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    • 1. 发明授权
    • Silicon-germanium bipolar transistor with optimized germanium profile
    • 具有优化锗型材的硅锗双极晶体管
    • US06750483B2
    • 2004-06-15
    • US10200541
    • 2002-07-22
    • Wolfgang KleinRudolf LachnerWolfgang Molzer
    • Wolfgang KleinRudolf LachnerWolfgang Molzer
    • H01L29737
    • H01L29/165H01L29/7378
    • A silicon-germanium bipolar transistor includes a silicon substrate in which a first n-doped emitter region, a second p-doped base region adjoining the latter and a third n-doped collector region adjoining the latter, are formed. A first space charge zone is formed between the emitter region and the base region and a second space charge zone is formed between the base region and the collector region. The base region and an edge zone of the adjoining emitter region are alloyed with germanium. The germanium concentration in the emitter region rises toward the base region. The germanium concentration in a junction region containing the first space charge zone rises less sharply than in the emitter region or decreases and, in the base region, it initially again rises more sharply than in the junction region.
    • 硅 - 锗双极晶体管包括硅衬底,其中形成有第一n掺杂发射极区域,与之相邻的第二p掺杂基极区域和与之相邻的第三n掺杂集电极区域。 在发射极区域和基极区域之间形成第一空间电荷区域,并且在基极区域和集电极区域之间形成第二空间电荷区域。 邻接发射极区域的基极区域和边缘区域与锗合金化。 发射极区域中的锗浓度朝向基极区域上升。 包含第一空间电荷区的结区中的锗浓度比发射极区域急剧上升或降低,并且在基极区域中其初始地再次比在结区域中急剧上升。
    • 5. 发明授权
    • Method for producing a transistor structure
    • 晶体管结构的制造方法
    • US07371650B2
    • 2008-05-13
    • US10532894
    • 2003-10-24
    • Josef BöckRudolf LachnerThomas MeisterReinhard StenglHerbert SchäferMartin Seck
    • Josef BöckRudolf LachnerThomas MeisterReinhard StenglHerbert SchäferMartin Seck
    • H01L21/331
    • H01L29/66272H01L21/8222H01L27/0825H01L29/0821
    • A method for fabricating a transistor structure with a first and a second bipolar transistor having different collector widths is presented. The method includes providing a semiconductor substrate, introducing a first buried layer of the first bipolar transistor and a second buried layer of the second bipolar transistor into the semiconductor substrate, and producing at least a first collector region having a first collector width on the first buried layer and a second collector region having a second collector width on the second buried layer. A first collector zone having a first thickness is produced on the second buried layer for production of the second collector width. A second collector zone having a second thickness is produced on the first collector zone. At least one insulation region is produced that isolates at least the collector regions from one another.
    • 提出了一种制造具有不同集电极宽度的第一和第二双极晶体管的晶体管结构的方法。 该方法包括提供半导体衬底,将第一双极晶体管的第一掩埋层和第二双极晶体管的第二掩埋层引入到半导体衬底中,并且至少在第一掩埋层上产生具有第一集电极宽度的第一集电极区域 层和在第二掩埋层上具有第二集电极宽度的第二集电极区。 在第二掩埋层上产生具有第一厚度的第一收集器区,用于产生第二收集器宽度。 在第一收集器区域上产生具有第二厚度的第二收集器区域。 产生至少一个绝缘区域,其至少隔离收集器区域彼此。