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1. 发明授权

US09016235B2 Substrate coating device that controls coating amount based on optical measurement of bead shape 有权
标题翻译：基于珠粒形状的光学测量来控制涂布量的基板涂布装置
公开(公告)号：US09016235B2
公开(公告)日：2015-04-28
申请号：US13256562
申请日：2010-03-12
申请人： Yoshinori Ikagawa , Mitsunori Oda , Minoru Yamamoto , Takashi Kawaguchi , Masaaki Tanabe , Hideo Hirata
发明人： Yoshinori Ikagawa , Mitsunori Oda , Minoru Yamamoto , Takashi Kawaguchi , Masaaki Tanabe , Hideo Hirata
IPC分类号： B05C11/00 , B05C5/00 , B05C11/10 , B05C5/02 , B05D1/30 , B05D1/02 , B05B12/08
CPC分类号： B05C11/1007 , B05B12/082 , B05C5/0258 , B05C11/1005
摘要： The substrate coating device (10) includes a slit nozzle (1), a first camera (3), a second camera (4), a control section (5), a pump (8), and a pressure control chamber (9). The control section (5) controls the supply of the coating liquid from the pump (8) to the slit nozzle (1) in accordance with the result of comparison between a bead shape imaged by the first camera (3) and a reference shape. The control section (5) also controls the air pressure on the upstream side of the slit nozzle (1) by the pressure control chamber (9) in accordance with the result of comparison between a distance measured from an image taken by the second camera (4) and a reference distance.
摘要翻译：基板涂布装置（10）包括狭缝喷嘴（1），第一相机（3），第二相机（4），控制部分（5），泵（8）和压力控制室（9）。控制部（5）根据由第一照相机（3）成像的珠粒形状与基准形状的比较结果，控制从泵（8）到狭缝喷嘴（1）的涂布液的供给。控制部（5）还根据从由第二照相机拍摄的图像测得的距离的比较来控制压力控制室（9）在狭缝喷嘴（1）的上游侧的空气压力 4）和参考距离。

2. 发明授权

US08770141B2 Substrate coating device with control section that synchronizes substrate moving velocity and delivery pump 有权
标题翻译：具有控制部分的基板涂层装置，其同步基板移动速度和输送泵
公开(公告)号：US08770141B2
公开(公告)日：2014-07-08
申请号：US13377606
申请日：2010-04-19
申请人： Yoshinori Ikagawa , Mitsunori Oda , Minoru Yamamoto , Takashi Kawaguchi , Hideo Hirata , Masaaki Tanabe
发明人： Yoshinori Ikagawa , Mitsunori Oda , Minoru Yamamoto , Takashi Kawaguchi , Hideo Hirata , Masaaki Tanabe
IPC分类号： B05C11/00 , C23C16/52 , B05D1/02
CPC分类号： B05C5/0262 , B05C5/0258 , B05C11/1013 , B05C11/1015 , B05C11/1023
摘要： A substrate coating device is provided which is capable of reducing non-uniform film thickness areas that take place in a coating start portion and a coating end portion during coating using a slit nozzle coater.The substrate coating device (10) includes at least a slider driving motor (4), a pump (8), a delivery state quantity measuring section (82), and a control section (5). The slider driving motor (4) scans a slit nozzle (1) over a substrate (100) at an established velocity relative to the substrate (100). The pump (8) controls the supply of the coating liquid to the slit nozzle (1). The delivery state quantity measuring section (82) is configured to measure a state quantity indicative of a delivery state of the coating liquid from the tip of the slit nozzle (1). The control section (5) corrects control information to be fed to the slider driving motor (4) in such a manner as to cancel out a difference between control information fed to the pump (8) and measurement information fed from the delivery state quantity measuring section (82) based on difference information indicative of the difference.
摘要翻译：提供一种基板涂布装置，其能够在使用狭缝喷嘴涂布机的涂布期间减少在涂层起始部分和涂覆端部发生的不均匀的膜厚度区域。基板涂布装置（10）至少包括滑块驱动电机（4），泵（8），输送状态量测量部（82）和控制部（5）。滑块驱动电机（4）以相对于基板（100）的建立速度在基板（100）上扫描狭缝喷嘴（1）。泵（8）控制向狭缝喷嘴（1）供给涂布液。输送状态量测量部（82）被配置为从狭缝喷嘴（1）的前端测量表示涂布液的输送状态的状态量。所述控制部（5）以与所述输送状态量计量供给的所述测量信息和从所述输送状态量计量得到的测量信息之间的差异来取消供给到所述滑块驱动电动机（4）的控制信息，（82）基于指示差异的差异信息。

3. 发明申请

US20120085282A1 SUBSTRATE COATING DEVICE 有权
标题翻译：基板涂层设备
公开(公告)号：US20120085282A1
公开(公告)日：2012-04-12
申请号：US13377606
申请日：2010-04-19
申请人： Yoshinori Ikagawa , Mitsunori Oda , Minoru Yamamoto , Takashi Kawaguchi , Hideo Hirata , Masaaki Tanabe
发明人： Yoshinori Ikagawa , Mitsunori Oda , Minoru Yamamoto , Takashi Kawaguchi , Hideo Hirata , Masaaki Tanabe
IPC分类号： B05C5/00
CPC分类号： B05C5/0262 , B05C5/0258 , B05C11/1013 , B05C11/1015 , B05C11/1023
摘要： A substrate coating device is provided which is capable of reducing non-uniform film thickness areas that take place in a coating start portion and a coating end portion during coating using a slit nozzle coater.The substrate coating device (10) includes at least a slider driving motor (4), a pump (8), a delivery state quantity measuring section (82), and a control section (5). The slider driving motor (4) scans a slit nozzle (1) over a substrate (100) at an established velocity relative to the substrate (100). The pump (8) controls the supply of the coating liquid to the slit nozzle (1). The delivery state quantity measuring section (82) is configured to measure a state quantity indicative of a delivery state of the coating liquid from the tip of the slit nozzle (1). The control section (5) corrects control information to be fed to the slider driving motor (4) in such a manner as to cancel out a difference between control information fed to the pump (8) and measurement information fed from the delivery state quantity measuring section (82) based on difference information indicative of the difference.
摘要翻译：提供一种基板涂布装置，其能够在使用狭缝喷嘴涂布机的涂布期间减少在涂层起始部分和涂覆端部发生的不均匀的膜厚度区域。基板涂布装置（10）至少包括滑块驱动电机（4），泵（8），输送状态量测量部（82）和控制部（5）。滑块驱动电机（4）以相对于基板（100）的建立速度在基板（100）上扫描狭缝喷嘴（1）。泵（8）控制向狭缝喷嘴（1）供给涂布液。输送状态量测量部（82）被配置为从狭缝喷嘴（1）的前端测量表示涂布液的输送状态的状态量。所述控制部（5）以与所述输送状态量计量供给的测量信息和从所述输送状态量计量得到的测量信息之间的差异来校正供给到所述滑块驱动电动机（4）的控制信息，（82）基于指示差异的差异信息。

4. 发明申请

US20120000420A1 SUBSTRATE COATING DEVICE 有权
标题翻译：基板涂层设备
公开(公告)号：US20120000420A1
公开(公告)日：2012-01-05
申请号：US13256562
申请日：2010-03-12
申请人： Yoshinori Ikagawa , Mitsunori Oda , Minoru Yamamoto , Takashi Kawaguchi , Masaaki Tanabe , Hideo Hirata
发明人： Yoshinori Ikagawa , Mitsunori Oda , Minoru Yamamoto , Takashi Kawaguchi , Masaaki Tanabe , Hideo Hirata
IPC分类号： B05C11/10
CPC分类号： B05C11/1007 , B05B12/082 , B05C5/0258 , B05C11/1005
摘要： The substrate coating device (10) includes a slit nozzle (1), a first camera (3), a second camera (4), a control section (5), a pump (8), and a pressure control chamber (9). The control section (5) controls the supply of the coating liquid from the pump (8) to the slit nozzle (1) in accordance with the result of comparison between a bead shape imaged by the first camera (3) and a reference shape. The control section (5) also controls the air pressure on the upstream side of the slit nozzle (1) by the pressure control chamber (9) in accordance with the result of comparison between a distance measured from an image taken by the second camera (4) and a reference distance.
摘要翻译：基板涂布装置（10）包括狭缝喷嘴（1），第一相机（3），第二相机（4），控制部分（5），泵（8）和压力控制室（9）。控制部（5）根据由第一照相机（3）成像的珠粒形状与基准形状的比较结果，控制从泵（8）到狭缝喷嘴（1）的涂布液的供给。控制部（5）还根据从由第二照相机拍摄的图像测得的距离的比较来控制压力控制室（9）在狭缝喷嘴（1）的上游侧的空气压力 4）和参考距离。

5. 发明授权

US09067234B2 Substrate coating device and substrate coating method 有权
标题翻译：基材涂布装置和基材涂布方法
公开(公告)号：US09067234B2
公开(公告)日：2015-06-30
申请号：US13519212
申请日：2010-06-03
申请人： Masaaki Tanabe , Hideo Hirata , Mitsunori Oda
发明人： Masaaki Tanabe , Hideo Hirata , Mitsunori Oda
IPC分类号： B05B1/02 , B05C13/02 , H01L21/67 , H01L21/677 , B05C5/02
CPC分类号： B05C13/02 , B05C5/0208 , B05C5/0216 , B05C5/0254 , B05C5/0283 , H01L21/6715 , H01L21/6776
摘要： A substrate coating device (10) includes a precision stage (7), a nozzle (8), and conveyors (3 to 6 and 21). The precision stage (7) has a horizontal placement surface for placing a substrate W thereon and is configured to be reciprocable between an upstream end and a downstream end in a conveying direction. The conveyors (3 to 6 and 21) are configured to convey the substrate W in the conveying direction via the placement surface of the precision stage (7) in such manner that a surface of the substrate W is positioned in a horizontal plane. The intermediate conveyor (21) is liftable between a conveying position where a conveying surface of the intermediate conveyor is coincident with the placement surface of the stage and a non-conveying position where the conveying surface is positioned below the placement surface of the stage.
摘要翻译：衬底涂覆装置（10）包括精密工作台（7），喷嘴（8）和输送机（3至6和21）。精密工作台（7）具有用于将衬底W放置在其上的水平放置表面，并且构造成可沿输送方向在上游端和下游端之间往复运动。输送机（3〜6,21）构成为，以使基板W的表面位于水平面的方式，经由精密台（7）的配置面在输送方向上输送基板W. 中间输送器（21）可以在输送位置与中间输送机的输送表面与载物台的放置表面重合的输送位置和输送表面位于载物台的放置表面下方的非输送位置之间提升。

6. 发明申请

US20120288635A1 SUBSTRATE COATING DEVICE AND SUBSTRATE COATING METHOD 有权
标题翻译：基板涂层装置和基板涂层方法
公开(公告)号：US20120288635A1
公开(公告)日：2012-11-15
申请号：US13519212
申请日：2010-06-03
申请人： Masaaki Tanabe , Hideo Hirata , Mitsunori Oda
发明人： Masaaki Tanabe , Hideo Hirata , Mitsunori Oda
IPC分类号： B05B1/02 , B05D1/02
CPC分类号： B05C13/02 , B05C5/0208 , B05C5/0216 , B05C5/0254 , B05C5/0283 , H01L21/6715 , H01L21/6776
摘要： A substrate coating device (10) includes a precision stage (7), a nozzle (8), and conveyors (3 to 6 and 21). The precision stage (7) has a horizontal placement surface for placing a substrate W thereon and is configured to be reciprocable between an upstream end and a downstream end in a conveying direction. The conveyors (3 to 6 and 21) are configured to convey the substrate W in the conveying direction via the placement surface of the precision stage (7) in such manner that a surface of the substrate W is positioned in a horizontal plane. The intermediate conveyor (21) is liftable between a conveying position where a conveying surface of the intermediate conveyor is coincident with the placement surface of the stage and a non-conveying position where the conveying surface is positioned below the placement surface of the stage.
摘要翻译：衬底涂覆装置（10）包括精密工作台（7），喷嘴（8）和输送机（3至6和21）。精密工作台（7）具有用于将衬底W放置在其上的水平放置表面，并且构造成可沿输送方向在上游端和下游端之间往复运动。输送机（3〜6,21）构成为，以使基板W的表面位于水平面的方式，经由精密台（7）的配置面在输送方向上输送基板W. 中间输送器（21）可以在输送位置与中间输送机的输送表面与载物台的放置表面重合的输送位置和输送表面位于载物台的放置表面下方的非输送位置之间提升。

7. 发明授权

US5429940A Process for producing oxazopyrroloquinolines, novel oxazopyrroloquinolines, and use of oxazopyrroloquinolines 失效
标题翻译：制备恶唑并吡咯并喹啉的方法，新型恶唑并吡咯啉喹啉和恶唑并吡咯啉喹啉的使用
公开(公告)号：US5429940A
公开(公告)日：1995-07-04
申请号：US060240
申请日：1993-07-12
申请人： Teizi Urakami , Mitsunori Oda , Chieko Itoh , Hisao Kobayashi , Toshio Nagai , Kazuhiro Sugamura
发明人： Teizi Urakami , Mitsunori Oda , Chieko Itoh , Hisao Kobayashi , Toshio Nagai , Kazuhiro Sugamura
IPC分类号： C07D498/14 , C12P17/18 , A61K31/435 , C12P17/16
CPC分类号： C07D498/14 , C12P17/188 , Y10S435/822 , Y10S435/863
摘要： The present invention provides a process for producing oxazopyrroloquinolines which comprises culturing microorganisms to produce pyrroloquinolinequinone and adding .alpha.-amino acids or monomethylamine to the resulting culture broth which contains the pyrroloquinolinequinone and from which cells of microorganisms are not separated, thereby to convert the pyrroloquinolinequinone to the corresponding oxazopyrroloquinolines. The thus obtained oxazopyrroloquinolines include novel compounds. The present invention further provides aldose reductase inhibitors, diabetic combined disease curing agents, immunopotentiating agents and liver disease inhibiting agents which contain as active ingredient these oxazopyrroloquinolines having excellent physiological activity.
摘要翻译：本发明提供一种生产恶唑并吡咯并喹啉的方法，其包括培养微生物以产生吡咯并喹啉醌，并向所得的含有吡咯并喹啉醌的培养液中加入α-氨基酸或一甲基胺，并且微生物细胞未分离，从而将吡咯并喹啉醌转化为对应的恶唑并吡咯啉喹啉。由此获得的恶唑并吡咯啉喹啉包括新化合物。本发明还提供了具有优异生理活性的醛糖还原酶抑制剂，糖尿病合并疾病固化剂，免疫增强剂和肝病抑制剂，其含有作为活性成分的恶唑吡咯并喹啉。

8. 发明授权

US5331011A N-benzyl-n-phenoxyethylamines and agricultural and horticultural bactericides 失效
标题翻译： N-苄基 - 正 - 苯氧基乙胺和农业和园艺杀菌剂
公开(公告)号：US5331011A
公开(公告)日：1994-07-19
申请号：US43854
申请日：1993-04-07
申请人： Mitsunori Oda , Kazutoshi Kikkawa , Akinori Tanaka , Satoko Imaruoka , Shigeo Yoshinaka
发明人： Mitsunori Oda , Kazutoshi Kikkawa , Akinori Tanaka , Satoko Imaruoka , Shigeo Yoshinaka
IPC分类号： A01N39/00 , C07C217/20 , A01N37/30 , C07C63/08 , C07C217/08
CPC分类号： C07C217/20 , A01N39/00
摘要： Disclosed is an N-benzyl-N-phenoxyethylamine selected from the group consisting of the N-benzyl-N-phenoxyethylamine represented by the following formula (I): ##STR1## and an agriculturally acceptable acid addition salt represented by the following formula (II): ##STR2## wherein m represents a number of 1 or 2 with a proviso that when m is 1 and a chlorine atom in the ring A is present at para(4)-position of the ring A, two chlorine atoms in the ring B are present at 2,3-, 2,5-, 2,6-, 3,4- or 3,5-positions of the ring B, and HX represents an acid.
摘要翻译：公开了N-苄基-N-苯氧基乙胺，其选自由下式（I）表示的N-苄基-N-苯氧基乙胺：由下式（I）表示的农业上可接受的酸加成盐式（II）：其中m表示1或2的数，条件是当m为1且环A中的氯原子存在于环A的对位（4）位时，环B中的两个氯原子存在于环B的2,3-，2,5-，2,6-，3,4-或3,5位，HX表示酸。

9. 发明授权

US5409957A Phenoxyalkylamine and agricultural and horticultural bactericide 失效
标题翻译：苯氧基烷基胺和农业和园艺杀菌剂
公开(公告)号：US5409957A
公开(公告)日：1995-04-25
申请号：US35903
申请日：1993-03-23
申请人： Mitsunori Oda , Kazutoshi Kikkawa , Akinori Tanaka , Satoko Imaruoka , Shigeo Yoshinaka
发明人： Mitsunori Oda , Kazutoshi Kikkawa , Akinori Tanaka , Satoko Imaruoka , Shigeo Yoshinaka
IPC分类号： A01N39/00 , C07C217/00 , C07C217/20 , A01N33/26
CPC分类号： A01N39/00 , C07C217/20
摘要： Disclosed are a phenoxyalkylamine represented by the following general formula I and a salt of said phenoxyalkylamine represented by the following general formula II: ##STR1## wherein R represents a linear saturated hydrocarbon having 7 to 12 carbon atoms, n is an integer of from 1 to 5, m is an integer of from 2 to 4, and HX represents a mineral acid.These compounds have strong bacteriostatic and bactericidal actions for plants with no phytotoxicity. Therefore, these compounds are effectively used as the active ingredient of an agricultural and horticultural bactericide.
摘要翻译：公开了由以下通式I表示的苯氧基烷基胺和由以下通式II表示的所述苯氧基烷基胺的盐：其中R表示具有7至12个碳原子的直链饱和烃，n是 1〜5的整数，m为2〜4的整数，HX表示无机酸。这些化合物对没有植物毒性的植物具有很强的抑菌和杀菌作用。因此，这些化合物有效地用作农业和园艺杀菌剂的活性成分。

10. 发明授权

US5236930A Oxazopyrroloquinolines and use of oxazopyrroloquinolines 失效
标题翻译：恶唑吡咯并喹啉和恶唑并吡咯啉喹啉的使用
公开(公告)号：US5236930A
公开(公告)日：1993-08-17
申请号：US826220
申请日：1992-01-23
申请人： Teizi Urakami , Mitsunori Oda , Chieko Itoh , Hisao Kobayashi , Toshio Nagai , Kazuhiro Sugamura
发明人： Teizi Urakami , Mitsunori Oda , Chieko Itoh , Hisao Kobayashi , Toshio Nagai , Kazuhiro Sugamura
IPC分类号： C07D498/14 , C12P17/18
CPC分类号： C07D498/14 , C12P17/188 , Y10S435/822 , Y10S435/863
摘要： The present invention provides a process for producing oxazopyrroloquinolines which comprises culturing microorganisms to produce pyrroloquinolinequinone and adding .alpha.-amino acids or monomethylamine to the resulting culture broth which contains the pyrroloquinolinequinone and from which cells of microorganisms are not separated, thereby to convert the pyrroloquinolinequinone to the corresponding oxazopyrroloquinolines.The thus obtained oxazopyrroloquinolines include novel compounds.The present invention further provides aldose reductase inhibitors, diabetic combined disease curing agents, immunopotentiating agents and liver disease inhibiting agents which contain as active ingredient these oxazopyrroloquinolines having excellent physiological activity.
摘要翻译：本发明提供一种生产恶唑并吡咯并喹啉的方法，其包括培养微生物以产生吡咯并喹啉醌，并向所得的含有吡咯并喹啉醌的培养液中加入α-氨基酸或一甲基胺，并且微生物细胞未分离，从而将吡咯并喹啉醌转化为对应的恶唑并吡咯啉喹啉。由此获得的恶唑并吡咯啉喹啉包括新化合物。本发明还提供了具有优异生理活性的醛糖还原酶抑制剂，糖尿病合并疾病固化剂，免疫增强剂和肝病抑制剂，其含有作为活性成分的恶唑吡咯并喹啉。

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