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    • 6. 发明申请
    • IMAGE DISPLAY UNIT AND METHOD FOR MANUFACUTRE THE SAME
    • 图像显示单元及其制造方法
    • US20080093602A1
    • 2008-04-24
    • US11874955
    • 2007-10-19
    • Mieko MatsumuraYoshiaki ToyotaTakeshi SatoMutsuko Hatano
    • Mieko MatsumuraYoshiaki ToyotaTakeshi SatoMutsuko Hatano
    • H01L33/00
    • H01L29/4908G09G3/3233G09G2300/0842G09G2300/0861H01L27/124H01L27/1255H01L27/3244H01L29/41733H01L51/56
    • The present invention provides an image display unit, which can be manufactured in shorter time by designing a thin-film transistor, by which it is possible to reduce the number of processes of ion implantation and photolithographic processes. A gate electrode GT is designed in a laminated structure of a thin bottom layer metal film GMB and a top layer metal film GMT, and a top electrode of a storage capacitor Cst is designed to have only the bottom layer metal film GMB. Ion implanter for the bottom electrode of the storage capacitor Cst is passed through the thin bottom layer metal film GMB, and ion implantation is performed at the same time as the ion implantation of source-drain electrodes. The gate electrode of PMOSTFT has also only the bottom layer metal GMB, and the ion implantation for threshold adjustment is performed by using the same resist. By designing the thin-film transistor and the storage capacitor in such structure, one process each can be reduced in the photolithographic process and in the ion implantation process, and an active matrix substrate for an image display unit can be manufactured in shorter time and at lower cost.
    • 本发明提供了一种图像显示单元,其可以通过设计薄膜晶体管在较短时间内制造,由此可以减少离子注入和光刻工艺的处理次数。 栅电极GT被设计成薄底层金属膜GMB和顶层金属膜GMT的层叠结构,并且存储电容器Cst的顶电极被设计为仅具有底层金属膜GMB。 用于存储电容器Cst的底部电极的离子注入机通过薄的底层金属膜GMB,并且在与源极 - 漏极电极的离子注入同时进行离子注入。 PMOSTFT的栅极也仅具有底层金属GMB,并且通过使用相同的抗蚀剂来执行用于阈值调整的离子注入。 通过在这种结构中设计薄膜晶体管和存储电容器,可以在光刻工艺和离子注入工艺中减少一个工艺,并且可以在更短的时间和更短的时间内制造用于图像显示单元的有源矩阵基板 降低成本。
    • 7. 发明申请
    • DISPLAY DEVICE
    • 显示设备
    • US20100200858A1
    • 2010-08-12
    • US12702900
    • 2010-02-09
    • Yoshiaki ToyotaMieko MatsumuraMasatoshi Wakagi
    • Yoshiaki ToyotaMieko MatsumuraMasatoshi Wakagi
    • H01L33/16H01L33/08H01L27/15
    • H01L27/1214H01L29/04H01L29/42384H01L29/78618
    • A display device includes a plurality of thin-film transistors formed on a substrate on which a display area is formed. At least one of the plurality of thin-film transistors includes a gate electrode, agate insulating film formed to cover the gate electrode, an interlayer insulating film formed on an upper surface of the gate insulating film and having an opening formed in an area where the gate electrode is formed in plan view, a pair of heavily-doped semiconductor films arranged on an upper surface of the interlayer insulating film with the opening interposed therebetween, a polycrystalline semiconductor film formed across the opening and formed in the area, the polycrystalline semiconductor film being electrically connected to the pair of heavily-doped semiconductor films, and a pair of electrodes formed to overlap the pair of heavily-doped semiconductor films, respectively, without overlapping the polycrystalline semiconductor film.
    • 显示装置包括形成在其上形成有显示区域的基板上的多个薄膜晶体管。 多个薄膜晶体管中的至少一个包括形成为覆盖栅电极的栅电极,玛瑙绝缘膜,形成在栅极绝缘膜的上表面上的层间绝缘膜,并且具有形成在 在平面图中形成栅极电极,一对重掺杂半导体膜布置在层间绝缘膜的上表面上,其间插入有开口,多个半导体膜形成在该开口两边形成在该区域中,多晶半导体膜 电连接到一对重掺杂半导体膜,以及一对电极,分别与一对重掺杂半导体膜重叠,而不与多晶半导体膜重叠。
    • 8. 发明授权
    • Display device and method of manufacturing the same
    • 显示装置及其制造方法
    • US08258024B2
    • 2012-09-04
    • US12606284
    • 2009-10-27
    • Mieko MatsumuraMutsuko HatanoYoshiaki ToyotaTakuo Kaitoh
    • Mieko MatsumuraMutsuko HatanoYoshiaki ToyotaTakuo Kaitoh
    • H01L21/00H01L21/84
    • H01L27/1288H01L27/1214H01L27/3262H01L29/04H01L29/78696
    • The display device having a thin film transistor formed on a substrate including a display portion is provided. The thin film transistor including: a gate electrode; a gate insulating film formed so as to cover the gate electrode; a semiconductor laminated film formed on top the gate insulating film so as to extend over the gate electrode, the semiconductor laminated film being formed by laminating at least a polycrystalline semiconductor film and an amorphous semiconductor film, a first electrode and a second electrode disposed on top of the semiconductor laminated film so as to be opposed to each other across a region superposing the gate electrode. In the display device, the semiconductor laminated film is formed immediately below a wiring extending from the first electrode and immediately below a wiring extending from the second electrode.
    • 提供具有形成在包括显示部分的基板上的薄膜晶体管的显示装置。 该薄膜晶体管包括:栅电极; 形成为覆盖所述栅电极的栅极绝缘膜; 半导体层叠膜,形成在所述栅极绝缘膜的顶部上,以在所述栅极上延伸,所述半导体层叠膜通过层叠至少多晶半导体膜和非晶半导体膜,第一电极和设置在顶部的第二电极而形成 的半导体层叠膜,以跨越叠加栅电极的区域彼此相对。 在显示装置中,半导体层叠膜形成在从第一电极延伸的布线的正下方并且紧接在从第二电极延伸的布线的下方。
    • 9. 发明授权
    • Display device
    • 显示设备
    • US08309960B2
    • 2012-11-13
    • US12702900
    • 2010-02-09
    • Yoshiaki ToyotaMieko MatsumuraMasatoshi Wakagi
    • Yoshiaki ToyotaMieko MatsumuraMasatoshi Wakagi
    • H01L29/04H01L31/036H01L31/0376H01L31/20
    • H01L27/1214H01L29/04H01L29/42384H01L29/78618
    • A display device includes a plurality of thin-film transistors formed on a substrate on which a display area is formed. At least one of the plurality of thin-film transistors includes a gate electrode, agate insulating film formed to cover the gate electrode, an interlayer insulating film formed on an upper surface of the gate insulating film and having an opening formed in an area where the gate electrode is formed in plan view, a pair of heavily-doped semiconductor films arranged on an upper surface of the interlayer insulating film with the opening interposed therebetween, a polycrystalline semiconductor film formed across the opening and formed in the area, the polycrystalline semiconductor film being electrically connected to the pair of heavily-doped semiconductor films, and a pair of electrodes formed to overlap the pair of heavily-doped semiconductor films, respectively, without overlapping the polycrystalline semiconductor film.
    • 显示装置包括形成在其上形成有显示区域的基板上的多个薄膜晶体管。 多个薄膜晶体管中的至少一个包括形成为覆盖栅电极的栅电极,玛瑙绝缘膜,形成在栅极绝缘膜的上表面上的层间绝缘膜,并且具有形成在 在平面图中形成栅极电极,一对重掺杂半导体膜布置在层间绝缘膜的上表面上,其间插入有开口,多个半导体膜形成在该开口两边形成在该区域中,多晶半导体膜 电连接到一对重掺杂半导体膜,以及一对电极,分别与一对重掺杂半导体膜重叠,而不与多晶半导体膜重叠。
    • 10. 发明授权
    • Display device
    • 显示设备
    • US08378946B2
    • 2013-02-19
    • US12625640
    • 2009-11-25
    • Yoshiaki ToyotaMieko Matsumura
    • Yoshiaki ToyotaMieko Matsumura
    • G09G3/36
    • G02F1/1368
    • A display device includes a plurality of thin-film transistors formed on a substrate on which a display area is formed. The display device also includes a gate electrode, a gate insulating film formed so as to cover the gate electrode, an semiconductor layer in an island shape formed on an upper surface of the gate insulating film so as to superimpose the gate electrode without protruding from the gate electrode when viewed planarly, an insulating film formed so as to cover the semiconductor layer, and a pair of electrodes electrically connected to the semiconductor layer respectively through a pair of through holes that are formed at the insulating film. The semiconductor layer is formed by sequentially laminating a crystalline semiconductor layer and an amorphous semiconductor layer. The pair of electrodes is respectively formed by sequentially laminating a semiconductor layer doped with impurities and a metal layer.
    • 显示装置包括形成在其上形成有显示区域的基板上的多个薄膜晶体管。 显示装置还包括栅极电极,形成为覆盖栅极电极的栅极绝缘膜,形成在栅极绝缘膜的上表面上的岛状半导体层,以便叠置栅电极而不从 栅极电极,以覆盖半导体层的方式形成的绝缘膜,以及分别通过形成在绝缘膜上的一对通孔与半导体层电连接的一对电极。 半导体层通过依次层叠晶体半导体层和非晶半导体层而形成。 该对电极分别通过顺序层叠掺杂有杂质的半导体层和金属层而形成。