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    • 1. 发明授权
    • Solid-state imaging device with dual lens structure
    • 具有双透镜结构的固态成像装置
    • US5796154A
    • 1998-08-18
    • US522131
    • 1995-08-31
    • Yoshikazu SanoYoko ShigetaHiromitsu Aoki
    • Yoshikazu SanoYoko ShigetaHiromitsu Aoki
    • H01L21/28H01L27/14H01L27/146H01L27/148H01L31/0216H01L31/0232H04N5/335H04N5/359H04N5/369H04N5/372
    • H01L31/0232H01L27/14621H01L27/14623H01L27/14625H01L27/14627H01L27/14632H01L27/14685H01L27/14687H01L27/14806H01L27/14868H01L31/02164
    • When light enters a solid-state imaging device obliquely, the light passing an optical path which misses a photodiode part is gathered by a second microlens located in the lower part which directs the light more vertically. A convergent rate of the oblique incident light can be prevented from decreasing. In this way, a solid-state imaging device having high sensitivity ratio, less smear (stray light), and excellent image characteristics can be provided. A metal with a high melting point or a metal silicide film thereof is used as a photo-shielding film. After making the photo-shielding film thinner, a Boro-Phospho-Silicate-Glass (BPSG) film is provided on the entire surface. Then, the second microlens is directly formed on an element provided with a surface protective coating comprising SiO.sub.2, SiON, or SiN, and on top of that, a color filter and an intermediate transparent film are formed, and then a first microlens is formed thereon. The second microlens located in the lower part is formed using a material having a larger refractive index than that of the intermediate transparent film or the BPSG film.
    • 当光线倾斜地进入固态成像装置时,通过错过光电二极管部分的光路的光通过位于下部的第二微透镜聚集,其使光线更垂直地引导。 可以防止倾斜入射光的收敛速度降低。 以这种方式,可以提供具有高灵敏度比,少污迹(杂散光)和优异的图像特性的固态成像装置。 使用具有高熔点金属或其金属硅化物膜作为光屏蔽膜。 在使光屏蔽膜变薄之后,在整个表面上提供硼磷硅酸盐玻璃(BPSG)膜。 然后,将第二微透镜直接形成在具有包含SiO 2,SiON或SiN的表面保护涂层的元件上,并且在其上形成滤色器和中间透明膜,然后在其上形成第一微透镜 。 使用具有比中间透明膜或BPSG膜的折射率大的折射率的材料形成位于下部的第二微透镜。