专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08289527B2 Optimization of ray tracing and beam propagation parameters 有权
标题翻译：光线跟踪和光束传播参数的优化
公开(公告)号：US08289527B2
公开(公告)日：2012-10-16
申请号：US12752637
申请日：2010-04-01
申请人： Shifang Li , Manuel Madriaga
发明人： Shifang Li , Manuel Madriaga
IPC分类号： G01B11/24 , G01J4/00
CPC分类号： G03F7/70625 , G01B11/24 , G01B2210/56 , G03F7/705
摘要： Provided is a method for determining profile parameters of a sample structure on a workpiece using an optical metrology system optimized to achieve one or more accuracy targets, the optical metrology system including an optical metrology tool, an optical metrology tool model, a profile model of the sample structure, and a parameter extraction algorithm, the method comprising: setting one or more accuracy targets for profile parameter determination for the sample structure; selecting a number of rays and beam propagation parameters to be used to model the optical metrology tool, measuring a diffraction signal off the sample structure using the optical metrology tool, generating a metrology output signal, determining an adjusted metrology output signal using the metrology output signal and calibration data, concurrently optimizing the optical metrology tool model and the profile model using the adjusted metrology output signal and the parameter extraction algorithm.
摘要翻译：提供了一种用于使用优化以实现一个或多个精度目标的光学测量系统来确定工件上的样品结构的轮廓参数的方法，所述光学测量系统包括光学测量工具，光学计量学工具模型，样本结构和参数提取算法，该方法包括：为样本结构的轮廓参数确定设置一个或多个精度目标; 选择用于对光学测量工具进行建模的光束和光束传播参数的数量，使用光学测量工具测量样品结构的衍射信号，产生测量输出信号，使用测量输出信号确定调节的测量输出信号和校准数据，同时使用调整的计量输出信号和参数提取算法优化光学测量工具模型和轮廓模型。

2. 发明申请

US20110246142A1 OPTIMIZATION OF RAY TRACING AND BEAM PROPAGATION PARAMETERS 有权
标题翻译： RAY跟踪和光束传播参数的优化
公开(公告)号：US20110246142A1
公开(公告)日：2011-10-06
申请号：US12752637
申请日：2010-04-01
申请人： SHIFANG LI , MANUEL MADRIAGA
发明人： SHIFANG LI , MANUEL MADRIAGA
IPC分类号： G06G7/48 , G06F15/18 , G06F17/10
CPC分类号： G03F7/70625 , G01B11/24 , G01B2210/56 , G03F7/705
摘要： Provided is a method for determining profile parameters of a sample structure on a workpiece using an optical metrology system optimized to achieve one or more accuracy targets, the optical metrology system including an optical metrology tool, an optical metrology tool model, a profile model of the sample structure, and a parameter extraction algorithm, the method comprising: setting one or more accuracy targets for profile parameter determination for the sample structure; selecting a number of rays and beam propagation parameters to be used to model the optical metrology tool, measuring a diffraction signal off the sample structure using the optical metrology tool, generating a metrology output signal, determining an adjusted metrology output signal using the metrology output signal and calibration data, concurrently optimizing the optical metrology tool model and the profile model using the adjusted metrology output signal and the parameter extraction algorithm.
摘要翻译：提供了一种用于使用优化以实现一个或多个精度目标的光学测量系统来确定工件上的样品结构的轮廓参数的方法，所述光学测量系统包括光学测量工具，光学计量学工具模型，样本结构和参数提取算法，该方法包括：为样本结构的轮廓参数确定设置一个或多个精度目标; 选择用于对光学测量工具进行建模的光束和光束传播参数的数量，使用光学测量工具测量样品结构的衍射信号，产生测量输出信号，使用测量输出信号确定调节的测量输出信号和校准数据，同时使用调整的计量输出信号和参数提取算法优化光学测量工具模型和轮廓模型。

3. 发明授权

US07526354B2 Managing and using metrology data for process and equipment control 失效
标题翻译：管理和使用测量数据进行过程和设备控制
公开(公告)号：US07526354B2
公开(公告)日：2009-04-28
申请号：US11484484
申请日：2006-07-10
申请人： Manuel Madriaga , Junwei Bao , Vi Vuong
发明人： Manuel Madriaga , Junwei Bao , Vi Vuong
IPC分类号： G06F19/00
CPC分类号： G01B11/14 , G01N21/4788 , G01N21/95607 , G01N2021/95615 , G03F7/70625
摘要： A system for examining a patterned structure formed on a semiconductor wafer using an optical metrology model includes a first fabrication cluster, a metrology cluster, an optical metrology model optimizer, and a real time profile estimator. The first fabrication cluster configured to process a wafer, the wafer having a first patterned and a first unpatterned structure. The first patterned structure has underlying film thicknesses, critical dimension, and profile. The metrology cluster including one or more optical metrology devices coupled to the first fabrication cluster. The metrology cluster is configured to measure diffraction signals off the first patterned and the first unpatterned structure. The metrology model optimizer is configured to optimize an optical metrology model of the first patterned structure using one or more measured diffraction signals off the first patterned structure and with floating profile parameters, material refraction parameters, and metrology device parameters.
摘要翻译：使用光学测量模型检查在半导体晶片上形成的图案化结构的系统包括第一制造集群，度量集群，光学计量模型优化器和实时分布估计器。第一制造集群被配置为处理晶片，晶片具有第一图案化和第一未图案化结构。第一图案结构具有底层膜厚度，临界尺寸和轮廓。测量集群包括耦合到第一制造集群的一个或多个光学测量装置。测量簇被配置为测量离开第一图案和第一未图案化结构的衍射信号。计量模型优化器被配置为使用离开第一图案化结构的一个或多个测量的衍射信号以及浮动轮廓参数，材料折射参数和度量设备参数来优化第一图案化结构的光学测量模型。

4. 发明申请

US20090082993A1 AUTOMATED PROCESS CONTROL OF A FABRICATION TOOL USING A DISPERSION FUNCTION RELATING PROCESS PARAMETER TO DISPERSION 失效
标题翻译：使用分散功能的制造工具的自动化过程控制相关过程参数分散
公开(公告)号：US20090082993A1
公开(公告)日：2009-03-26
申请号：US11859669
申请日：2007-09-21
申请人： SHIFANG LI , HANYOU CHU , MANUEL MADRIAGA
发明人： SHIFANG LI , HANYOU CHU , MANUEL MADRIAGA
IPC分类号： G01B15/00
CPC分类号： G01B11/0625 , H01L22/12
摘要： An optical metrology model for the structure is obtained. The optical metrology model comprising one or more profile parameters, one or more process parameters, and a dispersion. A dispersion function that relates the dispersion to at least one of the one or more process parameters is obtained. A simulated diffraction signal is generated using the optical metrology model and a value for the at least one of the process parameters and a value for the dispersion. The value for the dispersion is calculated using the value for the at least one of the process parameter and the dispersion function. A measured diffraction signal of the structure is obtained using an optical metrology tool. The measured diffraction signal is compared to the simulated diffraction signal to determine one or more profile parameters of the structure. The fabrication tool is controlled based on the determined one or more profile parameters of the structure.
摘要翻译：获得了该结构的光学计量学模型。光学测量模型包括一个或多个轮廓参数，一个或多个过程参数和分散体。获得将色散与一个或多个工艺参数中的至少一个相关联的色散函数。使用光学测量模型生成模拟衍射信号，并且生成用于至少一个工艺参数的值和分散值。使用过程参数和色散函数中的至少一个的值来计算色散的值。使用光学测量工具获得该结构的测量的衍射信号。将测量的衍射信号与模拟的衍射信号进行比较，以确定结构的一个或多个轮廓参数。基于确定的结构的一个或多个轮廓参数来控制制造工具。

5. 发明申请

US20090063077A1 AUTOMATED PROCESS CONTROL USING PARAMETERS DETERMINED WITH APPROXIMATION AND FINE DIFFRACTION MODELS 失效
标题翻译：自动化过程控制使用参数确定与近似和微分散模型
公开(公告)号：US20090063077A1
公开(公告)日：2009-03-05
申请号：US11848214
申请日：2007-08-30
申请人： WEI LIU , SHIFANG LI , WEIDUNG YANG , MANUEL MADRIAGA
发明人： WEI LIU , SHIFANG LI , WEIDUNG YANG , MANUEL MADRIAGA
IPC分类号： G06F19/00
CPC分类号： G05B19/41875 , G01N21/4788 , G03F7/70625 , G05B2219/32182 , G05B2219/32186 , G05B2219/32188 , G05B2219/37224
摘要： Provided is a method of controlling a fabrication cluster using a machine learning system, the machine learning system trained developed using an optical metrology model, the optical metrology model comprising a profile model, an approximation diffraction model, and a fine diffraction model. A simulated approximation diffraction signal is generated based on an approximation diffraction model of the structure. A set of difference diffraction signal is obtained by subtracting the simulated approximation diffraction signal from each of simulated fine diffraction signals and paired with the corresponding profile parameters. A first machine learning system is trained using the pairs of difference diffraction signal and corresponding profile parameters. A library of simulated fine diffraction signals and profile parameters is generated using the trained first machine learning system and using ranges and corresponding resolutions of the profile parameters. The library is used to train a second machine learning system. A measured diffraction signal is input into the trained second machine learning system to determine at least one profile parameter. The at least one profile parameter is used to adjust at least one process parameter or equipment setting of the fabrication cluster.
摘要翻译：提供了一种使用机器学习系统来控制制造集群的方法，使用光学测量模型训练的机器学习系统，包括轮廓模型，近似衍射模型和精细衍射模型的光学测量模型。基于结构的近似衍射模型生成模拟近似衍射信号。通过从每个模拟的细衍射信号中减去模拟近似衍射信号并与相应的轮廓参数配对来获得差分衍射信号。使用差分衍射信号和相应的轮廓参数对来训练第一机器学习系统。使用训练有素的第一机器学习系统并使用轮廓参数的范围和相应的分辨率来生成模拟的细衍射信号和轮廓参数的库。该图书馆用于训练第二台机器学习系统。测量的衍射信号被输入到训练有素的第二机器学习系统中以确定至少一个轮廓参数。至少一个轮廓参数用于调整至少一个制造集群的过程参数或设备设置。

6. 发明授权

US07444196B2 Optimized characterization of wafers structures for optical metrology 失效
标题翻译：光学测量的晶圆结构的优化表征
公开(公告)号：US07444196B2
公开(公告)日：2008-10-28
申请号：US11408744
申请日：2006-04-21
申请人： Steven Scheer , Alan Nolet , Manuel Madriaga
发明人： Steven Scheer , Alan Nolet , Manuel Madriaga
IPC分类号： G06F19/00 , G01B11/14 , G01R31/26 , H01L21/66
CPC分类号： G01N21/4788 , G03F7/70625
摘要： A patterned structure in a wafer is created using one or more fabrication treatment processes. The patterned structure has a treated and an untreated portion. One or more diffraction sensitivity enhancement techniques are applied to the structure, the one or more diffraction sensitivity enhancement techniques adjusting one or more properties of the patterned structure to enhance diffraction contrast between the treated portion and untreated portions. A first diffraction signal is measured off an unpatterned structure on the wafer using an optical metrology device. A second diffraction signal is measured off the patterned structure on the wafer using the optical metrology device. One or more diffraction sensitivity enhancement techniques are selected based on comparisons of the first and second diffraction signals.
摘要翻译：使用一个或多个制造处理工艺制造晶片中的图案化结构。图案化结构具有经处理和未处理的部分。将一种或多种衍射灵敏度增强技术应用于该结构，一种或多种衍射灵敏度增强技术调节图案化结构的一个或多个性质以增强经处理部分和未处理部分之间的衍射对比度。使用光学测量装置从晶片上的未图案化结构测量第一衍射信号。使用光学测量装置从晶片上的图案化结构测量第二衍射信号。基于第一和第二衍射信号的比较来选择一种或多种衍射灵敏度增强技术。

7. 发明授权

US07949618B2 Training a machine learning system to determine photoresist parameters 有权
标题翻译：培训机器学习系统以确定光刻胶参数
公开(公告)号：US07949618B2
公开(公告)日：2011-05-24
申请号：US11729498
申请日：2007-03-28
申请人： Joerg Bischoff , David Hetzer , Manuel Madriaga
发明人： Joerg Bischoff , David Hetzer , Manuel Madriaga
IPC分类号： G06F15/18 , G05B17/00 , G05B23/00 , G05B13/00 , G01J3/28
CPC分类号： G06N99/005 , G03F7/70625
摘要： To train a machine learning system, a set of different values of one or more photoresist parameters, which characterize behavior of photoresist when the photoresist undergoes processing steps in a wafer application, is obtained. A set of diffraction signals is obtained using the set of different values of the one or more photoresist parameters. The machine learning system is trained using the set of measured diffraction signals as inputs to the machine learning system and the set of different values of the one or more photoresist parameters as expected outputs of the machine learning system.
摘要翻译：为了训练机器学习系统，获得一组不同值的一个或多个光致抗蚀剂参数，其表征当光致抗蚀剂经历晶片应用中的处理步骤时光致抗蚀剂的行为。使用一组或多个光刻胶参数的不同值来获得一组衍射信号。机器学习系统是使用一组测量的衍射信号作为机器学习系统的输入和一个或多个光致抗蚀剂参数的不同值的集合来训练的，作为机器学习系统的预期输出。

8. 发明申请

US20090319075A1 AUTOMATED PROCESS CONTROL USING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH DESIGN GOALS 失效
标题翻译：使用优化设计目标的光学计量系统的自动化过程控制
公开(公告)号：US20090319075A1
公开(公告)日：2009-12-24
申请号：US12141892
申请日：2008-06-18
申请人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHAYLOV
发明人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHAYLOV
IPC分类号： G06F19/00 , G01B11/14
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2021/8416 , G03F1/84 , G03F7/705 , G03F7/70625 , H01L22/12
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet a plurality of design goals. The design of the optical metrology system is optimized by using collected design goal data in comparison to the set plurality of design goals. In one embodiment, the optical metrology system is used for stand alone metrology systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing. At least one parameter determined from a diffraction signal measured using the optical metrology system is transmitted to the fabrication cluster. The at least one parameter is used to modify at least one process variable or equipment setting of the fabrication cluster.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为满足多个设计目标。与设定的多个设计目标相比，通过使用收集的设计目标数据优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立测量系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。从使用光学测量系统测量的衍射信号确定的至少一个参数被传送到制造集群。至少一个参数用于修改制造集群的至少一个过程变量或设备设置。

9. 发明授权

US07636649B2 Automated process control of a fabrication tool using a dispersion function relating process parameter to dispersion 失效
标题翻译：使用将过程参数与色散相关联的色散函数对制造工具进行自动化过程控制
公开(公告)号：US07636649B2
公开(公告)日：2009-12-22
申请号：US11859669
申请日：2007-09-21
申请人： Shifang Li , Hanyou Chu , Manuel Madriaga
发明人： Shifang Li , Hanyou Chu , Manuel Madriaga
IPC分类号： G05B17/00 , G06F19/00 , G06F17/40
CPC分类号： G01B11/0625 , H01L22/12
摘要： An optical metrology model for the structure is obtained. The optical metrology model comprising one or more profile parameters, one or more process parameters, and a dispersion. A dispersion function that relates the dispersion to at least one of the one or more process parameters is obtained. A simulated diffraction signal is generated using the optical metrology model and a value for the at least one of the process parameters and a value for the dispersion. The value for the dispersion is calculated using the value for the at least one of the process parameter and the dispersion function. A measured diffraction signal of the structure is obtained using an optical metrology tool. The measured diffraction signal is compared to the simulated diffraction signal to determine one or more profile parameters of the structure. The fabrication tool is controlled based on the determined one or more profile parameters of the structure.
摘要翻译：获得了该结构的光学计量学模型。光学测量模型包括一个或多个轮廓参数，一个或多个过程参数和分散体。获得将色散与一个或多个工艺参数中的至少一个相关联的色散函数。使用光学测量模型生成模拟衍射信号，并且生成至少一个工艺参数的值和色散值。使用过程参数和色散函数中的至少一个的值来计算色散的值。使用光学测量工具获得该结构的测量的衍射信号。将测量的衍射信号与模拟的衍射信号进行比较，以确定结构的一个或多个轮廓参数。基于确定的结构的一个或多个轮廓参数来控制制造工具。

10. 发明授权

US07627392B2 Automated process control using parameters determined with approximation and fine diffraction models 失效
$Automated process control using parameters determined with approximation and fine diffraction models$
标题翻译：使用近似和精细衍射模型确定的参数进行自动过程控制
公开(公告)号：US07627392B2
公开(公告)日：2009-12-01
申请号：US11848214
申请日：2007-08-30
申请人： Wei Liu , Shifang Li , Weidung Yang , Manuel Madriaga
发明人： Wei Liu , Shifang Li , Weidung Yang , Manuel Madriaga
IPC分类号： G06F19/00
CPC分类号： G05B19/41875 , G01N21/4788 , G03F7/70625 , G05B2219/32182 , G05B2219/32186 , G05B2219/32188 , G05B2219/37224
摘要： Provided is a method of controlling a fabrication cluster using a machine learning system, the machine learning system trained developed using an optical metrology model. A simulated approximation diffraction signal is generated based on an approximation diffraction model of the structure. A set of difference diffraction signal is obtained by subtracting the simulated approximation diffraction signal from each of simulated fine diffraction signals and paired with the corresponding profile parameters. A first machine learning system is trained using the pairs of difference diffraction signal and corresponding profile parameters. A library of simulated fine diffraction signals and profile parameters is generated using the trained first machine learning system and using ranges and corresponding resolutions of the profile parameters. A measured diffraction signal is input into the trained second machine learning system to determine at least one profile parameter. The at least one profile parameter is used to adjust at least one process parameter or equipment setting of the fabrication cluster.
摘要翻译：提供了一种使用机器学习系统来控制制造集群的方法，使用光学计量学模型训练的机器学习系统。基于结构的近似衍射模型生成模拟近似衍射信号。通过从每个模拟的细衍射信号中减去模拟近似衍射信号并与相应的轮廓参数配对来获得差分衍射信号。使用差分衍射信号和相应的轮廓参数对来训练第一机器学习系统。使用训练有素的第一机器学习系统并使用轮廓参数的范围和相应的分辨率来生成模拟的细衍射信号和轮廓参数的库。测量的衍射信号被输入到训练有素的第二机器学习系统中以确定至少一个轮廓参数。至少一个轮廓参数用于调整至少一个制造集群的过程参数或设备设置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式