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1. 发明申请

US20090319075A1 AUTOMATED PROCESS CONTROL USING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH DESIGN GOALS 失效
标题翻译：使用优化设计目标的光学计量系统的自动化过程控制
公开(公告)号：US20090319075A1
公开(公告)日：2009-12-24
申请号：US12141892
申请日：2008-06-18
申请人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHAYLOV
发明人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHAYLOV
IPC分类号： G06F19/00 , G01B11/14
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2021/8416 , G03F1/84 , G03F7/705 , G03F7/70625 , H01L22/12
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet a plurality of design goals. The design of the optical metrology system is optimized by using collected design goal data in comparison to the set plurality of design goals. In one embodiment, the optical metrology system is used for stand alone metrology systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing. At least one parameter determined from a diffraction signal measured using the optical metrology system is transmitted to the fabrication cluster. The at least one parameter is used to modify at least one process variable or equipment setting of the fabrication cluster.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为满足多个设计目标。与设定的多个设计目标相比，通过使用收集的设计目标数据优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立测量系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。从使用光学测量系统测量的衍射信号确定的至少一个参数被传送到制造集群。至少一个参数用于修改制造集群的至少一个过程变量或设备设置。

2. 发明授权

US07789541B2 Method and system for lamp temperature control in optical metrology 有权
标题翻译：光度计中灯温控制的方法和系统
公开(公告)号：US07789541B2
公开(公告)日：2010-09-07
申请号：US12059610
申请日：2008-03-31
申请人： Ching-Ling Meng , Mihail Mihaylov
发明人： Ching-Ling Meng , Mihail Mihaylov
IPC分类号： F21V29/00 , H01J13/14
CPC分类号： F21V29/67 , F21V23/0442 , F21V23/0457 , F21V29/02 , F21V29/74
摘要： A method and system are provided for lamp temperature control for optical metrology. Precise control of the lamp temperature provides the improved signal-to-noise ratios required for accurately determining the profile of nanometer sized structures using optical metrology.
摘要翻译：提供了用于光学测量的灯温度控制的方法和系统。灯温度的精确控制提供了使用光学测量精确地确定纳米尺寸结构的轮廓所需的改善的信噪比。

3. 发明申请

US20090244910A1 METHOD AND SYSTEM FOR LAMP TEMPERATURE CONTROL IN OPTICAL METROLOGY 有权
标题翻译：光学计量学中温度控制的方法与系统
公开(公告)号：US20090244910A1
公开(公告)日：2009-10-01
申请号：US12059610
申请日：2008-03-31
申请人： Ching-Ling MENG , Mihail Mihaylov
发明人： Ching-Ling MENG , Mihail Mihaylov
IPC分类号： F21V29/00
CPC分类号： F21V29/67 , F21V23/0442 , F21V23/0457 , F21V29/02 , F21V29/74
摘要： A method and system are provided for lamp temperature control for optical metrology. Precise control of the lamp temperature provides the improved signal-to-noise ratios required for accurately determining the profile of nanometer sized structures using optical metrology.
摘要翻译：提供了用于光学测量的灯温度控制的方法和系统。灯温度的精确控制提供了使用光学测量精确地确定纳米尺寸结构的轮廓所需的改善的信噪比。

4. 发明授权

US06867870B1 Digital detector data communication in an optical metrology tool 失效
标题翻译：光学测量工具中的数字检测器数据通信
公开(公告)号：US06867870B1
公开(公告)日：2005-03-15
申请号：US10262722
申请日：2002-10-02
申请人： Mihail Mihaylov , Dale Lindseth
发明人： Mihail Mihaylov , Dale Lindseth
IPC分类号： G01B11/24
CPC分类号： G01B11/24
摘要： A detector network for an optical metrology system includes an analog to digital converter for each photodetector or detector array. Each analog to digital converter is connected to provide digitally encoded output from its associated detector. Each analog to digital converter is also connected to a hub. The hub receives commands from a processor and distributes them to the analog to digital converters. The converters sample the output of their associated detectors and return the digitized results to the hub. In turn, the hub passes the digitized results to the processor for analysis.
摘要翻译：用于光学测量系统的检测器网络包括用于每个光电检测器或检测器阵列的模数转换器。每个模数转换器被连接以从其相关联的检测器提供数字编码的输出。每个模数转换器也连接到集线器。集线器从处理器接收命令并将其分配给模数转换器。转换器对其相关检测器的输出进行采样，并将数字化结果返回到集线器。反过来，集线器将数字化结果传递给处理器进行分析。

5. 发明授权

US07761250B2 Optical metrology system optimized with design goals 失效
标题翻译：光学计量系统优化设计目标
公开(公告)号：US07761250B2
公开(公告)日：2010-07-20
申请号：US12141754
申请日：2008-06-18
申请人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihaylov
发明人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihaylov
IPC分类号： G01N37/00
CPC分类号： G01B11/24 , G01B21/042
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece where the optical metrology system is configured to meet two or more design goals. The design of the optical metrology system is optimized by using collected design goal data in comparison to the set two or more design goals. In one embodiment, the optical metrology system is used for stand alone metrology systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为满足两个或更多个设计目标。与设定的两个或多个设计目标相比，通过使用收集的设计目标数据来优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立测量系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。

6. 发明授权

US07761178B2 Automated process control using an optical metrology system optimized with design goals 失效
标题翻译：使用优化设计目标的光学计量系统进行自动化过程控制
公开(公告)号：US07761178B2
公开(公告)日：2010-07-20
申请号：US12141892
申请日：2008-06-18
申请人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihaylov
发明人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihaylov
IPC分类号： G06F19/00 , G01N21/00
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2021/8416 , G03F1/84 , G03F7/705 , G03F7/70625 , H01L22/12
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet a plurality of design goals. The design of the optical metrology system is optimized by using collected design goal data in comparison to the set plurality of design goals. In one embodiment, the optical metrology system is used for stand alone metrology systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing. At least one parameter determined from a diffraction signal measured using the optical metrology system is transmitted to the fabrication cluster. The at least one parameter is used to modify at least one process variable or equipment setting of the fabrication cluster.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为满足多个设计目标。与设定的多个设计目标相比，通过使用收集的设计目标数据优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立测量系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。从使用光学测量系统测量的衍射信号确定的至少一个参数被传送到制造集群。至少一个参数用于修改制造集群的至少一个过程变量或设备设置。

7. 发明申请

US20100118316A1 AUTO FOCUS ARRAY DETECTOR OPTIMIZED FOR OPERATING OBJECTIVES 审中-公开
标题翻译：自动聚焦阵列检测器优化用于操作目标
公开(公告)号：US20100118316A1
公开(公告)日：2010-05-13
申请号：US12270799
申请日：2008-11-13
申请人： MIHAIL MIHAYLOV , MANUEL MADRIAGA
发明人： MIHAIL MIHAYLOV , MANUEL MADRIAGA
IPC分类号： G02B5/18
CPC分类号： G02B27/40
摘要： Provided are an apparatus and a method of measuring structures on a workpiece using an optical metrology system, the optical metrology system comprising an auto focus subsystem which includes a motion control system and a focus detector. The focus detector includes an array of sensors where each sensor has identification (ID). The focus detector measures the focus beam and converts the measurements into a focus signal for each sensor. The focus signal and associated ID of each sensor are transmitted to a processor that generates a best focus instruction. A motion control system utilizes the best focus instruction to move the workpiece to the best focus location. The auto focusing of the workpiece is performed to meet set operating objectives of the auto focus subsystem.
摘要翻译：提供了一种使用光学测量系统来测量工件上的结构的装置和方法，该光学测量系统包括包括运动控制系统和焦点检测器的自动聚焦子系统。焦点检测器包括传感器阵列，其中每个传感器具有识别（ID）。聚焦检测器测量聚焦光束，并将测量值转换为每个传感器的聚焦信号。每个传感器的聚焦信号和相关ID被发送到产生最佳聚焦指令的处理器。运动控制系统利用最佳对焦指令将工件移动到最佳对焦位置。执行工件的自动对焦以满足自动对焦子系统的设定操作目标。

8. 发明授权

US07595869B1 Optical metrology system optimized with a plurality of design goals 失效
标题翻译：光学计量系统用多个设计目标优化
公开(公告)号：US07595869B1
公开(公告)日：2009-09-29
申请号：US12141867
申请日：2008-06-18
申请人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihaylov
发明人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihaylov
IPC分类号： G01N21/00
CPC分类号： G01N21/95607 , G01N21/4788 , G01N21/9501 , G01N2021/95615 , G03F7/70625
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece where the optical metrology system is configured to meet a plurality of design goals. Primary components of the optical metrology system affecting the design goals are determined and used in the initial design. The design of the optical metrology system is optimized by using collected design goal data in comparison to the set plurality of design goals. In one embodiment, the optical metrology system is used for stand alone metrology systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为满足多个设计目标。影响设计目标的光学计量系统的主要组件在初始设计中得到确定和使用。与设定的多个设计目标相比，通过使用收集的设计目标数据优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立测量系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。

9. 发明申请

US20090319214A1 OPTICAL METROLOGY SYSTEM OPTIMIZED WITH DESIGN GOALS 失效
标题翻译：光学计量系统优化设计目标
公开(公告)号：US20090319214A1
公开(公告)日：2009-12-24
申请号：US12141754
申请日：2008-06-18
申请人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHAYLOV
发明人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHAYLOV
IPC分类号： G01N37/00
CPC分类号： G01B11/24 , G01B21/042
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece where the optical metrology system is configured to meet two or more design goals. The design of the optical metrology system is optimized by using collected design goal data in comparison to the set two or more design goals. In one embodiment, the optical metrology system is used for stand alone metrology systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为满足两个或更多个设计目标。与设定的两个或多个设计目标相比，通过使用收集的设计目标数据来优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立测量系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。

10. 发明授权

US07595471B1 Auto focusing of a workpiece using an array detector each with a detector identification 有权
标题翻译：使用阵列检测器对工件进行自动对焦，每个都具有检测器识别
公开(公告)号：US07595471B1
公开(公告)日：2009-09-29
申请号：US12242839
申请日：2008-09-30
申请人： Mihail Mihaylov
发明人： Mihail Mihaylov
IPC分类号： G02B7/04
CPC分类号： G02B7/04 , G03F7/70491 , G03F7/70641 , G03F7/7085
摘要： Provided is a method and system for auto focusing a workpiece in the Z-axis using a position sensitive focus detector. A focus detection beam is measured using a focus detector, the focus detector having an array of sensors, each sensor of the array of sensors having a sensor identification, the focus detector measuring the focus detection beam projected on a plurality of sensors in the array of sensors, generating a corresponding focus signal for each sensor in the array of sensors. The plurality of focus signals and associated sensor data is used to generate a best focus instruction which is used to move the workpiece to the best focus position on the Z-axis.
摘要翻译：提供了一种使用位置敏感聚焦检测器自动聚焦工件在Z轴上的方法和系统。使用焦点检测器测量焦点检测光束，焦点检测器具有传感器阵列，传感器阵列的每个传感器具有传感器识别，聚焦检测器测量投影在阵列中的多个传感器上的焦点检测光束传感器，为传感器阵列中的每个传感器产生相应的聚焦信号。多个聚焦信号和相关联的传感器数据用于产生最佳聚焦指令，该指令用于将工件移动到Z轴上的最佳聚焦位置。

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