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1. 发明申请

US20100006755A1 CHARGED PARTICLE BEAM ALIGNMENT METHOD AND CHARGED PARTICLE BEAM APPARATUS 审中-公开
标题翻译：充电颗粒光束对准方法和充电颗粒光束装置
公开(公告)号：US20100006755A1
公开(公告)日：2010-01-14
申请号：US12564511
申请日：2009-09-22
申请人： Mitsugo Sato , Tadashi Otaka , Makoto Ezumi , Atsushi Takane , Shoji Yoshida , Satoru Yamaguchi , Yasuhiko Ozawa
发明人： Mitsugo Sato , Tadashi Otaka , Makoto Ezumi , Atsushi Takane , Shoji Yoshida , Satoru Yamaguchi , Yasuhiko Ozawa
IPC分类号： G01N23/22
CPC分类号： H01J37/1471 , H01J37/28 , H01J2237/1501 , H01J2237/153
摘要： An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged particle beam changes. The present invention comprises calculation means for calculating a deflection amount of an alignment deflector which performs an axis alignment for an objective lens, a plurality of calculation methods for calculating the deflection amount is memorized in the calculation means, and a selection means for selecting at least one of the calculation methods is provided.
摘要翻译：本发明的目的是提供一种带电粒子束装置和带电粒子束装置的对准方法，即使当带电粒子束的状态发生变化时，也能够容易地使带电粒子束的光轴对准。本发明包括用于计算对物镜执行轴对准的对准偏转器的偏转量的计算装置，用于计算偏转量的多种计算方法被存储在计算装置中，以及选择装置，用于至少选择提供了一种计算方法。

2. 发明授权

US06756589B1 Method for observing specimen and device therefor 有权
标题翻译：观察标本及其装置的方法
公开(公告)号：US06756589B1
公开(公告)日：2004-06-29
申请号：US09743560
申请日：2001-01-09
申请人： Kenji Obara , Yuji Takagi , Atsushi Shimoda , Ryou Nakagaki , Seiji Isogai , Yasuhiko Ozawa , Hideka Banba , Kenji Watanabe , Chie Shishido
发明人： Kenji Obara , Yuji Takagi , Atsushi Shimoda , Ryou Nakagaki , Seiji Isogai , Yasuhiko Ozawa , Hideka Banba , Kenji Watanabe , Chie Shishido
IPC分类号： H01L2166
CPC分类号： H01J37/28 , G01N21/956 , G01N21/95692 , G01N2021/8867 , H01J2237/2817 , H01L22/12
摘要： During closer inspection with a local defect area being magnified, it is desirable to reduce image acquisition time by making the number of stage moves as few as possible so that a defect can be observed efficiently. To accomplish this, the invention offers a method of observing samples characterized by: acquiring a reference sample image not including any defect on a sample by capturing an image of the sample, based on the information on the defect developed on the sample and detected by an inspection apparatus; adjusting the position of the sample so that the defect will fall within the field of view of image capture, based on the above information; acquiring a defective sample image including the defect on the sample by capturing an image of the sample in the adjusted position; locating the defect on the defective sample image by comparing the reference sample image and the defective sample image; acquiring a magnified image of the defect by capturing a magnified view of the local area where the located defect exists within the field of view of image capture; and displaying the magnified image of the defect on a screen.
摘要翻译：在局部缺陷区域放大的仔细检查中，期望通过使台数移动尽可能少地减少图像获取时间，从而可以有效地观察到缺陷。为了实现这一点，本发明提供了一种观察样本的方法，其特征在于：基于在样品上形成的缺陷的信息，通过采集样本的检测信息来获取样本上不包括任何缺陷的参考样本图像，检验仪器; 基于上述信息，调整样本的位置使得缺陷落入图像捕获视野内; 通过在调整位置拍摄样本的图像来获取包含样本上的缺陷的缺陷样本图像; 通过比较参考样本图像和有缺陷的样本图像来定位缺陷样本图像上的缺陷; 通过在图像捕获视野内捕获定位缺陷的局部区域的放大视图来获取缺陷的放大图像; 并在屏幕上显示缺陷的放大图像。

3. 再颁专利

USRE34495E NMR imaging method 失效
标题翻译： NMR成像方法
公开(公告)号：USRE34495E
公开(公告)日：1994-01-04
申请号：US725514
申请日：1991-07-03
申请人： Koichi Sano , Tetsuo Yokoyama , Ryuzaburo Takeda , Yasuhiko Ozawa , Shinichi Sato , Hideaki Koizumi
发明人： Koichi Sano , Tetsuo Yokoyama , Ryuzaburo Takeda , Yasuhiko Ozawa , Shinichi Sato , Hideaki Koizumi
IPC分类号： G01F1/716 , G01P5/00 , G01R33/563 , A61B5/055
CPC分类号： G01F1/716 , G01P5/00 , G01R33/56308 , G01R33/56316
摘要： A slice selection gradient magnetic field used in a pulse sequence for generating a spin echo signal is applied in such a fashion that its polarity at the time of a 90.degree. pulse becomes opposite to the one at the time of 180.degree. pulse, in order to expand a dynamic range of blood flow speed measurement. When the blood flow speed contains a component in a slice vertical direction, the gradient magnetic field in the slice vertical direction is adjusted so that the phase changes of two sets of flow encoded pulses contained in the slice vertical direction are opposite to each other.The flow speed in the direction of the readout gradient magnetic field, which is a lateral direction of the slice plane, is purely measured by canceling influences of the flow in the slice vertical direction.
摘要翻译：施加用于产生自旋回波信号的脉冲序列中的切片选择梯度磁场，使得其在90度脉冲时的极性与180度脉冲时的极性相反，以便扩大血流速度测量的动态范围。当血流速度包含切片垂直方向上的分量时，调整切片垂直方向上的梯度磁场，使得包含在切片垂直方向上的两组流动编码脉冲的相位变化彼此相反。通过消除切片垂直方向上的流动的影响，纯粹地测量作为切片平面的横向的读出梯度磁场的方向上的流速。

4. 发明授权

US5049940A Image forming apparatus 失效
公开(公告)号：US5049940A
公开(公告)日：1991-09-17
申请号：US470308
申请日：1990-01-25
申请人： Yasuyoshi Yamaguchi , Yasuhiko Ozawa , Masataka Suzuki , Akira Sato , Yoshinori Asai , Yoshiharu Horii , Takashi Shimaoka
发明人： Yasuyoshi Yamaguchi , Yasuhiko Ozawa , Masataka Suzuki , Akira Sato , Yoshinori Asai , Yoshiharu Horii , Takashi Shimaoka
IPC分类号： G03G21/18
CPC分类号： G03G21/1853 , G03G21/1647 , G03G21/1661 , G03G2221/1654 , G03G2221/1657 , G03G2221/166 , G03G2221/1678 , G03G2221/1869
摘要： According to the present invention, an upper body which is relatively light in weight is connected to a lower body which contains a paper conveying path and a transfer portion disposed in the paper conveying path, and support portions formed in the lower body are brought into abutment with an image forming portion comprising an image carrier unit and a developing unit, the image carrier unit having an image carrier, and in this state the image forming portion is fixed by a retaining device.

5. 发明授权

US08666165B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US08666165B2
公开(公告)日：2014-03-04
申请号：US12249014
申请日：2008-10-10
申请人： Satoru Yamaguchi , Takashi Iizumi , Osamu Komuro , Hidetoshi Morokuma , Tatsuya Maeda , Juntaro Arima , Yasuhiko Ozawa
发明人： Satoru Yamaguchi , Takashi Iizumi , Osamu Komuro , Hidetoshi Morokuma , Tatsuya Maeda , Juntaro Arima , Yasuhiko Ozawa
IPC分类号： G06K9/00
CPC分类号： H01J37/28 , G01N23/04 , G01N23/225 , G06T7/74 , G06T2207/10056 , G06T2207/30148 , H01J37/222 , H01J2237/2817
摘要： An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.
摘要翻译：本发明的目的是提供一种用于减少与检查定位或输入操作相关的处理的扫描电子显微镜，从而以高速度高精度地运行。为了实现上述目的，本发明提供了一种扫描电子显微镜，其具有基于预先登记的图案来识别期望位置的功能，该扫描电子显微镜包括用于设置关于图案种类的信息的装置，多个部分之间的间隔构成图案的部分，以及构成图案的部分的尺寸，以及基于由相关装置获得的信息形成由多个部分组成的图案图像的装置。

6. 发明授权

US07605381B2 Charged particle beam alignment method and charged particle beam apparatus 有权
公开(公告)号：US07605381B2
公开(公告)日：2009-10-20
申请号：US10734261
申请日：2003-12-15
申请人： Mitsugu Sato , Tadashi Otaka , Makoto Ezumi , Atsushi Takane , Shoji Yoshida , Satoru Yamaguchi , Yasuhiko Ozawa
发明人： Mitsugu Sato , Tadashi Otaka , Makoto Ezumi , Atsushi Takane , Shoji Yoshida , Satoru Yamaguchi , Yasuhiko Ozawa
IPC分类号： H01L21/027
CPC分类号： H01J37/1471 , H01J37/28 , H01J2237/1501 , H01J2237/153
摘要： An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged particle beam changes. The present invention comprises calculation means for calculating a deflection amount of an alignment deflector which performs an axis alignment for an objective lens, a plurality of calculation methods for calculating the deflection amount is memorized in the calculation means, and a selection means for selecting at least one of the calculation methods is provided.

7. 发明授权

US07439505B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US07439505B2
公开(公告)日：2008-10-21
申请号：US11292002
申请日：2005-12-02
申请人： Satoru Yamaguchi , Takashi Iizumi , Osamu Komuro , Hidetoshi Morokuma , Tatsuya Maeda , Juntaro Arima , Yasuhiko Ozawa
发明人： Satoru Yamaguchi , Takashi Iizumi , Osamu Komuro , Hidetoshi Morokuma , Tatsuya Maeda , Juntaro Arima , Yasuhiko Ozawa
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , G01N23/04 , G01N23/225 , G06T7/74 , G06T2207/10056 , G06T2207/30148 , H01J37/222 , H01J2237/2817
摘要： An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.
摘要翻译：本发明的目的是提供一种用于减少与检查定位或输入操作相关的处理的扫描电子显微镜，从而以高速度高精度地运行。为了实现上述目的，本发明提供了一种扫描电子显微镜，其具有基于预先登记的图案来识别期望位置的功能，该扫描电子显微镜包括用于设置关于图案种类的信息的装置，多个部分之间的间隔构成图案的部分，以及构成图案的部分的尺寸，以及基于由相关装置获得的信息形成由多个部分组成的图案图像的装置。

8. 发明申请

US20070194236A1 Semiconductor inspection system 审中-公开
公开(公告)号：US20070194236A1
公开(公告)日：2007-08-23
申请号：US11790224
申请日：2007-04-24
申请人： Atsushi Takane , Haruo Yoda , Shoji Yoshida , Mitsuji Ikeda , Yasuhiko Ozawa
发明人： Atsushi Takane , Haruo Yoda , Shoji Yoshida , Mitsuji Ikeda , Yasuhiko Ozawa
IPC分类号： G21K7/00
CPC分类号： H01J37/28
摘要： An operator-free and fully automated semiconductor inspection system with high throughput is realized. All conditions required for capturing and inspection are generated from design information such as CAD data. In order to perform actual inspection under the conditions, a semiconductor inspection system is composed of a navigation system for generating all the conditions required for capturing and inspection from the design information and a scanning electron microscope system for actually performing capturing and inspection. Moreover, in the case of performing a matching process between designed data and a SEM image, deformed parts are corrected by use of edge information in accordance with multiple directions and smoothing thereof. Furthermore, a SEM image corresponding to a detected position is re-registered as a template, and the matching process is thereby performed.

9. 发明授权

US07002151B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US07002151B2
公开(公告)日：2006-02-21
申请号：US10933342
申请日：2004-09-03
申请人： Satoru Yamaguchi , Takashi Iizumi , Osamu Komuro , Hidetoshi Morokuma , Tatsuya Maeda , Juntaro Arima , Yasuhiko Ozawa
发明人： Satoru Yamaguchi , Takashi Iizumi , Osamu Komuro , Hidetoshi Morokuma , Tatsuya Maeda , Juntaro Arima , Yasuhiko Ozawa
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , G01N23/04 , G01N23/225 , G06T7/74 , G06T2207/10056 , G06T2207/30148 , H01J37/222 , H01J2237/2817
摘要： An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.
摘要翻译：本发明的目的是提供一种用于减少与检查定位或输入操作相关的处理的扫描电子显微镜，从而以高速度高精度地运行。为了实现上述目的，本发明提供了一种扫描电子显微镜，其具有基于预先登记的图案来识别期望位置的功能，该扫描电子显微镜包括用于设置关于图案种类的信息的装置，多个部分之间的间隔构成图案的部分，以及构成图案的部分的尺寸，以及基于由相关装置获得的信息形成由多个部分组成的图案图像的装置。

10. 发明授权

US06864493B2 Charged particle beam alignment method and charged particle beam apparatus 有权
标题翻译：带电粒子束对准方法和带电粒子束装置
公开(公告)号：US06864493B2
公开(公告)日：2005-03-08
申请号：US10082288
申请日：2002-02-26
申请人： Mitsugu Sato , Tadashi Otaka , Makoto Ezumi , Atsushi Takane , Shoji Yoshida , Satoru Yamaguchi , Yasuhiko Ozawa
发明人： Mitsugu Sato , Tadashi Otaka , Makoto Ezumi , Atsushi Takane , Shoji Yoshida , Satoru Yamaguchi , Yasuhiko Ozawa
IPC分类号： H01J37/147 , H01J37/28 , H01J37/04
CPC分类号： H01J37/1471 , H01J37/28 , H01J2237/1501 , H01J2237/153
摘要： An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged particle beam changes. The present invention comprises calculation means for calculating a deflection amount of an alignment deflector which performs an axis alignment for an objective lens, a plurality of calculation methods for calculating the deflection amount is memorized in the calculation means, and a selection means for selecting at least one of the calculation methods is provided.
摘要翻译：本发明的目的是提供一种带电粒子束装置和带电粒子束装置的对准方法，其使得即使当带电粒子束的状态改变时也能够容易地对准带电粒子束的光轴。本发明包括用于计算对物镜执行轴对准的对准偏转器的偏转量的计算装置，用于计算偏转量的多种计算方法被存储在计算装置中，以及选择装置，用于至少选择提供了一种计算方法。

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