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1. 发明授权

US06802753B1 METHOD FOR MANUFACTURING ELECTRON BEAM DEVICE, METHOD FOR MANUFACTURING IMAGE FORMING APPARATUS, ELECTRON BEAM DEVICE AND IMAGE FORMING APPARATUS MANUFACTURED THOSE MANUFACTURING METHODS, METHOD AND APPARATUS FOR MANUFACTURING ELECTRON SOURCE, AND APPARATUS FOR MANUFACTURING IMAGE FORMING APPARATUS 失效
标题翻译：用于制造电子束装置的方法，用于制造图像形成装置的方法，电子束装置和制造装置的图像形成装置的制造方法，用于制造电子源的方法和装置以及用于制造图像形成装置的装置
公开(公告)号：US06802753B1
公开(公告)日：2004-10-12
申请号：US09722454
申请日：2000-11-28
申请人： Yoichi Ando , Keisuke Yamamoto , Hideshi Kawasaki , Tamaki Kobayashi , Satoshi Mogi , Akira Hayama
发明人： Yoichi Ando , Keisuke Yamamoto , Hideshi Kawasaki , Tamaki Kobayashi , Satoshi Mogi , Akira Hayama
IPC分类号： H01J900
CPC分类号： H01J9/027 , H01J2209/0223
摘要： In a manufacturing process of an image forming apparatus (electron beam device) using electron emission elements, particularly, surface conduction type electron emission elements, wirings on an electron source substrate on which the wirings and element electrodes are formed are opposite to electrodes for a face plate, and a given voltage is applied between the wirings and the electrodes to thereby generate a discharge phenomenon in advance, thus removing a protrusion or the like. In this way, when an electric field applying process is conducted on the electron source substrate, a factor such as a protrusion in an electron source which induces a discharge phenomenon in driving an electron beam device represented by an image forming apparatus is removed, thus realizing an image forming apparatus excellent in display characteristic with no defective pixel even in image display for a long period of time.
摘要翻译：在使用电子发射元件，特别是表面传导型电子发射元件的图像形成装置（电子束装置）的制造方法中，形成有布线和元件电极的电子源基板上的布线与面对的电极相对并且在布线和电极之间施加给定的电压，从而预先产生放电现象，从而去除突起等。以这种方式，当在电子源基板上进行电场施加处理时，去除了在驱动由图像形成装置表示的电子束装置中引起放电现象的电子源中的突起等因素，从而实现即使在长时间的图像显示中，也不会出现缺陷像素的显示特性优异的图像形成装置。

2. 发明授权

US07449828B2 Image forming apparatus provided with resistive-coated spacers contacting protruding sections of wiring elements 失效
标题翻译：图像形成装置具有与布线元件的突出部分接触的电阻涂覆间隔物
公开(公告)号：US07449828B2
公开(公告)日：2008-11-11
申请号：US11470876
申请日：2006-09-07
申请人： Yoichi Ando , Osamu Takamatsu , Taro Hiroike , Akira Hayama
发明人： Yoichi Ando , Osamu Takamatsu , Taro Hiroike , Akira Hayama
IPC分类号： H01J1/62 , H01J63/04
CPC分类号： H01J29/02 , H01J31/12
摘要： In order to prevent a spacer from being charged by using a plate shaped spacer covered with a high resistance film, the present invention is aimed at preventing irregular displacements of electron beams emitted from adjacent electron-emitting devices and suppressing displacements of impinging positions of the electron beams emitted from the adjacent electron-emitting devices even with a slight displacement of an installation position of the spacer. The spacer is disposed along a row directional wiring. The high resistance film is allowed to come into contact with a metal back and the row directional wiring to achieve electrical connection therebetween. Contact portions between the high resistance film of the spacer and the row directional wiring are provided at predetermined intervals.
摘要翻译：为了通过使用覆盖有高电阻膜的板状隔离物来防止间隔物的充电，本发明旨在防止从相邻的电子发射器件发射的电子束的不规则位移并且抑制电子的入射位置的位移即使是间隔件的安装位置的轻微位移，也从相邻的电子发射器件发射的光束。间隔件沿着行方向布线布置。允许高电阻膜与金属背和行方向布线接触以实现其间的电连接。间隔物的高电阻膜与行方向布线之间的接触部分以预定间隔设置。

3. 发明授权

US07138758B2 Image forming apparatus having a high-resistance coated spacer in electrical contact with wirings components at predetermined intervals 失效
标题翻译：图像形成装置具有以预定间隔与布线部件电接触的高电阻涂覆间隔物
公开(公告)号：US07138758B2
公开(公告)日：2006-11-21
申请号：US10833124
申请日：2004-04-28
申请人： Yoichi Ando , Osamu Takamatsu , Taro Hiroike , Akira Hayama
发明人： Yoichi Ando , Osamu Takamatsu , Taro Hiroike , Akira Hayama
IPC分类号： H01J1/62 , H01J63/04
CPC分类号： H01J29/02 , H01J31/12
摘要： In order to prevent a spacer from being charged by using a plate shaped spacer covered with a high resistance film, the present invention is aimed at preventing irregular displacements of electron beams emitted from adjacent electron-emitting devices and suppressing displacements of impinging positions of the electron beams emitted from the adjacent electron-emitting devices even with a slight displacement of an installation position of the spacer. The spacer is disposed along a row directional wiring. The high resistance film is allowed to come into contact with a metal back and the row directional wiring to achieve electrical connection therebetween. Contact portions between the high resistance film of the spacer and the row directional wiring are provided at predetermined intervals.
摘要翻译：为了通过使用覆盖有高电阻膜的板状隔离物来防止间隔物的充电，本发明旨在防止从相邻的电子发射器件发射的电子束的不规则位移并且抑制电子的入射位置的位移即使是间隔件的安装位置的轻微位移，也从相邻的电子发射器件发射的光束。间隔件沿着行方向布线布置。允许高电阻膜与金属背和行方向布线接触以实现其间的电连接。间隔物的高电阻膜与行方向布线之间的接触部分以预定间隔设置。

4. 发明申请

US20070018560A1 IMAGE FORMING APPARATUS 失效
标题翻译：图像形成装置
公开(公告)号：US20070018560A1
公开(公告)日：2007-01-25
申请号：US11470876
申请日：2006-09-07
申请人： Yoichi Ando , Osamu Takamatsu , Taro Hiroike , Akira Hayama
发明人： Yoichi Ando , Osamu Takamatsu , Taro Hiroike , Akira Hayama
IPC分类号： H01J63/04 , H01J1/62
CPC分类号： H01J29/02 , H01J31/12
摘要： In order to prevent a spacer from being charged by using a plate shaped spacer covered with a high resistance film, the present invention is aimed at preventing irregular displacements of electron beams emitted from adjacent electron-emitting devices and suppressing displacements of impinging positions of the electron beams emitted from the adjacent electron-emitting devices even with a slight displacement of an installation position of the spacer. The spacer is disposed along a row directional wiring. The high resistance film is allowed to come into contact with a metal back and the row directional wiring to achieve electrical connection therebetween. Contact portions between the high resistance film of the spacer and the row directional wiring are provided at predetermined intervals.
摘要翻译：为了通过使用覆盖有高电阻膜的板状隔离物来防止间隔物的充电，本发明旨在防止从相邻的电子发射器件发射的电子束的不规则位移并且抑制电子的入射位置的位移即使是间隔件的安装位置的轻微位移，也从相邻的电子发射器件发射的光束。间隔件沿着行方向布线布置。允许高电阻膜与金属背和行方向布线接触以实现其间的电连接。间隔物的高电阻膜与行方向布线之间的接触部分以预定间隔设置。

5. 发明授权

US07429821B2 Image display apparatus 失效
标题翻译：图像显示装置
公开(公告)号：US07429821B2
公开(公告)日：2008-09-30
申请号：US11139488
申请日：2005-05-31
申请人： Yoichi Ando
发明人： Yoichi Ando
IPC分类号： H01J1/62 , H01J63/04
CPC分类号： H01J29/04 , H01J1/316 , H01J29/028 , H01J29/864 , H01J31/127 , H01J2201/3165 , H01J2329/8625 , H01J2329/864 , H01J2329/8645 , H01J2329/8665
摘要： An irregular shift of the electron beam caused by a spacer is compensated without making a design change of the spacer. A rear plate 1 in which an electron source substrate 9 disposed with plural electron-emitting devices 8 emitting the electron is fixed and a face plate 2 in which a metal back 11 for accelerating the electron is formed are disposed in opposition to each other, and these plates are supported by the spacers 3 with constant intervals, and the initial velocity vector of the electron emitted from the electron-emitting device 8 is different according to the distance from the spacer 3.
摘要翻译：由间隔物引起的电子束的不规则偏移被补偿，而不会使间隔物的设计变化。设置有发射电子的多个电子发射器件8的电子源衬底9被固定的后板1和形成用于加速电子的金属背11的面板2彼此相对设置，并且这些板由间隔件3以恒定的间隔支撑，并且从电子发射器件8发射的电子的初始速度矢量根据与间隔件3的距离而不同。

6. 发明授权

US07075223B2 Electron beam apparatus with potential specifying plate structure 失效
标题翻译：具有电位指定板结构的电子束装置
公开(公告)号：US07075223B2
公开(公告)日：2006-07-11
申请号：US10684374
申请日：2003-10-15
申请人： Yoichi Ando
发明人： Yoichi Ando
IPC分类号： H01J1/62 , H01J63/04
CPC分类号： H01J29/028 , H01J29/46 , H01J31/127 , H01J2329/8625
摘要： In an electron beam apparatus including an electron source and an electron beam irradiation member, a potential specifying plate including openings through which an electron transmits is provided between the electron source and the electron beam irradiation member. A spacer is located between the electron beam irradiation member and the potential specifying plate. In the case where a distance between a region between one opening of the potential specifying plate near the spacer and the spacer and the electron beam irradiation member is D1 and a distance between a region between that opening and another opening not near the spacer and the electron beam irradiation member is given by D2, if D1
摘要翻译：在包括电子源和电子束照射构件的电子束装置中，在电子源和电子束照射构件之间设置包括电子透过的开口的电位指定板。间隔物位于电子束照射构件和电位指定板之间。在电位指定板的靠近隔离物的一个开口与间隔物之间的区域与电子束照射构件之间的距离为D 1和该开口与不在间隔物附近的另一个开口之间的距离的情况下，电子束照射部件由D 2给出，如果满足D 1

7. 发明授权

US07005797B2 Image forming apparatus 失效
标题翻译：图像形成装置
公开(公告)号：US07005797B2
公开(公告)日：2006-02-28
申请号：US10846704
申请日：2004-05-17
申请人： Yoichi Ando
发明人： Yoichi Ando
IPC分类号： H01J1/62 , H01J63/04
CPC分类号： H01J29/92 , H01J29/028 , H01J29/864 , H01J31/127 , H01J2329/8625 , H01J2329/864 , H01J2329/8645
摘要： An image forming apparatus comprises first and second substrates, a support frame arranged between the first and second substrates, and surrounding a space between the first and second substrates, electron emitting devices arranged on the first substrate facing the space, and an image forming member arranged on the second substrate. A spacer is disposed in the space between the first and second substrates, and a conductive film is arranged on the second substrate to surround the image forming member. The conductive film is supplied with a potential lower than that applied to the image forming member, and the spacer has a length greater than that of the image forming member. Each longitudinal end of the spacer is arranged between the inner periphery of the support frame and a respective plane through which a corresponding end of the conductive film extends perpendicularly to a principal surface of the second substrate.
摘要翻译：图像形成装置包括第一和第二基板，布置在第一和第二基板之间并且围绕第一和第二基板之间的空间的支撑框架，布置在面向空间的第一基板上的电子发射器件，以及布置成在第二基板上。间隔件设置在第一和第二基板之间的空间中，并且导电膜布置在第二基板上以包围图像形成部件。所述导电膜的电位低于施加到所述图像形成部件的电位，并且所述间隔物的长度大于所述图像形成部件的长度。间隔件的每个纵向端部布置在支撑框架的内周边和相应的平面之间，导电膜的相应端部通过该平面垂直于第二基板的主表面延伸。

8. 发明授权

US06946786B2 Electron beam device with spacer 失效
标题翻译：带间隔器的电子束装置
公开(公告)号：US06946786B2
公开(公告)日：2005-09-20
申请号：US10173603
申请日：2002-06-19
申请人： Yoichi Ando
发明人： Yoichi Ando
IPC分类号： H01J29/02 , H01J29/86 , H01J31/12 , H01J1/62
CPC分类号： H01J29/028 , H01J29/864 , H01J31/127 , H01J2329/863 , H01J2329/864 , H01J2329/8645 , H01J2329/865 , H01J2329/8655 , H01J2329/866
摘要： An electron beam device comprising an electron source having an electron-emitting device, a member to be irradiated with an electron beam disposed opposite to the electron source, and an electrically conductive spacer disposed between the electron source and the member to be irradiated with the electron beam, is characterized in that an electrode is disposed along an end portion of the spacer on the electron source side, and the electrode is disposed inside a region of a surface of the end portion of the spacer which is directed toward the electron source side.
摘要翻译：一种电子束装置，包括具有电子发射器件的电子源，与电子源相对设置的电子束照射的部件，以及设置在电子源和被照射电子元件之间的导电间隔物其特征在于，沿着所述间隔物的电子源侧的端部设置电极，并且所述电极设置在所述间隔物的朝向所述电子源侧的端部的表面的区域的内侧。

9. 发明授权

US06878028B1 Method of fabricating electron source and image forming apparatus 失效
标题翻译：电子源制作方法及成像装置
公开(公告)号：US06878028B1
公开(公告)日：2005-04-12
申请号：US09523598
申请日：2000-03-10
申请人： Akira Fujii , Fumio Kishi , Hisaaki Kawade , Yoichi Ando
发明人： Akira Fujii , Fumio Kishi , Hisaaki Kawade , Yoichi Ando
IPC分类号： H01J9/02 , H01J9/00
CPC分类号： H01J9/027 , H01J2329/00
摘要： A method of fabricating an electron source constituted by a plurality of x-direction wirings arranged on a substrate, a plurality of y-direction wirings crossing the x-direction wirings, an insulating layer for electrically insulating the x- and y-direction wirings, and a plurality of conductive films each of which is electrically connected to the x- and y-direction wirings and has a gap, comprises a conductive film formation step of forming a plurality of conductive films to be connected to the pluralities of x- and y-direction wirings, a grouping step of dividing all the x-direction wirings into a plurality of groups, and a forming step of sequentially performing, for all the groups, a step of simultaneously applying a voltage to all wirings assigned to the same group, thereby forming gaps in the plurality of conductive films. The grouping step includes the steps of assigning a plurality of wirings to each group, and arranging wirings constituting a group between wirings constituting other groups.
摘要翻译：一种制造电子源的方法，所述电子源由布置在基板上的多个x方向布线，与x方向布线交叉的多个y方向布线构成，用于将x和y方向布线电绝缘的绝缘层，以及多个导电膜，每个导电膜电连接到x和y方向布线并具有间隙，包括形成多个导电膜以与多个x和y连接的导电膜形成步骤方向布线，将所有x方向布线分成多个组的分组步骤;以及对于所有组，顺序执行分配给同一组的所有布线同时施加电压的步骤的形成步骤，从而在多个导电膜中形成间隙。分组步骤包括以下步骤：将多个布线分配给每个组，以及在构成其他组的布线之间布置构成组的布线。

10. 发明授权

US06534911B1 Electron beam device 有权
公开(公告)号：US06534911B1
公开(公告)日：2003-03-18
申请号：US09722702
申请日：2000-11-28
申请人： Yoichi Ando
发明人： Yoichi Ando
IPC分类号： H01J162
CPC分类号： H01J29/028 , H01J29/864 , H01J31/127 , H01J2329/863 , H01J2329/864 , H01J2329/8645 , H01J2329/865 , H01J2329/8655 , H01J2329/866
摘要： An electron beam device comprising an electron source having an electron-emitting device, a member to be irradiated with an electron beam disposed opposite to the electron source, and an electrically conductive spacer disposed between the electron source and the member to be irradiated with the electron beam, is characterized in that an electrode is disposed along an end portion of the spacer on the electron source side, and the electrode is disposed inside a region of a surface of the end portion of the spacer which is directed toward the electron source side.

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