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1. 发明授权

US08072705B1 Method and system for providing a magnetic writer using a BARC 有权
标题翻译：使用BARC提供磁性写入器的方法和系统
公开(公告)号：US08072705B1
公开(公告)日：2011-12-06
申请号：US11803071
申请日：2007-05-11
申请人： Yizhong Wang , Hong Zhang , Hai Sun , Hongping Yuan , Winnie Yu
发明人： Yizhong Wang , Hong Zhang , Hai Sun , Hongping Yuan , Winnie Yu
IPC分类号： G11B5/147
CPC分类号： G11B5/1278 , G11B5/3133 , G11B5/3163
摘要： A method and system for providing a magnetic writer are described. The method and system include providing a bottom antireflective coating (BARC) on a portion of the magnetic writer. The BARC has a low reflectivity. The method and system also include providing a barrier layer on at least a portion of the BAR and providing a mask on at least a portion of the barrier layer. The barrier layer isolates the BARC from the mask.
摘要翻译：描述了一种用于提供磁性写入器的方法和系统。该方法和系统包括在磁性写入器的一部分上提供底部抗反射涂层（BARC）。 BARC具有低反射率。所述方法和系统还包括在所述BAR的至少一部分上提供阻挡层并在所述阻挡层的至少一部分上提供掩模。阻挡层将BARC与掩模隔离。

2. 发明授权

US07846643B1 Method and system for providing a structure in a microelectronic device using a chromeless alternating phase shift mask 有权
标题翻译：在使用无铬交替相移掩模的微电子器件中提供结构的方法和系统
公开(公告)号：US07846643B1
公开(公告)日：2010-12-07
申请号：US11934599
申请日：2007-11-02
申请人： Hai Sun , Winnie Yu , Hongping Yuan , Yizhong Wang , Xianzhong Zeng
发明人： Hai Sun , Winnie Yu , Hongping Yuan , Yizhong Wang , Xianzhong Zeng
IPC分类号： G03F1/00
CPC分类号： G11B5/3906 , B82Y25/00 , G01R33/093 , G03F1/30 , G03F1/34
摘要： A method and system for providing a microelectric device, such as a magnetoresistive read sensor are described. The method and system include providing a mask layer on the microelectric device. The method and system further include exposing the mask layer to provide a mask. A portion of the mask covers a portion of the microelectric device. The step of exposing the mask layer further includes utilizing a chromeless alt-phase shift mask for providing the portion of the mask.
摘要翻译：描述了一种用于提供诸如磁阻读取传感器的微电子装置的方法和系统。该方法和系统包括在微电子器件上提供掩模层。该方法和系统还包括曝光掩模层以提供掩模。掩模的一部分覆盖微电子器件的一部分。暴露掩模层的步骤进一步包括利用无铬替代相位掩模来提供掩模的该部分。

3. 发明授权

US07829264B1 Method and system for providing a microelectronic device using a plurality of focus distances 有权
标题翻译：使用多个聚焦距离提供微电子器件的方法和系统
公开(公告)号：US07829264B1
公开(公告)日：2010-11-09
申请号：US11836629
申请日：2007-08-09
申请人： Yizhong Wang , Hai Sun , Hongping Yuan , Winnie Yu
发明人： Yizhong Wang , Hai Sun , Hongping Yuan , Winnie Yu
IPC分类号： G03F7/20
CPC分类号： G11B5/3163 , G03F7/70333 , G11B5/1278 , G11B5/1871 , G11B5/3116
摘要： A method and system for providing a microelectric device are described. The method and system include providing a photoresist layer having a surface. The method and system also include setting a focus range and exposing the photoresist layer over the focus range to form a photoresist mask having a trench therein. The focus range corresponding to a plurality of focus distances. The focus range also corresponds to a nonzero angle to be formed in the photoresist layer and to the structure. The trench has at least one sidewall that forms the angle with a normal to the surface. The method and system also include providing the structure utilizing the trench.
摘要翻译：描述了一种用于提供微电子器件的方法和系统。该方法和系统包括提供具有表面的光致抗蚀剂层。该方法和系统还包括设置聚焦范围并使光致抗蚀剂层在聚焦范围上曝光以形成其中具有沟槽的光致抗蚀剂掩模。对焦范围对应于多个聚焦距离。对焦范围也对应于在光致抗蚀剂层和结构中形成的非零角度。沟槽具有至少一个与表面垂直的角度形成的侧壁。该方法和系统还包括利用沟槽提供结构。

4. 发明授权

US07785666B1 Methods for fabricating a magnetic recording device 有权
标题翻译：制造磁记录装置的方法
公开(公告)号：US07785666B1
公开(公告)日：2010-08-31
申请号：US11955266
申请日：2007-12-12
申请人： Hai Sun , Liubo Hong , Hongping Yuan , Yizhong Wang , Winnie Yu , Xianzhong Zeng
发明人： Hai Sun , Liubo Hong , Hongping Yuan , Yizhong Wang , Winnie Yu , Xianzhong Zeng
IPC分类号： B05D1/32
CPC分类号： G11B5/855 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A method and system for fabricating a magnetic recording device are described. The method and system include providing a mask layer on the magnetic recording device and imprinting a pattern in the mask layer to form a mask. The method and system also include transferring the pattern from the mask to the magnetic recording device. In another aspect, the method and system include providing a malleable mask layer on the magnetic recording device. In this aspect, the method and system also include depressing an imprint mask into the mask layer and curing the mask layer while the imprint mask is depressed into the mask layer to provide a mask having a pattern. The pattern may correspond to a read sensor and/or a perpendicular magnetic recording pole. The method and system also include transferring the pattern from the mask to the magnetic recording device.
摘要翻译：描述了用于制造磁记录装置的方法和系统。所述方法和系统包括在磁记录装置上设置掩模层并在掩模层中印刷图案以形成掩模。该方法和系统还包括将图案从掩模转移到磁记录装置。在另一方面，该方法和系统包括在磁记录装置上提供可延展的掩模层。在这方面，该方法和系统还包括将印模掩模压入掩模层中并固化掩模层，同时将印模掩模压入掩模层中以提供具有图案的掩模。图案可以对应于读取传感器和/或垂直磁记录极。该方法和系统还包括将图案从掩模转移到磁记录装置。

5. 发明授权

US07736823B1 Method and system for providing optical proximity correction for structures such as a PMR nose 失效
标题翻译：用于为诸如PMR鼻子的结构提供光学邻近校正的方法和系统
公开(公告)号：US07736823B1
公开(公告)日：2010-06-15
申请号：US11801916
申请日：2007-05-11
申请人： Yizhong Wang , Hai Sun , Hongping Yuan , Winnie Yu
发明人： Yizhong Wang , Hai Sun , Hongping Yuan , Winnie Yu
IPC分类号： G03F1/00
CPC分类号： G11B5/3163 , G03F1/36 , G11B5/1278 , G11B5/3116
摘要： A mask for transferring a pattern for portion of a magnetic recording transducer is disclosed. The masks includes one corner corresponding to an angle of more than ninety degrees and less than one hundred eighty degrees. The mask also includes at least one rectangular serif residing at the corner.
摘要翻译：公开了用于传送磁记录换能器的一部分的图案的掩模。掩模包括对应于大于九十度且小于百八十度的角度的一个角。面罩还包括至少一个位于拐角处的矩形衬线。

6. 发明授权

US08163185B1 Method and apparatus for lifting off photoresist beneath an overlayer 有权
标题翻译：用于剥离覆盖层下面的光致抗蚀剂的方法和装置
公开(公告)号：US08163185B1
公开(公告)日：2012-04-24
申请号：US12059903
申请日：2008-03-31
申请人： Hai Sun , Liubo Hong , Rowena Schmidt , Lijie Zhao , Winnie Yu , Hongping Yuan
发明人： Hai Sun , Liubo Hong , Rowena Schmidt , Lijie Zhao , Winnie Yu , Hongping Yuan
IPC分类号： B44C1/22
CPC分类号： G11B5/3163 , Y10T29/49032
摘要： A method of lifting off photoresist beneath an overlayer includes providing a structure including photoresist and depositing an overlayer impenetrable to a liftoff solution over the photoresist and a field region around the structure. The method also includes forming a mask over the structure and ion milling to remove the overlayer in the field region not covered by the mask. The method then includes lifting off the photoresist using the liftoff solution.
摘要翻译：提供覆盖层下面的光致抗蚀剂的方法包括提供包括光致抗蚀剂的结构，以及沉积在光致抗蚀剂上的不透气的覆盖层和围绕结构的场区域的覆盖层。该方法还包括在结构上形成掩模和离子研磨以去除未被掩模覆盖的场区域中的覆盖层。该方法然后包括使用提升溶液提取光致抗蚀剂。

7. 发明授权

US08169473B1 Method and system for exposing a photoresist in a magnetic device 有权
标题翻译：用于在磁性装置中曝光光致抗蚀剂的方法和系统
公开(公告)号：US08169473B1
公开(公告)日：2012-05-01
申请号：US12056494
申请日：2008-03-27
申请人： Winnie Yu , Hai Sun , Hongping Yuan , Xianzhong Zeng
发明人： Winnie Yu , Hai Sun , Hongping Yuan , Xianzhong Zeng
IPC分类号： G03B27/32 , G03B27/42
CPC分类号： G03B27/32 , G03B27/53 , G03F7/70425
摘要： A method and system for exposing a plurality of fields on a substrate. The substrate has a center and an edge. The fields include a plurality of rows. The method and system include determining an exposure sequence for the plurality of fields. Each of the plurality of fields has a distance from the center and a placement in the exposure sequence. The placement of a field in the exposure sequence is based on the distance and excludes placing each of the plurality of fields in a row of the plurality of rows next to an adjacent field in the row in combination with placing each of the plurality of rows next to an adjacent row. The method and system also include exposing the plurality of fields in the exposure sequence in order of the placement.
摘要翻译：一种用于在衬底上暴露多个场的方法和系统。基板具有中心和边缘。这些字段包括多行。该方法和系统包括确定多个场的曝光序列。多个场中的每一个具有与中心的距离和曝光序列中的位置。曝光序列中的场的放置基于该距离，并且排除将多个场中的每一个放置在与行中的相邻场相邻的多行中的每一行中，并将下一个行中的每一行相结合到相邻行。该方法和系统还包括以放置顺序暴露曝光序列中的多个场。

8. 发明授权

US09274438B1 Method and system for exposing photoresist in a microelectric device 有权
标题翻译：用于在微电子器件中曝光光致抗蚀剂的方法和系统
公开(公告)号：US09274438B1
公开(公告)日：2016-03-01
申请号：US12146370
申请日：2008-06-25
申请人： Hongping Yuan , Hai Sun , Xianzhong Zeng , Winnie Yu
发明人： Hongping Yuan , Hai Sun , Xianzhong Zeng , Winnie Yu
IPC分类号： G03C5/04 , G03F7/20 , H01L21/027
CPC分类号： G03F7/2022 , G03F7/70466 , H01L21/0274
摘要： A method and system provide microelectric devices on fields on a substrate. Each field includes at least one microelectric device having a critical device feature and remaining device feature(s) distal from the critical device feature. The method and system include providing a photoresist layer for fabricating the microelectric devices and exposing the photoresist layer using a dark field mask. The dark field mask is for defining a critical mask feature corresponding to the critical device feature and exposing a first portion of the fields. The first portion includes not more than five percent of each field. The method and system further include exposing the photoresist layer using a clear field mask. The clear field mask is for defining remaining mask feature(s) corresponding to the remaining device feature(s). The clear field mask exposes a second portion of the fields that is different from the first portion.
摘要翻译：一种方法和系统在衬底上的场上提供微电子器件。每个场包括至少一个具有关键装置特征的微电子装置和远离关键装置特征的剩余装置特征。所述方法和系统包括提供用于制造微电子器件的光致抗蚀剂层并且使用暗场掩模曝光光致抗蚀剂层。暗场掩模用于定义与关键设备特征对应的关键掩模特征并暴露场的第一部分。第一部分不超过每个领域的百分之五。该方法和系统还包括使用清晰的场屏蔽来曝光光致抗蚀剂层。清除场掩模用于定义对应于剩余设备特征的剩余掩模特征。清除场掩模曝光与第一部分不同的场的第二部分。

9. 发明申请

US20100290157A1 Damascene coil processes and structures 审中-公开
标题翻译：大马士革线圈工艺和结构
公开(公告)号：US20100290157A1
公开(公告)日：2010-11-18
申请号：US12466353
申请日：2009-05-14
申请人： Jinqiu Zhang , Hongping Yuan , Hai Sun , Ming Zhao
发明人： Jinqiu Zhang , Hongping Yuan , Hai Sun , Ming Zhao
IPC分类号： G11B5/17 , B05D3/00 , B44C1/22 , C25D5/34
CPC分类号： G11B5/3123 , C25D7/123 , G11B5/17
摘要： A magnetic recording head is provided. The magnetic recording head comprises a write pole and a write coil structure configured to generate a magnetic field in the write pole. The write coil structure comprises a substrate layer and a coil material disposed within the substrate layer. The write coil structure is substantially free of photoresist. A method for forming a write coil structure is also provided. The method comprises the steps of providing a substrate layer, forming a photoresist pattern mask over the substrate layer, opening a damascene trench in the substrate layer by reactive ion etching, and disposing a coil material into the damascene trench in the substrate layer.
摘要翻译：提供磁记录头。磁记录头包括写极和写线圈结构，其被配置为在写极中产生磁场。写入线圈结构包括衬底层和设置在衬底层内的线圈材料。写入线圈结构基本上不含光致抗蚀剂。还提供了一种用于形成写入线圈结构的方法。该方法包括以下步骤：提供衬底层，在衬底层上形成光致抗蚀剂图案掩模，通过反应离子蚀刻在衬底层中打开镶嵌沟槽，以及将线圈材料设置在衬底层中的镶嵌沟槽中。

10. 发明授权

US08284517B1 Perpendicular magnetic recording head 有权
标题翻译：垂直磁记录头
公开(公告)号：US08284517B1
公开(公告)日：2012-10-09
申请号：US13372775
申请日：2012-02-14
申请人： Hai Sun , Jinqiu Zhang , Hongping Yuan , Donghong Li , Liubo Hong , Yong Shen
发明人： Hai Sun , Jinqiu Zhang , Hongping Yuan , Donghong Li , Liubo Hong , Yong Shen
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , Y10T29/49041
摘要： A perpendicular magnetic recording (PMR) head comprises a PMR pole having at least one side, a bottom, and a top wider than the bottom, a first portion of the at least one side being substantially vertical, a second portion of the at least one side being nonvertical, the top portion having a width not greater than one hundred fifty nanometers. The PMR head further comprises a nonmagnetic layer surrounding the bottom and the at least one side of the PMR pole, an intermediate layer substantially surrounding at least the second portion of the at least one side of the PMR pole, and a planarization stop layer adjacent to the first portion of the at least one side of the PMR pole.
摘要翻译：垂直磁记录（PMR）头包括具有至少一个侧面，底部和顶部宽于底部的PMR极，所述至少一个侧面的第一部分基本上垂直，所述至少一个的第二部分侧面是非垂直的，顶部具有不大于一百五十纳米的宽度。 PMR头还包括围绕PMR极的底部和至少一侧的非磁性层，基本上围绕PMR极的至少一个侧面的至少第二部分的中间层和与PMR极的相邻的平坦化停止层 PMR极点的至少一侧的第一部分。

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