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1. 发明授权

US07433039B1 Apparatus and methods for reducing tool-induced shift during overlay metrology 有权
标题翻译：在重叠计量时减少工具引起的移位的装置和方法
公开(公告)号：US07433039B1
公开(公告)日：2008-10-07
申请号：US10913188
申请日：2004-08-06
申请人： Vladimir Levinski , Ilan Sela
发明人： Vladimir Levinski , Ilan Sela
IPC分类号： G01B11/00
CPC分类号： G03F7/70633 , G03F7/70616
摘要： Disclosed are apparatus and methods for determining a minimum tool-induced shift (TIS) during an overlay metrology procedure. In a specific embodiment, a method of determining overlay or misalignment error on a target is disclosed. For a predefined number of positions of a target within a field of view (FOV) of a metrology tool, the following operations are performed: (i) determining a tool-induced shift (TIS) parameter value for each predefined position of the target within the FOV based on at least one overlay measurement obtained from the target at the each position (for example, based on overlay measurements at 0 and 180 degrees of wafer orientation) and (ii) determining a minimum TIS parameter value and its corresponding FOV position from the plurality of determined TIS parameters values at the predefined positions of the target within the FOV. The FOV position that corresponds to the minimum TIS is then defined as an appropriate position for the actual overlay measurement and the value of minimum TIS is used for overlay correction.
摘要翻译：公开了用于在覆盖计量过程期间确定最小工具引起的移动（TIS）的装置和方法。在具体实施例中，公开了一种确定目标上的重叠或未对准误差的方法。对于计量工具的视场（FOV）中的目标的预定数量的位置，执行以下操作：（i）确定目标的每个预定义位置的工具引起的移动（TIS）参数值，基于从每个位置处的目标获得的至少一个覆盖测量的FOV（例如，基于在0和180度晶片取向的覆盖测量），以及（ii）确定最小TIS参数值及其对应的FOV位置在FOV内的目标的预定义位置处的多个确定的TIS参数值。然后将对应于最小TIS的FOV位置定义为实际覆盖测量的适当位置，并且将最小TIS的值用于覆盖校正。

2. 发明申请

US20110069312A1 METROLOGY SYSTEMS AND METHODS 有权
标题翻译：计量系统与方法
公开(公告)号：US20110069312A1
公开(公告)日：2011-03-24
申请号：US12872988
申请日：2010-08-31
申请人： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
发明人： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
IPC分类号： G01J4/00 , G01J3/28 , G01B11/14
CPC分类号： G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
摘要： Various metrology systems and methods are provided.
摘要翻译：提供了各种计量系统和方法。

3. 发明授权

US08441639B2 Metrology systems and methods 有权
标题翻译：计量系统和方法
公开(公告)号：US08441639B2
公开(公告)日：2013-05-14
申请号：US12872988
申请日：2010-08-31
申请人： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
发明人： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
IPC分类号： G01J4/00 , G01B11/14 , G01B11/28 , G01B11/04 , G01B11/00
CPC分类号： G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
摘要： Various metrology systems and methods are provided.
摘要翻译：提供了各种计量系统和方法。

4. 发明授权

US08390808B1 Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods 有权
标题翻译：增强的OVL虚拟场使能即时OVL测量方法
公开(公告)号：US08390808B1
公开(公告)日：2013-03-05
申请号：US13548656
申请日：2012-07-13
申请人： Vladimir Levinski , Michael E. Adel , Mark Ghinovker , Alexander Svizher
发明人： Vladimir Levinski , Michael E. Adel , Mark Ghinovker , Alexander Svizher
IPC分类号： G01B11/00
CPC分类号： H01L21/67294 , H01L21/68
摘要： A semiconductor wafer may include a dummy field configured to enable overlay measurements. The enhanced dummy field may include a plurality of encoding blocs that enable OVL measurements to be made throughout the enhanced dummy field.
摘要翻译：半导体晶片可以包括被配置为实现覆盖测量的虚拟场。增强的伪字段可以包括能够在增强的伪字段中进行OVL测量的多个编码块。

5. 发明授权

US08243273B2 Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods 有权
标题翻译：增强的OVL虚拟场，实现了“即时”OVL测量方法
公开(公告)号：US08243273B2
公开(公告)日：2012-08-14
申请号：US12455640
申请日：2009-06-04
申请人： Vladimir Levinski , Michael Adel , Mark Ghinovker , Alexander Svizher
发明人： Vladimir Levinski , Michael Adel , Mark Ghinovker , Alexander Svizher
IPC分类号： G01B11/00
CPC分类号： H01L21/67294 , H01L21/68
摘要： A semiconductor wafer may include a dummy field configured to enable overlay measurements. The enhanced dummy field may include a plurality of encoding blocs that enable OVL measurements to be made throughout the enhanced dummy field.
摘要翻译：半导体晶片可以包括被配置为实现覆盖测量的虚拟场。增强的伪字段可以包括能够在增强的伪字段中进行OVL测量的多个编码块。

6. 发明授权

US07310789B2 Use of overlay diagnostics for enhanced automatic process control 有权
标题翻译：使用覆盖诊断功能进行增强的自动过程控制
公开(公告)号：US07310789B2
公开(公告)日：2007-12-18
申请号：US11510147
申请日：2006-08-24
申请人： Joel L. Seligson , Mark Ghinovker , John Robinson , Pavel Izikson , Michael E. Adel , Boris Simkin , David Tulipman , Vladimir Levinski
发明人： Joel L. Seligson , Mark Ghinovker , John Robinson , Pavel Izikson , Michael E. Adel , Boris Simkin , David Tulipman , Vladimir Levinski
IPC分类号： G06F17/50
CPC分类号： G03F7/705 , G03F7/70516 , G03F7/70633
摘要： Disclosed are apparatus and methods for obtaining and analyzing various unique metrics or “target diagnostics” from one or more semiconductor overlay targets. In one embodiment, an overlay target is measured to obtain one or both of two specific types of target diagnostic information, systematic error metrics and/or random noise metrics. The systematic error metrics generally quantify asymmetries of the overlay target, while the random noise metrics quantify and/or qualify the spatial noise that is proximate to or associated with the overlay target.
摘要翻译：公开了用于从一个或多个半导体覆盖目标获取和分析各种独特度量或“目标诊断”的装置和方法。在一个实施例中，测量覆盖目标以获得两种特定类型的目标诊断信息，系统误差度量和/或随机噪声度量中的一种或两种。系统误差度量通常量化覆盖目标的不对称性，而随机噪声度量量化和/或限定与覆盖目标邻近或相关联的空间噪声。

7. 发明申请

US20070279630A1 ORDER SELECTED OVERLAY METROLOGY 有权
标题翻译：订单选择重叠度量
公开(公告)号：US20070279630A1
公开(公告)日：2007-12-06
申请号：US11754892
申请日：2007-05-29
申请人： Daniel Kandel , Vladimir Levinski , Michael Adel , Joel Seligson
发明人： Daniel Kandel , Vladimir Levinski , Michael Adel , Joel Seligson
IPC分类号： G01B11/00
CPC分类号： G03F7/70633
摘要： Disclosed are apparatus and methods for measuring a characteristic, such as overlay, of a semiconductor target. In general, order-selected imaging and/or illumination is performed while collecting an image from a target using a metrology system. In one implementation, tunable spatial modulation is provided only in the imaging path of the system. In other implementations, tunable spatial modulation is provided in both the illumination and imaging paths of the system. In a specific implementation, tunable spatial modulation is used to image side-by-side gratings with diffraction orders ±n. The side-by-side gratings may be in different layers or the same layer of a semiconductor wafer. The overlay between the structures is typically found by measuring the distance between centers symmetry of the gratings. In this embodiment, only orders ±n for a given choice of n (where n is an integer and not equal to zero) are selected, and the gratings are only imaged with these diffraction orders.
摘要翻译：公开了用于测量半导体靶的特性（例如覆盖）的装置和方法。通常，在使用度量系统从目标物收集图像的同时执行顺序选择的成像和/或照明。在一个实现中，仅在系统的成像路径中提供可调谐空间调制。在其他实施方式中，在系统的照明和成像路径中提供可调谐的空间调制。在具体实现中，可调谐空间调制用于以衍射级±n对并行光栅进行成像。并排光栅可以在不同的层或相同的半导体晶片层中。通常通过测量光栅的中心对称性之间的距离来发现结构之间的覆盖。在本实施例中，对于给定的n（其中n是整数且不等于零）的选择，仅选择±n，并且光栅仅以这些衍射级成像。

8. 发明授权

US07111256B2 Use of overlay diagnostics for enhanced automatic process control 有权
标题翻译：使用覆盖诊断功能进行增强的自动过程控制
公开(公告)号：US07111256B2
公开(公告)日：2006-09-19
申请号：US10438963
申请日：2003-05-14
申请人： Joel L. Seligson , Mark Ghinovker , John Robinson , Pavel Izikson , Michael E. Adel , Boris Simkin , David Tulipman , Vladimir Levinski
发明人： Joel L. Seligson , Mark Ghinovker , John Robinson , Pavel Izikson , Michael E. Adel , Boris Simkin , David Tulipman , Vladimir Levinski
IPC分类号： G06F17/50
CPC分类号： G03F7/705 , G03F7/70516 , G03F7/70633
摘要： Disclosed are methods and apparatus for analyzing the quality of overlay targets. In one embodiment, a method of extracting data from an overlay target is disclosed. Initially, image information or one or more intensity signals of the overlay target are provided. An overlay error is obtained from the overlay target by analyzing the image information or the intensity signal(s) of the overlay target. A systematic error metric is also obtained from the overlay target by analyzing the image information or the intensity signal(s) of the overlay target. For example, the systematic error may indicate an asymmetry metric for one or more portions of the overlay target. A noise metric is further obtained from the overlay target by applying a statistical model to the image information or the intensity signal(s) of the overlay target. Noise metric characterizes noise, such as a grainy background, associated with the overlay target. In other embodiments, an overlay and/or stepper analysis procedure is then performed based on the systematic error metric and/or the noise metric, as well as the overlay data.
摘要翻译：公开了分析覆盖目标质量的方法和装置。在一个实施例中，公开了一种从覆盖目标提取数据的方法。首先，提供覆盖目标的图像信息或一个或多个强度信号。通过分析覆盖目标的图像信息或强度信号，从覆盖目标获得重叠错误。通过分析覆盖目标的图像信息或强度信号也可以从覆盖目标获得系统误差度量。例如，系统误差可以指示覆盖目标的一个或多个部分的不对称度量。通过将统计模型应用于覆盖目标的图像信息或强度信号，从覆盖目标进一步获得噪声度量。噪声度量表示与覆盖目标相关联的噪声，例如粒状背景。在其他实施例中，然后基于系统误差度量和/或噪声度量以及覆盖数据来执行覆盖和/或步进分析程序。

9. 发明授权

US11372340B2 Method and system for providing a quality metric for improved process control 有权
公开(公告)号：US11372340B2
公开(公告)日：2022-06-28
申请号：US13508495
申请日：2012-04-04
申请人： Daniel Kandel , Guy Cohen , Dana Klein , Vladimir Levinski , Noam Sapiens , Alex Shulman , Vladimir Kamenetsky , Eran Amit , Irina Vakshtein
发明人： Daniel Kandel , Guy Cohen , Dana Klein , Vladimir Levinski , Noam Sapiens , Alex Shulman , Vladimir Kamenetsky , Eran Amit , Irina Vakshtein
IPC分类号： G03F7/20 , G03F1/48
摘要： The present invention may include acquiring a plurality of overlay metrology measurement signals from a plurality of metrology targets distributed across one or more fields of a wafer of a lot of wafers, determining a plurality of overlay estimates for each of the plurality of overlay metrology measurement signals using a plurality of overlay algorithms, generating a plurality of overlay estimate distributions, and generating a first plurality of quality metrics utilizing the generated plurality of overlay estimate distributions, wherein each quality metric corresponds with one overlay estimate distribution of the generated plurality of overlay estimate distributions, each quality metric a function of a width of a corresponding generated overlay estimate distribution, each quality metric further being a function of asymmetry present in an overlay metrology measurement signal from an associated metrology target.

10. 发明授权

US08848186B2 Angle-resolved antisymmetric scatterometry 有权
标题翻译：角分辨反对称散射法
公开(公告)号：US08848186B2
公开(公告)日：2014-09-30
申请号：US13386524
申请日：2010-07-21
申请人： Daniel Kandel , Vladimir Levinski , Noam Sapiens
发明人： Daniel Kandel , Vladimir Levinski , Noam Sapiens
IPC分类号： G01B11/00 , G01J4/00 , G03F7/20 , G01B11/24 , G01N21/956
CPC分类号： G01N21/95607 , G01B11/14 , G01B11/24 , G01B2210/56 , G03F7/70633
摘要： A method for determining an overlay offset may include, but is not limited to: obtaining a first anti-symmetric differential signal (ΔS1) associated with a first scatterometry cell; obtaining a second anti-symmetric differential signal (ΔS2) associated with a second scatterometry cell and computing an overlay offset from the first anti-symmetric differential (ΔS1) signal associated with the first scatterometry cell and the second anti-symmetric differential signal (ΔS2) associated with the second scatterometry cell.
摘要翻译：用于确定覆盖偏移的方法可以包括但不限于：获得与第一散射测量单元相关联的第一反对称差分信号（＆Dgr; S1）; 获得与第二散射测量单元相关联的第二反对称差分信号（＆Dgr; S2），并计算与第一散射测量单元和第二反对称差分相关联的第一反对称差分（＆Dgr; S1）信号的叠加偏移与第二散射测量单元相关联的信号（＆Dgr; S2）。

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