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1. 发明申请

US20090240537A1 APPARATUS FOR DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED FOR OPERATING TIME BUDGET 审中-公开
标题翻译：设计用于操作时间预算的光学计量系统的设备
公开(公告)号：US20090240537A1
公开(公告)日：2009-09-24
申请号：US12050919
申请日：2008-03-18
申请人： XINKANG TIAN , EDRIC TONG , CHING-LING MENG , MIHAIL MIHALOV , MANUEL MADRIAGA
发明人： XINKANG TIAN , EDRIC TONG , CHING-LING MENG , MIHAIL MIHALOV , MANUEL MADRIAGA
IPC分类号： G06Q10/00 , G06F17/00
CPC分类号： G01B11/24 , G01B2210/56 , G03F7/70625 , G06Q10/0637 , H01L21/67253
摘要： Provided is an apparatus for designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to achieve a time budget for completing metrology process steps. The design of the optical metrology system is optimized by using collected operating data in comparison to the selected operating criteria. In one embodiment, the optical metrology system is used for stand alone systems. In another embodiment, the optical metrology system is integrated with fabrication clusters in semiconductor manufacturing.
摘要翻译：提供了一种用于设计用于测量工件上的结构的光学测量系统的设备，其中光学测量系统被配置为实现用于完成计量过程步骤的时间预算。通过使用收集的操作数据与选定的操作标准进行比较，优化了光学测量系统的设计。在一个实施例中，光学测量系统用于独立系统。在另一个实施例中，光学测量系统与半导体制造中的制造集成集成。

2. 发明申请

US20090234687A1 METHOD OF DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED FOR OPERATING TIME BUDGET 审中-公开
标题翻译：设计用于操作时间预算的光学计量系统的方法
公开(公告)号：US20090234687A1
公开(公告)日：2009-09-17
申请号：US12050053
申请日：2008-03-17
申请人： XINKANG TIAN , EDRIC TONG , CHING-LING MENG , MIHAIL MIHALOV , MANUEL MADRIAGA
发明人： XINKANG TIAN , EDRIC TONG , CHING-LING MENG , MIHAIL MIHALOV , MANUEL MADRIAGA
IPC分类号： G06Q10/00 , G06F17/00
CPC分类号： G06Q10/04 , G03F7/70625 , G06Q10/06 , G06Q10/1093 , G06Q30/0206
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to achieve a time budget for completing metrology process steps. The design of the optical metrology system is optimized by using collected operating data in comparison to the selected operating criteria. In one embodiment, the optical metrology system is used for stand alone systems. In another embodiment, the optical metrology system is integrated with fabrication clusters in semiconductor manufacturing.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为实现用于完成计量过程步骤的时间预算。通过使用收集的操作数据与选定的操作标准进行比较，优化了光学测量系统的设计。在一个实施例中，光学测量系统用于独立系统。在另一个实施例中，光学测量系统与半导体制造中的制造集成集成。

3. 发明申请

US20090248339A1 DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SIGNAL CRITERIA 失效
标题翻译：设计符合信号标准的光学计量系统
公开(公告)号：US20090248339A1
公开(公告)日：2009-10-01
申请号：US12057316
申请日：2008-03-27
申请人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHALOV
发明人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHALOV
IPC分类号： G06F19/00
CPC分类号： G01N21/956 , G01B2210/56
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet one or more signal criteria. The design of the optical metrology system is optimized by using collected signal data in comparison to the one or more signal criteria. In one embodiment, the optical metrology system is used for stand alone systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为满足一个或多个信号标准。通过使用收集的信号数据与一个或多个信号标准相比较来优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。

4. 发明申请

US20090248340A1 APPARATUS FOR DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SIGNAL CRITERIA 失效
标题翻译：设计符合信号标准的光学计量系统的设备
公开(公告)号：US20090248340A1
公开(公告)日：2009-10-01
申请号：US12057332
申请日：2008-03-27
申请人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHALOV
发明人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHALOV
IPC分类号： G06F19/00
CPC分类号： G01B11/24 , G01B2210/56 , G01N21/956
摘要： Provided is an apparatus for designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet one or more signal criteria. The design of the optical metrology system is optimized by using collected signal data in comparison to set one or more signal criteria. In one embodiment, the optical metrology system is used for stand alone systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.
摘要翻译：提供了一种用于设计用于测量工件上的结构的光学测量系统的设备，其中光学测量系统被配置为满足一个或多个信号标准。通过使用收集的信号数据来比较设置一个或多个信号标准来优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。

5. 发明申请

US20090248341A1 PROCESS CONTROL USING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SIGNAL CRITERIA 失效
标题翻译：使用光信号系统优化信号标准的过程控制
公开(公告)号：US20090248341A1
公开(公告)日：2009-10-01
申请号：US12057346
申请日：2008-03-27
申请人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHALOV
发明人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHALOV
IPC分类号： G06F19/00
CPC分类号： G01B11/02 , G01B11/24 , G03F7/70625
摘要： Provided is system and method for controlling a fabrication cluster using at least one parameter of a structure measured with an optical metrology system designed and configured to meet one or more signal criteria. The design of the optical metrology system is optimized by using collected signal data in comparison to set one or more signal criteria. In one embodiment, the optical metrology system is used for standalone systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing. At least one parameter determined from a signal measured using the optical metrology system is transmitted to a fabrication cluster. The at least one parameter is used to modify at least one process variable or equipment setting of the fabrication cluster.
摘要翻译：提供了用于使用被设计和配置为满足一个或多个信号标准的光学测量系统测量的结构的至少一个参数来控制制造集群的系统和方法。通过使用收集的信号数据来比较设置一个或多个信号标准来优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。从使用光学测量系统测量的信号确定的至少一个参数被传送到制造集群。至少一个参数用于修改制造集群的至少一个过程变量或设备设置。

6. 发明申请

US20090319075A1 AUTOMATED PROCESS CONTROL USING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH DESIGN GOALS 失效
标题翻译：使用优化设计目标的光学计量系统的自动化过程控制
公开(公告)号：US20090319075A1
公开(公告)日：2009-12-24
申请号：US12141892
申请日：2008-06-18
申请人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHAYLOV
发明人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHAYLOV
IPC分类号： G06F19/00 , G01B11/14
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2021/8416 , G03F1/84 , G03F7/705 , G03F7/70625 , H01L22/12
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet a plurality of design goals. The design of the optical metrology system is optimized by using collected design goal data in comparison to the set plurality of design goals. In one embodiment, the optical metrology system is used for stand alone metrology systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing. At least one parameter determined from a diffraction signal measured using the optical metrology system is transmitted to the fabrication cluster. The at least one parameter is used to modify at least one process variable or equipment setting of the fabrication cluster.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为满足多个设计目标。与设定的多个设计目标相比，通过使用收集的设计目标数据优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立测量系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。从使用光学测量系统测量的衍射信号确定的至少一个参数被传送到制造集群。至少一个参数用于修改制造集群的至少一个过程变量或设备设置。

7. 发明申请

US20090319214A1 OPTICAL METROLOGY SYSTEM OPTIMIZED WITH DESIGN GOALS 失效
标题翻译：光学计量系统优化设计目标
公开(公告)号：US20090319214A1
公开(公告)日：2009-12-24
申请号：US12141754
申请日：2008-06-18
申请人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHAYLOV
发明人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHAYLOV
IPC分类号： G01N37/00
CPC分类号： G01B11/24 , G01B21/042
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece where the optical metrology system is configured to meet two or more design goals. The design of the optical metrology system is optimized by using collected design goal data in comparison to the set two or more design goals. In one embodiment, the optical metrology system is used for stand alone metrology systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为满足两个或更多个设计目标。与设定的两个或多个设计目标相比，通过使用收集的设计目标数据来优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立测量系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。

8. 发明申请

US20100243859A1 APPARATUS FOR CONTROLLING ANGLE OF INCIDENCE OF MULTIPLE ILLUMINATION BEAMS 有权
标题翻译：用于控制多个照明束发生角度的装置
公开(公告)号：US20100243859A1
公开(公告)日：2010-09-30
申请号：US12413945
申请日：2009-03-30
申请人： ADAM NORTON , XINKANG TIAN
发明人： ADAM NORTON , XINKANG TIAN
IPC分类号： G01J1/20
CPC分类号： G01J1/04 , G01J1/02 , G01J1/0242 , G01J1/0411 , G01J1/0414 , G01J1/08 , G01N21/4788
摘要： Provided is an apparatus for projecting multiple beams to a structure on a workpiece comprising a first light source generating a first illumination beam and a second light source generating a second illumination beam, an illumination primary mirror configured to reflect the first illumination beam onto the structure of the workpiece at a first angle of incidence, generating a first detection beam, and configured to reflect the second illumination beam onto the workpiece at a second angle of incidence, generating a second detection beam, a separate illumination secondary mirror positioned relative to the illumination primary mirror so as make the first angle of incidence substantially the same or close to a calculated optimum first angle of incidence and make the second angle of incidence substantially the same or close to a calculated optimum second angle of incidence. The first and second detection beams are diffracted off the structure at the corresponding angle of incidence to a detection primary mirror, reflected onto a separate secondary detection mirror and other optical components on the detection path, and onto spectroscopic detectors.
摘要翻译：提供了一种用于将多个光束投影到工件上的结构的装置，包括产生第一照明光束的第一光源和产生第二照明光束的第二光源，照明主反射镜被配置为将第一照明光束反射到所述工件以第一入射角产生第一检测光束，并且被配置为以第二入射角将所述第二照明光束反射到所述工件上，产生第二检测光束，相对于所述照明原色物体定位的分离的照明次级反射镜使得第一入射角基本上相同或接近于计算的最佳第一入射角，并使第二入射角基本上相同或接近于计算出的最佳第二入射角。第一和第二检测光束以与检测主反射镜相对应的入射角度从结构衍射，反射到检测路径上的单独的次级检测镜和其它光学部件上，并被分布在光谱检测器上。

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