin composition includes (A) an acid labile group-containing resin which becomes alkali-soluble by an action of an acid, (B) a radiation-sensitive acid generator, and (C) a solvent. The resin (A) includes repeating units shown by formulas (1) and (2), wherein R1 and R2 represent a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, R3 represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, X represents a hydrogen atom, a hydroxyl group, or an acyl group, m represents an integer from 1 to 18, and n represents an integer from 4 to 8.
摘要翻译：辐射敏感性树脂组合物包括（A）通过酸的作用变成碱溶性的酸不稳定基团的树脂，（B）辐射敏感性酸产生剂和（C）溶剂。树脂（A）包括由式（1）和（2）表示的重复单元，其中R 1和R 2表示氢原子或取代或未取代的具有1至4个碳原子的烷基，R 3表示取代或未取代的烷基， 1至4个碳原子，X表示氢原子，羟基或酰基，m表示1至18的整数，n表示4至8的整数。

10. 发明申请

US20070269735A1 Radiation-Sensitive Resin Composition 审中-公开
标题翻译：辐射敏感性树脂组合物
公开(公告)号：US20070269735A1
公开(公告)日：2007-11-22
申请号：US10592879
申请日：2005-03-17
申请人： Isao Nishimura , Makoto Sugiura , Masato Tanaka
发明人： Isao Nishimura , Makoto Sugiura , Masato Tanaka
IPC分类号： G03C1/37 , C08G77/20
CPC分类号： G03F7/0757 , C08G77/14 , C08G77/24 , G03F7/0046 , G03F7/0392
摘要： A siloxane resin exhibiting high transparency at a wavelength of 193 nm or less, very suitable as a resin component in a radiation-sensitive resin composition useful particularly for manufacturing LSIs, and a radiation-sensitive resin composition useful as a chemically-amplified resist exhibiting excellent depth of focus (DOF) and capability of remarkably decreasing development defects are provided. The siloxane resin comprises the structural unit (I) shown by the following formula (I) and the structural unit (II) shown by the following formula (II) in the same molecule, the structural unit (I) and the structural unit (II) being included in an amount of more than 0 mol % but not more than 70 mol %, wherein A and B individually represents a divalent linear, branched, or cyclic hydrocarbon group, R1 represents a monovalent acid-dissociable group, and R2 represents a linear, branched, or cyclic alkyl group. The radiation-sensitive resin composition comprises (a) the siloxane resin and (b) a photoacid generator.
摘要翻译：在特别用于制造LSI的放射线敏感性树脂组合物中，波长193nm以下，非常适合作为树脂成分的高透明性的硅氧烷树脂，以及用作显示优异的化学增幅抗蚀剂的放射线敏感性树脂组合物提供了焦点深度（DOF）和显着降低开发缺陷的能力。硅氧烷树脂包含在同一分子中由下式（I）表示的结构单元（I）和由下式（II）表示的结构单元（II），结构单元（I）和结构单元（II ）含量大于0mol％但不大于70mol％，其中A和B各自表示二价直链，支链或环状烃基，R 1表示一价酸 R 2表示直链，支链或环状的烷基。辐射敏感性树脂组合物包含（a）硅氧烷树脂和（b）光致酸产生剂。

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