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1. 发明授权

US06480330B1 Ultraviolet polarization beam splitter for microlithography 有权
标题翻译：用于微光刻的紫外线偏振分束器
公开(公告)号：US06480330B1
公开(公告)日：2002-11-12
申请号：US09538529
申请日：2000-03-30
申请人： James A. McClay , Ronald A. Wilklow , Matthew Gregoire
发明人： James A. McClay , Ronald A. Wilklow , Matthew Gregoire
IPC分类号： G02B528
CPC分类号： G03F7/70216 , G02B1/02 , G02B5/3033 , G02B5/3066 , G02B27/283
摘要： The present invention provides an ultraviolet (UV) polarizing beam splitter cube. The UV polarizing beam splitter cube is transmissive to light at wavelengths equal to or less than 170 nm and can image, at high quality, light incident over a wide range of angles and including a numeric aperture greater than 0.6. The UV polarizing beam splitter cube comprises a pair of prisms that are made of at least a fluoride material, and a coating interface having at least one layer of a thin film fluoride material. Alternating layers of thin film fluoride materials can comprise a first fluoride material having a first refractive index and a second fluoride material having a second refractive index. The first and second fluoride materials form a stack of fluoride materials having relatively high and low refractive indices such that the coating interface separates UV light into two polarized states.
摘要翻译：本发明提供一种紫外线（UV）偏振分束器立方体。 UV偏振分束器立方体对于等于或小于170nm的波长的光是透射的，并且可以在高质量下成像在宽范围的角度入射的光并且包括大于0.6的数值孔径。 UV偏振分束镜包括由至少氟化物材料制成的一对棱镜和具有至少一层薄膜氟化物材料的涂层界面。薄膜氟化物材料的交替层可以包括具有第一折射率的第一氟化物材料和具有第二折射率的第二氟化物材料。第一和第二氟化物材料形成具有相对较高和低折射率的氟化物材料的堆叠，使得涂层界面将UV光分离成两个偏振态。

2. 发明授权

US06680794B2 Polarization beam splitter for photolithography 失效
标题翻译：用于光刻的偏振分束器
公开(公告)号：US06680794B2
公开(公告)日：2004-01-20
申请号：US10264318
申请日：2002-10-04
申请人： James A. McClay , Ronald A. Wilklow , Matthew Gregoire
发明人： James A. McClay , Ronald A. Wilklow , Matthew Gregoire
IPC分类号： G02B528
CPC分类号： G03F7/70216 , G02B1/02 , G02B5/3033 , G02B5/3066 , G02B27/283
摘要： The present invention provides a photolithography system having a catadioptric system with a polarizing beam splitter cube. The beam splitter cube transmits light at wavelengths equal to or less than 170 nm. The polarizing beam splitter cube can image at high quality light incident over a wide range of angles and including a numeric aperture greater than 0.6. In one embodiment, the polarizing beam splitter cube comprises a pair of prisms that are made of at least a fluoride material, such as calcium fluoride, and a coating interface having at least one layer of a thin film fluoride material. Layers in a multi-layer stack can also be graded across the hypotenuse face of a prism to adjust layer thicknesses at any point so as to compensate for changes in the incidence angle of the light. In one embodiment, the prisms and coating interface are joined by optical contact.
摘要翻译：本发明提供了一种具有偏光分束器立方体的反射折射系统的光刻系统。分束器立方体透射波长等于或小于170nm的光。偏振分束器立方体可以在宽范围的角度入射的高质量光下成像，并且包括大于0.6的数值孔径。在一个实施例中，偏振分束器立方体包括由至少氟化物材料如氟化钙制成的一对棱镜和具有至少一层薄膜氟化物材料的涂层界面。多层叠层中的层也可以跨越棱镜的斜边分级，以调整任何点的层厚度，以补偿光入射角的变化。在一个实施例中，棱镜和涂层界面通过光学接触连接。

3. 发明授权

US07249925B2 System and method for reticle protection and transport 失效
标题翻译：用于掩模保护和运输的系统和方法
公开(公告)号：US07249925B2
公开(公告)日：2007-07-31
申请号：US11282474
申请日：2005-11-21
申请人： Santiago E. del Puerto , Michael A. DeMarco , Glenn M. Friedman , Jorge S. Ivaldi , James A. McClay
发明人： Santiago E. del Puerto , Michael A. DeMarco , Glenn M. Friedman , Jorge S. Ivaldi , James A. McClay
IPC分类号： H01L21/68
CPC分类号： G03F7/70741 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/66 , G03F7/70808 , H01L21/67005 , H01L21/67751 , H01L21/67772 , H01L21/67778 , Y10S414/14
摘要： A substrate protection and transport system and method for transitioning a substrate from atmospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes that support a substrate. The cassette can include a base portion and top portion, and can include a seal. Each cassette has at least one vent and at least one filter. The system further includes a box having a base and lid. The box holds one or more cassette-substrate arrangements. A storage rack having shelves for holding the box-cassette-substrate arrangement is also provided. Further, an entry-exit module having a loadlock is provided for transitioning the cassette-substrate arrangement from atmospheric pressure to vacuum. The entry-exit module can include a shuttle and/or elevator for transporting the cassette-substrate arrangement. During transitioning, the filter(s) and vent(s) restrict particles within the loadlock from entering the cassette-substrate arrangement and reaching a surface of the substrate.
摘要翻译：一种用于在光刻工具中将基板从大气压转换成真空的衬底保护和输送系统和方法。该系统包括支撑衬底的一个或多个可移除的衬底输送盒。盒可以包括基部和顶部，并且可以包括密封。每个盒具有至少一个排气口和至少一个过滤器。该系统还包括具有底座和盖子的盒子。盒子保持一个或多个盒式衬底布置。还提供了一种具有用于保持盒 - 盒 - 衬底布置的搁架的存放架。此外，提供具有负载锁的入口模块，用于将盒式基板装置从大气压转换成真空。出入口模块可以包括用于运送盒式基板装置的梭和/或电梯。在过渡期间，过滤器和排气口限制负载锁中的颗粒进入盒 - 衬底布置并到达衬底的表面。

4. 发明授权

US06991416B2 System and method for reticle protection and transport 失效
公开(公告)号：US06991416B2
公开(公告)日：2006-01-31
申请号：US10216660
申请日：2002-08-12
申请人： Santiago E. del Puerto , Michael A. DeMarco , Glenn M. Friedman , Jorge S. Ivaldi , James A. McClay
发明人： Santiago E. del Puerto , Michael A. DeMarco , Glenn M. Friedman , Jorge S. Ivaldi , James A. McClay
IPC分类号： H01L21/68
CPC分类号： G03F7/70741 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/66 , G03F7/70808 , H01L21/67005 , H01L21/67751 , H01L21/67772 , H01L21/67778 , Y10S414/14
摘要： A substrate protection and transport system and method for transitioning a substrate from atomospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes. Each cassette has at least one vent and at least one filter. The system further includes an end effector coupled to a robotic arm to enable the substrate to be positioned within one of the cassettes, thereby forming a cassette-substrate arrangement. The system further includes a box having a base and a lid. The box holds one or more of the cassette-substrate arrangements. In this way, a box-cassette-substrate arrangement is provided. An out of vacuum storage rack having shelves for holding the box-cassette-substrate arrangement is also provided. Still further, an entry-exit module having a loadlock is provided for transitioning the cassette-substrate arrangement from atmospheric pressure to vacuum. To transport the substrate, the substrate is first loaded into a removable substrate transport cassette. Next, the cassette-substrate arrangement is loaded into the box. The box-cassette-substrate arrangement is then transported to a shelf of an out of vacuum storage rack. During further processing, the cassette-substrate arrangement is unloaded from the box-cassette-substrate arrangement. The cassette-substrate arrangement is then loaded into a loadlock where it can be transitioned from atmospheric pressure to vacuum. During transitioning, the filters and vents restrict particles within the loadlock from entering the cassette-substrate arrangement and reaching a surface of the substrate.

5. 发明授权

US06619903B2 System and method for reticle protection and transport 失效
标题翻译：用于掩模保护和运输的系统和方法
公开(公告)号：US06619903B2
公开(公告)日：2003-09-16
申请号：US09925722
申请日：2001-08-10
申请人： Glenn M. Friedman , Michael DeMarco , Jorge S. Ivaldi , James A. McClay
发明人： Glenn M. Friedman , Michael DeMarco , Jorge S. Ivaldi , James A. McClay
IPC分类号： B65G4907
CPC分类号： G03F7/70741 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/66 , G03F7/70808 , H01L21/67005 , H01L21/67751 , H01L21/67772 , H01L21/67778 , Y10S414/14
摘要： A reticle protection and transport system and method for a lithography tool. The system includes an indexer that stores a plurality of reticles and a removable reticle cassette. The removable reticle cassette is comprised of an inner chamber and an outer chamber. The system further includes an end effector coupled to a robotic arm. The end effector engages one of the plurality of reticles to enable the reticle to be positioned within the removable reticle cassette and thereafter transported. The system further includes a seal, coupled to the end effector and the robotic arm. To transport the reticle, the reticle is first loaded onto the end effector. Next, the end effector is used to create an arrangement wherein the reticle is loaded into the removable reticle cassette. Importantly, the reticle and removable reticle cassette do not come into contact with one another. The reticle and removable reticle cassette arrangement is then sealed and transported from the indexer to a mount for performing lithographic exposure. Once lithographic exposure is completed, the arrangement is returned to the indexer and the reticle is withdrawn from the removable reticle cassette.
摘要翻译：光刻工具的掩模版保护和输送系统及方法。该系统包括存储多个掩模版和可拆卸标线片盒的分度器。可移除的标线盒由内室和外室构成。该系统还包括耦合到机器臂的端部执行器。端部执行器与多个标线板中的一个接合，以使得标线片能够被定位在可移除的标线盒内并且之后传送。该系统还包括联接到末端执行器和机器臂的密封件。为了运输掩模版，首先将掩模版加载到末端执行器上。接下来，使用端部执行器来产生其中将光罩装载到可移除的标线盒中的布置。重要的是，标线和可拆卸的标线盒不会彼此接触。然后将掩模版和可去除的光罩盒装置密封并从分度器传送到用于进行光刻曝光的安装台。一旦光刻曝光完成，该布置返回到分度器，并将标线从可移除的标线片盒中取出。

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