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    • 3. 发明授权
    • Substrate processing apparatus and substrate processing method
    • 基板加工装置及基板处理方法
    • US07211145B2
    • 2007-05-01
    • US10422408
    • 2003-04-23
    • Gentaro Goshi
    • Gentaro Goshi
    • C30B29/06
    • H01L21/68728G03F7/3021H01L21/68792Y10T117/1004Y10T117/1008
    • A substrate processing apparatus include a spin chuck capable of holding a semiconductor wafer in a horizontal position, a drive motor for driving the spin chuck for rotation, and a processing vessel accommodating the spin chuck and the drive motor 50 therein and capable of sealing a supercritical fluid, such as supercritical carbon dioxide, therein. The supercritical fluid flows along the upper and the lower surface of the semiconductor wafer at velocities relative to the upper and the lower surface of the semiconductor wafer as the spin chuck holding the semiconductor wafer in a horizontal position rotates to remove contaminants including particles and adhering to the semiconductor wafer from the semiconductor wafer.
    • 基板处理装置包括能够将半导体晶片保持在水平位置的旋转卡盘,用于驱动旋转卡盘旋转的驱动马达以及容纳旋转卡盘和驱动马达50的处理容器,能够密封超临界 流体,如超临界二氧化碳。 超临界流体沿着半导体晶片的上表面和下表面以相对于半导体晶片的上表面和下表面的速度流动,因为保持半导体晶片处于水平位置的旋转卡盘旋转以除去包括颗粒的污染物并附着于 来自半导体晶片的半导体晶片。
    • 8. 发明授权
    • Method and system for cooling a pump
    • 冷却泵的方法和系统
    • US07491036B2
    • 2009-02-17
    • US10987066
    • 2004-11-12
    • Wayne M. ParentGentaro Goshi
    • Wayne M. ParentGentaro Goshi
    • F04B39/06F04B39/04F04F9/00
    • F04D29/5873F04D7/02F04D29/5866F04D29/588
    • A processing system utilizing a supercritical fluid for treating a substrate is described as having a pump for recirculating the supercritical fluid over the substrate. For various applications in supercritical fluid processing, the fluid temperature for the treatment process can elevate above the temperature acceptable for safe operation of the pump. Therefore, in accordance with one embodiment, a fraction of supercritical fluid from the primary recirculating flow of supercritical fluid over the substrate is circulated from the pressure side of the pump, through a heat exchanger to lower the temperature of the supercritical fluid, through the pump, and it is returned to the primary flow on the suction side of the pump. In accordance with yet another embodiment, supercritical fluid is circulated through the pump from an independent source to vent.
    • 描述了一种利用超临界流体处理衬底的处理系统,其具有用于将超临界流体再循环到衬底上的泵。 对于超临界流体处理中的各种应用,用于处理过程的流体温度可以提升到高于可接受的温度以使泵的安全运行。 因此,根据一个实施例,超临界流体在基体上的一次循环流中的一部分超临界流体从泵的压力侧通过热交换器循环,以通过泵降低超临界流体的温度 ,并返回到泵的吸入侧的主流。 根据另一个实施例,超临界流体通过泵从独立的来源循环通气。