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1. 发明申请

US20120205827A1 METHOD OF FABRICATING CONTIGUOUS MICROLENS ARRAY 有权
标题翻译：制作连续微阵列的方法
公开(公告)号：US20120205827A1
公开(公告)日：2012-08-16
申请号：US13457776
申请日：2012-04-27
申请人： Yu-Tsung Lin , Hsin-Ping Wu , Hung-Chao Kao , Ming-I Wang
发明人： Yu-Tsung Lin , Hsin-Ping Wu , Hung-Chao Kao , Ming-I Wang
IPC分类号： G02B1/12 , B29D11/00
CPC分类号： B29D11/00365 , G02B3/0018 , G02B3/0056 , G02B5/201 , G03F7/40
摘要： A method of fabricating a contiguous microlens array is disclosed. First, an array of photoresist patterns is formed, wherein each photoresist pattern has a substantially circular or polygonal shape in a top view and neighboring photoresist patterns are connected with each other or close to each other. Then a reflow step is performed to heat the photoresist patterns thereby rounding a surface of each photoresist pattern and connecting the neighboring photoresist patterns that are close to each other. Finally, a fixing step is performed to fix a shape of each photoresist pattern. The shape of the curved surface of a microlens in the microlens array is selectively adjusted according to its position in the array and the incident angle of light incident thereto.
摘要翻译：公开了制造连续微透镜阵列的方法。首先，形成光致抗蚀剂图案的阵列，其中每个光致抗蚀剂图案在顶视图中具有大致圆形或多边形形状，并且相邻的光致抗蚀剂图案彼此连接或彼此靠近。然后进行回流步骤以加热光致抗蚀剂图案，从而使每个光致抗蚀剂图案的表面四舍五入并且连接彼此靠近的相邻光致抗蚀剂图案。最后，执行定影步骤以固定每种光致抗蚀剂图案的形状。微透镜阵列中的微透镜的曲面的形状根据其在阵列中的位置和入射到其中的光的入射角度而被选择性地调节。

2. 发明授权

US08379312B2 Method of fabricating contiguous microlens array 有权
标题翻译：制造连续微透镜阵列的方法
公开(公告)号：US08379312B2
公开(公告)日：2013-02-19
申请号：US13457776
申请日：2012-04-27
申请人： Yu-Tsung Lin , Hsin-Ping Wu , Hung-Chao Kao , Ming-I Wang
发明人： Yu-Tsung Lin , Hsin-Ping Wu , Hung-Chao Kao , Ming-I Wang
IPC分类号： G02B27/10
CPC分类号： B29D11/00365 , G02B3/0018 , G02B3/0056 , G02B5/201 , G03F7/40
摘要： A method of fabricating a contiguous microlens array is disclosed. First, an array of photoresist patterns is formed, wherein each photoresist pattern has a substantially circular or polygonal shape in a top view and neighboring photoresist patterns are connected with each other or close to each other. Then a reflow step is performed to heat the photoresist patterns thereby rounding a surface of each photoresist pattern and connecting the neighboring photoresist patterns that are close to each other. Finally, a fixing step is performed to fix a shape of each photoresist pattern. The shape of the curved surface of a microlens in the microlens array is selectively adjusted according to its position in the array and the incident angle of light incident thereto.
摘要翻译：公开了制造连续微透镜阵列的方法。首先，形成光致抗蚀剂图案的阵列，其中每个光致抗蚀剂图案在顶视图中具有大致圆形或多边形形状，并且相邻的光致抗蚀剂图案彼此连接或彼此靠近。然后进行回流步骤以加热光致抗蚀剂图案，从而使每个光致抗蚀剂图案的表面四舍五入并且连接彼此靠近的相邻光致抗蚀剂图案。最后，执行定影步骤以固定每种光致抗蚀剂图案的形状。微透镜阵列中的微透镜的曲面的形状根据其在阵列中的位置和入射到其中的光的入射角度而被选择性地调节。

3. 发明授权

US08493661B2 Contiguous microlens array 有权
标题翻译：相邻的微透镜阵列
公开(公告)号：US08493661B2
公开(公告)日：2013-07-23
申请号：US13457680
申请日：2012-04-27
申请人： Yu-Tsung Lin , Hsin-Ping Wu , Hung-Chao Kao , Ming-I Wang
发明人： Yu-Tsung Lin , Hsin-Ping Wu , Hung-Chao Kao , Ming-I Wang
IPC分类号： G02B27/10
CPC分类号： B29D11/00365 , G02B3/0018 , G02B3/0056 , G02B5/201 , G03F7/40
摘要： The present disclosure provides a contiguous microlens array, which consists of a plurality of touching microlenses, wherein the adjacent microlenses are connected to each other to form a contiguous microlens array and curvatures of every angle cross section of each microlens are the same. The shape of the curved surface of a microlens in the microlens array is selectively adjusted according to its position in the array and the incident angle of light incident thereto.
摘要翻译：本公开提供了一种连续的微透镜阵列，其由多个触摸微透镜组成，其中相邻的微透镜彼此连接以形成连续的微透镜阵列，并且每个微透镜的每个角度横截面的曲率相同。微透镜阵列中的微透镜的曲面的形状根据其在阵列中的位置和入射到其中的光的入射角度而被选择性地调节。

4. 发明申请

US20090174945A1 CONTIGUOUS MICROLENS ARRAY, METHOD OF FABRICATING THE SAME AND PHOTOMASK FOR DEFINING THE SAME 有权
标题翻译：连续微阵列，其制造方法和用于定义其的光电子
公开(公告)号：US20090174945A1
公开(公告)日：2009-07-09
申请号：US11970936
申请日：2008-01-08
申请人： Yu-Tsung Lin , Hsin-Ping Wu , Hung-Chao Kao , Ming-I Wang
发明人： Yu-Tsung Lin , Hsin-Ping Wu , Hung-Chao Kao , Ming-I Wang
IPC分类号： G02B3/08 , B29D11/00 , G03F1/00
CPC分类号： B29D11/00365 , G02B3/0018 , G02B3/0056 , G02B5/201 , G03F7/40
摘要： A contiguous microlens array including a plurality of contiguous microlenses is described. Each microlens has substantially circular contours at the heights higher than the connection sections of the microlens with neighboring microlenses, and has substantially partially circular contours at the heights on the connection sections adjacent to the neighboring microlenses. The shape of the curved surface of a microlens in the microlens array is selectively adjusted according to its position in the array and the incident angle of light incident thereto.
摘要翻译：描述了包括多个相邻微透镜的连续微透镜阵列。每个微透镜在高于具有相邻微透镜的微透镜的连接部分的高度处具有基本上圆形的轮廓，并且在邻近相邻微透镜的连接部分上的高度处具有基本上部分圆形的轮廓。微透镜阵列中的微透镜的曲面的形状根据其在阵列中的位置和入射到其中的光的入射角度而被选择性地调节。

5. 发明授权

US08228606B2 Contiguous microlens array and photomask for defining the same 有权
标题翻译：相邻的微透镜阵列和光掩模用于定义相同的
公开(公告)号：US08228606B2
公开(公告)日：2012-07-24
申请号：US11970936
申请日：2008-01-08
申请人： Yu-Tsung Lin , Hsin-Ping Wu , Hung-Chao Kao , Ming-I Wang
发明人： Yu-Tsung Lin , Hsin-Ping Wu , Hung-Chao Kao , Ming-I Wang
IPC分类号： G02B27/10
CPC分类号： B29D11/00365 , G02B3/0018 , G02B3/0056 , G02B5/201 , G03F7/40
摘要： A contiguous microlens array including a plurality of contiguous microlenses is described. Each microlens has substantially circular contours at the heights higher than the connection sections of the microlens with neighboring microlenses, and has substantially partially circular contours at the heights on the connection sections adjacent to the neighboring microlenses. The shape of the curved surface of a microlens in the microlens array is selectively adjusted according to its position in the array and the incident angle of light incident thereto.
摘要翻译：描述了包括多个相邻微透镜的连续微透镜阵列。每个微透镜在高于具有相邻微透镜的微透镜的连接部分的高度处具有基本上圆形的轮廓，并且在邻近相邻微透镜的连接部分上的高度处具有基本上部分圆形的轮廓。微透镜阵列中的微透镜的曲面的形状根据其在阵列中的位置和入射到其中的光的入射角度而被选择性地调节。

6. 发明申请

US20090134484A1 Image sensor with correcting lens and fabrication thereof 有权
标题翻译：具有校正透镜及其制造的图像传感器
公开(公告)号：US20090134484A1
公开(公告)日：2009-05-28
申请号：US11945099
申请日：2007-11-26
申请人： Yu-Tsung Lin , Hung-Chao Kao , Ming-I Wang , Kuo-Yuh Yang
发明人： Yu-Tsung Lin , Hung-Chao Kao , Ming-I Wang , Kuo-Yuh Yang
IPC分类号： H01L31/0232 , H01L31/18
CPC分类号： H01L27/14625 , H01L27/14621 , H01L27/14627 , H01L27/14685
摘要： An image sensor with at least one correcting lens and a method for fabricating the same are described. The image sensor includes a substrate with an array of microlenses thereon and at least one correcting lens disposed over the substrate covering the microlens array. In the fabricating method, a substrate having formed with a microlens array thereon is provided, and then at least one correcting lens is disposed over the substrate covering the microlens array. The at least one correcting lens can, in use of the image sensor, shift the incident direction of light to a microlens in edge parts of the array of microlenses toward the normal line direction of the image sensor.
摘要翻译：描述了具有至少一个校正透镜的图像传感器及其制造方法。图像传感器包括其上具有微透镜阵列的衬底和设置在覆盖微透镜阵列的衬底上的至少一个校正透镜。在制造方法中，提供在其上形成有微透镜阵列的衬底，然后在覆盖微透镜阵列的衬底上方设置至少一个校正透镜。所述至少一个校正透镜可以在图像传感器的使用中将光的入射方向朝向图像传感器的法线方向移动到微透镜阵列的边缘部分中的微透镜。

7. 发明授权

US08519500B2 Image sensor with correcting lens and fabrication thereof 有权
公开(公告)号：US08519500B2
公开(公告)日：2013-08-27
申请号：US11945099
申请日：2007-11-26
申请人： Yu-Tsung Lin , Hung-Chao Kao , Ming-I Wang , Kuo-Yuh Yang
发明人： Yu-Tsung Lin , Hung-Chao Kao , Ming-I Wang , Kuo-Yuh Yang
IPC分类号： H01L31/00
CPC分类号： H01L27/14625 , H01L27/14621 , H01L27/14627 , H01L27/14685
摘要： An image sensor with at least one correcting lens and a method for fabricating the same are described. The image sensor includes a substrate with an array of microlenses thereon and at least one correcting lens disposed over the substrate covering the microlens array. In the fabricating method, a substrate having formed with a microlens array thereon is provided, and then at least one correcting lens is disposed over the substrate covering the microlens array. The at least one correcting lens can, in use of the image sensor, shift the incident direction of light to a microlens in edge parts of the array of microlenses toward the normal line direction of the image sensor.

8. 发明申请

US20110108715A1 IMAGE SENSOR AND METHOD FOR FABRICATING THE SAME 有权
标题翻译：图像传感器及其制造方法
公开(公告)号：US20110108715A1
公开(公告)日：2011-05-12
申请号：US12615268
申请日：2009-11-10
申请人： Chi-Chung Chen , Wen-Chen Chiang , Yu-Tsung Lin
发明人： Chi-Chung Chen , Wen-Chen Chiang , Yu-Tsung Lin
IPC分类号： H01L31/0232
CPC分类号： H01L27/14685 , H01L27/14621 , H01L27/14627 , H01L27/14645 , H01L27/14687 , H01L27/14689
摘要： A method for fabricating image sensor is disclosed. The method includes the steps of: providing a substrate, wherein the substrate comprises a plurality of photodiodes; forming at least one dielectric layer and a passivation layer on surface of the substrate; using a patterned photomask to perform a first pattern transfer process for forming a plurality of trenches corresponding to each photodiode in the passivation layer; forming a plurality of color filters in the trenches; covering a planarizing layer on the color filters; and using the patterned photomask to perform a second pattern transfer process for forming a plurality of microlenses corresponding to each color filter on the planarizing layer.
摘要翻译：公开了一种用于制造图像传感器的方法。该方法包括以下步骤：提供衬底，其中衬底包括多个光电二极管; 在所述基板的表面上形成至少一个介电层和钝化层; 使用图案化的光掩模来执行用于形成对应于钝化层中的每个光电二极管的多个沟槽的第一图案转移处理; 在沟槽中形成多个滤色器; 覆盖滤色器上的平坦化层; 并且使用图案化的光掩模执行用于在平坦化层上形成对应于每个滤色器的多个微透镜的第二图案转印处理。

9. 发明授权

US07608504B2 Memory and manufacturing method thereof 有权
标题翻译：其记忆及其制造方法
公开(公告)号：US07608504B2
公开(公告)日：2009-10-27
申请号：US11468311
申请日：2006-08-30
申请人： Chien-Hung Liu , Shou-Wei Huang , Ying-Tso Chen , Yu-Tsung Lin
发明人： Chien-Hung Liu , Shou-Wei Huang , Ying-Tso Chen , Yu-Tsung Lin
IPC分类号： H01L21/00
CPC分类号： H01L27/115 , H01L27/0207 , H01L27/11568
摘要： A memory is provided. The memory includes a substrate, a number of parallel bit lines, a number of parallel word lines and at least a oxide-nitride-oxide (ONO) structure. The bit lines are disposed in the substrate. The word lines are disposed on the substrate. The word lines are crossed with but not perpendicular to the bit lines. The ONO structure is disposed between the word lines and the substrate.
摘要翻译：提供记忆。存储器包括衬底，多个并行位线，多个并行字线和至少氧化物 - 氧化物 - 氧化物（ONO）结构。位线设置在基板中。字线设置在基板上。字线与位线交叉但不垂直于位线。 ONO结构设置在字线和衬底之间。

10. 发明授权

US08466000B2 Backside-illuminated image sensor and fabricating method thereof 有权
标题翻译：背面照明图像传感器及其制造方法
公开(公告)号：US08466000B2
公开(公告)日：2013-06-18
申请号：US13086554
申请日：2011-04-14
申请人： Yu-Tsung Lin
发明人： Yu-Tsung Lin
IPC分类号： H01L31/18
CPC分类号： B32B7/12 , B32B2457/20 , H01L27/1464 , H01L27/14685 , Y10T428/24802
摘要： A backside-illuminated image sensor and a fabricating method thereof are provided. The fabricating method includes the following steps. Firstly, a first substrate having a first side and a second side is provided, wherein a sensing structure is formed on the first side of the first substrate, and the sensing structure includes an alignment mark. Then, a second substrate is provided and bonded to the first side of the first substrate. Then, a light-transmissible structure is formed on the second side of the first substrate at a location corresponding to the alignment mark. Afterwards, an optical structure is positioned on the second side of the first substrate by referring to the light-transmissible structure and the alignment mark.
摘要翻译：提供背照式图像传感器及其制造方法。制造方法包括以下步骤。首先，提供具有第一侧和第二侧的第一基板，其中在第一基板的第一侧上形成感测结构，并且感测结构包括对准标记。然后，提供第二基板并将其接合到第一基板的第一侧。然后，在对应于对准标记的位置处，在第一基板的第二面上形成透光结构。之后，参考光透射结构和对准标记，光学结构位于第一基板的第二侧。

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