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    • 1. 发明授权
    • Method of programming a nonvolatile memory cell and related memory array
    • 非易失性存储单元和相关存储器阵列的编程方法
    • US07499336B2
    • 2009-03-03
    • US11748459
    • 2007-05-14
    • Yi-Ching LiuI-Long LeeMing-Hung ChouFuja Shone
    • Yi-Ching LiuI-Long LeeMing-Hung ChouFuja Shone
    • G11C16/04
    • G11C16/0458G11C16/12
    • A programming method for programming stored bits in floating gates of a flash memory cell or selected flash memory cells of a flash memory array is utilized for applying SSI injection on said flash memory cell or said selected flash memory cells of a flash memory array is disclosed. Constant charges at the drain regions of said flash memory cell or said selected flash memory cells of the flash memory array is implemented with a capacitor and a related switch for suppressing variant injected-charges-related properties in applying the SSI injection. A constant biasing current, which may be implemented with a constant current source or a current mirror equipped with a constant current source, is applied on source regions of said flash memory cell or said selected flash memory cells of the flash memory array for enhancing the suppression of said variant biasing properties.
    • 用于对闪速存储器单元的浮动栅极中的存储位进行编程的闪存存储器阵列的选定闪存单元的编程方法被用于在所述闪速存储器单元上施加SSI注入或者闪存阵列的所选闪存单元。 闪速存储器阵列的所述闪速存储器单元或所选闪存单元的漏极区域的恒定电荷用电容器和相关开关来实现,用于在应用SSI注入时抑制变型注入电荷相关的特性。 可以用恒定电流源或配备有恒定电流源的电流镜来实现的恒定偏置电流被施加在闪速存储器单元的所述闪速存储器单元的所述闪存单元的所述源区域上,或者用于增强抑制 的所述变体偏置属性。
    • 2. 发明申请
    • Method of Programming a Nonvolatile Memory Cell and Related Memory Array
    • 非易失性存储器单元和相关存储器阵列的编程方法
    • US20080285342A1
    • 2008-11-20
    • US11748459
    • 2007-05-14
    • Yi-Ching LiuI-Long LeeMing-Hung ChouFuja Shone
    • Yi-Ching LiuI-Long LeeMing-Hung ChouFuja Shone
    • G11C11/34
    • G11C16/0458G11C16/12
    • A programming method for programming stored bits in floating gates of a flash memory cell or selected flash memory cells of a flash memory array is utilized for applying SSI injection on said flash memory cell or said selected flash memory cells of a flash memory array is disclosed. Constant charges at the drain regions of said flash memory cell or said selected flash memory cells of the flash memory array is implemented with a capacitor and a related switch for suppressing variant injected-charges-related properties in applying the SSI injection. A constant biasing current, which may be implemented with a constant current source or a current mirror equipped with a constant current source, is applied on source regions of said flash memory cell or said selected flash memory cells of the flash memory array for enhancing the suppression of said variant biasing properties.
    • 用于对闪速存储器单元的浮动栅极中的存储位进行编程的闪存存储器阵列的选定闪存单元的编程方法被用于在所述闪速存储器单元上施加SSI注入或者闪存阵列的所选闪存单元。 闪速存储器阵列的所述闪速存储器单元或所选闪存单元的漏极区域的恒定电荷用电容器和相关开关来实现,用于在应用SSI注入时抑制变型注入电荷相关的特性。 可以用恒定电流源或配备有恒定电流源的电流镜来实现的恒定偏置电流被施加在闪速存储器单元的所述闪速存储器单元的所述闪存单元的所述源区域上,或者用于增强抑制 的所述变体偏置属性。
    • 7. 发明授权
    • Method and system for adaptively finding reference voltages for reading data from a MLC flash memory
    • 用于自适应地寻找用于从MLC闪速存储器读取数据的参考电压的方法和系统
    • US07848152B1
    • 2010-12-07
    • US12464240
    • 2009-05-12
    • Chien-Fu HuangMing-Hung ChouHan-Lung HuangShih-Keng Cho
    • Chien-Fu HuangMing-Hung ChouHan-Lung HuangShih-Keng Cho
    • G11C16/04
    • G11C11/5642G11C2211/5621G11C2211/5634
    • A method and system for adaptively finding reference voltages for reading data from a multi-level cell (MLC) flash memory is disclosed. According to one embodiment, information about an initial threshold voltage distribution is firstly provided. A first threshold voltage in the initial threshold voltage distribution is then associated with a second threshold voltage in a shifted threshold voltage distribution to be determined, such that the information corresponding to the first threshold voltage is approximate to the information corresponding to the second threshold voltage. Accordingly, initial reference voltage or voltages of the initial threshold voltage distribution are shifted with an amount approximate to difference between the first threshold voltage and the second threshold voltage, thereby resulting in new reference voltage or voltages for reading the data from the MLC flash memory.
    • 公开了一种用于自适应地寻找用于从多电平单元(MLC)闪速存储器读取数据的参考电压的方法和系统。 根据一个实施例,首先提供关于初始阈值电压分布的信息。 初始阈值电压分布中的第一阈值电压然后与移位的阈值电压分布中的第二阈值电压相关联,以使得与第一阈值电压对应的信息接近于与第二阈值电压对应的信息。 因此,初始阈值电压分布的初始参考电压或电压以接近于第一阈值电压和第二阈值电压之间的差值的量移动,由此导致用于从MLC闪速存储器读取数据的新参考电压或电压。
    • 8. 发明授权
    • Memory structure and method of manufacturing a memory array
    • 内存结构和制造存储器阵列的方法
    • US07439133B2
    • 2008-10-21
    • US11306548
    • 2006-01-02
    • Ming-Hung ChouFu-Chia Shone
    • Ming-Hung ChouFu-Chia Shone
    • H01L21/336
    • H01L27/115G11C16/0458H01L27/11519H01L27/11521
    • A memory structure formed between two doping regions in a semiconductor substrate includes two conductive blocks functioning as floating gates formed at two sides of a first conductive line functioning as a select gat and insulated from the first conductive line with two first dielectric spacers therebetween, wherein the two conductive blocks each have a raised top and raised parts of sides relative to the top of the first conductive line. A first dielectric layer is formed on the tops and the parts of the sides of the two conductive blocks. A second conductive line functioning as a word line is formed on the first dielectric layer, wherein the second conductive line has a part deposited between the two conductive blocks and is substantially perpendicular to the first conductive line and two doping region functioning as bit lines.
    • 在半导体衬底中的两个掺杂区域之间形成的存储器结构包括两个用作浮置栅极的导电块,该栅极形成在用作选择栅的第一导线的两侧,并且与第一导线绝缘,其间具有两个第一介电隔离件, 两个导电块各自具有相对于第一导电线的顶部的凸起的顶部和凸起部分的侧面。 第一电介质层形成在两个导电块的顶部和侧面的一部分上。 用作字线的第二导电线形成在第一电介质层上,其中第二导线具有沉积在两个导电块之间的部分,并且基本上垂直于第一导电线和两个用作位线的掺杂区域。