专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5395727A Positive resist composition containing a novolak resin made from an aldehyde and dimer of isopropenyl phenol 失效
标题翻译：含有由醛形成的酚醛清漆树脂和异丙烯基苯酚二聚体的正性抗蚀剂组合物
公开(公告)号：US5395727A
公开(公告)日：1995-03-07
申请号：US158817
申请日：1993-11-29
申请人： Yasunori Uetani , Haruyoshi Osaki , Naoki Takeyama , Yuji Ueda , Hiromi Ueki , Takehiro Kusumoto
发明人： Yasunori Uetani , Haruyoshi Osaki , Naoki Takeyama , Yuji Ueda , Hiromi Ueki , Takehiro Kusumoto
IPC分类号： C08G8/08 , C08G8/20 , G03F7/023 , G03F7/30
CPC分类号： C08G8/08 , C08G8/20 , G03F7/0236
摘要： A novolak resin made from a carbonyl compound and a specific phenol compound, which resin has good properties, in particular, as a base resin of a photoresist.
摘要翻译：由羰基化合物和特定酚化合物制成的酚醛清漆树脂，该树脂具有良好的性能，特别是光致抗蚀剂的基础树脂。

2. 发明授权

US5736292A Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups 失效
标题翻译：包含由间甲酚，2,3,5-三甲基苯酚和任选的对甲酚制成的碱溶性树脂和具有烷基或烷氧基侧基的多酚化合物的辐射敏感性正性抗蚀剂组合物
公开(公告)号：US5736292A
公开(公告)日：1998-04-07
申请号：US490511
申请日：1995-06-14
申请人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
发明人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
IPC分类号： C07C39/15 , G03F7/004 , G03F7/022 , G03F7/023 , H01L21/027 , H01L21/30
CPC分类号： G03F7/022 , C07C39/15 , G03F7/0226 , G03F7/0236
摘要： A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, l, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.
摘要翻译：包含1,2-醌二叠氮化合物的正性抗蚀剂组合物和作为碱溶性树脂的碱溶性树脂（A），其包含可通过间甲酚，2,5-二氯苯的混合物的缩合反应获得的树脂（I） 3,5-二甲基苯酚和任选的具有醛和低分子量酚醛清漆（II）的对甲酚，其重均分子量为200至2000，转化为聚苯乙烯，碱溶性树脂（B）包含树脂（ I）和通式（III）的化合物：其中R1，R2和R3分别为C1-C5烷基或C1-C5烷氧基，l，m和n分别为0〜 3，R'是氢原子或C1-C3烷基，或碱溶性树脂（C），其包含可通过间 - 甲氧基苯酚和2,3,5-三羟基苯酚的混合物的缩合反应获得的树脂（IV） - 三甲基苯酚与摩尔比为80:20至30:70的醛，其具有良好的灵敏度，改进的分辨率和耐热性。

3. 发明授权

US5188920A Positive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compound 失效
标题翻译：含有1,2-二酮双酯化合物的阳离子组合物，碱溶性树脂和聚羟基苯酚添加剂化合物
公开(公告)号：US5188920A
公开(公告)日：1993-02-23
申请号：US712729
申请日：1991-06-10
申请人： Hiroshi Moriuma , Haruyoshi Osaki , Takeshi Hioki , Yasunori Uetani
发明人： Hiroshi Moriuma , Haruyoshi Osaki , Takeshi Hioki , Yasunori Uetani
IPC分类号： G03F7/039 , C07C39/15 , G03F7/022 , H01L21/027
CPC分类号： G03F7/0226 , C07C39/15
摘要： A positive resist composition comprising a radiation-sensitive component and an alkali-soluble resin and a phenol compound of the formula: ##STR1## wherein R is a hydrogen atom, a lower alkyl group or a phenyl group, R' is an alkyl group or an alkoxy group, and n is a number of 0 to 3, which has well balanced good properties such as sensitivity, resolution, heat resistance and adhesiveness.

4. 发明授权

US5792585A Radiation-sensitive positive resist composition 失效
标题翻译：辐射敏感正光刻胶组合物
公开(公告)号：US5792585A
公开(公告)日：1998-08-11
申请号：US217892
申请日：1994-03-25
申请人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
发明人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
IPC分类号： C07C39/15 , G03F7/004 , G03F7/022 , G03F7/023 , H01L21/027 , H01L21/30
CPC分类号： G03F7/022 , C07C39/15 , G03F7/0226 , G03F7/0236
摘要： A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, 1, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.
摘要翻译：包含1,2-醌二叠氮化合物的正性抗蚀剂组合物和作为碱溶性树脂的碱溶性树脂（A），其包含可通过间甲酚，2,5-二氯苯的混合物的缩合反应获得的树脂（I） 3,5-二甲基苯酚和任选的具有醛和低分子量酚醛清漆（II）的对甲酚，其重均分子量为200至2000，转化为聚苯乙烯，碱溶性树脂（B）包含树脂（ I）和通式（III）的化合物：其中R 1，R 2和R 3分别是C 1 -C 5烷基或C 1 -C 5烷氧基，m和n分别为0〜 3，R'是氢原子或C1-C3烷基，或碱溶性树脂（C），其包含可通过间 - 甲氧基苯酚和2,3,5-三羟基苯酚的混合物的缩合反应获得的树脂（IV） - 三甲基苯酚与摩尔比为80:20至30:70的醛，其具有良好的灵敏度，改进的分辨率和耐热性。

5. 发明授权

US5326665A Positive type resist composition 失效
标题翻译：正型抗蚀剂组合物
公开(公告)号：US5326665A
公开(公告)日：1994-07-05
申请号：US24499
申请日：1993-03-01
申请人： Haruyoshi Osaki , Hiroshi Moriuma , Yasunori Uetani
发明人： Haruyoshi Osaki , Hiroshi Moriuma , Yasunori Uetani
IPC分类号： C08G8/04 , G03F7/023 , G03F7/039 , H01L21/027 , G03F7/30
CPC分类号： C08G8/04 , G03F7/0236
摘要： A positive type resist composition comprising an alkali-soluble resin and a quinonediazide compound, wherein the alkali-soluble resin containing resin (A) is obtainable through a condensation reaction with at least one phenol compound represented by the following general formula (I): ##STR1## wherein R.sub.1 to R.sub.3 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and k represents 1 or 2, at least one compound represented by the following general formula (II): ##STR2## wherein R.sub.4 represents a hydrogen atom, an alkyl group having 1-4 carbon atoms or a phenyl group, R.sub.5 to R.sub.7 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and n represents 1 or 2, and an aldehyde compound. This composition is excellent in the balance between performances such as sensitivity, heat resistance and profile, and is free from scum.
摘要翻译：包含碱溶性树脂和醌二叠氮化合物的正型抗蚀剂组合物，其中所述含碱树脂（A）的树脂可通过与至少一种由以下通式（I）表示的酚化合物的缩合反应获得：（I）其中R1至R3彼此独立地表示氢原子或具有1-4个碳原子的烷基或烷氧基，k表示1或2，至少一种由以下通式（II）表示的化合物：：其中R 4表示氢原子，具有1-4个碳原子的烷基或苯基，R 5至R 7彼此独立地表示氢原子或具有1-4个碳原子的烷基或烷氧基碳原子，n表示1或2，醛化合物。该组合物在灵敏度，耐热性和轮廓性能之间的平衡方面是优异的，并且没有浮渣。

6. 发明授权

US06383708B1 Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US06383708B1
公开(公告)日：2002-05-07
申请号：US08160290
申请日：1993-12-02
申请人： Yasunori Uetani , Yasunori Doi , Kazuhiko Hashimoto , Haruyoshi Osaki , Ryotaro Hanawa
发明人： Yasunori Uetani , Yasunori Doi , Kazuhiko Hashimoto , Haruyoshi Osaki , Ryotaro Hanawa
IPC分类号： G03C152
CPC分类号： G03F7/0048 , G03F7/0226
摘要： A positive resist composition comprising, in admixture, an alkali-soluble resin, a quinone diazide compound and a mixed solvent of (B) at least one organic solvent selected from the group consisting of &ggr;-butyrolactone, 3-methoxybutanol and cyclohexanone and (A) an organic solvent other than the solvents (B) which does not have simultaneously an alkylcarbonyl group and an alkoxy group in a molecule and has a boiling point of from 140 to 180° C. under atmospheric pressure (B), which composition has a large &ggr;-value and provides an improved profile and a large depth of focus.
摘要翻译：一种正性抗蚀剂组合物，其包含碱溶性树脂，醌二叠氮化合物和（B）至少一种选自γ-丁内酯，3-甲氧基丁醇和环己酮的至少一种有机溶剂和（A ）除了在大气压（B）下在分子中不具有烷基羰基和烷氧基并且沸点为140〜180℃的溶剂（B）的有机溶剂，该组合物具有大的伽马值，并提供改进的轮廓和较大的焦点深度。

7. 发明授权

US5861229A Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound 失效
标题翻译：包含1,2-醌二叠氮化合物，碱溶性树脂和多酚化合物的辐射敏感性正性抗蚀剂组合物
公开(公告)号：US5861229A
公开(公告)日：1999-01-19
申请号：US948466
申请日：1992-09-22
申请人： Haruyoshi Osaki , Fumio Oi , Yasunori Uetani , Makoto Hanabata , Takeshi Hioki
发明人： Haruyoshi Osaki , Fumio Oi , Yasunori Uetani , Makoto Hanabata , Takeshi Hioki
IPC分类号： G03F7/022 , G03F7/023
CPC分类号： G03F7/0226 , G03F7/0236
摘要： A positive resist composition which comprises a 1,2-quinone diazide compound and an alkali-soluble resin containing a polyphenol compound (I) of the general formula:X--.alpha.--H (I)wherein x is a group of the formula: ##STR1## and .alpha. is a divalent group which comprises a repeating unit of the formula: ##STR2## in which n is a number of not less than 1; a, b, c, d, e and f are the same or different and a number of 0-3, provided that d+f is not less than 1; R.sub.1, R.sub.2 and R.sub.3 are the same or different and a C.sub.1 -C.sub.18 alkyl group, a C.sub.1 -C.sub.18 alkoxy group, a carboxyl group or a halogen atom; R.sub.4 is a hydrogen atom, a C.sub.1 -C.sub.18 alkyl group or an aryl group, which resist composition is sensitive to radiation and has good balance of sensitivity, resolving power and heat resistance.
摘要翻译：一种正性抗蚀剂组合物，其包含1,2-醌二叠氮化合物和含有下列通式的多酚化合物（I）的碱溶性树脂：X-α-H（I），其中x是下式的基团：并且α是包含下式的重复单元的二价基团：其中n是不小于1的数目：或 a，b，c，d，e和f相同或不同，数目为0-3，条件是d + f不小于1; R1，R2和R3相同或不同，C1-C18烷基，C1-C18烷氧基，羧基或卤原子; R4是氢原子，C1-C18烷基或芳基，其抗蚀剂组成对辐射敏感，并具有良好的灵敏度，分辨能力和耐热性的平衡。

8. 发明授权

US5783355A Radiation-sensitive positive resist composition 失效
公开(公告)号：US5783355A
公开(公告)日：1998-07-21
申请号：US490512
申请日：1995-06-14
申请人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
发明人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
IPC分类号： C07C39/15 , G03F7/004 , G03F7/022 , G03F7/023 , H01L21/027 , H01L21/30
CPC分类号： G03F7/022 , C07C39/15 , G03F7/0226 , G03F7/0236
摘要： A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, 1, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.

9. 发明授权

US5288587A Radiation-sensitive positive resist composition comprising an o-quinone diazide, an alkali-soluble resin and a polyphenol compound 失效
标题翻译：包含邻醌二叠氮化物，碱溶性树脂和多酚化合物的辐射敏感正性抗蚀剂组合物
公开(公告)号：US5288587A
公开(公告)日：1994-02-22
申请号：US43151
申请日：1993-03-31
申请人： Haruyoshi Osaki , Yasunori Uetani
发明人： Haruyoshi Osaki , Yasunori Uetani
IPC分类号： G03F7/022 , G03F7/023 , G03F7/32
CPC分类号： G03F7/0226
摘要： A positive resist composition which comprises a 1,2-quinone diazide compound and an alkali-soluble resin containing a polyphenol compound (I) of the general formula: ##STR1## wherein R is a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, and n is a number of 0 to 3, which has good sensitivity, improved resolution and heat resistance.
摘要翻译：一种正性抗蚀剂组合物，其包含1,2-醌二叠氮化合物和含有下列通式的多酚化合物（I）的碱溶性树脂：（*化学结构*）（I）其中R是C1-C5烷基或C 1 -C 5烷氧基，n为0〜3的数，具有良好的灵敏度，分辨率和耐热性。

10. 发明授权

US5807656A Polyhydroxy compound and a positive photoresist containing the same 失效
标题翻译：多羟基化合物和含有其的正性光致抗蚀剂
公开(公告)号：US5807656A
公开(公告)日：1998-09-15
申请号：US709323
申请日：1996-09-04
申请人： Koji Ichikawa , Haruyoshi Osaki , Yasunori Uetani , Yoshiyuki Takata
发明人： Koji Ichikawa , Haruyoshi Osaki , Yasunori Uetani , Yoshiyuki Takata
IPC分类号： C07C39/15 , G03F7/022 , G03F7/023
CPC分类号： G03F7/022 , C07C39/15 , G03F7/0226
摘要： A polyhydroxy compound represented by the following formula (I): ##STR1## and a positive resist composition which comprises an alkali-soluble resin, a quinonediazide sulfonic acid ester, and a polyhydroxy compound of formula (I) or a polyhydroxy compound represented by the following formula (C): ##STR2## which is satisfactory in properties such as sensitivity, resolution, .tau.-value and peeling off resistance.
摘要翻译：由下式（I）表示的多羟基化合物：（I）和含有碱溶性树脂，醌二叠氮化物磺酸酯和式（I）的多羟基化合物或多羟基化合物的正性抗蚀剂组合物由下式（C）表示：在图像敏感度，分辨率，tau值和抗剥离性等性能方面令人满意的。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式