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1. 发明授权

US5318875A Positive quinonediazide photoresist composition containing select hydroxyphenol additive 失效
标题翻译：含有选择性羟基苯酚添加剂的正醌二叠氮化物光致抗蚀剂组合物
公开(公告)号：US5318875A
公开(公告)日：1994-06-07
申请号：US15921
申请日：1993-02-10
申请人： Yasumasa Kawabe , Toshiaki Aoai , Tadayoshi Kokubo , Shiro Tan
发明人： Yasumasa Kawabe , Toshiaki Aoai , Tadayoshi Kokubo , Shiro Tan
IPC分类号： C07C45/46 , G03F7/022 , G03F7/023 , G03C1/61
CPC分类号： G03F7/0226 , C07C45/46 , G03F7/022
摘要： A positive photoresist composition includes an alkali-soluble resin, a quinonediazide compound and a compound selected from the group consisting of compounds represented by formulae (I), (II) and (III): ##STR1## wherein R.sub.1 to R.sub.27, which may be the same or different, each represents a hydrogen atom, hydroxyl group, halogen atom, alkyl group, alkoxy group, nitro group, alkenyl group, aryl group, aralkyl group, alkoxycarbonyl group, arylcarbonyl group, acyloxy group, acyl group, aryloxy group or aralkoxy group; ##STR2## wherein R.sub.31 represents an organic group, single bond, ##STR3## R.sub.32 represents a hydrogen atom, monovalent organic group or ##STR4## R.sub.33 to R.sub.37, which may be the same or different, and in which not all four groups for each of R.sub.33 to R.sub.37 may be the same at the same time, each represents a hydrogen atom, hydroxyl group, halogen atom, alkyl group, alkoxy group or alkenyl group, with the proviso that at least one of R.sub.33 to R.sub.35 is a hydroxyl group; X represents a divalent organic group; and m represents an integer 0 or 1; ##STR5## wherein R.sub.41 to R.sub.44, which may be the same or different and in which not all four groups for each of R.sub.41 to R.sub.44 may be the same at the same time, each represents a hydrogen atom, hydroxyl group, halogen atom, alkyl group, alkoxy group or alkenyl group; R.sub.45 and R.sub.46 each represents a hydrogen atom, alkyl group or ##STR6## a and c each represents an integer 0 or 1; and b represents an integer from 1 to 4.
摘要翻译：正型光致抗蚀剂组合物包括碱溶性树脂，醌二叠氮化合物和选自由式（I），（II）和（III）表示的化合物的化合物：其中R 1至R 27，可以相同或不同，分别表示氢原子，羟基，卤素原子，烷基，烷氧基，硝基，烯基，芳基，芳烷基，烷氧基羰基，芳基羰基，酰氧基，酰基，芳氧基或芳烷氧基; （II）其中R31表示有机基团，单键，R32表示氢原子，一价有机基团或R33至R37，其可以相同或不同，并且其中并不全部为四 R 33〜R 37各自可以相同，各自表示氢原子，羟基，卤素原子，烷基，烷氧基或烯基，条件是R 33〜R 35中的至少一个为羟基; X表示二价有机基团; m表示0或1的整数; （III）其中R41〜R44可以相同或不同，并且其中R41至R44中的每一个不是全部四个基团可以同时相同，各自表示氢原子，羟基，卤素原子，烷基，烷氧基或烯基; R 45和R 46各自表示氢原子，烷基或者a和c各自表示0或1的整数; b表示1〜4的整数。

2. 发明授权

US5340688A Positive type photoresist composition 失效
标题翻译：正型光致抗蚀剂组合物
公开(公告)号：US5340688A
公开(公告)日：1994-08-23
申请号：US15578
申请日：1993-02-10
申请人： Yasumasa Kawabe , Toshiaki Aoai , Tadayoshi Kokubo
发明人： Yasumasa Kawabe , Toshiaki Aoai , Tadayoshi Kokubo
IPC分类号： G03F7/022 , H01L21/027 , G03F7/021 , G03F7/30
CPC分类号： G03F7/022
摘要： Disclosed is a novel positive type photoresist composition comprising a 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonic ester of a member selected from the group consisting of the polyhydroxy compounds represented by the following formula (I), (II) or (III) and an alkali-soluble resin: ##STR1## wherein the variables of Formula I are defined in the specification; ##STR2## wherein the variables of Formula II are defined in the specification; ##STR3## wherein the variables of Formula III are defined in the specification.
摘要翻译：公开了一种新型的正型光致抗蚀剂组合物，其包含选自由下式（I）表示的多羟基化合物，（I），（I）表示的多羟基化合物的组分的1,2-萘醌二叠氮基-5-（和/或-4-）磺酸酯， II）或（III）和碱溶性树脂：其中式I的变量在说明书中定义; （II）其中式II的变量在说明书中定义; （III）其中式III的变量在本说明书中定义。

3. 发明授权

US4842986A Positively working resist material 失效
标题翻译：积极的抗拒材料
公开(公告)号：US4842986A
公开(公告)日：1989-06-27
申请号：US889707
申请日：1986-07-28
申请人： Nobuaki Matsuda , Tadayoshi Kokubo , Toshiaki Aoai , Akira Umehara , Yoshimasa Aotani
发明人： Nobuaki Matsuda , Tadayoshi Kokubo , Toshiaki Aoai , Akira Umehara , Yoshimasa Aotani
IPC分类号： G03C7/10 , C08G77/46 , G03C1/72 , G03F7/039 , G03F7/075 , H01L21/027
CPC分类号： G03C1/72 , G03F7/0758 , Y10T403/3926 , Y10T403/3933 , Y10T403/556 , Y10T403/60
摘要： A positively working resist material is disclosed, comprising a compound having at least one silyl ether group and capable of directly dissociating an Si-O-C bond upon irradiation with far ultraviolet rays, X-rays, an electron beam, or an ion beam. The resist material has high sensitivity to high energy radiation, excellent resistance to dry etching, and can be developed with an alkaline aqueous solution.
摘要翻译：公开了一种正性抗蚀剂材料，其包含具有至少一个甲硅烷基醚基团且能够在远紫外线，X射线，电子束或离子束照射时直接解离Si-O-C键的化合物。抗蚀剂材料对高能量辐射具有高灵敏度，优异的抗干蚀刻性，并且可以用碱性水溶液显影。

4. 发明授权

US5576143A Light-sensitive composition 失效
标题翻译：感光组合物
公开(公告)号：US5576143A
公开(公告)日：1996-11-19
申请号：US985262
申请日：1992-12-03
申请人： Toshiaki Aoai , Tadayoshi Kokubo
发明人： Toshiaki Aoai , Tadayoshi Kokubo
IPC分类号： G03F7/004 , G03C1/492
CPC分类号： G03F7/0045 , Y10S430/156
摘要： A positive type or negative type light-sensitive composition providing high sensitivity and high resolution in the manufacture of a semiconductor device, and contains:(a) a compound which has at least one group capable of decomposing by acid and a solubility that is increased in an alkaline developing solution,(b) a compound which generates acid by an irradiation with actinic rays or radiation,(c) a compound which generates a base at 50.degree. C. or higher, and(d) a resin which is insoluble in water and soluble in an alkaline aqueous solution.
摘要翻译：在半导体器件的制造中提供高灵敏度和高分辨率的正型或负型光敏组合物，其包含：（a）具有至少一个能够被酸分解的基团和溶解度增加的化合物碱性显影液，（b）通过光化射线或辐射照射产生酸的化合物，（c）在50℃以上产生碱的化合物，和（d）不溶于水的树脂并溶于碱性水溶液。

5. 发明授权

US5707777A Light-sensitive composition 失效
标题翻译：感光组合物
公开(公告)号：US5707777A
公开(公告)日：1998-01-13
申请号：US466136
申请日：1995-06-06
申请人： Toshiaki Aoai , Tadayoshi Kokubo
发明人： Toshiaki Aoai , Tadayoshi Kokubo
IPC分类号： G03F7/004 , G03F7/039 , G03F7/075 , H01L21/027 , G03F7/038
CPC分类号： G03F7/0755 , G03F7/0045 , Y10S430/11 , Y10S430/111 , Y10S430/122
摘要： A positive-working light-sensitive composition which comprises: (a) 0.5 to 80% by weight of a compound which has at least one group capable of being decomposed by an acid and whose solubility in an alkaline developer is increased by an acid; (b) 0.01 to 20% by weight of a disulfone compound represented by the following formula (I); R.sup.1 --SO.sub.2 --SO.sub.2 --R.sup.2 (I) wherein R.sup.1 and R.sup.2 may be the same or different and represent a substituted or unsubstituted alkyl, alkenyl or aryl group; and (c) 5 to 99.49% by weight of a resin insoluble in water and soluble in an alkaline water, wherein the compound of the component (a) has a molecular weight of not more than 2,000 and a boiling point of not less than 150.degree. C. and wherein a film of the composition having a thickness of 1 .mu.m has an optical density determined at 248 nm of not more than 1.4 before exposure to light and the optical density of the composition determined at 248 nm is reduced by exposure to light of 248 nm.
摘要翻译：一种正性感光性组合物，其包含：（a）0.5〜80重量％的具有至少一个能够被酸分解并且在碱性显影剂中的溶解度由酸增加的化合物; （b）0.01〜20重量％的由下式（I）表示的二砜化合物; R1-SO2-SO2-R2（Ⅰ）其中R1和R2可以相同或不同，表示取代或未取代的烷基，烯基或芳基; 和（c）5〜99.49重量％的不溶于水且可溶于碱性水的树脂，其中组分（a）的化合物的分子量不大于2,000，沸点不小于150 并且其中具有1μm厚度的组合物的膜在暴露于光之前在248nm处确定为不大于1.4的光密度，并且通过暴露于248nm下测定的组合物的光密度降低 248nm的光。

6. 发明授权

US5110709A Light-sensitive positive working composition containing a pisolfone compound 失效
标题翻译：含有酚醛化合物的敏感正性工作组合物
公开(公告)号：US5110709A
公开(公告)日：1992-05-05
申请号：US680733
申请日：1991-04-05
申请人： Toshiaki Aoai , Tadayoshi Kokubo
发明人： Toshiaki Aoai , Tadayoshi Kokubo
IPC分类号： G03F7/039 , H01L21/027
CPC分类号： G03F7/039
摘要： A positive working light-sensitive composition which comprises:(a) 10 to 95% by weight of a compound which has at least one acid-decomposable group and whose solubility in an alkaline developer increases by the action of an acid,(b) 0.01 to 20% by weight of a disulfone compound represented by the formula (I):R.sup.1 --SO.sub.2 --SO.sub.2 --R.sup.2 (I) wherein R.sup.1 and R.sup.2 may be same or different and represent substituted or unsubstituted alkyl groups, substituted or unsubstituted alkenyl groups or substituted or unsubstituted aryl groups, and(c) 3 to 85% by weight of a water-insoluble but alkaline water-soluble resin, wherein the optical density at 248 nm of 1 .mu.m thick coating of the composition is not more than 1.4 and the optical density at 248 nm of the coating exposed to light of 248 nm is less than the optical density of the coating before exposed to light.The light-sensitive composition is highly responsive to light of Deep-UV regions and excellent in image resolution.
摘要翻译：一种正性工作感光性组合物，其包含：（a）10至95重量％的具有至少一个酸可分解基团并且其在碱性显影剂中的溶解度随着酸的作用而增加的化合物，（b）0.01 至20重量％的由式（I）表示的二砜化合物：R 1 -SO 2 -SO 2 -R 2（I）其中R 1和R 2可以相同或不同，表示取代或未取代的烷基，取代或未取代的烯基或取代或未取代的芳基，和（c）3-85重量％的不溶于水的碱性水溶性树脂，其中组合物的1μm厚涂层的248nm处的光密度不大于1.4，曝光于248nm的涂层的248nm处的光密度小于曝光前的涂层的光密度。感光组合物对深UV区域的光敏感性高，图像分辨率优异。

7. 发明授权

US06846610B2 Positive photosensitive resin composition 有权
标题翻译：正型感光性树脂组合物
公开(公告)号：US06846610B2
公开(公告)日：2005-01-25
申请号：US10315182
申请日：2002-12-10
申请人： Yasumasa Kawabe , Kenichiro Sato , Toshiaki Aoai
发明人： Yasumasa Kawabe , Kenichiro Sato , Toshiaki Aoai
IPC分类号： G03F7/004 , G03F7/039 , G03C1/76
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： Provided is a positive photosensitive resin composition comprising (A) a polymer which has alicyclic hydrocarbon skeleton and decomposes under the action of an acid to be rendered soluble in alkali, (B) a compound which generates an acid upon irradiation with actinic rays, (C) a nitrogen-containing basic compound, (D) at least one of a fluorine-containing surfactant and a silicon-containing surfactant and (E) a solvent. The composition can exhibit better characteristics when the solvent (E) is a combination of specified solvents.
摘要翻译：本发明提供一种正型感光性树脂组合物，其含有（A）具有脂环式烃骨架的聚合物，在酸的作用下分解成碱溶性的聚合物，（B）在光化射线照射时产生酸的化合物，（C ）含氮碱性化合物，（D）含氟表面活性剂和含硅表面活性剂中的至少一种和（E）溶剂。当溶剂（E）是特定溶剂的组合时，组合物可以表现出更好的特性。

8. 发明授权

US06699635B1 Positive photosensitive composition 有权
标题翻译：正光敏组合物
公开(公告)号：US06699635B1
公开(公告)日：2004-03-02
申请号：US09471007
申请日：1999-12-23
申请人： Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai , Yasumasa Kawabe
发明人： Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai , Yasumasa Kawabe
IPC分类号： G03F7004
CPC分类号： G03F7/0048 , G03F7/0397 , Y10S430/106
摘要： A positive photosensitive composition suitable for resist pattern formation under exposure to far ultraviolet light of wavelengths of 250 nm or shorter, particularly 220 nm or shorther, comprising: (A) a resin comprising constitutional repeating units wherein particular ring structures are present and having groups capable of decomposing under the action of an acid to cause an increase of the solubility in an alkali developer, (B) a photo-acid generator capable of generating an acid upon irradiation with actinic rays or radiation, and (C) a fluorine-containing surfactant, a silicon-containing surfactant or a mixture thereof.
摘要翻译：适合于在暴露于波长为250nm或更短，特别是220nm或更短的远紫外光下的抗蚀剂图案形成的正性感光性组合物，其包含：（A）包含结构重复单元的树脂，其中存在特定的环结构并具有基团在酸的作用下分解，导致碱显影剂溶解度的增加，（B）能够在用光化学射线或辐射照射时产生酸的光酸发生剂，（C）含氟表面活性剂，含硅表面活性剂或其混合物。

9. 发明授权

US5707776A Positive resin composition sensitive to ultraviolet rays 失效
标题翻译：对紫外线敏感的正性树脂组合物
公开(公告)号：US5707776A
公开(公告)日：1998-01-13
申请号：US438481
申请日：1995-05-10
申请人： Yasumasa Kawabe , Tsukasa Yamanaka , Toshiaki Aoai
发明人： Yasumasa Kawabe , Tsukasa Yamanaka , Toshiaki Aoai
IPC分类号： G03F7/004 , G03F7/023 , G03F7/039 , H01L21/027 , G03C1/73
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/121 , Y10S430/122
摘要： Disclosed is a positive radiation-sensitive resist composition comprising polymer(s) of the following general formula (1) and a radiation-sensitive agent. ##STR1## Ra, Rb, Rc and Rd each are independently a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group, an alkenyl group, an aryl group, an aralkyl group, an alkoxycarbonyl group, an arylcarbonyl group, an acyloxy group, an acyl group, or a cycloalkyl group; k is an integer of from 1 to 30; (1+n) is an integer of from 1 to 100; m is an integer of from 1 to 50; p1, p2 and p3 each are an integer of from 1 to 3; q1 is an integer of from 1 to 4. The resist composition has high resolution to give resist patterns with good profiles and has high heat resistance and good storage stability.
摘要翻译：公开了包含以下通式（1）的聚合物和辐射敏感剂的正辐射敏感抗蚀剂组合物。（1）<图像> Ra，Rb，Rc和Rd分别独立地为氢原子，羟基，卤素原子，烷基，烷氧基，烯基，芳基，芳烷基烷氧基羰基，芳基羰基，酰氧基，酰基或环烷基; k为1〜30的整数，（1 + n）为1〜100的整数， m为1〜50的整数， p1，p2和p3各自为1〜3的整数; q1为1〜4的整数。抗蚀剂组合物具有高分辨率，得到具有良好外形的抗蚀剂图案，并且具有高耐热性和良好的储存稳定性。

10. 发明授权

US06806022B1 Positive photosensitive resin composition 有权
标题翻译：正型感光性树脂组合物
公开(公告)号：US06806022B1
公开(公告)日：2004-10-19
申请号：US09295329
申请日：1999-04-21
申请人： Yasumasa Kawabe , Kenichiro Sato , Toshiaki Aoai
发明人： Yasumasa Kawabe , Kenichiro Sato , Toshiaki Aoai
IPC分类号： G03C1492
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： Provided is a positive photosensitive resin composition comprising (A) a polymer which has alicyclic hydrocarbon skeletons and composes under the action of an acid to be rendered soluble in alkali, (B) a compound which generates an acid upon irradiation with actinic rays, (C) a nitrogen-containing basic compound, (D) at least one of a fluorine-containing surfactant and a silicon-containing surfactant and (E) a solvent. The composition can exhibit better characteristics when the solvent (E) is a combination of specified solvents.
摘要翻译：本发明提供一种正型感光性树脂组合物，其包含（A）具有脂环族烃骨架并在酸性作用下组成的聚合物，使其易溶于碱，（B）在光化射线照射时产生酸的化合物，（C ）含氮碱性化合物，（D）含氟表面活性剂和含硅表面活性剂中的至少一种和（E）溶剂。当溶剂（E）是特定溶剂的组合时，组合物可以表现出更好的特性。

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