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1. 发明授权

US08512916B2 Photomask blank, photomask, and method for manufacturing photomask blank 有权
公开(公告)号：US08512916B2
公开(公告)日：2013-08-20
申请号：US12935766
申请日：2009-03-31
申请人： Hiroyuki Iwashita , Hiroaki Shishido , Atsushi Kominato , Masahiro Hashimoto , Morio Hosoya
发明人： Hiroyuki Iwashita , Hiroaki Shishido , Atsushi Kominato , Masahiro Hashimoto , Morio Hosoya
IPC分类号： G03F1/26 , G03F1/46 , G03F1/50 , G03F1/58
CPC分类号： G03F1/22 , G03F1/46 , G03F1/54 , G03F1/80 , H01L21/0274
摘要： A photomask blank for producing a photomask to which an ArF excimer laser light is applied. The blank includes a light transmissive substrate on which a thin film having a multilayer structure is provided. The thin film has a light-shielding film in which a back-surface antireflection layer, a light-shielding layer and a front-surface antireflection layer are laminated in this order. The light-shielding layer comprises chromium and nitrogen, and the chromium content is more than 50 atomic %. The front-surface antireflection layer and the back-surface antireflection layer each has an amorphous structure made of a material comprising chromium, nitrogen, oxygen and carbon. The chromium content ratio of the front-surface antireflection layer and the back-surface antireflection layer is 40 atomic % or less. A first sum of nitrogen content and oxygen content of the back-surface antireflection layer is less than a second sum of nitrogen content and oxygen content of the front-surface antireflection layer.

2. 发明授权

US08304147B2 Photomask blank, photomask, and method for manufacturing photomask blank 有权
标题翻译：光掩模坯料，光掩模以及制造光掩模坯料的方法
公开(公告)号：US08304147B2
公开(公告)日：2012-11-06
申请号：US12935517
申请日：2009-03-31
申请人： Hiroyuki Iwashita , Hiroaki Shishido , Atsushi Kominato , Masahiro Hashimoto
发明人： Hiroyuki Iwashita , Hiroaki Shishido , Atsushi Kominato , Masahiro Hashimoto
IPC分类号： G03F1/20
CPC分类号： G03F1/22 , G03F1/46 , G03F1/54 , G03F1/80 , H01L21/0274
摘要： The present invention provides a photomask blank used for producing a photomask to which an ArF excimer laser light is applied, wherein: a light-shielding film is provided on a light transmissive substrate; the light-shielding film has a laminated structure in which a back-surface antireflection layer, a light-shielding layer and a front-surface antireflection layer are laminated in this order from the side close to the light transmissive substrate; the thickness of the entire light-shielding film is 60 nm or less; the back-surface antireflection layer is made of a film containing a metal and has a first etching rate; the front-surface antireflection layer is made of a film containing a metal and has a third etching rate; the light-shielding layer is made of a film containing the same metal as that contained in the back-surface antireflection layer or the front-surface antireflection layer and has a second etching rate that is lower than the first etching rate and the third etching rate; and the thickness of the light-shielding layer is 30% or less of the thickness of the entire light-shielding film.
摘要翻译：本发明提供一种用于制造施加了ArF准分子激光的光掩模的光掩模坯料，其中：在透光基板上设置有遮光膜; 遮光膜具有层叠结构，其中背面防反射层，遮光层和前表面抗反射层从靠近透光基板的一侧依次层叠; 整个遮光膜的厚度为60nm以下; 背面抗反射层由含有金属的膜制成，具有第一蚀刻速率; 前表面抗反射层由含有金属的膜制成，具有第三蚀刻速率; 遮光层由含有与背面防反射层或前表面防反射层中所含的金属相同的金属的膜制成，并且具有比第一蚀刻速率和第三蚀刻速率低的第二蚀刻速率 ; 遮光层的厚度为整个遮光膜的厚度的30％以下。

3. 发明申请

US20110244373A1 MASK BLANK, TRANSFER MASK, AND METHODS OF MANUFACTURING THE SAME 有权
标题翻译：掩蔽层，转移掩模及其制造方法
公开(公告)号：US20110244373A1
公开(公告)日：2011-10-06
申请号：US12875783
申请日：2010-09-03
申请人： Osamu NOZAWA , Hiroaki SHISHIDO
发明人： Osamu NOZAWA , Hiroaki SHISHIDO
IPC分类号： G03F1/00
CPC分类号： G03F1/54 , G03F1/50
摘要： In a mask blank for manufacturing a transfer mask adapted to exposure light having a wavelength of 200 nm or less, the mask blank has a light-shielding film on a transparent substrate. The light-shielding film is made of a material containing tantalum as a main metal component and includes a highly oxidized layer which has an oxygen content of 60 at % or more and which is formed as a surface layer of the light-shielding film, that is placed on a side opposite to a transparent substrate side.
摘要翻译：在用于制造适于曝光波长为200nm以下的光的转印掩模的掩模坯料中，掩模坯料在透明基板上具有遮光膜。遮光膜由含有钽作为主要金属成分的材料制成，并且包含氧含量为60原子％以上且形成为遮光膜的表面层的高度氧化层，放置在与透明基板侧相对的一侧。

4. 发明申请

US20110104592A1 PHOTOMASK BLANK, PHOTOMASK, AND METHOD FOR MANUFACTURING PHOTOMASK BLANK 有权
标题翻译： PHOTOMASK BLANK，PHOTOMASK和制造光电隔离层的方法
公开(公告)号：US20110104592A1
公开(公告)日：2011-05-05
申请号：US12935517
申请日：2009-03-31
申请人： Hiroyuki Iwashita , Hiroaki Shishido , Atsushi Kominato , Masahiro Hashimoto
发明人： Hiroyuki Iwashita , Hiroaki Shishido , Atsushi Kominato , Masahiro Hashimoto
IPC分类号： G03F1/00
CPC分类号： G03F1/22 , G03F1/46 , G03F1/54 , G03F1/80 , H01L21/0274
摘要： The present invention provides a photomask blank used for producing a photomask to which an ArF excimer laser light is applied, wherein: a light-shielding film is provided on a light transmissive substrate; the light-shielding film has a laminated structure in which a back-surface antireflection layer, a light-shielding layer and a front-surface antireflection layer are laminated in this order from the side close to the light transmissive substrate; the thickness of the entire light-shielding film is 60 nm or less; the back-surface antireflection layer is made of a film containing a metal and has a first etching rate; the front-surface antireflection layer is made of a film containing a metal and has a third etching rate; the light-shielding layer is made of a film containing the same metal as that contained in the back-surface antireflection layer or the front-surface antireflection layer and has a second etching rate that is lower than the first etching rate and the third etching rate; and the thickness of the light-shielding layer is 30% or less of the thickness of the entire light-shielding film.
摘要翻译：本发明提供一种用于制造施加了ArF准分子激光的光掩模的光掩模坯料，其中：在透光基板上设置有遮光膜; 遮光膜具有层叠结构，其中背面防反射层，遮光层和前表面抗反射层从靠近透光基板的一侧依次层叠; 整个遮光膜的厚度为60nm以下; 背面抗反射层由含有金属的膜制成，具有第一蚀刻速率; 前表面抗反射层由含有金属的膜制成，具有第三蚀刻速率; 遮光层由含有与背面防反射层或前表面防反射层中所含的金属相同的金属的膜制成，并且具有比第一蚀刻速率和第三蚀刻速率低的第二蚀刻速率 ; 遮光层的厚度为整个遮光膜的厚度的30％以下。

5. 发明申请

US20070052955A1 Method and equipment for detecting pattern defect 失效
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US20070052955A1
公开(公告)日：2007-03-08
申请号：US11593091
申请日：2006-11-06
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01N21/88 , G01J4/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An Inspection apparatus and method includes utilizing an emitter which emits a light beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer, and an objective lens, for illuminating a specimen with a polarization condition controlled and coherency reduced light beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the light beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.
摘要翻译：检查装置和方法包括利用发射光束的发射器，照明光学系统，检测光学系统和处理器。照明光学系统包括偏振控制器，相干减少器和物镜，用于照射具有偏振状态的样本并通过物镜降低光束的相干性。检测光学系统包括成像透镜和用于检测由通过照明光学系统的光束照射的样本的图像的传感器。处理器处理从传感器输出的信号并检测样本上的缺陷。

6. 发明授权

US07132669B2 Method and equipment for detecting pattern defect 有权
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US07132669B2
公开(公告)日：2006-11-07
申请号：US11184981
申请日：2005-07-20
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An Inspection apparatus and method includes utilizing a laser source which emits an ultraviolet laser beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer and an objective lens for illuminating a specimen with a polarization condition controlled and coherency reduced ultraviolet laser beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the ultraviolet laser beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.
摘要翻译：一种检查装置和方法，包括利用发射紫外激光束的激光源，照明光学系统，检测光学系统和处理器。照明光学系统包括偏振控制器，相干减少器和用于照射具有偏振状态的样本的物镜，并且通过物镜减少紫外激光束的相干性。检测光学系统包括成像透镜和用于检测通过照明光学系统由紫外线激光束照射的样本的图像的传感器。处理器处理从传感器输出的信号并检测样本上的缺陷。

7. 发明申请

US20060063335A1 Semiconductor device 有权
公开(公告)号：US20060063335A1
公开(公告)日：2006-03-23
申请号：US10967657
申请日：2004-10-19
申请人： Toru Kurosaki , Hiroaki Shishido , Mizue Kitada , Shinji Kunori , Kosuke Ohshima
发明人： Toru Kurosaki , Hiroaki Shishido , Mizue Kitada , Shinji Kunori , Kosuke Ohshima
IPC分类号： H01L21/336 , H01L21/3205
CPC分类号： H01L29/7813 , H01L29/0619 , H01L29/0634 , H01L29/0692 , H01L29/0696 , H01L29/4238 , H01L29/66348 , H01L29/7397 , H01L29/7811 , H01L29/872
摘要： A technique for improving a ruggedness of a transistor against breakdown is provided. In a transistor of the present invention, a height of filling regions is higher than that of buried regions, so that a withstanding voltage of the filling regions is higher than that of the buried regions. Therefore, since avalanche breakdown occurs in an active region, causing an avalanche breakdown current to flow through the active region having a large area, current concentration does not occur. As a result, a ruggedness of an element against breakdown is increased.

8. 发明授权

US06921905B2 Method and equipment for detecting pattern defect 失效
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US06921905B2
公开(公告)日：2005-07-26
申请号：US10947262
申请日：2004-09-23
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01N21/00 , G01N21/88 , G01N21/95 , G01N21/956 , G02B5/09 , G02B26/12
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： Inspection apparatus and method in which laser source emits a laser beam and a coherence of the laser beam emitted from the laser source is reduced by a coherence reducer. A detector detects light from the sample irradiated with the coherence reduced laser beam and a processor processes a signal outputted from the detector and detects a defect on the sample. The coherence reducer has an optical path which includes a plurality of at least one of optical fibers and glass rods.
摘要翻译：激光源发射激光束的检查装置和方法，并且通过相干减少器减少从激光源发射的激光束的相干性。检测器检测来自用相干减少的激光束照射的样品的光，处理器处理从检测器输出的信号，并检测样品上的缺陷。相干减光器具有包括光纤和玻璃棒中的至少一个的光路。

9. 发明申请

US20050045830A1 Method and equipment for detecting pattern defect 失效
公开(公告)号：US20050045830A1
公开(公告)日：2005-03-03
申请号：US10947262
申请日：2004-09-23
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01N21/00 , G01N21/88 , G01N21/95 , G01N21/956 , G02B5/09 , G02B26/12
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： Inspection apparatus and method in which laser source emits a laser beam and a coherence of the laser beam emitted from the laser source is reduced by a coherence reducer. A detector detects light from the sample irradiated with the coherence reduced laser beam and a processor processes a signal outputted from the detector and detects a defect on the sample. The coherence reducer has an optical path which includes a plurality of at least one of optical fibers and glass rods.

10. 发明授权

US06819416B2 Defect inspection method and apparatus therefor 失效
标题翻译：缺陷检查方法及其设备
公开(公告)号：US06819416B2
公开(公告)日：2004-11-16
申请号：US10295909
申请日：2002-11-18
申请人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
发明人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
IPC分类号： G01N2100
CPC分类号： G01N21/956
摘要： A method of inspecting a pattern formed on a substrate, comprising the steps of emitting an ultraviolet laser beam from a light source, polarizing the ultraviolet laser beam, scanning the polarized ultraviolet laser beam on a pupil of an objective lens, illuminating a sample with the polarized ultraviolet laser beam after the polarized ultraviolet light beam has passed through the objective lens, analyzing light reflected from the sample as a result of the illuminating step after the reflected light has passed through the objective lens, detecting an image of the sample formed by the analyzed light with a time delay integration sensor, outputting signals corresponding to the detected image of the sample from the time delay integration sensor in parallel, and processing the parallel signals outputted from the time delay integration sensor to detect a defect of a pattern on the sample.
摘要翻译：一种检查形成在基板上的图案的方法，包括以下步骤：从光源发射紫外激光束，使紫外激光束偏振，扫描物镜的光瞳上的偏振紫外激光束，照射样品在偏光紫外光束通过物镜之后，偏振紫外激光束作为反射光通过物镜后的照明步骤的结果分析从样品反射的光，检测由所述物镜形成的样品的图像用时间延迟积分传感器对光进行分析，并行地从时间延迟积分传感器输出与检测出的样本图像相对应的信号，对从时间延迟积分传感器输出的并行信号进行处理，检测样本上的图案缺陷。

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