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1. 发明授权

US07271892B2 Method and apparatus for inspecting defects 有权
标题翻译：检查缺陷的方法和装置
公开(公告)号：US07271892B2
公开(公告)日：2007-09-18
申请号：US10699934
申请日：2003-11-04
申请人： Yukihiro Shibata , Shunji Maeda , Masahiro Watanabe
发明人： Yukihiro Shibata , Shunji Maeda , Masahiro Watanabe
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： Though it is necessary to enhance sensitivity in detecting defects as design rules grow finer, the resolution of a conventional optical system is not sufficient to cope with it. In order to increase vertical resolution, an optical system is so configured to perform detection by differential interference in which beams of light are sheared in two-dimensional directions in a plane perpendicular to an optical axis, thereby achieving zero-order light phase-difference detection. Further, the system is configured such that inconsistencies in brightness caused by thin-film interference, which appear as a noise component in a comparative inspection, are reduced by differential interference and dark-field illumination. Further, with respect to non-critical grains in metal wiring, the contrast of grains is reduced by bright-field/dark-field-combined illumination. The sensitivity in defect detection can be enhanced and highly sensitive inspection can be achieved even when detecting objects of various types and processes.
摘要翻译：虽然随着设计规则越来越精细，需要提高检测缺陷的灵敏度，但是常规光学系统的分辨率不足以应对。为了提高垂直分辨率，光学系统被配置为通过差分干涉进行检测，其中光束在垂直于光轴的平面中在二维方向上剪切，从而实现零级光相位差检测。此外，该系统被配置为使得通过差分干涉和暗场照明来减少在比较检查中作为噪声分量出现的薄膜干扰导致的亮度不一致。此外，关于金属布线中的非临界晶粒，通过亮场/暗场组合照明来减小晶粒的对比度。可以提高缺陷检测的灵敏度，即使在检测到各种类型和过程的物体时也能实现高度敏感的检测。

2. 发明授权

US08228494B2 Apparatus for inspecting defects 有权
标题翻译：检查缺陷的装置
公开(公告)号：US08228494B2
公开(公告)日：2012-07-24
申请号：US13198170
申请日：2011-08-04
申请人： Yukihiro Shibata , Shunji Maeda
发明人： Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/00
CPC分类号： G01N21/94 , G01N21/21 , G01N21/4788 , G01N21/9501 , G01N21/95623 , G01N2021/8822 , G01N2021/9513
摘要： A defect inspection apparatus includes an illumination optical system, a detection optical system which includes a reflecting objective lens, and wavelength separation optics for conducting wavelength separation, and after the wavelength separation, branching the scattered light into at least a first detection optical path and a second detection optical path. The detection optical system further includes, on the first detection optical path, a first sensor, and on the second detection optical path, a second sensor. A signal processor is provided which, in accordance with at least one of a first signal obtained from the first sensor and a second signal obtained from the second sensor, discriminates defects or defect candidates present on a surface of a sample.
摘要翻译：缺陷检查装置包括照明光学系统，包括反射物镜的检测光学系统和用于进行波长分离的波长分离光学器件，并且在波长分离之后，将散射光分支成至少第一检测光路和第二检测光路。检测光学系统还在第一检测光路上包括第一传感器，并且在第二检测光路上还包括第二传感器。提供了一种信号处理器，其根据从第一传感器获得的第一信号和从第二传感器获得的第二信号中的至少一个识别存在于样品表面上的缺陷或缺陷候选物。

3. 发明申请

US20080144023A1 APPARATUS FOR INSPECTING DEFECTS 失效
标题翻译：检查缺陷的装置
公开(公告)号：US20080144023A1
公开(公告)日：2008-06-19
申请号：US11936115
申请日：2007-11-07
申请人： Yukihiro Shibata , Shunji Maeda
发明人： Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/88
CPC分类号： G01N21/94 , G01N21/21 , G01N21/4788 , G01N21/9501 , G01N21/95623 , G01N2021/8822 , G01N2021/9513
摘要： This invention is a defect inspection apparatus having a reflecting objective lens free from chromatic aberration, or an achromatic catadioptric lens, and a dioptric objective lens, and thus constructed to suppress changes in brightness due to multi-wavelength illumination (i.e., illumination with the irradiation light having a plurality of wavelength bands), to provide a clearer view of defects present on a sample, by means of selective wavelength detection in order to improve sensitivity, and to allow one spatial image on the sample to be acquired as different kinds of optical images.
摘要翻译：本发明是一种具有无色差的反射物镜或无色反射折射透镜和折射物镜的缺陷检查装置，因此能够抑制多波长照明引起的亮度变化（即照射照射具有多个波长带的光），以通过选择性波长检测提供样品上存在的缺陷的清晰度，以便提高灵敏度，并且允许获取样品上的一个空间图像作为不同种类的光学图片。

4. 发明授权

US07372561B2 Method and apparatus for inspecting defects and a system for inspecting defects 失效
标题翻译：用于检查缺陷的方法和装置以及检查缺陷的系统
公开(公告)号：US07372561B2
公开(公告)日：2008-05-13
申请号：US11139594
申请日：2005-05-31
申请人： Yukihiro Shibata , Shunji Maeda , Takafumi Okabe , Yoichi Takahara
发明人： Yukihiro Shibata , Shunji Maeda , Takafumi Okabe , Yoichi Takahara
IPC分类号： G01N21/00
CPC分类号： H01L21/67253 , G01N21/95607 , G01N2021/4792 , H01L21/67028 , H01L21/67057
摘要： The present invention relates to a high-sensitivity defect inspection method, apparatus, and system adapted for the fine-structuring of patterns; wherein, in addition to a cleaning tank which chemically cleans a sample and rinses the sample, a defect inspection apparatus having a liquid-immersion element by which the interspace between the sample and the objective lens of an optical system is filled with a liquid, and a drying tank which dries the sample, the invention uses liquid-immersion transfer means from said cleaning tank through said liquid-immersion means of said defect inspection apparatus to said drying tank so that the sample is transferred in a liquid-immersed state from said cleaning tank to said liquid-immersion means.
摘要翻译：本发明涉及一种适用于精细构图的高灵敏度缺陷检查方法，装置和系统，其特征在于，除了对样品进行化学清洗并冲洗样品的清洗槽以外，还具有具有液体浸渍元件的缺陷检查装置，通过该液浸元件将样品与光学系统的物镜之间的间隙填充液体，干燥箱，干燥箱，将所述清洗槽的浸液转移装置通过所述缺陷检查装置的浸液装置使用于所述干燥箱，使样品以浸液状态从所述清洗罐到所说的液浸装置。

5. 发明申请

US20070121106A1 Apparatus and method for optical inspection 有权
标题翻译：光学检测仪器及方法
公开(公告)号：US20070121106A1
公开(公告)日：2007-05-31
申请号：US11583892
申请日：2006-10-20
申请人： Yukihiro Shibata , Shunji Maeda
发明人： Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/88
CPC分类号： G01N21/8806 , G01N21/9501 , G01N21/95607 , G01N2021/8825 , G01N2021/8887 , G06T7/001 , G06T2207/30148
摘要： The present invention provides a variety of optical functions so as to be applicable to various kinds of objects to be inspected. For each of the optical functions, the invention accumulates contrasts (brightness differences), etc. of defects to be detected (DOI) and false defects not to be detected (nuisance), and efficiently selects parameters advantageous for inspection with high sensitivity and low nuisance ratio. A wavelength band, an illumination scheme, and filtering parameters can be selected for an optical system.
摘要翻译：本发明提供各种光学功能，以适用于各种被检查物体。对于每个光学功能，本发明积累了要检测的缺陷（DOI）和不被检测的假缺陷（烦扰）的对比度（亮度差）等，并且有效地选择了具有高灵敏度和低噪声的检查有利的参数比。可以为光学系统选择波长带，照明方案和滤波参数。

6. 发明申请

US20060238760A1 Method and apparatus for observing and inspecting defects 有权
标题翻译：观察和检查缺陷的方法和装置
公开(公告)号：US20060238760A1
公开(公告)日：2006-10-26
申请号：US11475667
申请日：2006-06-26
申请人： Yukihiro Shibata , Shunji Maeda , Kazuo Yamaguchi , Minoru Yoshida , Atsushi Yoshida , Kenji Oka , Kenji Watanabe
发明人： Yukihiro Shibata , Shunji Maeda , Kazuo Yamaguchi , Minoru Yoshida , Atsushi Yoshida , Kenji Oka , Kenji Watanabe
IPC分类号： G01J4/00
CPC分类号： G01N21/21 , G01N21/9501 , G01N21/956 , G01N21/95607 , G02B21/0016
摘要： A defect inspecting apparatus is disclosed that can detect finer defects with high resolution optical images of those defects, and which makes the difference in contrast greater between fine line patterns of a semiconductor device. The defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.
摘要翻译：公开了能够利用这些缺陷的高分辨率光学图像检测更细的缺陷的缺陷检查装置，并且使得半导体器件的细线图案之间的对比度差异更大。缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置，用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置，用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。

7. 发明申请

US20050264802A1 Method and apparatus for inspecting defects and a system for inspecting defects 失效
标题翻译：用于检查缺陷的方法和装置以及检查缺陷的系统
公开(公告)号：US20050264802A1
公开(公告)日：2005-12-01
申请号：US11139594
申请日：2005-05-31
申请人： Yukihiro Shibata , Shunji Maeda , Takafumi Okabe , Yoichi Takahara
发明人： Yukihiro Shibata , Shunji Maeda , Takafumi Okabe , Yoichi Takahara
IPC分类号： G01N21/88 , G01N21/956 , H01L21/00 , H01L21/66
CPC分类号： H01L21/67253 , G01N21/95607 , G01N2021/4792 , H01L21/67028 , H01L21/67057
摘要： The present invention relates to a high-sensitivity defect inspection method, apparatus, and system adapted for the fine-structuring of patterns; wherein, in addition to a cleaning tank which chemically cleans a sample and rinses the sample, a defect inspection apparatus having a liquid-immersion element by which the interspace between the sample and the objective lens of an optical system is filled with a liquid, and a drying tank which dries the sample, the invention uses liquid-immersion transfer means from said cleaning tank through said liquid-immersion means of said defect inspection apparatus to said drying tank so that the sample is transferred in a liquid-immersed state from said cleaning tank to said liquid-immersion means.
摘要翻译：本发明涉及一种适用于精细构图的高灵敏度缺陷检查方法，装置和系统，其特征在于，除了对样品进行化学清洗并冲洗样品的清洗槽以外，还具有具有液体浸渍元件的缺陷检查装置，通过该液浸元件将样品与光学系统的物镜之间的间隙填充液体，干燥箱，干燥箱，将所述清洗槽的浸液转移装置通过所述缺陷检查装置的浸液装置使用于所述干燥箱，使样品以浸液状态从所述清洗罐到所说的液浸装置。

8. 发明申请

US20050110988A1 Method and apparatus for inspecting defects of patterns 失效
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US20050110988A1
公开(公告)日：2005-05-26
申请号：US10981721
申请日：2004-11-05
申请人： Hidetoshi Nishiyama , Minoru Yoshida , Yukihiro Shibata , Shunji Maeda
发明人： Hidetoshi Nishiyama , Minoru Yoshida , Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/956 , G01N21/88
CPC分类号： G01N21/95684
摘要： Disclosed is a method and apparatus for inspecting defects of patterns of a sample at high speed and with high sensitivity while damage of the sample arising from high-power pulsed light is reduced. Light emitted from a pulsed laser light source is transmitted through a pseudo continuous-wave forming optical system having an optical system capable of reducing energy per pulse and yet maintaining the entire amount of light of the pulsed light, a beam formation optical system, and a coherence reduction optical system, and a beam deflected by a deformation illumination optical system is made to reflect on a PBS to be irradiated on a wafer. The apparatus is configured so that the diffracted light from the wafer is focused by an objective lens, transmitted through light modulation units, focused to form a plurality of images on a plurality of image sensors in a visual-field divided parallel detection unit 12, and then defects are detected by a signal processing unit.
摘要翻译：公开了一种用于在高功率脉冲光下产生的样品损坏的情况下高速且高灵敏度地检查样品的图案的缺陷的方法和装置。从脉冲激光光源发出的光通过伪连续波形成光学系统传输，该光学系统具有能够减少每脉冲能量并且仍保持脉冲光的光量，光束形成光学系统和相干降低光学系统和由变形照明光学系统偏转的光束在PBS上反射以照射在晶片上。该装置被配置为使得来自晶片的衍射光被物镜聚焦，透镜通过光调制单元被聚焦以在视野分割并行检测单元12中的多个图像传感器上形成多个图像，以及那么由信号处理单元检测到缺陷。

9. 发明授权

US06690469B1 Method and apparatus for observing and inspecting defects 失效
标题翻译：观察和检查缺陷的方法和装置
公开(公告)号：US06690469B1
公开(公告)日：2004-02-10
申请号：US09397334
申请日：1999-09-14
申请人： Yukihiro Shibata , Shunji Maeda , Kazuo Yamaguchi , Minoru Yoshida , Atsushi Yoshida , Kenji Oka , Kenji Watanabe
发明人： Yukihiro Shibata , Shunji Maeda , Kazuo Yamaguchi , Minoru Yoshida , Atsushi Yoshida , Kenji Oka , Kenji Watanabe
IPC分类号： G01J400
CPC分类号： G01N21/21 , G01N21/9501 , G01N21/956 , G01N21/95607 , G02B21/0016
摘要： A defect inspecting apparatus is disclosed that can detect finer defects with high resolution optical images of those defects, and which makes the difference in contrast greater between fine line patterns of a semiconductor device. The defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.
摘要翻译：公开了能够利用这些缺陷的高分辨率光学图像检测更细的缺陷的缺陷检查装置，并且使得半导体器件的细线图案之间的对比度差异更大。缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置，用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置，用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。

10. 发明授权

US06654112B2 Apparatus and method for inspecting defects 有权
公开(公告)号：US06654112B2
公开(公告)日：2003-11-25
申请号：US10140183
申请日：2002-05-08
申请人： Minori Noguchi , Shunji Maeda , Yukihiro Shibata , Takanori Ninomiya
发明人： Minori Noguchi , Shunji Maeda , Yukihiro Shibata , Takanori Ninomiya
IPC分类号： G01N2189
CPC分类号： G01N21/9501
摘要： A method and apparatus for inspecting a specimen which includes emitting a deep ultraviolet light from a light source illuminating a sample with the deep ultraviolet light through an objective lens, detecting an optical image of the sample by receiving light from the sample by the illumination with a time delay integration sensor through the objective lens, and outputting an image signal, processing the outputted image signal to extract a defect candidate, and determining a defect among the extracted defect candidate using information of a characteristic quality of the extracted defect candidate. In the detection, the time delay integration sensor receives the light from the sample by the illumination through a rear side of the time delay integration sensor.

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