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1. 发明授权

US07773199B2 Methods and systems to compensate for a stitching disturbance of a printed pattern 有权
标题翻译：用于补偿印刷图案的缝合干扰的方法和系统
公开(公告)号：US07773199B2
公开(公告)日：2010-08-10
申请号：US12000523
申请日：2007-12-13
申请人： Arno Bleeker , Wenceslao A. Cebuhar , Justin Kreuzer , Azat Latypov , Yuli Vladimirsky
发明人： Arno Bleeker , Wenceslao A. Cebuhar , Justin Kreuzer , Azat Latypov , Yuli Vladimirsky
IPC分类号： G03B27/32 , G03B27/42
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided of using a patterning device. An exemplary method includes defining a first region on a surface, the first region being associated with a first element of the patterning device, defining a second region on the surface, the second region being associated with a second element of the patterning device, activating the first element to expose the overlapping region, and deactivating the second element when the first element is active. The first region and the second region overlap in an overlapping region.
摘要翻译：提供了使用图案形成装置的方法和系统。示例性方法包括限定表面上的第一区域，第一区域与图案形成装置的第一元件相关联，限定表面上的第二区域，第二区域与图案形成装置的第二元件相关联，第一元件以暴露所述重叠区域，以及当所述第一元件处于活动状态时停用所述第二元件。第一区域和第二区域在重叠区域中重叠。

2. 发明申请

US20100045955A1 Particle Detection on an Object Surface 有权
标题翻译：物体表面上的粒子检测
公开(公告)号：US20100045955A1
公开(公告)日：2010-02-25
申请号：US12537728
申请日：2009-08-07
申请人： Yuli VLADIMIRSKY , James H. WALSH
发明人： Yuli VLADIMIRSKY , James H. WALSH
IPC分类号： G01N21/94 , G03B27/52 , H04N7/18
CPC分类号： G01N21/94 , G01N2021/95676 , G03F7/7085 , G03F7/70916
摘要： Systems and methods are provided for inspecting an object surface. An illumination source illuminates the object surface. An optic intercepts scattered light from the illuminated object surface and projects a real image of an area of the object surface. A sensor receives the projected real image. A computer system, coupled to the sensor, stores and analyzes the real image. The real image is processed to detect particles located on the object surface. This arrangement is particularly useful for detecting contaminants or defects on a reticle of a lithography device.
摘要翻译：提供了用于检查物体表面的系统和方法。照明源照亮物体表面。光学器件拦截来自被照射物体表面的散射光并投射物体表面区域的真实图像。传感器接收投影的真实图像。耦合到传感器的计算机系统存储和分析真实图像。处理真实图像以检测位于物体表面上的颗粒。这种布置对于检测光刻设备的掩模版上的污染物或缺陷特别有用。

3. 发明申请

US20070146672A1 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region 审中-公开
标题翻译：在无掩模光刻系统中补偿印刷图案的缝合干扰的方法和系统，利用曝光区域与重叠区域中的空间图像的衰减重叠
公开(公告)号：US20070146672A1
公开(公告)日：2007-06-28
申请号：US11593076
申请日：2006-11-06
申请人： Arno Bleeker , Wenceslao Cebuhar , Justin Kreuzer , Azat Latypov , Yuli Vladimirsky
发明人： Arno Bleeker , Wenceslao Cebuhar , Justin Kreuzer , Azat Latypov , Yuli Vladimirsky
IPC分类号： G03B27/54
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.
摘要翻译：提供了一种使用空间光调制器（SLM）在感光表面上印刷图案的方法和系统。示例性方法包括在感光表面上限定两个或更多个曝光区域，曝光区域沿着曝光区域的相应边缘部分重叠以在它们之间形成重叠区域。暴露两个或更多个曝光区域以在其中打印图像，曝光延伸穿过重叠区域。然后在重叠区域内的曝光被衰减。

4. 发明申请

US20060044533A1 System and method for reducing disturbances caused by movement in an immersion lithography system 审中-公开
标题翻译：用于减少浸没式光刻系统中运动引起的干扰的系统和方法
公开(公告)号：US20060044533A1
公开(公告)日：2006-03-02
申请号：US10927394
申请日：2004-08-27
申请人： Lev Ryzhikov , Yuli Vladimirsky
发明人： Lev Ryzhikov , Yuli Vladimirsky
IPC分类号： G03B27/52
CPC分类号： G03F7/70275 , G03F7/70258 , G03F7/70341 , G03F7/709
摘要： In an immersion lithography system, a moveable substrate unit is formed from a substrate and at least one optical element, with immersion liquid between them. The immersion liquid and the optical element move in unison with the substrate. Movement of the substrate unit reduces refractive index disturbance produced by turbulence during exposure scans. The projection optical system is enhanced with a dynamic axial compensation group. Elements in the dynamic axial compensation group can move to compensate aberrations caused by deviation of axial symmetry due to movement of the optical element in the substrate unit. The space in the substrate unit filled with immersion liquid may be dynamically controlled to provide proper working distance. If the optical element in the substrate unit has optical power, both resolution and depth of focus may be enhanced. Even if the optical element has no optical power, depth of focus may still be enhanced.
摘要翻译：在浸没式光刻系统中，可移动基板单元由基板和至少一个光学元件形成，其间具有浸没液体。浸没液体和光学元件与基底一致地移动。衬底单元的移动降低了曝光扫描期间由湍流产生的折射率干扰。投影光学系统通过动态轴向补偿组增强。动态轴向补偿组中的元件可以移动以补偿由于基板单元中的光学元件的移动引起的轴对称偏差引起的像差。填充有浸没液体的基板单元中的空间可以被动态地控制以提供适当的工作距离。如果基板单元中的光学元件具有光学功率，则可以提高分辨率和聚焦深度。即使光学元件没有光学功率，仍然可以提高焦深。

5. 发明授权

US06383697B1 Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction 失效
$Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction$
标题翻译：通过利用菲涅尔衍射在临界条件附近通过曝光进行超高分辨率光刻成像和印刷和缺陷减少
公开(公告)号：US06383697B1
公开(公告)日：2002-05-07
申请号：US09514304
申请日：2000-02-28
申请人： Yuli Vladimirsky , Antony Bourdillon
发明人： Yuli Vladimirsky , Antony Bourdillon
IPC分类号： G03C500
CPC分类号： G03F7/70216 , G03F7/70325 , G03F7/7035 , Y10S430/143 , Y10S430/168
摘要： Ultra-high resolution lithographic imaging and printing refers to the reduction in printed feature size, or “demagnification” obtained by the use of “bias”. A new meaning is given to Next Generation Lithography (NGL) in terms of fidelity in the reproduction of masks. Applying the classical manifestation of Fresnel diffraction, the mask pattern features are “demagnified” by “bias”. Classically, bias is minimized but the invention uses it to advantage so that: (i) mask-wafer gaps are thus enlarged; (ii) mask features are enlarged 3×-6× for a given printed feature size (cf. classically 1:1 in proximity lithography); (iii) the technique is extensible to beyond 25 nm feature sizes and (iv) exposure times are reduced. The invention is specifically demonstrated in proximity X-ray lithography but has a generic extension to all lithographies that can use out of focus imaging to produce ultra-high resolution. In consequence of the diffraction, printing defects due to mask faults are reduced including edge roughness, writing errors, diffraction effects at shielded areas and absorber thickness variations. Moreover the exposure doses from mask features of various sizes are controlled by various techniques.
摘要翻译：超高分辨率平版印刷成像和印刷是指通过使用“偏压”获得的印刷特征尺寸减小或“缩小”。新一代平版印刷术（NGL）在面具复制方面的保真度有新意义。应用菲涅耳衍射的经典表现，掩模图案特征通过“偏差”“缩小”。通常，偏压被最小化，但是本发明使用它有利于：（i）掩模 - 晶片间隙因此被扩大; （ii）对于给定的印刷特征尺寸，掩模特征被放大3×6x（参见邻近光刻中的经典1：1）; （iii）该技术可扩展到超过25nm的特征尺寸，并且（iv）降低曝光时间。本发明在接近X射线光刻技术中被具体证明，但是具有可以使用离焦成像以产生超高分辨率的所有平版印刷术的通用扩展。由于衍射，由于掩模故障引起的印刷缺陷减少，包括边缘粗糙度，写入误差，屏蔽区域的衍射效应和吸收体厚度变化。此外，各种尺寸的掩模特征的曝光剂量由各种技术控制。

6. 发明授权

US08681313B2 Diffraction elements for alignment targets 失效
$Diffraction elements for alignment targets$
标题翻译：对准目标的衍射元件
公开(公告)号：US08681313B2
公开(公告)日：2014-03-25
申请号：US12921559
申请日：2009-04-03
申请人： Yuli Vladimirsky , Muhammad Arif , Robert Albert Tharaldsen
发明人： Yuli Vladimirsky , Muhammad Arif , Robert Albert Tharaldsen
IPC分类号： G01B11/00 , G01B11/14 , G02B5/18 , G03B27/32 , G03B27/42 , G03B27/54 , G03B27/74
CPC分类号： G03F9/7011 , G03F9/7076
摘要： A patterning device, including alignment targets having alignment features formed from a plurality of diffractive elements, each diffractive element including an absorber stack and a multi-layered reflector stack is provided. The diffractive elements are configured to enhance a pre-determined diffraction order used for pre-alignment and to diffract light in a pre-determined direction of a pre-alignment system when illuminated with light of a wavelength used for the pre-alignment. The diffractive elements may occupy at least half of an area of each alignment feature. The diffractive elements may be configured to enhance first or higher order diffractions, while substantially reducing zeroth diffraction orders and specular reflection when illuminated with a wavelength used for reticle prealignment. The dimensions of each diffractive element may be a function of a diffraction grating period of each alignment feature.
摘要翻译：一种图案形成装置，包括具有由多个衍射元件形成的对准特征的对准目标，每个衍射元件包括吸收体堆叠和多层反射器叠层。衍射元件被配置为当用用于预对准的波长的光照射时，增强用于预对准的预定衍射级并且在预对准系统的预定方向上衍射光。衍射元件可以占据每个对准特征的面积的至少一半。衍射元件可以被配置为增强第一或更高阶衍射，同时当用用于掩模版预对准的波长照射时，基本上减少了零级衍射级和镜面反射。每个衍射元件的尺寸可以是每个对准特征的衍射光栅周期的函数。

7. 发明申请

US20110019173A1 Diffraction Elements for Alignment Targets 失效
$Diffraction Elements for Alignment Targets$
标题翻译：对准目标的衍射元件
公开(公告)号：US20110019173A1
公开(公告)日：2011-01-27
申请号：US12921559
申请日：2009-04-03
申请人： Yuli Vladimirsky , Muhammah Arif , Robert Albert Tharaldsen
发明人： Yuli Vladimirsky , Muhammah Arif , Robert Albert Tharaldsen
IPC分类号： G03B27/54 , G03B27/32 , G02B5/18
CPC分类号： G03F9/7011 , G03F9/7076
摘要： A patterning device, including alignment targets having alignment features formed from a plurality of diffractive elements, each diffractive element including an absorber stack and a multi-layered reflector stack is provided. The diffractive elements are configured to enhance a pre-determined diffraction order used for pre-alignment and to diffract light in a pre-determined direction of a pre-alignment system when illuminated with light of a wavelength used for the pre-alignment. The diffractive elements may occupy at least half of an area of each alignment feature. The diffractive elements may be configured to enhance first or higher order diffractions, while substantially reducing zeroth diffraction orders and specular reflection when illuminated with a wavelength used for reticle prealignment. The dimensions of each diffractive element may be a function of a diffraction grating period of each alignment feature.
摘要翻译：一种图案形成装置，包括具有由多个衍射元件形成的对准特征的对准目标，每个衍射元件包括吸收体堆叠和多层反射器叠层。衍射元件被配置为当用用于预对准的波长的光照射时，增强用于预对准的预定衍射级并且在预对准系统的预定方向上衍射光。衍射元件可以占据每个对准特征的面积的至少一半。衍射元件可以被配置为增强第一或更高阶衍射，同时当用用于掩模版预对准的波长照射时，基本上减少了零级衍射级和镜面反射。每个衍射元件的尺寸可以是每个对准特征的衍射光栅周期的函数。

8. 发明申请

US20090122289A1 Thin Film Continuous Spatially Modulated Grey Attenuators and Filters 有权
标题翻译：薄膜连续空间调制灰色衰减器和滤波器
公开(公告)号：US20090122289A1
公开(公告)日：2009-05-14
申请号：US12265235
申请日：2008-11-05
申请人： Yuli VLADIMIRSKY , Lev Ryzhikov , Ronald A. Wilklow
发明人： Yuli VLADIMIRSKY , Lev Ryzhikov , Ronald A. Wilklow
IPC分类号： G03B27/54
CPC分类号： G03B27/54 , G03F7/70191
摘要： A system and method for use of a lithography apparatus having a substrate and an absorbing film formed on the substrate. A thickness of the absorbing film is spatially modulated across at least a part of the substrate to reduce a non-uniform intensity of a radiation beam transmitted through the substrate.
摘要翻译：一种使用具有在基板上形成的基板和吸收膜的光刻设备的系统和方法。吸收膜的厚度跨越衬底的至少一部分进行空间调制，以减少透射通过衬底的辐射束的不均匀的强度。

9. 发明申请

US20090021748A1 Method and system for wavefront measurements of an optical system 有权
标题翻译：光学系统的波前测量方法和系统
公开(公告)号：US20090021748A1
公开(公告)日：2009-01-22
申请号：US12178524
申请日：2008-07-23
申请人： Azat M. Latypov , Sherman K. Poultney , Yuli Vladimirsky
发明人： Azat M. Latypov , Sherman K. Poultney , Yuli Vladimirsky
IPC分类号： G01B9/02
CPC分类号： G03F7/706 , G01J9/0215
摘要： A wavefront measurement system includes a source of electromagnetic radiation. An illumination system delivers the electromagnetic radiation to an object plane. A source of a diffraction pattern is in the object plane. A projection optical system projects the diffraction pattern onto an image plane, which includes a mechanism (e.g., a shearing grating) to introduce the lateral shear. A detector is located optically conjugate with the pupil of the projection optical system, and receives an instant fringe pattern, resulting from the interference between sheared wavefronts, from the image plane. The diffraction pattern is dynamically scanned across a pupil of the projection optical system, and the resulting time-integrated interferogram obtained from the detector is used to measure the wavefront aberration across the entire pupil.
摘要翻译：波前测量系统包括电磁辐射源。照明系统将电磁辐射传送到物体平面。衍射图案的来源在物体平面中。投影光学系统将衍射图案投影到图像平面上，该图像平面包括用于引入横向剪切的机构（例如，剪切光栅）。检测器与投影光学系统的光瞳光学共轭，并且从图像平面接收由剪切波前的干涉导致的即时条纹图案。衍射图案被动态地扫描投影光学系统的光瞳，并且由检测器获得的所得到的时间积分干涉图用于测量整个瞳孔上的波前像差。

10. 发明授权

US07133121B2 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region 有权
标题翻译：在无掩模光刻系统中补偿印刷图案的缝合干扰的方法和系统，利用曝光区域与重叠区域中的空间图像的衰减重叠
公开(公告)号：US07133121B2
公开(公告)日：2006-11-07
申请号：US11098561
申请日：2005-04-05
申请人： Arno Bleeker , Wenceslao A. Cebuhar , Justin Kreuzer , Azat Latypov , Yuli Vladimirsky
发明人： Arno Bleeker , Wenceslao A. Cebuhar , Justin Kreuzer , Azat Latypov , Yuli Vladimirsky
IPC分类号： G03B27/32 , G03B27/68 , G03B27/54
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.
摘要翻译：提供了一种使用空间光调制器（SLM）在感光表面上印刷图案的方法和系统。示例性方法包括在感光表面上限定两个或更多个曝光区域，曝光区域沿着曝光区域的相应边缘部分重叠以在它们之间形成重叠区域。暴露两个或更多个曝光区域以在其中打印图像，曝光延伸穿过重叠区域。然后在重叠区域内的曝光被衰减。

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