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1. 发明申请

US20070145023A1 Toroidal Low-Field Reactive Gas and Plasma Source Having a Dielectric Vacuum Vessel 有权
标题翻译：具有介质真空容器的环形低场反应气体和等离子体源
公开(公告)号：US20070145023A1
公开(公告)日：2007-06-28
申请号：US11684916
申请日：2007-03-12
申请人： William Holber , Xing Chen , Andrew Cowe , Matthew Besen , Ronald Collins , Susan Trullin , Shouqian Shao
发明人： William Holber , Xing Chen , Andrew Cowe , Matthew Besen , Ronald Collins , Susan Trullin , Shouqian Shao
IPC分类号： B23K9/00
CPC分类号： H01J37/32357 , H01J37/32009 , H01J37/32091 , H01J37/321 , H01J37/32449 , H01J37/32467 , H01J37/32522
摘要： Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus can include a vessel and at least one ignition electrode adjacent to the vessel. A total length of a dimension of the at least one ignition electrode is greater than 10% of a length of the vessel's channel. The apparatus can include a dielectric toroidal vessel, a heat sink having multiple segments urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. A method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel. The gas is ignited in the channel while the remaining portion of the flow rate is directed away from the channel.
摘要翻译：描述了等离子体点火和冷却装置和等离子体系统的方法。装置可以包括容器和与容器相邻的至少一个点火电极。所述至少一个点火电极的尺寸的总长度大于所述容器通道的长度的10％。该装置可以包括介质环形容器，具有通过弹簧加载机构朝向容器推动的多个部分的散热器以及容器和散热器之间的热界面。一种方法可以包括提供具有流速和压力的气体并将气体的一部分流量引导到容器通道中。气体在通道中被点燃，而流量的剩余部分被引导离开通道。

2. 发明申请

US20050145173A1 Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel 有权
公开(公告)号：US20050145173A1
公开(公告)日：2005-07-07
申请号：US11058620
申请日：2005-02-15
申请人： William Holber , Xing Chen , Andrew Cowe , Matthew Besen , Ronald Collins , Susan Trulli , Shouqian Shao
发明人： William Holber , Xing Chen , Andrew Cowe , Matthew Besen , Ronald Collins , Susan Trulli , Shouqian Shao
IPC分类号： H01J37/32 , C23C16/00
CPC分类号： H01J37/32357 , H01J37/32009 , H01J37/32091 , H01J37/321 , H01J37/32449 , H01J37/32467 , H01J37/32522
摘要： Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus can include a vessel and at least one ignition electrode adjacent to the vessel. A total length of a dimension of the at least one ignition electrode is greater than 10% of a length of the vessel's channel. The apparatus can include a dielectric toroidal vessel, a heat sink having multiple segments urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. A method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel. The gas is ignited in the channel while the remaining portion of the flow rate is directed away from the channel.

3. 发明申请

US20070145018A1 Inductively-coupled toroidal plasma source 有权
标题翻译：电感耦合环形等离子体源
公开(公告)号：US20070145018A1
公开(公告)日：2007-06-28
申请号：US11636891
申请日：2006-12-11
申请人： Donald Smith , Xing Chen , William Holber , Eric Georgelis
发明人： Donald Smith , Xing Chen , William Holber , Eric Georgelis
IPC分类号： B23K9/00
CPC分类号： H05H1/46 , H05H2001/4667 , H05H2001/4682
摘要： Apparatus for dissociating gases includes a plasma chamber comprising a gas. A first transformer having a first magnetic core surrounds a first portion of the plasma chamber and has a first primary winding. A second transformer having a second magnetic core surrounds a second portion of the plasma chamber and has a second primary winding. A first solid state AC switching power supply including one or more switching semiconductor devices is coupled to a first voltage supply and has a first output that is coupled to the first primary winding. A second solid state AC switching power supply including one or more switching semiconductor devices is coupled to a second voltage supply and has a second output that is coupled to the second primary winding. The first solid state AC switching power supply drives a first AC current in the first primary winding. The second solid state AC switching power supply drives a second AC current in the second primary winding. The first AC current and the second AC current induce a combined AC potential inside the plasma chamber that directly forms a toroidal plasma that completes a secondary circuit of the transformer and that dissociates the gas.
摘要翻译：用于解离气体的装置包括包含气体的等离子体室。具有第一磁芯的第一变压器包围等离子体室的第一部分并且具有第一初级绕组。具有第二磁芯的第二变压器包围等离子体室的第二部分并且具有第二初级绕组。包括一个或多个切换半导体器件的第一固态AC开关电源耦合到第一电压源并且具有耦合到第一初级绕组的第一输出。包括一个或多个开关半导体器件的第二固态AC开关电源耦合到第二电压源，并且具有耦合到第二初级绕组的第二输出。第一固态交流开关电源驱动第一初级绕组中的第一交流电流。第二固态交流开关电源驱动第二初级绕组中的第二交流电流。第一AC电流和第二AC电流引起等离子体室内的组合AC电位，其直接形成环形等离子体，其完成变压器的次级电路并且解离气体。

4. 发明申请

US20060118240A1 Methods and apparatus for downstream dissociation of gases 审中-公开
公开(公告)号：US20060118240A1
公开(公告)日：2006-06-08
申请号：US11003109
申请日：2004-12-03
申请人： William Holber , Xing Chen
发明人： William Holber , Xing Chen
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： B01J19/088 , B01J2219/0875 , C23C16/452 , H01J37/32357 , H01J37/3244
摘要： A method and apparatus for activating and dissociating gases involves generating an activated gas with a plasma located in a chamber. A downstream gas input is positioned relative to an output of the chamber to enable the activated gas to facilitate dissociation of a downstream gas introduced by the gas input, wherein the dissociated downstream gas does not substantially interact with an interior surface of the chamber.

5. 发明申请

US20070272299A1 Methods and apparatus for downstream dissociation of gases 审中-公开
标题翻译：气体下游解离的方法和装置
公开(公告)号：US20070272299A1
公开(公告)日：2007-11-29
申请号：US11640434
申请日：2006-12-15
申请人： Jack Schuss , William Holber , John Summerson , Susan Trulli , Weiguo Zhang , Xing Chen
发明人： Jack Schuss , William Holber , John Summerson , Susan Trulli , Weiguo Zhang , Xing Chen
IPC分类号： B01D53/00 , F17D1/02
CPC分类号： B01D53/68 , B01D53/32 , B01D53/70 , B01D2257/204 , B01D2257/206 , B01D2259/818 , Y10T137/0391
摘要： A method and apparatus for activating and dissociating gases involves generating an activated gas with a plasma located in a chamber. A downstream gas input is positioned relative to an output of the chamber to enable the activated gas to facilitate dissociation of a downstream gas introduced by the gas input, wherein the dissociated downstream gas does not substantially interact with an interior surface of the chamber.
摘要翻译：用于激活和解离气体的方法和装置包括用位于室中的等离子体产生活化气体。下游气体输入端相对于腔室的输出定位，以使得活化气体能够促进由气体输入引入的下游气体的解离，其中解离的下游气体基本上不与腔室的内表面相互作用。

6. 发明申请

US20060137612A1 Methods and apparatus for downstream dissociation of gases 审中-公开
标题翻译：气体下游解离的方法和装置
公开(公告)号：US20060137612A1
公开(公告)日：2006-06-29
申请号：US11292520
申请日：2005-12-02
申请人： William Holber , Xing Chen
发明人： William Holber , Xing Chen
IPC分类号： C23C16/00 , C23F1/00
CPC分类号： B01J19/088 , B01J2219/0875 , C23C16/452 , H01J37/32357 , H01J37/3244
摘要： A method and apparatus for activating and dissociating gases involves generating an activated gas with a plasma located in a chamber. A downstream gas input is positioned relative to an output of the chamber to enable the activated gas to facilitate dissociation of a downstream gas introduced by the gas input, wherein the dissociated downstream gas does not substantially interact with an interior surface of the chamber.
摘要翻译：用于激活和解离气体的方法和装置包括用位于室中的等离子体产生活化气体。下游气体输入端相对于腔室的输出定位，以使得活化气体能够促进由气体输入引入的下游气体的解离，其中解离的下游气体基本上不与腔室的内表面相互作用。

7. 发明申请

US20060086699A1 Method and apparatus for processing metal bearing gases 有权
公开(公告)号：US20060086699A1
公开(公告)日：2006-04-27
申请号：US11269917
申请日：2005-11-08
申请人： William Holber , John Smith , Xing Chen , Donald Smith
发明人： William Holber , John Smith , Xing Chen , Donald Smith
IPC分类号： B23K9/00
CPC分类号： H01J37/32174 , H01J37/321 , H05H1/46 , H05H2001/4667
摘要： A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the toroidal plasma. The interaction between the toroidal plasma and the metal bearing gas produces at least one of a metallic material, a metal oxide material or a metal nitride material.

8. 发明申请

US20140272108A1 Toroidal Plasma Processing Apparatus 审中-公开
标题翻译：环形等离子体处理装置
公开(公告)号：US20140272108A1
公开(公告)日：2014-09-18
申请号：US14212073
申请日：2014-03-14
申请人： William Holber , Robert J. Basnett
发明人： William Holber , Robert J. Basnett
IPC分类号： C23C16/505 , C23C16/27 , C23C16/26
CPC分类号： C23C16/505 , C23C16/26 , C23C16/272 , C23C16/507 , H01J37/321 , H01J37/32357 , H01J37/32458 , H01J37/3266 , H01J37/32669 , H05H1/46 , H05H2001/4667
摘要： A plasma processing apparatus including a vacuum chamber comprising a conduit, a process chamber, and a first gas input port for introducing gas into the vacuum chamber, and a pump port for evacuating gas from the vacuum chamber. A magnetic core surrounds the conduit. An output of an RF power supply is electrically connected to the magnetic core. The RF power supply energizes the magnetic core, thereby forming a toroidal plasma loop discharge in the vacuum chamber. A platen that supports a workpiece during plasma processing is positioned in the process chamber.
摘要翻译：一种等离子体处理装置，包括：真空室，包括导管，处理室和用于将气体引入真空室的第一气体输入口，以及用于从真空室排出气体的泵口。磁芯围绕导管。 RF电源的输出电连接到磁芯。 RF电源使磁芯通电，从而在真空室中形成环形等离子体环放电。在等离子体处理期间支撑工件的压板位于处理室中。

9. 发明申请

US20070139122A1 Radio Frequency Power Delivery System 有权
标题翻译：射频供电系统
公开(公告)号：US20070139122A1
公开(公告)日：2007-06-21
申请号：US11554979
申请日：2006-10-31
申请人： Siddharth Nagarkatti , Michael Kishinevsky , Ali Shajii , Timothy Kalvaitis , William McKinney , Daniel Goodman , William Holber , John Smith
发明人： Siddharth Nagarkatti , Michael Kishinevsky , Ali Shajii , Timothy Kalvaitis , William McKinney , Daniel Goodman , William Holber , John Smith
IPC分类号： H03F3/191
CPC分类号： H03F1/56 , H03F3/191 , H03F3/20
摘要： A system and method are provided for delivering power to a dynamic load. The system includes a power supply providing DC power having a substantially constant power open loop response, a power amplifier for converting the DC power to RF power, a sensor for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system to modify the impedance of the power amplifier to at least a substantially matched impedance of a dynamic load, and a controller for controlling the electrically controllable impedance matching system. The system further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module for determining power delivered to a dynamic load, and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system.
摘要翻译：提供了一种将功率传递给动态负载的系统和方法。该系统包括提供具有基本上恒定的功率开环响应的DC电力的电源，用于将DC功率转换为RF功率的功率放大器，用于测量与RF功率相关联的电压和电流矢量之间的电压，电流和相位角的传感器，电可控阻抗匹配系统，用于将功率放大器的阻抗修改为动态负载的至少基本匹配的阻抗;以及用于控制电可控阻抗匹配系统的控制器。该系统还包括用于确定由功率放大器输出的功率的传感器校准测量模块，用于确定输送到动态负载的功率的电子匹配系统校准模块，以及用于计算在电气可控阻抗匹配系统中消耗的功率的功率耗散模块。

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