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    • 7. 发明授权
    • Selective bonding interconnection mask
    • 选择性粘接互连面罩
    • US4626309A
    • 1986-12-02
    • US627127
    • 1984-07-02
    • William B. Mullen, IIIJames H. GrotelueschenRobert Henschel
    • William B. Mullen, IIIJames H. GrotelueschenRobert Henschel
    • C09J5/00H05K1/02H05K1/03H05K3/00H05K3/28H05K3/32B32B31/04B32B31/12
    • H05K3/0061C09J5/00H05K1/0271H05K1/0306H05K2201/0999H05K2203/0191H05K3/281H05K3/321Y10T29/49126Y10T428/24289Y10T428/24331
    • An interconnection mask which is sandwiched between two members to be bonded together is comprised of a thin sheet of preselected material which has a plurality of apertures therein which are positioned, sized, and shaped to define the common bonding areas between the two members whereby structural failures induced by bonding and loading characteristics of the two members are minimized. A method for making an apparatus which utilizes the interconnection mask comprises the steps of preparing a mask of preselected material having a plurality of apertures therein, each aperture being positioned, sized and shaped to define a common bonding area between first and second members of the apparatus whereby the structural failures induced by the bonding and loading characteristics of the two members are minimized; placing a layer of bonding material on a surface of the first member; placing the interconnection mask over the layer of bonding material; placing the second member over the mask; bonding the first and second members together at each common bonding area defined by the apertures in the mask.
    • 被夹在两个待接合的构件之间的互连掩模由预选材料薄片组成,其中具有多个孔,其中定位,大小和成形以限定两个构件之间的共同接合区域,从而结构故障 通过两个构件的结合和加载特性引起的最小化。 制造利用所述互连掩模的装置的方法包括以下步骤:制备其中具有多个孔的预选材料的掩模,每个孔被定位,尺寸和形状以在所述装置的第一和第二构件之间限定公共粘合区域 由此两个构件的结合和加载特性引起的结构失效最小化; 在所述第一构件的表面上放置一层接合材料; 将互连掩模放置在结合材料层上; 将第二个成员放在面罩上; 在由掩模中的孔限定的每个公共接合区域处将第一和第二构件结合在一起。