专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20110216296A1 HOLOGRAM AND EXPOSURE APPARATUS 有权
标题翻译：手套和暴露装置
公开(公告)号：US20110216296A1
公开(公告)日：2011-09-08
申请号：US12718666
申请日：2010-03-05
申请人： Isao Matsubara , Yasuyuki Unno , William Dallas , Tom D. Milster
发明人： Isao Matsubara , Yasuyuki Unno , William Dallas , Tom D. Milster
IPC分类号： G03B27/54 , G02B5/32
CPC分类号： G02B5/32 , G03B27/54 , G03F7/70108 , G03F7/70158 , G03F7/70566
摘要： The present invention provides a hologram which forms a light intensity distribution on a predetermined plane by using incident light. The hologram includes a plurality of cells configured to control both a phase of a first polarized light component in a first polarization direction of the incident light and a phase of a second polarized light component in a second polarization direction perpendicular to the first polarization direction, to form a phase difference distribution between phase distributions for the first and second polarized light components. The plurality of cells are designed so that a number of phase difference levels of the phase difference distribution is less than a number of phase levels of the phase distribution of the first polarized light component.
摘要翻译：本发明提供一种通过使用入射光在预定平面上形成光强度分布的全息图。全息图包括多个单元，被配置为控制入射光的第一偏振方向上的第一偏振光分量的相位和垂直于第一偏振方向的第二偏振方向上的第二偏振光分量的相位，在第一和第二偏振光分量的相位分布之间形成相位差分布。多个单元被设计成使得相位差分布的多个相位差级别小于第一偏振光分量的相位分布的相位级数。

2. 发明授权

US07911709B2 Apparatus and method for improving detected resolution and/or intensity of a sampled image 失效
标题翻译：用于提高采样图像的检测分辨率和/或强度的装置和方法
公开(公告)号：US07911709B2
公开(公告)日：2011-03-22
申请号：US11256250
申请日：2005-10-21
申请人： Yasuyuki Unno
发明人： Yasuyuki Unno
IPC分类号： G02B9/00 , G02B9/08
CPC分类号： G03F7/7085 , G03F7/70216 , G03F7/7025 , G03F7/70566 , G03F7/706 , G03F7/70666
摘要： At least one exemplary embodiment is directed to a detection aperture that varies the effective aperture index of refraction or provides scattering structures to improve the detected resolution and/or intensity of a sampled image. In at least one exemplary embodiment a medium is inserted into the aperture, to match transmittance of polarization through the aperture, and to control the relative transmittance of polarizations through the aperture. In yet another exemplary embodiment structures are provided to scatter or redirect diffracted aperture light to improve detection resolution and/or intensity.
摘要翻译：至少一个示例性实施例涉及改变有效孔径折射率的检测孔径，或提供散射结构以改善检测到的采样图像的分辨率和/或强度。在至少一个示例性实施例中，将介质插入到孔中，以匹配通过孔的偏振的透射率，并且控制穿过孔的偏振的相对透射率。在又一示例性实施例中，提供了用于散射或重定向衍射光圈光的结构，以提高检测分辨率和/或强度。

3. 发明授权

US5706077A Scan type projection exposure apparatus and microdevice manufacturing method using the same 失效
标题翻译：扫描型投影曝光装置及使用其的微型装置制造方法
公开(公告)号：US5706077A
公开(公告)日：1998-01-06
申请号：US423110
申请日：1995-04-18
申请人： Yasuyuki Unno
发明人： Yasuyuki Unno
IPC分类号： G03B27/32 , G03B27/54 , G03F7/20 , H01L21/027 , H01L21/30 , G03B27/72
CPC分类号： G03F7/70333 , G03F7/70241 , G03F7/70358 , G03F7/70733
摘要： A scanning projection exposure apparatus includes an imaging system for imaging a pattern of an original, placed on an object plane, upon a substrate, and a scanning device for relatively scanning the original and the substrate relative to the imaging system, wherein the imaging system provides different imaging positions with respect to a direction of an optical axis, to plural zones on the object plane, which zones are juxtaposedly defined along a direction of scan.
摘要翻译：一种扫描投影曝光装置，包括：成像系统，用于将放置在物体平面上的原稿图案放置在基板上;以及扫描装置，用于相对于成像系统相对地扫描原件和基板，其中成像系统提供相对于光轴的方向的不同成像位置，到物平面上的多个区域，哪些区域沿着扫描方向并列确定。

4. 发明授权

US5459000A Image projection method and device manufacturing method using the image projection method 失效
标题翻译：图像投影方法和使用图像投影方法的装置制造方法
公开(公告)号：US5459000A
公开(公告)日：1995-10-17
申请号：US130903
申请日：1993-10-04
申请人： Yasuyuki Unno
发明人： Yasuyuki Unno
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70583 , G03F7/70091 , G03F7/70125
摘要： An image of a fine pattern having light-projecting portions and non-light-projecting portions is formed by illuminating the fine pattern. Upon illumination of the fine pattern, light beams are projected from respective light-projecting portions of the pattern onto an image-forming surface to form an image. Coherency of light beams from respective adjacent light-projecting portions is reduced to provide an image of the fine pattern having high contrast.
摘要翻译：通过照亮精细图案来形成具有凸出部分和非突出部分的精细图案的图像。在照射精细图案时，将光束从图案的各个投光部分投影到图像形成表面上以形成图像。来自各个相邻的光投射部分的光束的一致性被减小以提供具有高对比度的精细图案的图像。

5. 发明申请

US20130286403A1 INTERFEROMETRIC METHOD AND DIGITAL HOLOGRAPHIC MICROSCOPE 有权
标题翻译：干涉法和数字全息显微镜
公开(公告)号：US20130286403A1
公开(公告)日：2013-10-31
申请号：US13455931
申请日：2012-04-25
申请人： Isao Matsubara , Chung-Chieh Yu , Yasuyuki Unno , William Dallas
发明人： Isao Matsubara , Chung-Chieh Yu , Yasuyuki Unno , William Dallas
IPC分类号： G01B9/02 , G01B9/023 , G01B11/24
CPC分类号： G01N21/453 , G02B21/0052 , G03H1/0443 , G03H2001/005 , G03H2001/0456 , G03H2001/046 , G03H2222/36 , G03H2222/44
摘要： An interferometric method for detecting information about a sample includes emitting a laser beam; splitting the laser beam into a reference beam and an object beam; transmitting the object beam through the sample in an incident angle; combining the reference beam with the object beam passed through the sample to form an interference pattern; detecting the interference pattern, and non-linearly scanning the object beam in order to detect a plurality of interference patterns.
摘要翻译：用于检测关于样本的信息的干涉测量方法包括发射激光束; 将激光束分成参考光束和物体光束; 以入射角透射物体通过样品; 将参考光束与通过样本的物体光束组合以形成干涉图案; 检测干涉图案，以及非线性扫描物体光束，以便检测多个干涉图案。

6. 发明申请

US20100328742A1 HOLOGRAM, HOLOGRAM DATA GENERATION METHOD, AND EXPOSURE APPARATUS 有权
标题翻译： HOLOGRAM，HOLOGRAM数据生成方法和曝光装置
公开(公告)号：US20100328742A1
公开(公告)日：2010-12-30
申请号：US12491094
申请日：2009-06-24
申请人： Isao Matsubara , Yasuyuki Unno , William Dallas
发明人： Isao Matsubara , Yasuyuki Unno , William Dallas
IPC分类号： G03H1/08 , G02B5/32
CPC分类号： G02B5/32 , G03F7/70108 , G03F7/70566 , G03H1/0244 , G03H1/08 , G03H2001/2276
摘要： The present invention provides a hologram which forms a light intensity distribution on a predetermined plane by using an incident light. The hologram includes a plurality of cells configured to control both a phase of a first polarized light component of the incident light and a phase of a second polarized light component. The plurality of cells are designed to form a portion in an overlap region in which a first light intensity distribution region formed on the predetermined plane by the first polarized light component and a second light intensity distribution region formed on the predetermined plane by the second polarized light component are superposed on each other. The phase of the first polarized light component is diffused in the portion formed in the overlap region.
摘要翻译：本发明提供一种通过使用入射光在预定平面上形成光强度分布的全息图。全息图包括被配置为控制入射光的第一偏振光分量的相位和第二偏振光分量的相位的多个单元。多个单元被设计成在重叠区域中形成部分，其中通过第一偏振光分量在预定平面上形成的第一光强度分布区域和通过第二偏振光在预定平面上形成的第二光强度分布区域组件彼此重叠。第一偏振光分量的相位在形成在重叠区域中的部分中扩散。

7. 发明申请

US20090116694A1 DEVICE FOR MEASURING AN AERIAL IMAGE PRODUCED BY AN OPTICAL LITHOGRAPHY SYSTEM 审中-公开
标题翻译：用于测量由光学平版印刷系统产生的气象图像的装置
公开(公告)号：US20090116694A1
公开(公告)日：2009-05-07
申请号：US11934733
申请日：2007-11-02
申请人： Yasuyuki Unno
发明人： Yasuyuki Unno
IPC分类号： G06K9/00 , B05D1/12
CPC分类号： G03F7/70958 , G03F7/70575 , G03F7/70666 , G03F7/7085
摘要： An image measuring device that measures an aerial image, with relatively small or no dependence on the incident angle and polarization state of the beams projected onto the measuring device. The aerial image measuring device includes a substrate in which there are photo-luminescent nanoparticles that isotropically emit a photo-luminescent wavelength in response to an illuminated wavelength of the aerial image, a filter that blocks the illuminated wavelength and is transparent to the photo-luminescent wavelength, and a light detector that is sensitive to light of the photo-luminescent wavelength. The substrate is transparent to light of both the illuminated and the photo-luminescent wavelength, and the aerial image passes through the substrate and illuminates the nanoparticles. The photoluminescent light emitted by the nanoparticles passes through the filter and enters the light detector, which measures the aerial image. The aerial image is scanned by the aerial image measuring device
摘要翻译：一种测量空间图像的图像测量装置，其相对较小或不依赖于投射到测量装置上的光束的入射角和偏振状态。所述空间图像测量装置包括基板，其中存在响应于所述空间图像的照射波长而各向同性地发射光致发光波长的光致发光纳米颗粒，阻挡所述被照射波长并对于所述光致发光透明的滤光器以及对光发光波长的光敏感的光检测器。衬底对照明和光致发光波长的光是透明的，并且空中图像通过衬底并照射纳米颗粒。纳米颗粒发出的光致发光光通过滤光片并进入测量空中影像的光检测器。航空图像由空间图像测量装置扫描

8. 发明授权

US07262920B2 Optical element and manufacturing method therefor 有权
标题翻译：光学元件及其制造方法
公开(公告)号：US07262920B2
公开(公告)日：2007-08-28
申请号：US10684294
申请日：2003-10-10
申请人： Yasuyuki Unno , Seiji Takeuchi
发明人： Yasuyuki Unno , Seiji Takeuchi
IPC分类号： G02B3/00
CPC分类号： G03F7/70966 , C30B11/00 , C30B29/12 , G02B1/02 , Y10S117/918
摘要： An optical element and a manufacturing method therefor, an exposure apparatus, and a device manufacturing method that can reduce the effect of intrinsic birefringence under high NA conditions. According to an optical element as one aspect of the present invention, an angle between a [0 0 1] axis of an isometric crystal and an optical axis is less than 10°, and preferably 0°.
摘要翻译：一种光学元件及其制造方法，曝光装置和可以在高NA条件下降低固有双折射效应的器件制造方法。根据作为本发明的一个方面的光学元件，等轴晶体的[0 0]轴与光轴之间的角度小于10°，优选为0°。

9. 发明授权

US06301001B1 Optical element manufacturing system, an illumination system, and an exposure apparatus 有权
标题翻译：光学元件制造系统，照明系统和曝光装置
公开(公告)号：US06301001B1
公开(公告)日：2001-10-09
申请号：US09518103
申请日：2000-03-03
申请人： Yasuyuki Unno
发明人： Yasuyuki Unno
IPC分类号： G03B2754
CPC分类号： G03F7/70633 , G02B5/1857 , G02B5/1876 , G02B5/188 , G03F9/70
摘要： An optical element manufacturing method includes a first process for forming a mask pattern on a substrate, and a second process for forming a step-like structure on the substrate by use of the mask pattern, wherein the first and second processes are repeated N times, and wherein, before execution of the (k)th time second process where 2≦k≦N, there is a process for determining a relative alignment error between a mask pattern as formed through the (k)th time first process and a mask pattern as formed through the (k−1)th time first process, and wherein the height of the step-like structure to be defined by the (k)th time second process is determined in accordance with the alignment error.
摘要翻译：光学元件制造方法包括在基板上形成掩模图案的第一工序，以及通过使用掩模图案在基板上形成台阶状结构的第二工序，其中第一工序和第二工序重复N次，并且其中，在执行其中2 <= k <= N的第（k）个第二处理之前，存在用于确定通过第（k）次第一进程形成的掩模图案和通过第（k-1）次第一处理形成的掩模图案，并且其中根据对准误差确定由第（k）次第二处理定义的阶梯状结构的高度。

10. 发明授权

US09091614B2 Wavefront optical measuring apparatus 有权
标题翻译：波前光学测量仪器
公开(公告)号：US09091614B2
公开(公告)日：2015-07-28
申请号：US13112967
申请日：2011-05-20
申请人： Akinori Ohkubo , Yasuyuki Unno
发明人： Akinori Ohkubo , Yasuyuki Unno
IPC分类号： G01M11/02
CPC分类号： G01M11/0257 , G01M11/02 , G01M11/0207 , G01M11/0221 , G01M11/0235
摘要： An apparatus for measuring a wavefront of light traveling through test optics includes: a light source; a lenslet array where light from the light source travels through; a detector array configured to acquire a light intensity distribution through the lenslet array; and a processing unit, wherein the processing unit executes data processing with the acquired light intensity distribution, the data processing comprising an estimation process using a beamlet-based propagation model or a ray-based propagation model as a forward propagation model.
摘要翻译：一种用于测量通过测试光学器件传播的光的波前的装置，包括：光源; 来自光源的光穿过的小透镜阵列; 检测器阵列，被配置为获取通过所述小透镜阵列的光强度分布; 以及处理单元，其中所述处理单元使用所获取的光强度分布来执行数据处理，所述数据处理包括使用基于子束的传播模型或基于射线的传播模型的估计处理作为前向传播模型。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式