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1. 发明申请

US20110228263A1 ILLUMINATING A SPECIMEN FOR METROLOGY OR INSPECTION 有权
标题翻译：照亮计量或检验样本
公开(公告)号：US20110228263A1
公开(公告)日：2011-09-22
申请号：US13073986
申请日：2011-03-28
申请人： Yung-Ho (Alex) Chuang , Vladimir Levinski , Xuefeng Liu , John Fielden
发明人： Yung-Ho (Alex) Chuang , Vladimir Levinski , Xuefeng Liu , John Fielden
IPC分类号： G01J3/00
CPC分类号： G01N21/9501 , G01N2021/479
摘要： Illumination subsystems of a metrology or inspection system, metrology systems, inspection systems, and methods for illuminating a specimen for metrology measurements or for inspection are provided.
摘要翻译：提供了计量或检查系统的照明子系统，计量系统，检查系统和用于计量测量或检查的照明样本的方法。

2. 发明授权

US09080991B2 Illuminating a specimen for metrology or inspection 有权
标题翻译：照亮样本进行计量或检查
公开(公告)号：US09080991B2
公开(公告)日：2015-07-14
申请号：US13073986
申请日：2011-03-28
申请人： Yung-Ho (Alex) Chuang , Vladimir Levinski , Xuefeng Liu , John Fielden
发明人： Yung-Ho (Alex) Chuang , Vladimir Levinski , Xuefeng Liu , John Fielden
IPC分类号： G01N21/00 , G01N21/95 , G01N21/47
CPC分类号： G01N21/9501 , G01N2021/479
摘要： Illumination subsystems of a metrology or inspection system, metrology systems, inspection systems, and methods for illuminating a specimen for metrology measurements or for inspection are provided. One illumination subsystem includes a light source configured to generate coherent pulses of light and a dispersive element positioned in the path of the coherent pulses of light, which is configured to reduce coherence of the pulses of light by mixing spatial and temporal characteristics of light distribution in the pulses of light. The illumination subsystem also includes an electro-optic modulator positioned in the path of the pulses of light exiting the dispersive element and which is configured to reduce the coherence of the pulses of light by temporally modulating the light distribution in the pulses of light. The illumination subsystem is configured to direct the pulses of light from the electro-optic modulator to a specimen.
摘要翻译：提供了计量或检查系统的照明子系统，计量系统，检查系统和用于计量测量或检查的照明样本的方法。一个照明子系统包括被配置为产生相干的光脉冲的光源和位于相干脉冲光的路径中的色散元件，该色散元件被配置为通过将光分布的空间和时间特征混合在一起来减小光脉冲的相干性光的脉冲。照明子系统还包括位于离开色散元件的光的脉冲的路径中的电光调制器，其被配置为通过暂时调制光脉冲中的光分布来减小光脉冲的相干性。照明子系统被配置为将来自电光调制器的光脉冲引导到样本。

3. 发明授权

US09080990B2 Illumination subsystems of a metrology system, metrology systems, and methods for illuminating a specimen for metrology measurements 有权
标题翻译：计量系统的照明子系统，计量系统以及用于计量测量的照明样本的方法
公开(公告)号：US09080990B2
公开(公告)日：2015-07-14
申请号：US13061936
申请日：2009-09-29
申请人： Yung-Ho (Alex) Chuang , Vladimir Levinski , Xuefeng Liu
发明人： Yung-Ho (Alex) Chuang , Vladimir Levinski , Xuefeng Liu
IPC分类号： G01N21/55 , G01N21/95 , G01N21/47
CPC分类号： G01N21/9501 , G01N2021/479
摘要： Illumination subsystems of a metrology system, metrology systems, and methods for illuminating a specimen for metrology measurements are provided. One illumination subsystem includes a light source configured to generate coherent pulses of light and a dispersive element positioned in the path of the coherent pulses of light, which is configured to reduce coherence of the pulses of light by mixing spatial and temporal characteristics of light distribution in the pulses of light. The illumination subsystem also includes an electro-optic modulator positioned in the path of the pulses of light exiting the dispersive element and which is configured to reduce the coherence of the pulses of light by temporally modulating the light distribution in the pulses of light. The illumination subsystem is configured to direct the pulses of light from the electro-optic modulator to a specimen positioned in the metrology system.
摘要翻译：提供了计量系统的照明子系统，计量系统和用于度量测量的照明样本的方法。一个照明子系统包括被配置为产生相干的光脉冲的光源和位于相干脉冲光的路径中的色散元件，该色散元件被配置为通过将光分布的空间和时间特征混合在一起来减小光脉冲的相干性光的脉冲。照明子系统还包括位于离开色散元件的光的脉冲的路径中的电光调制器，其被配置为通过暂时调制光脉冲中的光分布来减小光脉冲的相干性。照明子系统被配置为将来自电光调制器的光的脉冲引导到位于计量系统中的样本。

4. 发明申请

US20110279819A1 ILLUMINATION SUBSYSTEMS OF A METROLOGY SYSTEM, METROLOGY SYSTEMS, AND METHODS FOR ILLUMINATING A SPECIMEN FOR METROLOGY MEASUREMENTS 有权
标题翻译：计量系统的照明子系统，计量系统和用于量化测量样本的方法
公开(公告)号：US20110279819A1
公开(公告)日：2011-11-17
申请号：US13061936
申请日：2009-09-29
申请人： Yung-Ho (Alex) Chuang , Vladimir Levinski , Xuefeng Liu
发明人： Yung-Ho (Alex) Chuang , Vladimir Levinski , Xuefeng Liu
IPC分类号： G02F1/03 , G01B11/00
CPC分类号： G01N21/9501 , G01N2021/479
摘要： Illumination subsystems of a metrology system, metrology systems, and methods for illuminating a specimen for metrology measurements are provided.
摘要翻译：提供了计量系统的照明子系统，计量系统和用于度量测量的照明样本的方法。

5. 发明申请

US20110069312A1 METROLOGY SYSTEMS AND METHODS 有权
标题翻译：计量系统与方法
公开(公告)号：US20110069312A1
公开(公告)日：2011-03-24
申请号：US12872988
申请日：2010-08-31
申请人： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
发明人： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
IPC分类号： G01J4/00 , G01J3/28 , G01B11/14
CPC分类号： G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
摘要： Various metrology systems and methods are provided.
摘要翻译：提供了各种计量系统和方法。

6. 发明授权

US08441639B2 Metrology systems and methods 有权
标题翻译：计量系统和方法
公开(公告)号：US08441639B2
公开(公告)日：2013-05-14
申请号：US12872988
申请日：2010-08-31
申请人： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
发明人： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
IPC分类号： G01J4/00 , G01B11/14 , G01B11/28 , G01B11/04 , G01B11/00
CPC分类号： G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
摘要： Various metrology systems and methods are provided.
摘要翻译：提供了各种计量系统和方法。

7. 发明授权

US08390808B1 Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods 有权
标题翻译：增强的OVL虚拟场使能即时OVL测量方法
公开(公告)号：US08390808B1
公开(公告)日：2013-03-05
申请号：US13548656
申请日：2012-07-13
申请人： Vladimir Levinski , Michael E. Adel , Mark Ghinovker , Alexander Svizher
发明人： Vladimir Levinski , Michael E. Adel , Mark Ghinovker , Alexander Svizher
IPC分类号： G01B11/00
CPC分类号： H01L21/67294 , H01L21/68
摘要： A semiconductor wafer may include a dummy field configured to enable overlay measurements. The enhanced dummy field may include a plurality of encoding blocs that enable OVL measurements to be made throughout the enhanced dummy field.
摘要翻译：半导体晶片可以包括被配置为实现覆盖测量的虚拟场。增强的伪字段可以包括能够在增强的伪字段中进行OVL测量的多个编码块。

8. 发明授权

US08243273B2 Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods 有权
标题翻译：增强的OVL虚拟场，实现了“即时”OVL测量方法
公开(公告)号：US08243273B2
公开(公告)日：2012-08-14
申请号：US12455640
申请日：2009-06-04
申请人： Vladimir Levinski , Michael Adel , Mark Ghinovker , Alexander Svizher
发明人： Vladimir Levinski , Michael Adel , Mark Ghinovker , Alexander Svizher
IPC分类号： G01B11/00
CPC分类号： H01L21/67294 , H01L21/68
摘要： A semiconductor wafer may include a dummy field configured to enable overlay measurements. The enhanced dummy field may include a plurality of encoding blocs that enable OVL measurements to be made throughout the enhanced dummy field.
摘要翻译：半导体晶片可以包括被配置为实现覆盖测量的虚拟场。增强的伪字段可以包括能够在增强的伪字段中进行OVL测量的多个编码块。

9. 发明授权

US07433039B1 Apparatus and methods for reducing tool-induced shift during overlay metrology 有权
标题翻译：在重叠计量时减少工具引起的移位的装置和方法
公开(公告)号：US07433039B1
公开(公告)日：2008-10-07
申请号：US10913188
申请日：2004-08-06
申请人： Vladimir Levinski , Ilan Sela
发明人： Vladimir Levinski , Ilan Sela
IPC分类号： G01B11/00
CPC分类号： G03F7/70633 , G03F7/70616
摘要： Disclosed are apparatus and methods for determining a minimum tool-induced shift (TIS) during an overlay metrology procedure. In a specific embodiment, a method of determining overlay or misalignment error on a target is disclosed. For a predefined number of positions of a target within a field of view (FOV) of a metrology tool, the following operations are performed: (i) determining a tool-induced shift (TIS) parameter value for each predefined position of the target within the FOV based on at least one overlay measurement obtained from the target at the each position (for example, based on overlay measurements at 0 and 180 degrees of wafer orientation) and (ii) determining a minimum TIS parameter value and its corresponding FOV position from the plurality of determined TIS parameters values at the predefined positions of the target within the FOV. The FOV position that corresponds to the minimum TIS is then defined as an appropriate position for the actual overlay measurement and the value of minimum TIS is used for overlay correction.
摘要翻译：公开了用于在覆盖计量过程期间确定最小工具引起的移动（TIS）的装置和方法。在具体实施例中，公开了一种确定目标上的重叠或未对准误差的方法。对于计量工具的视场（FOV）中的目标的预定数量的位置，执行以下操作：（i）确定目标的每个预定义位置的工具引起的移动（TIS）参数值，基于从每个位置处的目标获得的至少一个覆盖测量的FOV（例如，基于在0和180度晶片取向的覆盖测量），以及（ii）确定最小TIS参数值及其对应的FOV位置在FOV内的目标的预定义位置处的多个确定的TIS参数值。然后将对应于最小TIS的FOV位置定义为实际覆盖测量的适当位置，并且将最小TIS的值用于覆盖校正。

10. 发明授权

US07310789B2 Use of overlay diagnostics for enhanced automatic process control 有权
标题翻译：使用覆盖诊断功能进行增强的自动过程控制
公开(公告)号：US07310789B2
公开(公告)日：2007-12-18
申请号：US11510147
申请日：2006-08-24
申请人： Joel L. Seligson , Mark Ghinovker , John Robinson , Pavel Izikson , Michael E. Adel , Boris Simkin , David Tulipman , Vladimir Levinski
发明人： Joel L. Seligson , Mark Ghinovker , John Robinson , Pavel Izikson , Michael E. Adel , Boris Simkin , David Tulipman , Vladimir Levinski
IPC分类号： G06F17/50
CPC分类号： G03F7/705 , G03F7/70516 , G03F7/70633
摘要： Disclosed are apparatus and methods for obtaining and analyzing various unique metrics or “target diagnostics” from one or more semiconductor overlay targets. In one embodiment, an overlay target is measured to obtain one or both of two specific types of target diagnostic information, systematic error metrics and/or random noise metrics. The systematic error metrics generally quantify asymmetries of the overlay target, while the random noise metrics quantify and/or qualify the spatial noise that is proximate to or associated with the overlay target.
摘要翻译：公开了用于从一个或多个半导体覆盖目标获取和分析各种独特度量或“目标诊断”的装置和方法。在一个实施例中，测量覆盖目标以获得两种特定类型的目标诊断信息，系统误差度量和/或随机噪声度量中的一种或两种。系统误差度量通常量化覆盖目标的不对称性，而随机噪声度量量化和/或限定与覆盖目标邻近或相关联的空间噪声。

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