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    • 1. 发明授权
    • Ultra-thin, corrosion resistant, hydrogenated carbon overcoats by combined sputtering and PECVD
    • 通过组合溅射和​​PECVD,超薄,耐腐蚀,氢化碳外涂层
    • US06815054B1
    • 2004-11-09
    • US09986863
    • 2001-11-13
    • Wen Hong LiuYao-Tzung Roger ShihTaesun Ernest KimChung Yuang Shih
    • Wen Hong LiuYao-Tzung Roger ShihTaesun Ernest KimChung Yuang Shih
    • G11B572
    • G11B11/10584G11B5/656G11B5/72G11B5/8408G11B11/10586Y10T428/30
    • A method of forming a layer of a hard, abrasion, and corrosion-resistant hydrogenated carbon (C:H) material on a substrate surface comprises steps of: (a) providing a vacuum chamber including a carbon sputtering target in the interior space thereof; (b) providing a substrate in the chamber interior space, a surface of the substrate the sputtering target; (c) supplying the vacuum chamber with at least one hydrocarbon gas and at least one inert gas at separately controllable flow rates and applying a sufficient negative potential to the carbon target to generate a plasma in said interior space to deposit a layer of the C:H material on the substrate surface by a process comprising simultaneous sputtering of the carbon sputtering target and plasma enhanced chemical vapor deposition (PECVD) of carbon and hydrogen from the hydrocarbon gas, wherein: step (c) includes separately controlling the flow rates of each of the hydrocarbon and inert gases such that the amount of C atoms in the C:H which are contributed by the PECVD component of the process is less than about 50 at. %. Embodiments of the invention include utilizing the C:H material as a protective overcoat layer for magnetic and magneto-optical recording media.
    • 在基材表面上形成硬质,耐磨和耐腐蚀氢化碳(C:H)材料层的方法包括以下步骤:(a)在其内部空间中提供包括碳溅射靶的真空室; (b)在所述室内部空间中提供衬底,所述衬底的所述溅射靶的表面;(c)以独立可控的流速向所述真空室提供至少一种烃气体和至少一种惰性气体,并施加足够的负极 通过包括碳溅射靶的同时溅射和碳的等离子体增强化学气相沉积(PECVD)的方法,在所述内部空间中产生等离子体的潜力以沉积在衬底表面上的C:H材料层,以及 来自烃气体的氢,其中:步骤(c)包括分别控制每种烃和惰性气体的流速,使得C:H中的C原子的量为 由PECVD组件重新贡献的过程小于约50。 本发明的实施例包括利用C:H材料作为磁和磁光记录介质的保护性外涂层。
    • 2. 发明授权
    • Method and apparatus for workpiece biassing utilizing non-arcing bias rail
    • 利用非电弧偏压导轨进行工件偏压的方法和装置
    • US06749729B1
    • 2004-06-15
    • US10270638
    • 2002-10-16
    • Weilu Hang XuSam Vi LuongYao-Tzung Roger Shih
    • Weilu Hang XuSam Vi LuongYao-Tzung Roger Shih
    • C23C1434
    • H01J37/32577C23C14/568
    • A non-arcing bias rail assembly for supplying an electrical bias potential to a moving workpiece/substrate holder, comprising an elongated metal strip adapted for mounting along a wall of a workpiece/substrate treatment apparatus and having a surface bounded by first and second opposed, laterally extending side edges; a bracket comprised of an electrically insulating material and including a first portion mounted on the surface adjacent to and extending along a portion of the first side edge, and a second portion forming an upstanding wall extending perpendicularly from the first portion and including a surface facing the second side edge of the metal strip; an electrically conductive bias contact spring assembly mounted on the upstanding wall of the bracket facing the second side edge; and electrically insulated wire means electrically connected to the bias contact spring assembly for supplying an electrical bias potential.
    • 一种用于向移动的工件/衬底保持器提供电偏置电位的非电弧偏置轨道组件,包括适于沿着工件/衬底处理设备的壁安装并具有由第一和第二相对的边界限定的表面的细长金属条, 横向延伸的侧边缘; 由电绝缘材料构成的支架,其包括安装在与第一侧边缘的一部分相邻并沿其延伸的表面上的第一部分,以及形成从第一部分垂直延伸的直立壁的第二部分, 金属条的第二侧边缘; 导电偏压接触弹簧组件,其安装在所述托架的面向所述第二侧边缘的所述直立壁上; 以及电连接到偏置接触弹簧组件的用于提供电偏置电位的电绝缘电线装置。