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1. 发明申请

US20080132598A1 SURFACE MODIFICATION OF CYCLOOLEFIN COPOLYMER SUBSTRATES 审中-公开
标题翻译：环烯烃共聚物基材的表面改性
公开(公告)号：US20080132598A1
公开(公告)日：2008-06-05
申请号：US11930964
申请日：2007-10-31
申请人： Young-Jun Kim , Won-Ick Jang , Hyeon-Bong Pyo , Seon-Hee Park
发明人： Young-Jun Kim , Won-Ick Jang , Hyeon-Bong Pyo , Seon-Hee Park
IPC分类号： C08F8/06
CPC分类号： C08J7/123 , C08F8/06 , C08F8/42 , C08J7/14 , C08J2365/00 , C08F132/00
摘要： Provided is a method for modifying the surface of cycloolefin copolymer substrates, which includes oxygen plasma treatment and acid treatment for immobilizing a variety of functional groups or compounds having the functional groups onto the surface so that the surface can be easily modified, or can have hydrophilic property or biocompatibility. The method for modifying surface of cycloolefin copolymer substrates includes the steps of: a) treating the surface of a cycloolefin copolymer substrate with oxygen plasma to form hydroxyl groups on the surface; b) treating the oxygen plasma treated surface with an acid; and c) immobilizing one or more compounds having a functional group to the acid treated surface.
摘要翻译：提供了一种改性环烯共聚物基材表面的方法，其包括氧等离子体处理和酸处理，用于将各种具有官能团的官能团或具有官能团的化合物固定在表面上，使得表面可以容易地改性或可具有亲水性财产或生物相容性。改性环烯共聚物基材表面的方法包括以下步骤：a）用氧等离子体处理环烯烃共聚物基材的表面以在表面上形成羟基; b）用酸处理氧等离子体处理的表面; 和c）将一种或多种具有官能团的化合物固定在酸处理过的表面上。

2. 发明授权

US06531417B2 Thermally driven micro-pump buried in a silicon substrate and method for fabricating the same 有权
公开(公告)号：US06531417B2
公开(公告)日：2003-03-11
申请号：US09834586
申请日：2001-04-12
申请人： Chang-Auck Choi , Won-Ick Jang , Chi-Hoon Jun , Yun-Tae Kim
发明人： Chang-Auck Choi , Won-Ick Jang , Chi-Hoon Jun , Yun-Tae Kim
IPC分类号： H01L2100
CPC分类号： F04B53/1077 , F04B19/24 , F04B43/043
摘要： The present invention relates to a micro electro mechanical system (MEMS); and, more particularly, to a micro pump used in micro fluid transportation and control and a method for fabricating the same. The micro pump according to the present invention comprises: trenches formed in a silicon substrate in order to form a pumping region including a main pumping region and an auxiliary pumping region; channels formed on both sides of the pumping region; a flow prevention region having backward-flow preventing layers to resist a fluid flow; inlet/outlet regions formed at each of the channels which are disposed on both ends of the pumping region; an outer layer covering the trenches of the silicon substrate and opening portions of the inlet/outlet regions; and a thermal conducting layer formed on the outer layer and over the main pumping region so that a pressure of the fluid in the main pumping region is increased by the thermal conducting layer.

3. 发明授权

US06798940B2 Optical tunable filters and optical communication device incorporated therein optical tunable filters 失效
标题翻译：光可调谐滤波器和光通信装置并入其中的光可调谐滤波器
公开(公告)号：US06798940B2
公开(公告)日：2004-09-28
申请号：US09853289
申请日：2001-05-09
申请人： Myung-Lae Lee , Won-Ick Jang , Chang-Auck Choi , Youn-Tae Kim
发明人： Myung-Lae Lee , Won-Ick Jang , Chang-Auck Choi , Youn-Tae Kim
IPC分类号： G02B626
CPC分类号： G02B6/3584 , G02B6/29358 , G02B6/2938 , G02B6/29395 , G02B6/3512 , G02B6/356 , G02B6/357
摘要： The disclosure concerns to an optical filter for use in an optical communication device such as a multiplexer and demultiplexer. The optical filter is a Fabry-Perot filter that is formed with a silicon substrate by using a silicon micromachining process and a silicon etching process. The optical filters are applied to various optical communication devices, such as multiplexer (MUX) or demultiplexer (DEMUX) In each of the optical communication devices, the optical filters are installed and integrated on the silicon substrate together with input/output optical fibers and collimating lenses, resulting in simplifying the manufacturing process thereof and, hence, in reducing the manufacturing cost thereof. Furthermore, each of the optical filters incorporates therein an actuator so as to be tunable (wavelength-selective) in the optical filtering function and to be capable of filtering more various wavelengths in a range.
摘要翻译：本公开涉及用于诸如复用器和解复用器的光通信设备中的光学滤波器。滤光器是通过使用硅微加工工艺和硅蚀刻工艺由硅衬底形成的法布里 - 珀罗滤光器。光滤波器被应用于诸如多路复用器（MUX）或解复用器（DEMUX）的各种光通信设备。在每个光通信设备中，光滤波器与输入/输出光纤一起安装并集成在硅衬底上并准直透镜，从而简化了其制造工艺，并因此降低了其制造成本。此外，每个光学滤波器在其中结合有致动器，以便在光学滤波功能中是可调谐的（波长选择性的），并且能够在一定范围内滤波更多的各种波长。

4. 发明授权

US06806205B2 Stiction-free microstructure releasing method for fabricating MEMS device 有权
标题翻译：用于制造MEMS器件的无静电微结构释放方法
公开(公告)号：US06806205B2
公开(公告)日：2004-10-19
申请号：US09753065
申请日：2000-12-29
申请人： Won-Ick Jang , Chang-Auck Choi , Chi-Hoon Jun , Youn-Tae Kim , Myung-Lae Lee
发明人： Won-Ick Jang , Chang-Auck Choi , Chi-Hoon Jun , Youn-Tae Kim , Myung-Lae Lee
IPC分类号： H01L21302
CPC分类号： B81C1/00936 , H01L21/31111 , H01L21/31116
摘要： Disclosed is a a method of fabricating a MEMS device by means of surface micromachining without leaving any stiction or residues by etching silicon oxide of a sacrificial layer, which is an intermediate layer between a substrate and a microstructure, rather than by etching silicon oxide of a semiconductor device. The method according to the invention includes the steps of supplying alcohol vapor bubbled with anhydrous HF, maintaining a temperature of the supplying device and a moving path of the anhydrous HF and the alcohol to be higher than a boiling point of the alcohol, performing a vapor etching by controlling a temperature and a pressure to be within the vapor region of a phase equilibrium diagram of water, and removing silicon oxide of a sacrificial layer on a lower portion of the microstructure.
摘要翻译：公开了一种通过表面微机械加工制造MEMS器件的方法，而不通过蚀刻作为衬底和微结构之间的中间层的牺牲层的氧化硅而不留下任何残留物，而不是通过蚀刻半导体的氧化硅设备。根据本发明的方法包括以下步骤：提供用无水HF鼓泡的醇蒸汽，保持供料装置的温度和无水HF和醇的移动路径高于醇的沸点，进行蒸汽通过控制温度和压力在水的相平衡图的蒸汽区域内进行蚀刻，并且在微结构的下部去除牺牲层的氧化硅。

5. 发明授权

US5810935A Apparatus for transferring a wafer 失效
标题翻译：用于传送晶片的装置
公开(公告)号：US5810935A
公开(公告)日：1998-09-22
申请号：US564575
申请日：1995-11-29
申请人： Jong-Hyun Lee , Hyung-Joun Yoo , Boo-Yeon Choi , Won-Ick Jang , Ki-Ho Jang
发明人： Jong-Hyun Lee , Hyung-Joun Yoo , Boo-Yeon Choi , Won-Ick Jang , Ki-Ho Jang
IPC分类号： B65G49/07 , B25J15/08 , H01L21/677 , H01L21/68 , H01L21/687 , C23C16/00
CPC分类号： H01L21/68707 , Y10S414/136 , Y10S414/137 , Y10S414/139 , Y10S414/141
摘要： An apparatus for transferring a wafer in a semiconductor manufacturing process, and for carrying a wafer between a cassette and a wafer chuck without an additional tool such as a tripod. The apparatus includes: a holder capable of holding the side of the wafer; a wafer transfer assembly including an actuator of the holder and a detector that detects a malfunction of the holder; and a process reactor having a vacuum exhaust port installed under a wafer chuck so as to guide gas in an axially-symmetric flow pattern. The holder grasps the rounded side of a wafer. Removal of additional tools makes the structure of an overall system more simple and an exhaust port can be installed under the reactor so as to cause processing gas to be guided in an axially-symmetric flow, resulting in an enhancement of the process uniformity.
摘要翻译：一种用于在半导体制造工艺中转移晶片的装置，并且用于在没有诸如三脚架的附加工具之间将晶片携带在盒和晶片卡盘之间。该装置包括：能够保持晶片侧面的保持器; 晶片传送组件，其包括所述保持器的致动器和检测器，所述检测器检测所述保持器的故障; 以及具有安装在晶片卡盘下方的真空排气口以便引导轴向对称流动模式的气体的处理反应器。保持器抓住晶片的圆形侧。除去附加工具使得整个系统的结构更简单，并且排气口可以安装在反应器下方，以便使处理气体以轴向对称的流动被引导，导致工艺均匀性的提高。

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