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    • 5. 发明授权
    • Ultra-thin, corrosion resistant, hydrogenated carbon overcoats by combined sputtering and PECVD
    • 通过组合溅射和​​PECVD,超薄,耐腐蚀,氢化碳外涂层
    • US06815054B1
    • 2004-11-09
    • US09986863
    • 2001-11-13
    • Wen Hong LiuYao-Tzung Roger ShihTaesun Ernest KimChung Yuang Shih
    • Wen Hong LiuYao-Tzung Roger ShihTaesun Ernest KimChung Yuang Shih
    • G11B572
    • G11B11/10584G11B5/656G11B5/72G11B5/8408G11B11/10586Y10T428/30
    • A method of forming a layer of a hard, abrasion, and corrosion-resistant hydrogenated carbon (C:H) material on a substrate surface comprises steps of: (a) providing a vacuum chamber including a carbon sputtering target in the interior space thereof; (b) providing a substrate in the chamber interior space, a surface of the substrate the sputtering target; (c) supplying the vacuum chamber with at least one hydrocarbon gas and at least one inert gas at separately controllable flow rates and applying a sufficient negative potential to the carbon target to generate a plasma in said interior space to deposit a layer of the C:H material on the substrate surface by a process comprising simultaneous sputtering of the carbon sputtering target and plasma enhanced chemical vapor deposition (PECVD) of carbon and hydrogen from the hydrocarbon gas, wherein: step (c) includes separately controlling the flow rates of each of the hydrocarbon and inert gases such that the amount of C atoms in the C:H which are contributed by the PECVD component of the process is less than about 50 at. %. Embodiments of the invention include utilizing the C:H material as a protective overcoat layer for magnetic and magneto-optical recording media.
    • 在基材表面上形成硬质,耐磨和耐腐蚀氢化碳(C:H)材料层的方法包括以下步骤:(a)在其内部空间中提供包括碳溅射靶的真空室; (b)在所述室内部空间中提供衬底,所述衬底的所述溅射靶的表面;(c)以独立可控的流速向所述真空室提供至少一种烃气体和至少一种惰性气体,并施加足够的负极 通过包括碳溅射靶的同时溅射和碳的等离子体增强化学气相沉积(PECVD)的方法,在所述内部空间中产生等离子体的潜力以沉积在衬底表面上的C:H材料层,以及 来自烃气体的氢,其中:步骤(c)包括分别控制每种烃和惰性气体的流速,使得C:H中的C原子的量为 由PECVD组件重新贡献的过程小于约50。 本发明的实施例包括利用C:H材料作为磁和磁光记录介质的保护性外涂层。
    • 7. 发明授权
    • Nitrogen -implanted, high carbon density overcoats for recording media
    • 用于记录介质的氮移植,高碳密度外涂层
    • US06613422B1
    • 2003-09-02
    • US09994780
    • 2001-11-28
    • Xiaoding MaMichael Joseph StirnimanJing Gui
    • Xiaoding MaMichael Joseph StirnimanJing Gui
    • G11B572
    • G11B5/72G11B11/10584G11B11/10586Y10T428/24942Y10T428/24975Y10T428/24992Y10T428/265Y10T428/30
    • A method of forming a layer of a novel hard, abrasion and corrosion resistant, nitrogen-doped, high carbon density, amorphous carbon or hydrogenated carbon (C:H) protective overcoat material on a surface of a recording medium comprises steps of: (a) providing a substrate including a stacked plurality of thin film layers thereon constituting the medium; (b) forming, by a process comprising generation and deposition of C ions having energies of at least about 90 eV, a layer of an amorphous carbon or hydrogenated carbon (C:H) material on the at least one surface of the substrate, the C:H layer having a high carbon density of at least about 2.0 gm/cm3; and (c) implanting nitrogen (N) ions in a surface portion of the high carbon density amorphous carbon or C:H layer to form an N-doped amorphous carbon or C:H surface layer having a carbon density substantially equal to said high C density of the C:H layer formed in step (b). Embodiments of the invention include thin-film magnetic and magneto-optical recording media including a layer of the novel material as a protective overcoat.
    • 在记录介质的表面上形成新颖的耐硬,耐磨,耐腐蚀,氮掺杂,高碳密度,无定形碳或氢化碳(C:H)保护性覆盖材料层的方法包括以下步骤:(a )提供包括构成介质的层叠的多个薄膜层的衬底;(b)通过包括产生和沉积具有至少约90eV的能量的C离子的方法形成无定形碳或氢化碳的层 (C:H)材料,所述基材的至少一个表面上的C:H层具有至少约2.0gm / cm 3的高碳密度; 和(c)在高碳密度无定形碳或C:H层的表面部分中注入氮(N)离子以形成具有基本上等于所述高C的碳密度的N掺杂无定形碳或C:H表面层 在步骤(b)中形成的C:H层的密度。本发明的实施例包括包括作为保护性外涂层的新型材料层的薄膜磁性和磁光记录介质。