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1. 发明申请

US20090122289A1 Thin Film Continuous Spatially Modulated Grey Attenuators and Filters 有权
标题翻译：薄膜连续空间调制灰色衰减器和滤波器
公开(公告)号：US20090122289A1
公开(公告)日：2009-05-14
申请号：US12265235
申请日：2008-11-05
申请人： Yuli VLADIMIRSKY , Lev Ryzhikov , Ronald A. Wilklow
发明人： Yuli VLADIMIRSKY , Lev Ryzhikov , Ronald A. Wilklow
IPC分类号： G03B27/54
CPC分类号： G03B27/54 , G03F7/70191
摘要： A system and method for use of a lithography apparatus having a substrate and an absorbing film formed on the substrate. A thickness of the absorbing film is spatially modulated across at least a part of the substrate to reduce a non-uniform intensity of a radiation beam transmitted through the substrate.
摘要翻译：一种使用具有在基板上形成的基板和吸收膜的光刻设备的系统和方法。吸收膜的厚度跨越衬底的至少一部分进行空间调制，以减少透射通过衬底的辐射束的不均匀的强度。

2. 发明授权

US08558988B2 Thin film continuous spatially modulated grey attenuators and filters 有权
标题翻译：薄膜连续空间调制灰色衰减器和滤波器
公开(公告)号：US08558988B2
公开(公告)日：2013-10-15
申请号：US12265235
申请日：2008-11-05
申请人： Yuli Vladimirsky , Lev Ryzhikov , Ronald A. Wilklow
发明人： Yuli Vladimirsky , Lev Ryzhikov , Ronald A. Wilklow
IPC分类号： G03B27/42 , G03B27/54 , G03B27/72
CPC分类号： G03B27/54 , G03F7/70191
摘要： A system and method for use of a lithography apparatus having a substrate and an absorbing film formed on the substrate. A thickness of the absorbing film is spatially modulated across at least a part of the substrate to reduce a non-uniform intensity of a radiation beam transmitted through the substrate.
摘要翻译：一种使用具有在基板上形成的基板和吸收膜的光刻设备的系统和方法。吸收膜的厚度跨越衬底的至少一部分进行空间调制，以减少透射通过衬底的辐射束的不均匀的强度。

3. 发明授权

US08013999B2 Beam characterization monitor for sensing pointing or angle of an optical beam 有权
标题翻译：用于感测光束的指向或角度的光束特性监视器
公开(公告)号：US08013999B2
公开(公告)日：2011-09-06
申请号：US12339217
申请日：2008-12-19
申请人： Matthew E. Hansen , Ronald A. Wilklow
发明人： Matthew E. Hansen , Ronald A. Wilklow
IPC分类号： G01N21/55
CPC分类号： G03B27/54 , G03F7/70133
摘要： The divergence of an optical beam is determined. An optic is configured to provide internal reflection of at least a part of a beam of radiation scanned over varying angles of incidence on the optic. The optic has a film configured to provide a surface plasmon resonance (SPR) effect. A detector is arranged relative to the optic and configured to electronically detect radiation reflected from the optic. The divergence angle of the beam of radiation is calculated based on a change in reflectance relative to angle of incidence.
摘要翻译：确定光束的发散。光学器件被配置为提供在光学器件上以不同入射角度扫描的辐射束的至少一部分的内部反射。光学元件具有配置成提供表面等离子体共振（SPR）效应的膜。检测器相对于光学元件布置，并被配置为电子地检测从光学元件反射的辐射。基于相对于入射角的反射率的变化来计算辐射束的发散角。

4. 发明授权

US06680794B2 Polarization beam splitter for photolithography 失效
标题翻译：用于光刻的偏振分束器
公开(公告)号：US06680794B2
公开(公告)日：2004-01-20
申请号：US10264318
申请日：2002-10-04
申请人： James A. McClay , Ronald A. Wilklow , Matthew Gregoire
发明人： James A. McClay , Ronald A. Wilklow , Matthew Gregoire
IPC分类号： G02B528
CPC分类号： G03F7/70216 , G02B1/02 , G02B5/3033 , G02B5/3066 , G02B27/283
摘要： The present invention provides a photolithography system having a catadioptric system with a polarizing beam splitter cube. The beam splitter cube transmits light at wavelengths equal to or less than 170 nm. The polarizing beam splitter cube can image at high quality light incident over a wide range of angles and including a numeric aperture greater than 0.6. In one embodiment, the polarizing beam splitter cube comprises a pair of prisms that are made of at least a fluoride material, such as calcium fluoride, and a coating interface having at least one layer of a thin film fluoride material. Layers in a multi-layer stack can also be graded across the hypotenuse face of a prism to adjust layer thicknesses at any point so as to compensate for changes in the incidence angle of the light. In one embodiment, the prisms and coating interface are joined by optical contact.
摘要翻译：本发明提供了一种具有偏光分束器立方体的反射折射系统的光刻系统。分束器立方体透射波长等于或小于170nm的光。偏振分束器立方体可以在宽范围的角度入射的高质量光下成像，并且包括大于0.6的数值孔径。在一个实施例中，偏振分束器立方体包括由至少氟化物材料如氟化钙制成的一对棱镜和具有至少一层薄膜氟化物材料的涂层界面。多层叠层中的层也可以跨越棱镜的斜边分级，以调整任何点的层厚度，以补偿光入射角的变化。在一个实施例中，棱镜和涂层界面通过光学接触连接。

5. 发明申请

US20130033690A1 ELECTROSTATIC CLAMP, LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING AN ELECTROSTATIC CLAMP 有权
标题翻译：静电夹，光刻胶及其制造方法
公开(公告)号：US20130033690A1
公开(公告)日：2013-02-07
申请号：US13564316
申请日：2012-08-01
申请人： Peter Richard HELMUS , Ronald A. Wilklow
发明人： Peter Richard HELMUS , Ronald A. Wilklow
IPC分类号： H02N13/00 , G03B27/58 , B32B37/00 , G03B27/62
CPC分类号： H01L21/6831 , G03F7/70708 , H01L21/6833 , Y10T156/10
摘要： An electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The clamp comprises a first layer of material, an electrode disposed over the first layer, an isolating, dielectric or semi-dielectric material deposited between portions of the electrode, and a second layer disposed over the electrode. Further, a method of manufacturing of the electrostatic clamp is described.
摘要翻译：静电夹具，其构造成将物品静电地夹持在光刻设备中的物品支撑件上。夹具包括第一材料层，设置在第一层之上的电极，沉积在电极部分之间的隔离，电介质或半电介质材料，以及设置在电极上的第二层。此外，描述了制造静电夹的方法。

6. 发明申请

US20090161088A1 Beam Characterization Monitor for Sensing Pointing or Angle of an Optical Beam 有权
标题翻译：用于感光指向或光束角度的光束表征监视器
公开(公告)号：US20090161088A1
公开(公告)日：2009-06-25
申请号：US12339217
申请日：2008-12-19
申请人： Matthew E. Hansen , Ronald A. Wilklow
发明人： Matthew E. Hansen , Ronald A. Wilklow
IPC分类号： G03B27/54 , G01B11/26 , G06F15/00
CPC分类号： G03B27/54 , G03F7/70133
摘要： The divergence of an optical beam is determined. An optic is configured to provide internal reflection of at least a part of a beam of radiation scanned over varying angles of incidence on the optic. The optic has a film configured to provide a surface plasmon resonance (SPR) effect. A detector is arranged relative to the optic and configured to electronically detect radiation reflected from the optic. The divergence angle of the beam of radiation is calculated based on a change in reflectance relative to angle of incidence.
摘要翻译：确定光束的发散。光学器件被配置为提供在光学器件上以不同入射角度扫描的辐射束的至少一部分的内部反射。光学元件具有配置成提供表面等离子体共振（SPR）效应的膜。检测器相对于光学元件布置，并被配置为电子地检测从光学元件反射的辐射。基于相对于入射角的反射率的变化来计算辐射束的发散角。

7. 发明授权

US09348236B2 Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp 有权
标题翻译：静电夹具，光刻设备及制造静电夹具的方法
公开(公告)号：US09348236B2
公开(公告)日：2016-05-24
申请号：US13991089
申请日：2011-09-21
申请人： Peter Richard Helmus , Matthew Lipson , Ronald A. Wilklow , James Kennon , Kennard White , Wilbur Jordan Reichmann, II
发明人： Peter Richard Helmus , Matthew Lipson , Ronald A. Wilklow , James Kennon , Kennard White , Wilbur Jordan Reichmann, II
IPC分类号： H01L21/683 , H01T23/00 , G03F7/20 , H02N13/00
CPC分类号： G03F7/70708 , G03F7/70691 , H01L21/6833 , H02N13/00
摘要： An electrostatic clamp for use in a lithographic apparatus includes burls and an electrode surrounded by an insulator and/or a dielectric material between adjacent burls. In an embodiment, two or more layers of dielectric material are provided between adjacent burls and surround an electrode provided between adjacent burls. The electrostatic clamp may be used to clamp an object to an object support in a lithographic apparatus.
摘要翻译：用于光刻设备的静电夹具包括毛刺和由绝缘体和/或相邻毛边之间的介电材料包围的电极。在一个实施例中，两层或更多层电介质材料设置在相邻的孔之间并且围绕设置在相邻的孔之间的电极。静电夹可用于将物体夹持在光刻设备中的物体支撑件上。

8. 发明授权

US07548370B2 Layered structure for a tile wave plate assembly 有权
标题翻译：瓷砖波片组件的分层结构
公开(公告)号：US07548370B2
公开(公告)日：2009-06-16
申请号：US10878040
申请日：2004-06-29
申请人： Michael M. Albert , Justin Kreuzer , Ronald A. Wilklow
发明人： Michael M. Albert , Justin Kreuzer , Ronald A. Wilklow
IPC分类号： G02B27/28
CPC分类号： G03B27/72
摘要： The present invention relates to an apparatus for polarizing an incident light beam. In embodiments, a tile wave plate assembly is provided. The tile wave plate includes a layered structure having a substrate plate and two layers of mosaic tiles. The layers of the apparatus are mechanically separated to form a controlled gap spacing. The mosaic tiles can be configured to form a pseudo or true zero order wave plate.
摘要翻译：本发明涉及一种使入射光束偏振的装置。在实施例中，提供瓦片波片组件。瓦片波片包括具有基板和两层马赛克瓦的层状结构。设备的层被机械分离以形成受控的间隙间隔。可以将马赛克瓦片配置成形成伪或真正的零级波片。

9. 发明授权

US5429732A High rate ion beam sputtering process 失效
标题翻译：高速离子束溅射工艺
公开(公告)号：US5429732A
公开(公告)日：1995-07-04
申请号：US197643
申请日：1994-02-14
申请人： Sandeep Dave , Ronald A. Wilklow
发明人： Sandeep Dave , Ronald A. Wilklow
IPC分类号： C23C14/46 , H01J37/34 , C23C14/34
CPC分类号： H01J37/3411 , C23C14/46 , H01J37/34
摘要： An ion beam sputtering process for fabricating a multilayer optical coating. The process adds energy to surface atoms of a sputtering target to increase deposition rates of atoms comprising the optical coating, thereby improving yield. The present process comprises providing a sputtering chamber. A sputtering target having a predetermined binding energy is disposed in the sputtering chamber, along with an optical element onto which a multilayer optical coating is to be deposited. The sputtering chamber is then pressurized to a predetermined sputtering pressure. Energy is then applied to the sputtering target to increase the vibrational energy of surface atoms and mean target energy thereof, thereby decreasing the amount of energy required to sputter atoms from the surface of the sputtering target onto the surface of the optical element. Energy may be added to the surface atoms of the sputtering target by adding acoustic (ultrasonic) energy, by irradiating the surface of the target using a laser, or by causing lattice strain in the target.
摘要翻译：一种用于制造多层光学涂层的离子束溅射工艺。该方法将能量添加到溅射靶的表面原子，以增加包含光学涂层的原子的沉积速率，从而提高产率。本方法包括提供溅射室。具有预定结合能的溅射靶与散射多层光学涂层的光学元件一起设置在溅射室中。然后将溅射室加压至预定的溅射压力。然后将能量施加到溅射靶，以增加表面原子的振动能量和平均目标能量，从而减少从溅射靶的表面将原子溅射到光学元件的表面上所需的能量。可以通过使用激光照射靶的表面或通过在靶中引起晶格应变，通过添加声学（超声波）能量，将溅射靶的表面原子加入能量。

10. 发明授权

US08736810B2 EUV reticle substrates with high thermal conductivity 有权
标题翻译：具有高导热性的EUV掩模版基板
公开(公告)号：US08736810B2
公开(公告)日：2014-05-27
申请号：US13054008
申请日：2009-07-29
申请人： Ronald A. Wilklow , Michael L. Nelson , Michael Perry
发明人： Ronald A. Wilklow , Michael L. Nelson , Michael Perry
IPC分类号： G03B27/42 , G03F1/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F7/70891
摘要： A reflective reticle substantially reduces or eliminates pattern distortion that results from the absorption of EUV radiation while maintaining a reticle thickness consistent with industry standards. The reflective reticle includes a layer of ultra-low expansion (ULE) glass and a substrate of Cordierite having a thermal conductivity substantially larger than that of ULE glass. An aluminum layer is disposed onto a first surface of the ULE glass and a second surface of the ULE glass is polished to be substantially flat and defect-free. The Cordierite substrate can be directly bonded to the aluminum layer using anodic bonding to form the reflective reticle. Alternatively, a first surface of an intermediate Zerodur layer can be bonded to the aluminum layer, and a second aluminum layer can be used to anodically bond the Cordierite substrate to a second surface of the Zerodur layer, thereby forming the reflective reticle.
摘要翻译：反射型掩模版基本上减少或消除由于EUV辐射的吸收而导致的图案变形，同时保持与行业标准一致的光罩厚度。反射型掩模版包括一层超低膨胀（ULE）玻璃和堇青石的基底，其导热率基本上大于ULE玻璃的热导率。将铝层设置在ULE玻璃的第一表面上，并将ULE玻璃的第二表面抛光成基本平坦且无缺陷。堇青石基材可以使用阳极结合直接结合到铝层上以形成反射型掩模版。或者，中间Zerodur层的第一表面可以结合到铝层，并且可以使用第二铝层将堇青石基板阳极结合到Zerodur层的第二表面，从而形成反射掩模版。

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