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1. 发明公开

CN1059048A 阴极射线管面板凹面充电的方法失效
公开(公告)号：CN1059048A
公开(公告)日：1992-02-26
申请号：CN91105537.1
申请日：1991-08-12
申请人： PCA许可公司
发明人： P·达塔 , G·H·N·里德尔 , R·N·弗里尔 , R·E·西姆斯 , C·C·施泰因梅茨
IPC分类号： H01J9/227 , G03C7/10
CPC分类号： H01J9/2276 , G03G5/10 , G03G7/00 , G03G7/0093 , G03G15/0291 , G03G2215/028 , H01J9/225 , Y10S430/102
摘要：一种以电子照相方式制造荧光屏的方法，该方法采用一个充电装置(36)给位于面板(12)的内侧非平面状表面上的光电导层(34)均匀充电，并包括下列步骤：从电晕发生器(46)向至少一个电晕充电器(50)提供电晕电压，所述电晕充电器与非平面状表面上的光电导层基本一致并与隔开；在非平面状表面范围内移动电晕充电器。

2. 发明公开

EP0135965A2 Photographic process for applying phosphor pattern to color CRT shadow mask 失效
标题翻译：摄影师Verfahren zum Aufbringen eines Phosphormusters auf eine Schattenmaske eines Farb-Kathodenstrahlungsrohrs。
公开(公告)号：EP0135965A2
公开(公告)日：1985-04-03
申请号：EP84201296.5
申请日：1984-09-10
申请人： NORTH AMERICAN PHILIPS CONSUMER ELECTRONICS CORP.
发明人： Bergamo, Robert Leo INT. OCTROOIBUREAU B.V. , Foreman, Gordon Thomas INT. OCTROOIBUREAU B.V. , Gallaro, Anthony Vincent INT. OCTROOIBUREAU B.V. , Nagel, Judy Ann INT. OCTROOIBUREAU B.V.
IPC分类号： H01J9/227 , G03C1/64 , G03C7/10
CPC分类号： H01J9/2271
摘要： In accordance with the invention, a photographic process for providing a phosphor pattern on a CCRT shadow mask comprises the steps of:

a) applying a uniform layer of a positive-working photoresist composition to the shadow mask surface, at least in the areas where phosphor is desired;
b) applying a uniform layer of phosphor particles in contact with the photoresist layer;
c) exposing the photoresist layer to actinic radiation through a positive photomask to solubilize the exposed portions of the photoresist layer;
d) exposing the reverse side of the shadow mask to actinic radiation to solubilize portions of the photoresist layer in the aperture areas of the shadow mask;
e) contacting the photoresist layer with a solvent to remove the solubilized portions of the layer; and
f) baking the shadow mask to remove the remaining photoresist, to leave a uniform, adherent phosphor pattern layer on the mask.

Such a process does not rely upon the use of a pattern stencil to define the phosphor pattern, and enables the application of a phosphor pattern without reducing the size of, or blocking the mask apertures.
摘要翻译：根据本发明，用于在CCRT荫罩上提供磷光体图案的照相方法包括以下步骤：a）至少在以下区域中施加均匀的正性光致抗蚀剂组合物到荫罩表面上：磷光体; b）施加与光致抗蚀剂层接触的均匀的荧光体颗粒层; c）将光致抗蚀剂层暴露于通过正光掩模的光化辐射，以溶解光致抗蚀剂层的暴露部分; d）将阴影掩模的反面使光化辐射溶解在荫罩的孔径区域中的光致抗蚀剂层的部分; e）使光致抗蚀剂层与溶剂接触以除去该层的溶解部分; 和... f）烘烤荫罩以除去残留的光致抗蚀剂，以在掩模上留下均匀的粘附的荧光体图案层。这种方法不依赖于使用图案模板来限定磷光体图案，并且能够在不减小掩模孔径的尺寸或阻挡掩模孔的情况下施加荧光体图案。

3. 发明专利

JPH0146865B2 失效
公开(公告)号：JPH0146865B2
公开(公告)日：1989-10-11
申请号：JP13972980
申请日：1980-10-06
申请人： CORNING GLASS WORKS
发明人： SUTANREI DONARUDO SUTOTSUKII
IPC分类号： G03C7/00 , C03C3/11 , C03C4/04 , G03B33/00 , G03B33/16 , G03C1/725 , G03C5/08 , G03C7/04 , G03C7/10 , G03C7/12

4. 发明专利

JPS6238452A PHOTO-SOLUBILIZABLE COMPOSITION 失效
公开(公告)号：JPS6238452A
公开(公告)日：1987-02-19
申请号：JP17871485
申请日：1985-08-14
申请人： FUJI PHOTO FILM CO LTD
发明人： AOSO TOSHIAKI , UMEHARA AKIRA , AOTANI NORIMASA
IPC分类号： G03C7/10 , G03C1/72 , G03F7/039 , G03F7/075
摘要： PURPOSE:To obtain the titled composition having a high photosensitivity and an excellent stability during a lapse of time and enabling to a storage for long periods by incorporating a compd. capable of generating an acid by irradiating an active ray, and a compd. contg. at least one of the silylether unit capable of decomposing with a specific acid and also having a property of increasing a solubility in a developer with an action of the acid to the titled composition. CONSTITUTION:The titled composition comprises the compd. (a) capable of generating the acid with the irradiation of the active ray, and the compd. (b) shown by the formula and having at least one of the silylether group unit capable of decomposing with the acid and having the property of increasing the solubility in the developer with the action of the acid. The weight ratio of the compds. (a) and (b) is preferably (0.001:1)-(2:1). The titled compd. may be composed of a combination of only the compd. (a) capable of generating the acid with the irradiation of the active ray and the compd. (b) contg. at least one of the silylether group unit capable of decomposing with the acid. However, preferably, the titled composition may be used jointly with an alkaline soluble resin. The suitable alkaline soluble resin comprises a novolak type phenol resin.

5. 发明专利

JPS60103346A PHOTOSENSITIVE RESIN COMPOSITION 失效
公开(公告)号：JPS60103346A
公开(公告)日：1985-06-07
申请号：JP21226183
申请日：1983-11-10
申请人： SEKISUI CHEMICAL CO LTD
发明人： YANAGISAWA KUNIO , ARAKI YASUHIKO , SHIYOUHI HAJIME
IPC分类号： G03F7/038 , G03C7/10 , G03F7/004 , G03F7/032 , G03F7/033
摘要： PURPOSE:To obtain an image forming photosensitive resin compsn. superior in storage stability, hardenability, etc., by mixing a photopolymerizable unsatd. compd. having plural terminal ethylenic groups, a photopolymerization sensitizer, an epoxy compd., and a specified linear polymer compd. CONSTITUTION:An objective photosensitive resin compsn. is obtained by mixing (A) a photopolymerizable unsatd. compd. having plural terminal ethylenic groups, e.g., triethylene glycol acrylate, (B) a photopolymn. sensitizer, e.g., benzophenone, (C) an epoxy compd. having plural epoxy groups, e.g., an epoxy prepolymer, and (D) a linear prepolymer obtained by polymerizing a compd. represented by the formula in which R1 is H, methyl, ethyl, or the like, and R2, R3, R4 are each aliphatic or aromatic hydrocarbon group or the like, e.g., 1,1-dimethyl-1-(2-hydroxy-3-butoxypropyl)amine-methacylimide, as one component.

6. 发明专利

JPS6035727A MANUFACTURE OF PATTERN 失效
公开(公告)号：JPS6035727A
公开(公告)日：1985-02-23
申请号：JP14464383
申请日：1983-08-08
申请人： HITACHI CHEMICAL CO LTD
发明人： UCHIMURA SHIYUNICHIROU , SATOU TOUNOBU , KOIBUCHI SHIGERU , MAKINO DAISUKE
IPC分类号： C08K5/28 , C08K5/36 , C08L83/00 , C08L83/04 , G03C5/00 , G03C7/10 , G03F7/038 , G03F7/075 , H01L21/027
摘要： PURPOSE:To obtain a pattern faithful to a resist pattern by coating a specified photosensitive silicone resin composition on a layer to be processed, forming a pattern by exposure and development, and carrying out dry etching with oxygen plasma. CONSTITUTION:A photosensitive silicone resin composition 3 consisting of ladder polysiloxane having optionally terminal hydroxy groups represented by formula I and/or II [where each of R1-4 is a univalent (substituted) hydrocarbon group, and each of m and n is a positive integer] and an aromatic (sulfonyl) azide compound is dissolved in an org. solvent. The composition 3 is coated on a layer 2 to be processed such as an insulating layer on a substrate 1, and it is dried, irradiated with light, and developed to form a patterned resist layer 3. The layer 3 is exposed to oxygen plasma to dry etch the part of the layer 2 not covered with the layer 3, and the layer 3 is removed. Dry etching is easily applied, and a fine circuit pattern can be formed.

7. 发明专利

JPS5952822B2 失效
公开(公告)号：JPS5952822B2
公开(公告)日：1984-12-21
申请号：JP4328878
申请日：1978-04-14
申请人： TORAY INDUSTRIES
发明人： HIRAMOTO YOSHI , EGUCHI MASUICHI
IPC分类号： G03C7/10 , C08F2/00 , C08F2/48 , C08G69/28 , C08G73/00 , C08G73/10 , C08G73/14 , C08G73/16 , G03F7/037 , G03F7/038 , H01L21/027 , H05K3/28

8. 发明专利

JPS59164552A Formation of color image 失效
标题翻译：形成彩色图像
公开(公告)号：JPS59164552A
公开(公告)日：1984-09-17
申请号：JP3868883
申请日：1983-03-08
申请人： Konishiroku Photo Ind Co Ltd
发明人： HIRABAYASHI SHIGETO , HOTSUTA YUUJI , YAMASHITA KIYOSHI
IPC分类号： G03C5/08 , G03C7/10 , G03C8/08 , G03C8/30 , G03C7/00
CPC分类号： G03C8/30
摘要： PURPOSE:To obtain a color image high in quality by forming a mosaic layer consisting of finely divided regions contg. each of 3 kinds of dye donors separately, and a photosensitive silver halide emulsion layer on a transparent support, exposing it to single color light, and developing it. CONSTITUTION:A mosaic layer 2 formed on a transparent support 1 consists of a large number of finely divided regions contg. each of dye donors of Y, M, and C releasing each of yellow, magenta, and cyan diffusive dyes or their precursors selectively and alternately. Further, a photosensitive silver halide emulsion layer 3 is formed on the layer 2. The mosaic layer is exposed to laser beams through the support 1 and developed with an alkaline developing soln. As a result, only the regions of the mosaic layer 2 corresponding to the exposed parts are developed and the diffusive dyes are diffused and transferred to the image receiving layer of an image receiving element 4 to form an image.
摘要翻译：目的：通过形成由细分区域组成的镶嵌层来获得高质量的彩色图像。分别在3种染料供体中分别加入3种染料供体，并在透明载体上涂上感光卤化银乳剂层，将其曝光于单色光并显影。构成：形成在透明支撑体1上的马赛克层2由大量细分区域构成。每个Y，M和C的染料供体都选择性地和交替地释放黄色，品红色和青色漫射染料或其前体中的每一种。此外，在层2上形成感光性卤化银乳剂层3.马赛克层通过支撑体1暴露于激光束，并用碱性显影溶液显影。结果，只有与曝光部分相对应的马赛克层2的区域被显影，并且漫射染料被扩散并转移到图像接收元件4的图像接收层以形成图像。

9. 发明专利

JPS5694309A MULTICOLOR OPTICAL FILTER AND ITS PRODUCTION 失效
公开(公告)号：JPS5694309A
公开(公告)日：1981-07-30
申请号：JP17383679
申请日：1979-12-27
申请人： FUJI PHOTO FILM CO LTD , FUJI PHOTO OPTICAL CO LTD
发明人： SATOU MASAMICHI , MATSUMOTO KENJI , SEKI KAZUHISA
IPC分类号： H04N9/07 , G02B5/20 , G02B5/28 , G03C7/10 , H01L31/0216
摘要： PURPOSE:To obtain spectral characteristics equivalent to those of an interference filter and simplify production processes by joining the interference filter arranged with an interference film on a transparent substrate and the dye filter constituted on another substrate in a manner as to oppose to each other. CONSTITUTION:Two sheets of filters consisting of an interference filter 10 made by forming a cyan interference stripelike pattern 12 on a transparent glass substrate 11, and a dye filter 30 made by forming a yellow stripe filter 32 and optical black 34 etc. through coupler-in-developer-type color development in the silver halide emulsion layer provided on an nother transparent glass substrate 31, are bonded by a transparent adhesive agent, for example, epoxy adhesive agent 41, in such a manner that the mutual filter surfaces oppose to each other, thereafter the glass substrate 31 is polished 42 thinly. Thereby, the spectral characteristics equivalent to those of an interference filter are obtained and neverthless the production processes are simplifiled.

10. 发明专利

JP2607870B2 失效
公开(公告)号：JP2607870B2
公开(公告)日：1997-05-07
申请号：JP16551285
申请日：1985-07-26
IPC分类号： G03C7/10 , C08G77/46 , G03C1/72 , G03F7/039 , G03F7/075 , H01L21/027
摘要： A positively working resist material is disclosed, comprising a compound having at least one silyl ether group and capable of directly dissociating an Si-O-C bond upon irradiation with far ultraviolet rays, X-rays, an electron beam, or an ion beam. The resist material has high sensitivity to high energy radiation, excellent resistance to dry etching, and can be developed with an alkaline aqueous solution.

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