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1. 发明申请

US20130133030A1 PLATFORM AUTHENTICATION STRATEGY MANAGEMENT METHOD AND DEVICE FOR TRUSTED CONNECTION ARCHITECTURE 有权
标题翻译：平台认证策略管理方法和设备连接建筑
公开(公告)号：US20130133030A1
公开(公告)日：2013-05-23
申请号：US13813291
申请日：2011-05-26
申请人： Yonggang Xue , Runtian Kan , Yuelei Xiao , Jun Cao , Zhenhai Huang , Ke Wang , Guoqiang Zhang , Kelong Yuan , Lin Zhu , Xiaoyong Liu
发明人： Yonggang Xue , Runtian Kan , Yuelei Xiao , Jun Cao , Zhenhai Huang , Ke Wang , Guoqiang Zhang , Kelong Yuan , Lin Zhu , Xiaoyong Liu
IPC分类号： H04L29/06
CPC分类号： H04L63/20 , G06F21/57 , H04L63/0876 , H04L63/10 , H04L63/1433
摘要： Provided are a platform authentication strategy management method for trusted connection architecture (TCA), and the trusted network connection (TNC) client, TNC access point and evaluation strategy service provider for implementing the method in the TCA. In the embodiments of the present invention, the platform authentication strategy for the access requester can be configured in the TNC access point or the evaluation strategy service provider, and the platform authentication strategy for the access requester configured in the evaluation strategy service provider can be delivered to the TNC access point. Moreover, a component-type-level convergence platform evaluation strategy can be executed in the TNC access point or the evaluation strategy service provider, to ensure that the realization of the TCA platform authentication has good application extensibility.
摘要翻译：提供了一种用于可信连接架构（TCA）和可信网络连接（TNC）客户端，TNC接入点和评估策略服务提供商的平台认证策略管理方法，用于在TCA中实现该方法。在本发明的实施例中，可以在TNC接入点或评估策略服务提供者中配置用于接入请求者的平台认证策略，并且可以在评估策略服务提供商中配置的接入请求者的平台认证策略到TNC接入点。此外，TNC接入点或评估策略服务提供商可以执行组件级融合平台评估策略，确保TCA平台认证的实现具有良好的应用可扩展性。

2. 发明授权

US09246942B2 Platform authentication strategy management method and device for trusted connection architecture 有权
标题翻译：平台认证策略管理方法和可信连接体系结构的设备
公开(公告)号：US09246942B2
公开(公告)日：2016-01-26
申请号：US13813291
申请日：2011-05-26
申请人： Yonggang Xue , Runtian Kan , Yuelei Xiao , Jun Cao , Zhenhai Huang , Ke Wang , Guoqiang Zhang , Kelong Yuan , Lin Zhu , Xiaoyong Liu
发明人： Yonggang Xue , Runtian Kan , Yuelei Xiao , Jun Cao , Zhenhai Huang , Ke Wang , Guoqiang Zhang , Kelong Yuan , Lin Zhu , Xiaoyong Liu
IPC分类号： H04L29/06 , G06F21/57
CPC分类号： H04L63/20 , G06F21/57 , H04L63/0876 , H04L63/10 , H04L63/1433
摘要： Provided are a platform authentication strategy management method for trusted connection architecture (TCA), and the trusted network connection (TNC) client, TNC access point and evaluation strategy service provider for implementing the method in the TCA. In the embodiments of the present invention, the platform authentication strategy for the access requester can be configured in the TNC access point or the evaluation strategy service provider, and the platform authentication strategy for the access requester configured in the evaluation strategy service provider can be delivered to the TNC access point. Moreover, a component-type-level convergence platform evaluation strategy can be executed in the TNC access point or the evaluation strategy service provider, to ensure that the realization of the TCA platform authentication has good application extensibility.
摘要翻译：提供了一种用于可信连接架构（TCA）和可信网络连接（TNC）客户端，TNC接入点和评估策略服务提供商的平台认证策略管理方法，用于在TCA中实现该方法。在本发明的实施例中，可以在TNC接入点或评估策略服务提供者中配置用于接入请求者的平台认证策略，并且可以在评估策略服务提供商中配置的接入请求者的平台认证策略到TNC接入点。此外，TNC接入点或评估策略服务提供商可以执行组件级融合平台评估策略，确保TCA平台认证的实现具有良好的应用可扩展性。

3. 发明申请

US20060187402A1 Stressed liquid crystals materials for light modulation 有权
公开(公告)号：US20060187402A1
公开(公告)日：2006-08-24
申请号：US11299993
申请日：2005-12-12
申请人： John West , Anatoliy Glushchenko , Guoqiang Zhang
发明人： John West , Anatoliy Glushchenko , Guoqiang Zhang
IPC分类号： C09K19/02
CPC分类号： G02F1/1334 , C09K19/542 , G02F2203/50 , Y10T29/49117
摘要： A new light modulating material using interconnected unidirectionally oriented microdomains of a liquid crystal, dispersed in a stressed polymer structure, is provided. The light modulating material is prepared by dissolving the liquid crystal in an uncured monomer and then curing the monomer so that the polymer forms a well-developed interpenetrating structure of polymer chains or sheets that is uniformly dispersed through the film. When the film is subjected to stress deformation the liquid crystal undergoes a change in its unidirectional orientation. The concentration of the polymer is high enough to hold the shear stress, but is as low as possible to provide the highest switch of the phase retardation when an electric field is applied. The new materials are optically transparent and provide phase modulation of the incident light opposed to the low driving voltage, linear electro-optical response, and absence of hysteresis. It has been shown that these new materials may be successfully used in display applications, optical modulator, and beam steering devices.

4. 发明授权

US08853054B2 Method of manufacturing silicon-on-insulator wafers 有权
标题翻译：绝缘体上硅晶片的制造方法
公开(公告)号：US08853054B2
公开(公告)日：2014-10-07
申请号：US13413284
申请日：2012-03-06
申请人： Guoqiang Zhang , Jeffrey L. Libbert
发明人： Guoqiang Zhang , Jeffrey L. Libbert
IPC分类号： H01L21/46 , H01L21/30
CPC分类号： H01L21/2007
摘要： A method is provided for preparing multilayer semiconductor structures, such as silicon-on-insulator wafers, having reduced warp and bow. Reduced warp multilayer semiconductor structures are prepared by forming a dielectric structure on the exterior surfaces of a bonded pair of a semiconductor device substrate and a semiconductor handle substrate having an intervening dielectric layer therein. Forming a dielectric layer on the exterior surfaces of the bonded pair offsets stresses that may occur within the bulk of the semiconductor handle substrate due to thermal mismatch between the semiconductor material and the intervening dielectric layer as the structure cools from process temperatures to room temperatures.
摘要翻译：提供了一种制备多层半导体结构的方法，例如绝缘体上硅晶片，具有减少的经线和弓形。通过在半导体器件基板的接合对的外表面和其中具有中间介电层的半导体处理基板上形成介电结构来制备经折叠的多层半导体结构。在结合对的外表面上形成电介质层，由于半导体材料和中间介电层之间的热失配，当结构从工艺温度冷却到室温时，偏移应力可能发生在半导体处理衬底本体内。

5. 发明申请

US20130212390A1 METHOD AND SYSTEM FOR AUTHENTICATING ENTITY BASED ON SYMMETRIC ENCRYPTION ALGORITHM 有权
标题翻译：基于对称加密算法认证实体的方法和系统
公开(公告)号：US20130212390A1
公开(公告)日：2013-08-15
申请号：US13879619
申请日：2010-12-22
申请人： Zhiqiang Du , Manxia Tie , Guoqiang Zhang , Qin Li
发明人： Zhiqiang Du , Manxia Tie , Guoqiang Zhang , Qin Li
IPC分类号： H04L9/32
CPC分类号： H04L9/32 , H04L9/3271 , H04W12/06
摘要： A method and a system for authenticating an entity based on a symmetric encryption algorithm are provided. The method includes the following steps: 1) an entity A sends an authentication request message to an entity B; 2) after receiving the authentication request message, the entity B sends an authentication response message to the entity A; 3) the entity A determines the validity of the entity B according to the received authentication response message. The implementation cost of the system can be reduced by using the authentication according to the invention.
摘要翻译：提供了一种基于对称加密算法认证实体的方法和系统。该方法包括以下步骤：1）实体A向实体B发送认证请求消息; 2）接收到认证请求报文后，实体B向实体A发送认证响应消息; 3）实体A根据收到的认证响应消息确定实体B的有效性。通过使用根据本发明的认证可以减少系统的实现成本。

6. 发明授权

US08054413B2 Stressed liquid crystals materials for light modulation 有权
标题翻译：强调液晶材料进行光调制
公开(公告)号：US08054413B2
公开(公告)日：2011-11-08
申请号：US12559872
申请日：2009-09-15
申请人： John L. West , Anatoliy Glushchenko , Guoqiang Zhang
发明人： John L. West , Anatoliy Glushchenko , Guoqiang Zhang
IPC分类号： G02F1/1333 , G02F1/13
CPC分类号： G02F1/1334 , C09K19/542 , G02F2203/50 , Y10T29/49117
摘要： A new light modulating material using interconnected unidirectionally oriented microdomains of a liquid crystal, dispersed in a stressed polymer structure, is provided. The light modulating material is prepared by dissolving the liquid crystal in an uncured monomer and then curing the monomer so that the polymer forms a well-developed interpenetrating structure of polymer chains or sheets that is uniformly dispersed through the film. When the film is subjected to stress deformation the liquid crystal undergoes a change in its unidirectional orientation. The concentration of the polymer is high enough to hold the shear stress, but is as low as possible to provide the highest switch of the phase retardation when an electric field is applied. The new materials are optically transparent and provide phase modulation of the incident light opposed to the low driving voltage, linear electro-optical response, and absence of hysteresis. It has been shown that these new materials may be successfully used in display applications, optical modulator, and beam steering devices.
摘要翻译：提供了使用分散在应力聚合物结构中的液晶的相互连接的单向定向微区域的新的光调制材料。光调制材料通过将液晶溶解在未固化的单体中然后固化单体来制备，使得聚合物形成均匀地分散在膜中的聚合物链或片材的良好发展的互穿结构。当膜受到应力变形时，液晶经历其单向取向的变化。聚合物的浓度足够高以保持剪切应力，但是当施加电场时，尽可能低地提供相位延迟的最高开关。新材料是光学透明的，并且提供与低驱动电压相对的入射光的相位调制，线性电光响应和不存在滞后。已经表明这些新材料可以成功地用于显示应用，光学调制器和光束转向装置中。

7. 发明授权

US09450756B2 Method and system for authenticating entity based on symmetric encryption algorithm 有权
标题翻译：基于对称加密算法认证实体的方法和系统
公开(公告)号：US09450756B2
公开(公告)日：2016-09-20
申请号：US13879619
申请日：2010-12-22
申请人： Zhiqiang Du , Manxia Tie , Guoqiang Zhang , Qin Li
发明人： Zhiqiang Du , Manxia Tie , Guoqiang Zhang , Qin Li
IPC分类号： H04L9/32 , H04W12/06
CPC分类号： H04L9/32 , H04L9/3271 , H04W12/06
摘要： A method and a system for authenticating an entity based on a symmetric encryption algorithm are provided. The method includes the following steps: 1) an entity A sends an authentication request message to an entity B; 2) after receiving the authentication request message, the entity B sends an authentication response message to the entity A; 3) the entity A determines the validity of the entity B according to the received authentication response message. The implementation cost of the system can be reduced by using the authentication according to the invention.
摘要翻译：提供了一种基于对称加密算法认证实体的方法和系统。该方法包括以下步骤：1）实体A向实体B发送认证请求消息; 2）接收到认证请求报文后，实体B向实体A发送认证响应消息; 3）实体A根据收到的认证响应消息确定实体B的有效性。通过使用根据本发明的认证可以减少系统的实现成本。

8. 发明授权

US08192248B2 Semiconductor wafer polishing apparatus and method of polishing 有权
标题翻译：半导体晶片抛光装置及抛光方法
公开(公告)号：US08192248B2
公开(公告)日：2012-06-05
申请号：US12130190
申请日：2008-05-30
申请人： Peter D. Albrecht , Guoqiang Zhang
发明人： Peter D. Albrecht , Guoqiang Zhang
IPC分类号： B24B1/00
CPC分类号： B24B37/30
摘要： A wafer polishing apparatus has a base and a turntable having a polishing pad thereon and mounted on the base for rotation of the turntable and polishing pad relative to the base about an axis perpendicular to the turntable and polishing pad. The polishing pad includes a work surface engageable with a front surface of a wafer for polishing the front surface of the wafer. A drive mechanism is mounted on the base for imparting rotational motion about an axis substantially parallel to the axis of the turntable. A polishing head is connected to the drive mechanism for driving rotation of the polishing head. The polishing head has a pressure plate adapted to hold the wafer for engaging the front surface of the wafer with the work surface of the polishing pad. The pressure plate has a generally planar position and is selectively movable from the planar position to a convex position and to a concave position.
摘要翻译：晶片抛光装置具有基座和转盘，其上具有抛光垫，并且安装在基座上，用于使旋转台和抛光垫相对于垂直于转盘和抛光垫的轴线相对于基座旋转。抛光垫包括可与晶片的前表面接合的工作表面，用于抛光晶片的前表面。驱动机构安装在基座上，用于绕基本上平行于转台的轴线的轴线进行旋转运动。抛光头连接到用于驱动抛光头旋转的驱动机构。抛光头具有适于保持晶片的压板，用于与晶片的前表面接合抛光垫的工作表面。压板具有大致平面的位置，并且可以从平面位置选择性地移动到凸形位置和凹入位置。

9. 发明授权

US07938982B2 Silicon wafer etching compositions 有权
标题翻译：硅晶片蚀刻组合物
公开(公告)号：US07938982B2
公开(公告)日：2011-05-10
申请号：US11968381
申请日：2008-01-02
申请人： Mark G. Stinson , Henry F. Erk , Guoqiang Zhang
发明人： Mark G. Stinson , Henry F. Erk , Guoqiang Zhang
IPC分类号： C09K13/08
CPC分类号： H01L21/30608 , C09K13/02 , C11D7/265 , C11D7/3245 , C11D11/0047 , H01L21/02019
摘要： A process for etching silicon wafers using a caustic etchant in the form of an aqueous solution comprising water, a hydroxide ion source, and a chelating agent. The process produces silicon wafers substantially free from diffused metal ions.
摘要翻译：使用包含水，氢氧根离子源和螯合剂的水溶液形式的苛性蚀刻剂来蚀刻硅晶片的方法。该方法产生基本上不含扩散金属离子的硅晶片。

10. 发明申请

US20090298399A1 SEMICONDUCTOR WAFER POLISHING APPARATUS AND METHOD OF POLISHING 有权
标题翻译：半导体波长抛光装置和抛光方法
公开(公告)号：US20090298399A1
公开(公告)日：2009-12-03
申请号：US12130190
申请日：2008-05-30
申请人： Peter D. Albrecht , Guoqiang Zhang
发明人： Peter D. Albrecht , Guoqiang Zhang
IPC分类号： B24B9/00
CPC分类号： B24B37/30
摘要： A wafer polishing apparatus has a base and a turntable having a polishing pad thereon and mounted on the base for rotation of the turntable and polishing pad relative to the base about an axis perpendicular to the turntable and polishing pad. The polishing pad includes a work surface engageable with a front surface of a wafer for polishing the front surface of the wafer. A drive mechanism is mounted on the base for imparting rotational motion about an axis substantially parallel to the axis of the turntable. A polishing head is connected to the drive mechanism for driving rotation of the polishing head. The polishing head has a pressure plate adapted to hold the wafer for engaging the front surface of the wafer with the work surface of the polishing pad. The pressure plate has a generally planar position and is selectively movable from the planar position to a convex position and to a concave position.
摘要翻译：晶片抛光装置具有基座和转盘，其上具有抛光垫，并且安装在基座上，用于使旋转台和抛光垫相对于垂直于转盘和抛光垫的轴线相对于基座旋转。抛光垫包括可与晶片的前表面接合的工作表面，用于抛光晶片的前表面。驱动机构安装在基座上，用于绕基本上平行于转台的轴线的轴线进行旋转运动。抛光头连接到用于驱动抛光头旋转的驱动机构。抛光头具有适于保持晶片的压板，用于与晶片的前表面接合抛光垫的工作表面。压板具有大致平面的位置，并且可以从平面位置选择性地移动到凸形位置和凹入位置。

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