专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5932354A Obliquely deposited film element 失效
标题翻译：倾斜沉积膜元件
公开(公告)号：US5932354A
公开(公告)日：1999-08-03
申请号：US893510
申请日：1997-07-11
申请人： Yasuhiko Takeda , Tomoyoshi Motohiro , Tatsumi Hioki , Shoji Noda , Mikio Okamoto , Hiroshi Niikura
发明人： Yasuhiko Takeda , Tomoyoshi Motohiro , Tatsumi Hioki , Shoji Noda , Mikio Okamoto , Hiroshi Niikura
IPC分类号： C03C17/34 , G02B5/30 , B32B17/00
CPC分类号： C03C17/3452 , C03C17/3417 , G02B5/3033
摘要： By providing a normally deposited layer as a buffer layer between a substrate and an obliquely deposited layer, it is possible to prevent contaminants on the substrate from diffusing into the obliquely deposited layer. Also, by providing a normally deposited layer as a passivation layer on the uppermost obliquely deposited layer, absorption of water vapor in the air by the obliquely deposited layer is prevented. Further, by forming a laminated object comprising obliquely deposited layers and dense normally deposited layers, strength of each obliquely deposited layer itself is increased and relaxation of its columnar structure can be suppressed with certainty because both the diffusion of contaminants from the substrate and the absorption of water in the air is prevented. Thus, by removing factors to accelerate the relaxation of columnar structure in the obliquely deposited layer, clouding of the obliquely deposited film layer can be prevented.
摘要翻译：通过在衬底和倾斜沉积层之间提供作为缓冲层的常规沉积层，可以防止衬底上的污染物扩散到倾斜沉积层中。此外，通过在最上面的倾斜沉积层上提供作为钝化层的正常沉积层，防止了倾斜沉积层对空气中的水蒸气的吸收。此外，通过形成包括倾斜沉积层和致密正常沉积层的层叠物体，每个倾斜沉积层本身的强度增加，并且可靠地确定地抑制其柱状结构的松弛，因为污染物从基底的扩散和吸收防止空气中的水。因此，通过去除加速倾斜沉积层中的柱状结构的因素，可以防止倾斜沉积膜层的混浊。

2. 发明申请

US20050140967A1 Method for evaluating refractive index homogeneity of optical member 有权
$Method for evaluating refractive index homogeneity of optical member$
标题翻译：评价光学元件的折射率均匀性的方法
公开(公告)号：US20050140967A1
公开(公告)日：2005-06-30
申请号：US11002456
申请日：2004-12-03
申请人： Yutaka Yamaguchi , Masaaki Mochida , Atsushi Yanagisawa , Hiroshi Niikura
发明人： Yutaka Yamaguchi , Masaaki Mochida , Atsushi Yanagisawa , Hiroshi Niikura
IPC分类号： G01M11/00 , G03F7/20 , G01B9/00
CPC分类号： G03F7/70591 , G01M11/00 , G03F7/706
摘要： A method for evaluating the refractive index homogeneity of an optical member includes passing light through an optical member (1) used for photolithography. The side surface (1a) with respect to the optical axis (AX) of the optical member (1) is retained by elastic members (4) at a plurality of positions disposed at equal intervals to pass light through the optical member (1) and measure a wave front aberration. The optical member is rotated around the optical axis (AX) by the equal interval to measure a wave front aberration again and determine the difference from the initial measurement. The optical member (1) is moved in a direction perpendicular to the optical axis (AX) to measure a wave front aberration again and determined the difference from the initial measurement. The refractive index homogeneity of the optical member can be accurately evaluated from those differences by using fitting of the Zernike cylindrical function.
摘要翻译：用于评估光学构件的折射率均匀性的方法包括使光通过用于光刻的光学构件（1）。相对于光学构件（1）的光轴（AX）的侧表面（1a）由弹性构件（4）在相等间隔设置的多个位置处保持以使光通过光学构件（1）并测量波前像差。光学构件围绕光轴（AX）旋转相等的间隔，以再次测量波前像差，并确定与初始测量的差异。光学构件（1）沿垂直于光轴（AX）的方向移动，以再次测量波前像差，并确定与初始测量的差异。通过使用Zernike圆柱形函数的拟合，可以从这些差异精确地评估光学构件的折射率均匀性。

3. 发明授权

US6128093A Unit for measuring optical properties 有权
标题翻译：用于测量光学特性的单位
公开(公告)号：US6128093A
公开(公告)日：2000-10-03
申请号：US414075
申请日：1999-10-07
申请人： Hiroshi Niikura
发明人： Hiroshi Niikura
IPC分类号： G01N21/01 , G01N21/21 , G01N21/27 , G01N21/41 , G01N21/59 , G01N21/00
CPC分类号： G01N21/55
摘要： A unit for measuring optical properties. The unit includes the first through sixth reflecting surfaces, a reflecting surface rotating device and an object moving device. In order to accurately measure transmittance, reflectance and phase change in transmittance or reflection of optical elements, especially transmittance of a thick object, the first through the fourth reflecting surfaces M1-M4 are arranged so that an optical path formed by the reflecting surfaces M1-M4 has a shape like an "N" letter and so that light of incidence L1 has the same optical axis as exit light L2. An optical center O is a point that a line segment that connects a point of incidence A with an exit point D intersects an optical path that connects the reflecting surface M2 with the reflecting surface M3. The reflecting surface M2 is an ellipsoid of revolution having foci of the optical center O and the point of incidence A. The reflecting surface M3 is an ellipsoid of revolution having foci of the optical center and the exit point D. A reflecting surface rotating device rotates M4 at the exit point D in conjunction with the reflecting surface M1 that is rotated at the point of incidence A. The reflecting surface M5 is a parabolic mirror that makes light reflected from the reflecting surface M1 parallel. M6 is a parabolic mirror that converges light reflected from the reflecting surface M5 onto the reflecting mirror M4.
摘要翻译：用于测量光学性能的单元。该单元包括第一至第六反射表面，反射表面旋转装置和物体移动装置。为了准确测量透光率，光学元件的透射率或反射率的反射率和相位变化，特别是厚物体的透射率，第一至第四反射表面M1-M4被布置成使得由反射表面M1- M4具有类似“N”字形的形状，使得入射光L1具有与出射光L2相同的光轴。光学中心O是将入射点A与出射点D连接的线段与将反射面M2与反射面M3连接的光路相交的点。反射面M2是具有光学中心O和入射点A的焦点的旋转椭圆体。反射面M3是具有光学中心和出射点D的焦点的旋转椭圆体。反射面旋转装置旋转 M4与在入射点A旋转的反射面M1结合。出射点D处的反射面M5是使从反射面M1反射的光平行的抛物面镜。 M6是将从反射面M5反射的光会聚在反射镜M4上的抛物面镜。

4. 发明授权

US07245361B2 Method for evaluating refractive index homogeneity of optical member 有权
$Method for evaluating refractive index homogeneity of optical member$
标题翻译：评价光学元件的折射率均匀性的方法
公开(公告)号：US07245361B2
公开(公告)日：2007-07-17
申请号：US11002456
申请日：2004-12-03
申请人： Yutaka Yamaguchi , Masaaki Mochida , Atsushi Yanagisawa , Hiroshi Niikura
发明人： Yutaka Yamaguchi , Masaaki Mochida , Atsushi Yanagisawa , Hiroshi Niikura
IPC分类号： G01B9/00 , G01N21/41
CPC分类号： G03F7/70591 , G01M11/00 , G03F7/706
摘要： A method for evaluating the refractive index homogeneity of an optical member includes passing light through an optical member (1) used for photolithography. The side surface (1a) with respect to the optical axis (AX) of the optical member (1) is retained by elastic members (4) at a plurality of positions disposed at equal intervals to pass light through the optical member (1) and measure a wave front aberration. The optical member is rotated around the optical axis (AX) by the equal interval to measure a wave front aberration again and determine the difference from the initial measurement. The optical member (1) is moved in a direction perpendicular to the optical axis (AX) to measure a wave front aberration again and determined the difference from the initial measurement. The refractive index homogeneity of the optical member can be accurately evaluated from those differences by using fitting of the Zernike cylindrical function.
摘要翻译：用于评估光学构件的折射率均匀性的方法包括使光通过用于光刻的光学构件（1）。相对于光学构件（1）的光轴（AX）的侧表面（1a）由弹性构件（4）在相等间隔设置的多个位置处保持以使光通过光学构件（1）并测量波前像差。光学构件围绕光轴（AX）旋转相等的间隔，以再次测量波前像差，并确定与初始测量的差异。光学构件（1）沿垂直于光轴（AX）的方向移动，以再次测量波前像差，并确定与初始测量的差异。通过使用Zernike圆柱形函数的拟合，可以从这些差异精确地评估光学构件的折射率均匀性。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式