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1. 发明授权

US07671219B2 Method for manufacturing fullerene derivatives 失效
标题翻译：富勒烯衍生物的制造方法
公开(公告)号：US07671219B2
公开(公告)日：2010-03-02
申请号：US11569571
申请日：2005-05-26
申请人： Yasuo Shigemitsu , Yusuke Tajima
发明人： Yasuo Shigemitsu , Yusuke Tajima
IPC分类号： C07D307/94 , C07D317/72 , C07D317/70 , C07D317/44
CPC分类号： C07D317/70 , C07C2604/00
摘要： Provided is a method for manufacturing fullerene 1,3-dioxolane conveniently at high yield. Fullerene 1,3-dioxolane is manufactured by reacting a fullerene oxide and a carbonyl compound in the presence of a catalyst.
摘要翻译：提供了以高产率方便地制造富勒烯1,3-二氧戊环的方法。富勒烯1,3-二氧戊环是通过在催化剂存在下使富勒烯氧化物和羰基化合物反应来制造的。

2. 发明授权

US06709804B2 Printed wiring board and semiconductor device and processes to prepare the same 失效
标题翻译：印刷电路板和半导体器件及其制备方法
公开(公告)号：US06709804B2
公开(公告)日：2004-03-23
申请号：US10368960
申请日：2003-02-19
申请人： Yusuke Tajima , Kazuo Takeuchi , Yasuo Shigemitsu , Etsu Takeuchi
发明人： Yusuke Tajima , Kazuo Takeuchi , Yasuo Shigemitsu , Etsu Takeuchi
IPC分类号： G03C173
CPC分类号： B82Y15/00 , B82Y30/00 , G03F7/0387 , H05K1/023 , H05K3/4676 , Y10S430/116 , Y10S430/121
摘要： A printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating a substrate with a photosensitive resin composition comprising an oxygen sensitizer and a cis-diene-substituted polyamic acid or polyimide and forming fine patterns by exposure to radiation. Processes for producing a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device, which comprises coating a substrate with the photosensitive resin composition and forming fine patterns by crosslinking cis-diene by oxidation polycondensation with singlet oxygen generated by exposure of the oxygen sensitizer to radiation. The photosensitive resin composition is of the negative type and exhibits high sensitivity and high resolution. The photosensitive resin composition forms a resin layer having excellent heat resistance.
摘要翻译：印刷电路板，用于配置半导体芯片的基板和通过用包含氧敏感剂和顺式二烯取代的聚酰胺酸或聚酰亚胺的感光性树脂组合物涂布基板而制备的半导体装置，并通过暴露于辐射形成精细图案。用于制造印刷线路板的方法，用于设置半导体芯片的基板和半导体器件，其包括用感光性树脂组合物涂布基材并通过与通过氧气曝光产生的单线态氧化缩聚反应顺式二烯来形成精细图案敏化剂对辐射。感光性树脂组合物为负型，显示出高灵敏度，高分辨率。感光性树脂组合物形成耐热性优异的树脂层。

3. 发明授权

US06528231B1 PHOTOSENSITIVE RESIN COMPOSITION, PRINTED WIRING BOARD, SUBSTRATE FOR DISPOSING SEMICONDUCTOR CHIPS, SEMICONDUCTOR DEVICE AND PROCESSES FOR PRODUCING A PRINTED WIRING BOARD, A SUBSTRATE FOR DISPOSING SEMICONDUCTOR CHIPS AND A SEMICONDUCTOR DEVICE 失效
标题翻译：感光性树脂组合物，印刷线路板，用于处理半导体芯片的基板，用于制造印刷电路板的半导体器件和工艺，用于处理半导体器件的衬底和半导体器件
公开(公告)号：US06528231B1
公开(公告)日：2003-03-04
申请号：US09490627
申请日：2000-01-24
申请人： Yusuke Tajima , Kazuo Takeuchi , Yasuo Shigemitsu , Etsu Takeuchi
发明人： Yusuke Tajima , Kazuo Takeuchi , Yasuo Shigemitsu , Etsu Takeuchi
IPC分类号： G03C173
CPC分类号： B82Y15/00 , B82Y30/00 , G03F7/0387 , H05K1/023 , H05K3/4676 , Y10S430/116 , Y10S430/121
摘要： A photosensitive resin composition comprising an oxygen sensitizer and a cis-diene-substituted polyamic acid or a polyimide. A printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating a substrate with the photosensitive resin composition and forming fine patterns by exposure to radiation. Processes for producing a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device, which comprise coating a substrate with the photosensitive resin composition and forming fine patterns by crosslinking cis-diene by oxidation polycondensation with singlet oxygen generated by exposure of the oxygen sensitizer to radiation. The photosensitive resin composition is of the negative type and exhibits high sensitivity and high resolution. The photosensitive resin composition can form a resin layer having excellent heat resistance.
摘要翻译：包含氧敏感剂和顺式二烯取代的聚酰胺酸或聚酰亚胺的感光性树脂组合物。印刷电路板，用于设置半导体芯片的基板和通过用感光性树脂组合物涂布基板而制备的半导体器件，并且通过暴露于辐射形成精细图案。制造印刷电路板的方法，用于设置半导体芯片的基板和半导体装置，其包括用感光性树脂组合物涂布基板并通过与通过氧气曝光产生的单线态的氧化缩聚来交联顺式二烯而形成精细图案敏化剂对辐射。感光性树脂组合物为负型，显示出高灵敏度，高分辨率。感光性树脂组合物可以形成耐热性优异的树脂层。

4. 发明申请

US20080139826A1 Method For Manufacturing Fullerene Derivatives 失效
标题翻译：制造富勒烯衍生物的方法
公开(公告)号：US20080139826A1
公开(公告)日：2008-06-12
申请号：US11569571
申请日：2005-05-26
申请人： Yasuo Shigemitsu , Yusuke Tajima
发明人： Yasuo Shigemitsu , Yusuke Tajima
IPC分类号： C07D317/70 , C07D493/04 , C07D493/10
CPC分类号： C07D317/70 , C07C2604/00
摘要： Provided is a method for manufacturing fullerene 1,3-dioxolane conveniently at high yield. Fullerene 1,3-dioxolane is manufactured by reacting a fullerene oxide and a carbonyl compound in the presence of a catalyst.
摘要翻译：提供了以高产率方便地制造富勒烯1,3-二氧戊环的方法。富勒烯1,3-二氧戊环是通过在催化剂存在下使富勒烯氧化物和羰基化合物反应来制造的。

5. 发明授权

US5460919A Process of forming super high-contrast negative images and silver halide photographic material and developer being used therefor 失效
标题翻译：用于形成超高对比度负影像和卤化银照相材料和显影剂的方法
公开(公告)号：US5460919A
公开(公告)日：1995-10-24
申请号：US278823
申请日：1994-07-22
申请人： Naoki Obi , Yasuhiko Kojima , Yasuo Shigemitsu , Jun Takeuchi , Kiyoshi Suematsu
发明人： Naoki Obi , Yasuhiko Kojima , Yasuo Shigemitsu , Jun Takeuchi , Kiyoshi Suematsu
IPC分类号： G03C1/06 , G03C5/30
CPC分类号： G03C1/067 , G03C5/30
摘要： A process of forming a super high-contrast negative image is disclosed, which comprises the steps of imagewise exposing a negative-working silver halide photographic material comprising a support having thereon one or more hydrophilic colloidal layers, at least one of the one or more hydrophilic colloidal layers being a negative-working silver halide emulsion layer, and then developing the photographic material with a developer containing an aminophenol derivative developing agent and a reductone compound in the existence of an organic compound having a negative reduction potential. A negative-working silver halide photographic material and a photographic developer being used for the image-forming process are also disclosed.
摘要翻译：公开了形成超高对比度负像的方法，其包括以下步骤：将包含其上具有一个或多个亲水性胶体层的载体的负性卤化银照相材料成像曝光，所述一种或多种亲水性胶体层中的至少一种胶体层是负性卤化银乳剂层，然后在具有负还原电位的有机化合物存在下，用含有氨基苯酚衍生物显影剂和还原酮化合物的显影剂显影照相材料。还公开了用于图像形成过程的负性卤化银照相材料和照相显影剂。

6. 发明授权

US5217842A Superhigh contrast negative image forming process 失效
标题翻译：超对比度阴影图像形成过程
公开(公告)号：US5217842A
公开(公告)日：1993-06-08
申请号：US761549
申请日：1991-09-18
申请人： Yasuhiko Kojima , Naoki Obi , Yasuo Shigemitsu
发明人： Yasuhiko Kojima , Naoki Obi , Yasuo Shigemitsu
IPC分类号： G03C1/06 , G03C1/33 , G03C5/29 , G03C5/30 , G03C5/305
CPC分类号： G03C5/29 , G03C1/067
摘要： A process of forming superhigh-contrast negative images is disclosed. The process comprises the steps of imagewise exposing a substantially surface latent image-type silver halide photographic material which is spectrally sensitized with a sensitizing dye and then developing said photographic material with a developer, wherein said photographic material contains a heterocyclic thione compound and said developer comprises (a) an aminophenol derivative developing agent, (b) a reductone compound, (c) a quaternary ammonium salt, and (d) a compound represented by formula (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3, which may be the same or different, each represents a hydrogen atom, a nitro group, a halogen atom, or a cyano group, and wherein said development processing is carried out in the existence of at least one kind of a polyalkylene oxide or a derivative thereof. The process provides negative images of superhigh contrast having gamma over 10 substantially free from appearance of pepper.

7. 发明授权

US5372911A Process of forming super high-contrast negative images and silver halide photographic material and developer being used therefor 失效
标题翻译：用于形成超高对比度负影像和卤化银照相材料和显影剂的方法
公开(公告)号：US5372911A
公开(公告)日：1994-12-13
申请号：US897098
申请日：1992-06-11
申请人： Naoki Obi , Yasuhiko Kojima , Yasuo Shigemitsu , Jun Takeuchi , Kiyoshi Suematsu
发明人： Naoki Obi , Yasuhiko Kojima , Yasuo Shigemitsu , Jun Takeuchi , Kiyoshi Suematsu
IPC分类号： G03C1/06 , G03C5/30
CPC分类号： G03C1/067 , G03C5/30
摘要： A process of forming a super high-contrast negative image is disclosed, which comprises the steps of imagewise exposing a negative-working silver halide photographic material comprising a support having thereon one or more hydrophilic colloidal layers, at least one of the one or more hydrophilic colloidal layers being a negative-working silver halide emulsion layer, and then developing the photographic material with a developer containing an aminophenol derivative developing agent and a reductone compound in the existence of an organic compound having a negative reduction potential. A negative-working silver halide photographic material and a photographic developer being used for the image-forming process are also disclosed.
摘要翻译：公开了形成超高对比度负像的方法，其包括以下步骤：将包含其上具有一个或多个亲水性胶体层的载体的负性卤化银照相材料成像曝光，所述一种或多种亲水性胶体层中的至少一种胶体层是负性卤化银乳剂层，然后在具有负还原电位的有机化合物存在下，用含有氨基苯酚衍生物显影剂和还原酮化合物的显影剂显影照相材料。还公开了用于图像形成过程的负性卤化银照相材料和照相显影剂。

8. 发明授权

US5275915A Developer for light-sensitive material 失效
标题翻译：感光材料开发商
公开(公告)号：US5275915A
公开(公告)日：1994-01-04
申请号：US892148
申请日：1992-06-02
申请人： Yasuhiko Kojima , Yasuo Shigemitsu
发明人： Yasuhiko Kojima , Yasuo Shigemitsu
IPC分类号： G03C5/26 , G03F7/07 , G03F7/32 , G03C1/06
CPC分类号： G03F7/322 , G03C5/262 , G03F7/07
摘要： A developer for light-sensitive material capable of processing in common a negative-working light-sensitive lithographic printing plate and a positive-working light-sensitive printing plate as well as a developing agent-containing type silver halide photographic material, is disclosed. The developer comprises an alkali agent, an anionic surface active agent, an antifoggant for a silver halide photographic material, and an alkylene oxide addition product (molecular weight of from 130 to 1200) of an aromatic amine or an aralkyl amine, and has pH of the range of from 11.5 to 13.5.
摘要翻译：公开了一种用于感光材料的显影剂，其能够共同处理负性光敏平版印刷版和正性感光印版以及含显影剂的卤化银照相材料。显色剂包括碱剂，阴离子表面活性剂，卤化银照相材料的防雾剂和芳族胺或芳烷基胺的烯化氧加成产物（分子量为130〜1200），pH为范围为11.5至13.5。

9. 发明授权

US4724196A Silver halide photographic lith material 失效
标题翻译：卤化银摄影材料
公开(公告)号：US4724196A
公开(公告)日：1988-02-09
申请号：US21555
申请日：1987-03-02
申请人： Tadao Shoji , Yonosuke Tsuka , Naoki Obi , Yasuhiko Kojima , Yasuo Shigemitsu
发明人： Tadao Shoji , Yonosuke Tsuka , Naoki Obi , Yasuhiko Kojima , Yasuo Shigemitsu
IPC分类号： G03C1/06 , G03C1/09 , G03C1/72
CPC分类号： G03C1/09 , Y10S430/15
摘要： A lith-type silver halide photographic material comprising a tetrahydro-1,3,5-triazine-2-thione derivative and a polyalkylene oxide derivative.
摘要翻译：包含四氢-1,3,5-三嗪-2-硫酮衍生物和聚环氧烷衍生物的锂型卤化银照相材料。

10. 发明授权

US5766833A Process of forming super high-contrast negative images and silver halide photographic material and developer being used therefor 失效
标题翻译：用于形成超高对比度负影像和卤化银照相材料和显影剂的方法
公开(公告)号：US5766833A
公开(公告)日：1998-06-16
申请号：US889576
申请日：1997-07-08
申请人： Kiyoshi Suematsu , Hiroaki Muratake , Haruhiko Kaji , Naoki Obi , Yasuhiko Kojima , Yasuo Shigemitsu
发明人： Kiyoshi Suematsu , Hiroaki Muratake , Haruhiko Kaji , Naoki Obi , Yasuhiko Kojima , Yasuo Shigemitsu
IPC分类号： G03C1/06 , G03C1/34 , G03C5/30 , G03C5/305
CPC分类号： G03C5/30 , G03C1/067 , G03C1/346 , G03C5/305
摘要： An image-forming process developing a previously image-exposed silver halide photographic material with an alkaline developer containing a reductone compound as a main developing agent in the presence of a 1,2,5-thiadiazole compound and/or a 2,1,3-benzothiadiazole compound, and the silver halide photographic material and the photographic developer being used for the process are disclosed. In this case, the 1,2,5-thuiadiazole compound and/or the 2,1,3-benzothiadiazole may be contained in the silver halide photographic material and/or the alkaline developer. Super high-contrast images for photomechanical process having a gamma of higher than 15 and having no pepper and less fog can be obtained.
摘要翻译：在1,2,5-噻二唑化合物和/或2,1,3-二噻唑化合物存在下，用含有还原酮化合物作为主要显影剂的碱性显影剂显影先前图像曝光的卤化银照相材料的成像方法 - 苯并噻二唑化合物，以及用于该方法的卤化银照相材料和照相显影剂。在这种情况下，卤化银照相材料和/或碱性显影剂中可以含有1,2,5-噻二唑化合物和/或2,1,3-苯并噻二唑。可以获得具有高于15的γ并且不具有胡椒和较少雾的光机械方法的超高对比度图像。

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