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1. 发明授权

US09016235B2 Substrate coating device that controls coating amount based on optical measurement of bead shape 有权
标题翻译：基于珠粒形状的光学测量来控制涂布量的基板涂布装置
公开(公告)号：US09016235B2
公开(公告)日：2015-04-28
申请号：US13256562
申请日：2010-03-12
申请人： Yoshinori Ikagawa , Mitsunori Oda , Minoru Yamamoto , Takashi Kawaguchi , Masaaki Tanabe , Hideo Hirata
发明人： Yoshinori Ikagawa , Mitsunori Oda , Minoru Yamamoto , Takashi Kawaguchi , Masaaki Tanabe , Hideo Hirata
IPC分类号： B05C11/00 , B05C5/00 , B05C11/10 , B05C5/02 , B05D1/30 , B05D1/02 , B05B12/08
CPC分类号： B05C11/1007 , B05B12/082 , B05C5/0258 , B05C11/1005
摘要： The substrate coating device (10) includes a slit nozzle (1), a first camera (3), a second camera (4), a control section (5), a pump (8), and a pressure control chamber (9). The control section (5) controls the supply of the coating liquid from the pump (8) to the slit nozzle (1) in accordance with the result of comparison between a bead shape imaged by the first camera (3) and a reference shape. The control section (5) also controls the air pressure on the upstream side of the slit nozzle (1) by the pressure control chamber (9) in accordance with the result of comparison between a distance measured from an image taken by the second camera (4) and a reference distance.
摘要翻译：基板涂布装置（10）包括狭缝喷嘴（1），第一相机（3），第二相机（4），控制部分（5），泵（8）和压力控制室（9）。控制部（5）根据由第一照相机（3）成像的珠粒形状与基准形状的比较结果，控制从泵（8）到狭缝喷嘴（1）的涂布液的供给。控制部（5）还根据从由第二照相机拍摄的图像测得的距离的比较来控制压力控制室（9）在狭缝喷嘴（1）的上游侧的空气压力 4）和参考距离。

2. 发明授权

US08770141B2 Substrate coating device with control section that synchronizes substrate moving velocity and delivery pump 有权
标题翻译：具有控制部分的基板涂层装置，其同步基板移动速度和输送泵
公开(公告)号：US08770141B2
公开(公告)日：2014-07-08
申请号：US13377606
申请日：2010-04-19
申请人： Yoshinori Ikagawa , Mitsunori Oda , Minoru Yamamoto , Takashi Kawaguchi , Hideo Hirata , Masaaki Tanabe
发明人： Yoshinori Ikagawa , Mitsunori Oda , Minoru Yamamoto , Takashi Kawaguchi , Hideo Hirata , Masaaki Tanabe
IPC分类号： B05C11/00 , C23C16/52 , B05D1/02
CPC分类号： B05C5/0262 , B05C5/0258 , B05C11/1013 , B05C11/1015 , B05C11/1023
摘要： A substrate coating device is provided which is capable of reducing non-uniform film thickness areas that take place in a coating start portion and a coating end portion during coating using a slit nozzle coater.The substrate coating device (10) includes at least a slider driving motor (4), a pump (8), a delivery state quantity measuring section (82), and a control section (5). The slider driving motor (4) scans a slit nozzle (1) over a substrate (100) at an established velocity relative to the substrate (100). The pump (8) controls the supply of the coating liquid to the slit nozzle (1). The delivery state quantity measuring section (82) is configured to measure a state quantity indicative of a delivery state of the coating liquid from the tip of the slit nozzle (1). The control section (5) corrects control information to be fed to the slider driving motor (4) in such a manner as to cancel out a difference between control information fed to the pump (8) and measurement information fed from the delivery state quantity measuring section (82) based on difference information indicative of the difference.
摘要翻译：提供一种基板涂布装置，其能够在使用狭缝喷嘴涂布机的涂布期间减少在涂层起始部分和涂覆端部发生的不均匀的膜厚度区域。基板涂布装置（10）至少包括滑块驱动电机（4），泵（8），输送状态量测量部（82）和控制部（5）。滑块驱动电机（4）以相对于基板（100）的建立速度在基板（100）上扫描狭缝喷嘴（1）。泵（8）控制向狭缝喷嘴（1）供给涂布液。输送状态量测量部（82）被配置为从狭缝喷嘴（1）的前端测量表示涂布液的输送状态的状态量。所述控制部（5）以与所述输送状态量计量供给的所述测量信息和从所述输送状态量计量得到的测量信息之间的差异来取消供给到所述滑块驱动电动机（4）的控制信息，（82）基于指示差异的差异信息。

3. 发明申请

US20120085282A1 SUBSTRATE COATING DEVICE 有权
标题翻译：基板涂层设备
公开(公告)号：US20120085282A1
公开(公告)日：2012-04-12
申请号：US13377606
申请日：2010-04-19
申请人： Yoshinori Ikagawa , Mitsunori Oda , Minoru Yamamoto , Takashi Kawaguchi , Hideo Hirata , Masaaki Tanabe
发明人： Yoshinori Ikagawa , Mitsunori Oda , Minoru Yamamoto , Takashi Kawaguchi , Hideo Hirata , Masaaki Tanabe
IPC分类号： B05C5/00
CPC分类号： B05C5/0262 , B05C5/0258 , B05C11/1013 , B05C11/1015 , B05C11/1023
摘要： A substrate coating device is provided which is capable of reducing non-uniform film thickness areas that take place in a coating start portion and a coating end portion during coating using a slit nozzle coater.The substrate coating device (10) includes at least a slider driving motor (4), a pump (8), a delivery state quantity measuring section (82), and a control section (5). The slider driving motor (4) scans a slit nozzle (1) over a substrate (100) at an established velocity relative to the substrate (100). The pump (8) controls the supply of the coating liquid to the slit nozzle (1). The delivery state quantity measuring section (82) is configured to measure a state quantity indicative of a delivery state of the coating liquid from the tip of the slit nozzle (1). The control section (5) corrects control information to be fed to the slider driving motor (4) in such a manner as to cancel out a difference between control information fed to the pump (8) and measurement information fed from the delivery state quantity measuring section (82) based on difference information indicative of the difference.
摘要翻译：提供一种基板涂布装置，其能够在使用狭缝喷嘴涂布机的涂布期间减少在涂层起始部分和涂覆端部发生的不均匀的膜厚度区域。基板涂布装置（10）至少包括滑块驱动电机（4），泵（8），输送状态量测量部（82）和控制部（5）。滑块驱动电机（4）以相对于基板（100）的建立速度在基板（100）上扫描狭缝喷嘴（1）。泵（8）控制向狭缝喷嘴（1）供给涂布液。输送状态量测量部（82）被配置为从狭缝喷嘴（1）的前端测量表示涂布液的输送状态的状态量。所述控制部（5）以与所述输送状态量计量供给的测量信息和从所述输送状态量计量得到的测量信息之间的差异来校正供给到所述滑块驱动电动机（4）的控制信息，（82）基于指示差异的差异信息。

4. 发明申请

US20120000420A1 SUBSTRATE COATING DEVICE 有权
标题翻译：基板涂层设备
公开(公告)号：US20120000420A1
公开(公告)日：2012-01-05
申请号：US13256562
申请日：2010-03-12
申请人： Yoshinori Ikagawa , Mitsunori Oda , Minoru Yamamoto , Takashi Kawaguchi , Masaaki Tanabe , Hideo Hirata
发明人： Yoshinori Ikagawa , Mitsunori Oda , Minoru Yamamoto , Takashi Kawaguchi , Masaaki Tanabe , Hideo Hirata
IPC分类号： B05C11/10
CPC分类号： B05C11/1007 , B05B12/082 , B05C5/0258 , B05C11/1005
摘要： The substrate coating device (10) includes a slit nozzle (1), a first camera (3), a second camera (4), a control section (5), a pump (8), and a pressure control chamber (9). The control section (5) controls the supply of the coating liquid from the pump (8) to the slit nozzle (1) in accordance with the result of comparison between a bead shape imaged by the first camera (3) and a reference shape. The control section (5) also controls the air pressure on the upstream side of the slit nozzle (1) by the pressure control chamber (9) in accordance with the result of comparison between a distance measured from an image taken by the second camera (4) and a reference distance.
摘要翻译：基板涂布装置（10）包括狭缝喷嘴（1），第一相机（3），第二相机（4），控制部分（5），泵（8）和压力控制室（9）。控制部（5）根据由第一照相机（3）成像的珠粒形状与基准形状的比较结果，控制从泵（8）到狭缝喷嘴（1）的涂布液的供给。控制部（5）还根据从由第二照相机拍摄的图像测得的距离的比较来控制压力控制室（9）在狭缝喷嘴（1）的上游侧的空气压力 4）和参考距离。

5. 发明申请

US20130252432A1 PATTERNING METHOD 审中-公开
标题翻译：绘图方法
公开(公告)号：US20130252432A1
公开(公告)日：2013-09-26
申请号：US13992932
申请日：2011-12-16
申请人： Masaru Nakamura , Takashi Kawaguchi , Yoshinori Ikagawa , Chisato Nagahata
发明人： Masaru Nakamura , Takashi Kawaguchi , Yoshinori Ikagawa , Chisato Nagahata
IPC分类号： H01L21/306
CPC分类号： H01L21/306 , H01L31/022425 , H01L31/0392 , H01L31/1884 , H01L51/0017 , Y02E10/50
摘要： Provided is a patterning method that can greatly reduce process costs and environmental load. The patterning method includes: a film forming step of forming a functional film (2) on a substrate (1) ; and an etching step of irradiating the substrate with vacuum ultraviolet light (12) from above a mask (4) that is placed on the functional film (2) and has an arbitrarily-defined opening (4A) so as to dry etch the functional film (2) positioned below the opening (4A). The dry etching step can be carried out in an atmosphere containing oxygen. For example, dry air can be used as process gas. In addition, N2 may be supplied as an inert gas to the substrate (1) placed in the atmosphere.
摘要翻译：提供了可以大大降低工艺成本和环境负荷的图案化方法。图案形成方法包括：在基板（1）上形成功能膜（2）的成膜工序; 以及蚀刻步骤，从放置在功能膜（2）上的掩模（4）的上方以真空紫外线（12）照射基板，并具有任意限定的开口（4A），从而干燥蚀刻功能膜（2）定位在开口（4A）的下方。干蚀刻步骤可以在含氧的气氛中进行。例如，干燥空气可以用作工艺气体。此外，可以将N 2作为惰性气体供给到放置在大气中的基板（1）。

6. 发明申请

US20140186537A1 METHOD FOR CONTROLLING A FLOW RATE OF A PUMP AND METHOD FOR FORMING A COATED FILM 审中-公开
标题翻译：用于控制泵的流量的方法和形成涂膜的方法
公开(公告)号：US20140186537A1
公开(公告)日：2014-07-03
申请号：US14119309
申请日：2012-05-25
申请人： Yoshinori Ikagawa
发明人： Yoshinori Ikagawa
IPC分类号： F04B49/02 , B05D1/40
CPC分类号： F04B49/02 , B05C5/02 , B05C11/1002 , B05D1/26 , B05D1/40 , F04B49/106
摘要： A method for controlling a flow rate of a pump (10) transporting a liquid being driven by a drive system having a sliding portion, wherein a flow rate is maintained at a minute first flow rate (R1) at an early stage of operation of the pump (10); and subsequently the flow rate is increased to a steady second flow rate (R). With the method, at the early stage of operation of the pump (10), a state is established beforehand in which the pump (10) is kept stable at the minute first flow rate in order for the stick-slip phenomenon not to occur; and because the flow rate of the pump is increased from the state, transition from static friction to kinetic friction does not occur; and thus a disorderly flow rate of the pump (10) due to the stick-slip phenomenon of a motor (12) is suppressed.This makes it possible to attain a stable control of the flow rate at the early stage of operation of the pump (10).
摘要翻译：一种用于控制运送由具有滑动部分的驱动系统驱动的液体的泵（10）的流量的方法，其中在所述运行的早期阶段将流量保持在微小的第一流量（R1）泵（10）; 随后流量增加到稳定的第二流量（R）。利用该方法，在泵（10）的早期运行时，预先建立状态，其中泵（10）以微小的第一流量保持稳定，以便不发生粘滑现象; 并且由于泵的流量从该状态增加，不会发生从静摩擦到动摩擦的转变; 因此抑制了由于马达（12）的粘滑现象引起的泵（10）的无序流动。这使得可以在泵（10）的早期操作期间获得对流量的稳定控制。

7. 发明授权

US08980114B2 Film removing method, nozzle for removing film, and film removing device 有权
标题翻译：除膜方法，除膜用喷嘴和除膜装置
公开(公告)号：US08980114B2
公开(公告)日：2015-03-17
申请号：US14113261
申请日：2012-04-11
申请人： Yoshinori Ikagawa
发明人： Yoshinori Ikagawa
IPC分类号： C03C15/00 , B05C5/02 , B05C9/12 , B05C11/06
CPC分类号： B05C5/02 , B05C5/0208 , B05C5/022 , B05C9/12 , B05C11/06
摘要： A film in a dry state is efficiently dissolved and removed. A film removing method includes steps of moving a nozzle head (10B) close to a soluble film (201) formed on a substrate (200), forming a liquid pool (302) of chemical liquid (300) between the nozzle head (10B) and the film (201) by continuously and simultaneously discharging and sucking the chemical liquid (300) from the nozzle head (10B), and horizontally moving the substrate (100) in a state in which the nozzle head (10B) and the surface of the film (201) are not contacted so as to relatively move the liquid pool (302) of the chemical liquid on the substrate (100).
摘要翻译：处于干燥状态的膜被有效地溶解并除去。一种膜去除方法包括以下步骤：使形成在基板（200）上的可溶性膜（201）附近的喷嘴头（10B）移动，在喷嘴头（10B）之间形成化学液体（300）的液体池（302）所述薄膜（201）通过从所述喷嘴头（10B）连续同时排出和吸引所述药液（300），并且在所述喷嘴头（10B）和所述喷嘴头膜（201）不接触以相对移动基板（100）上的化学液体的液体池（302）。

8. 发明申请

US20140042124A1 FILM REMOVING METHOD, NOZZLE FOR REMOVING FILM, AND FILM REMOVING DEVICE 有权
标题翻译：薄膜去除方法，去除胶片的喷嘴和薄膜去除装置
公开(公告)号：US20140042124A1
公开(公告)日：2014-02-13
申请号：US14113261
申请日：2012-04-11
申请人： Yoshinori Ikagawa
发明人： Yoshinori Ikagawa
IPC分类号： B05C5/02
CPC分类号： B05C5/02 , B05C5/0208 , B05C5/022 , B05C9/12 , B05C11/06
摘要： A film in a dry state is efficiently dissolved and removed. A film removing method includes steps of moving a nozzle head (10B) close to a soluble film (201) formed on a substrate (200), forming a liquid pool (302) of chemical liquid (300) between the nozzle head (10B) and the film (201) by continuously and simultaneously discharging and sucking the chemical liquid (300) from the nozzle head (10B), and horizontally moving the substrate (100) in a state in which the nozzle head (10B) and the surface of the film (201) are not contacted so as to relatively move the liquid pool (302) of the chemical liquid on the substrate (100).
摘要翻译：处于干燥状态的膜被有效地溶解并除去。一种膜去除方法包括以下步骤：使形成在基板（200）上的可溶性膜（201）附近的喷嘴头（10B）移动，在喷嘴头（10B）之间形成化学液体（300）的液体池（302）所述薄膜（201）通过从所述喷嘴头（10B）连续同时排出和吸引所述药液（300），并且在所述喷嘴头（10B）和所述喷嘴头膜（201）不接触以相对移动基板（100）上的化学液体的液体池（302）。

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