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1. 发明授权

US07431858B2 Nanoimprint resist 有权
标题翻译：纳米抗蚀剂
公开(公告)号：US07431858B2
公开(公告)日：2008-10-07
申请号：US10511402
申请日：2003-04-09
申请人： Walter Spiess , Fumio Kita , Michael Meier , Andreas Gier , Martin Mennig , Peter W Oliveira , Helmut Schmidt
发明人： Walter Spiess , Fumio Kita , Michael Meier , Andreas Gier , Martin Mennig , Peter W Oliveira , Helmut Schmidt
IPC分类号： B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00
CPC分类号： G03F7/0757 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F7/0047
摘要： The invention relates to a method for microstructuring electronic components, which yields high resolutions (≦200 nm) at a good aspect ratio while being significantly less expensive than photolithographic methods. The inventive method comprises the following steps: i) a planar unhardened sol film of a nanocomposite composition according to claim 1 is produced; ii) a target substrate consisting of a bottom coat (b) and a support (c) is produced; iii) sol film material obtained in step i) is applied to the bottom coat (b) obtained in step ii) by means of a microstructured transfer embossing stamp; iv) the applied sol film material is hardened; v) the transfer embossing stamp is separated, whereby an embossed microstructure is obtained as a top coat (a). The method for producing a microstructured semiconductor material comprises the following additional steps: vi) the remaining layer of the nanocomposite sol film is plasma etched, preferably with CHF3/O2 plasma; vii) the bottom coat is plasma etched, preferably with O2 plasma; viii) the semiconductor material is etched or the semiconductor material is doped in the etched areas.
摘要翻译：本发明涉及一种用于微结构化电子部件的方法，其以良好的纵横比产生高分辨率（<= 200nm），同时显着地低于光刻方法。本发明的方法包括以下步骤：i）制备根据权利要求1的纳米复合组合物的平面未硬化溶胶膜; ii）制备由底涂层（b）和载体（c）组成的靶基材; iii）在步骤i）中获得的溶胶膜材料通过微结构转印压花印刷施加到在步骤ii）中获得的底涂层（b） iv）涂覆的溶胶膜材料硬化; v）分离转印压花印模，由此获得作为顶涂层（a）的压花微结构。制造微结构化半导体材料的方法包括以下附加步骤：vi）纳米复合溶胶膜的剩余层被等离子体蚀刻，优选地具有CHF 3 O 2 / O 2等离子体 ; vii）底涂层被等离子体蚀刻，优选为O 2等离子体; viii）蚀刻半导体材料或者在蚀刻区域中掺杂半导体材料。

2. 发明申请

US20050224452A1 Nanoimprint resist 有权
标题翻译：纳米抗蚀剂
公开(公告)号：US20050224452A1
公开(公告)日：2005-10-13
申请号：US10511402
申请日：2003-04-09
申请人： Walter Spiess , Fumio Kita , Michael Meier , Andreas Gier , Martin Mennig , Helmut Schmidt
发明人： Walter Spiess , Fumio Kita , Michael Meier , Andreas Gier , Martin Mennig , Helmut Schmidt
IPC分类号： G03F7/20 , B81C1/00 , G03F7/00 , G03F7/004 , G03F7/075 , H01L21/027 , H01L21/3065 , C23F1/00 , B05D5/00 , B44C1/22 , C03C15/00 , C03C25/68 , G03G15/00 , H01L21/311 , H01L29/06
CPC分类号： G03F7/0757 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F7/0047
摘要： The invention relates to a method for microstructuring electronic components, which yields high resolutions (≦200 nm) at a good aspect ratio while being significantly less expensive than photolithographic methods. The inventive method comprises the following steps: i) a planar unhardened sol film of a nanocomposite composition according to claim 1 is produced; ii) a target substrate consisting of a bottom coat (b) and a support (c) is produced; iii) sol film material obtained in step i) is applied to the bottom coat (b) obtained in step ii) by means of a microstructured transfer embossing stamp; iv) the applied sol film material is hardened; v) the transfer embossing stamp is separated, whereby an embossed microstructure is obtained as a top coat (a). The method for producing a microstructured semiconductor material comprises the following additional steps: vi) the remaining layer of the nanocomposite sol film is plasma etched, preferably with CHF3/O2 plasma; vii) the bottom coat is plasma etched, preferably with O2 plasma; viii) the semiconductor material is etched or the semiconductor material is doped in the etched areas.
摘要翻译：本发明涉及一种用于微结构化电子部件的方法，其以良好的纵横比产生高分辨率（<= 200nm），同时显着地低于光刻方法。本发明的方法包括以下步骤：i）制备根据权利要求1的纳米复合组合物的平面未硬化溶胶膜; ii）制备由底涂层（b）和载体（c）组成的靶基材; iii）在步骤i）中获得的溶胶膜材料通过微结构转印压花印刷施加到在步骤ii）中获得的底涂层（b） iv）涂覆的溶胶膜材料硬化; v）分离转印压花印模，由此获得作为顶涂层（a）的压花微结构。制造微结构化半导体材料的方法包括以下附加步骤：vi）纳米复合溶胶膜的剩余层被等离子体蚀刻，优选地具有CHF 3 O 2 / O 2等离子体 ; vii）底涂层被等离子体蚀刻，优选为O 2等离子体; viii）蚀刻半导体材料或者在蚀刻区域中掺杂半导体材料。

3. 发明授权

US06855371B2 Method for producing a microstructured surface relief by embossing thixotropic layers 有权
标题翻译：通过压花触变层制造微结构化表面浮雕的方法
公开(公告)号：US06855371B2
公开(公告)日：2005-02-15
申请号：US10169971
申请日：2001-01-12
申请人： Andreas Gier , Nora Kunze , Martin Mennig , Peter W. Oliveira , Stefan Sepeur , Bruno Schaefer , Helmut Schmidt
发明人： Andreas Gier , Nora Kunze , Martin Mennig , Peter W. Oliveira , Stefan Sepeur , Bruno Schaefer , Helmut Schmidt
IPC分类号： B05D5/06 , B05D1/42 , B05D3/12 , B05D7/24
CPC分类号： B05D3/12 , B05D1/42
摘要： A method is described for producing a microstructured surface relief by applying to a substrate a coating composition which is thixotropic or which acquires thixotropic properties by pretreatment on the substrate, embossing the surface relief into the applied thixotropic coating composition with an embossing device, and curing the coating composition following removal of the embossing device. The substrates obtainable by this method, provided with a microstructured surface relief, are particularly suitable for optical, electronic, micromechanical and/or dirt repellency applications.
摘要翻译：描述了一种用于通过向基底施加触变性的涂料组合物或通过在基材上预处理来获得触变性能，通过压花装置将表面浮雕压印到所施加的触变涂料组合物中并固化所述涂层组合物的方法去除压花装置后的涂料组合物。通过该方法获得的可提供微结构表面浮雕的基板特别适用于光学，电子，微机械和/或防污性应用。

4. 发明授权

US08034435B2 Plastic film with a multilayered interference coating 有权
标题翻译：塑料薄膜与多层干涉涂层
公开(公告)号：US08034435B2
公开(公告)日：2011-10-11
申请号：US10508193
申请日：2003-03-14
申请人： Andreas Zimmermann , Fumio Kita , Anette Berni , Martin Mennig , Peter W. Oliveira , Helmut Schmidt , Takamasa Harada
发明人： Andreas Zimmermann , Fumio Kita , Anette Berni , Martin Mennig , Peter W. Oliveira , Helmut Schmidt , Takamasa Harada
IPC分类号： B32B7/02
CPC分类号： G02B5/0841 , B32B27/06 , C08J7/047 , C08J7/16 , G02B1/11 , Y10T428/24942 , Y10T428/256
摘要： The invention relates to a plastic film with an interference multilayer system applied thereon that comprises at least two layers. Said layers can be obtained by hardening and/or applying thermal treatment to a coating composition containing nanoscale inorganic solid particles having polymerizable and/or polycondensable organic surface groups, thereby forming a layer that is crosslinked by means of the polymerizable and/or polycondensable organic surface groups. The films can be used as an optical laminating film.
摘要翻译：本发明涉及一种其上施加有干涉多层系统的塑料膜，其包括至少两层。所述层可以通过硬化和/或施加热处理获得，所述涂层组合物含有具有可聚合和/或可缩聚有机表面基团的纳米级无机固体颗粒，由此形成通过可聚合和/或可缩聚有机表面交联的层团体这些膜可以用作光学层压膜。

5. 发明授权

US07473721B2 Nanocomposite material for the production of index of refraction gradient films 有权
$Nanocomposite material for the production of index of refraction gradient films$
标题翻译：用于生产折射率梯度膜的纳米复合材料
公开(公告)号：US07473721B2
公开(公告)日：2009-01-06
申请号：US10500194
申请日：2003-01-03
申请人： Takamasa Harada , Fumio Kita , Andreas Zimmermann , Ulrike Dellwo , Martin Mennig , Peter W. Oliveira , Helmut Schmidt , Heike Schneider
发明人： Takamasa Harada , Fumio Kita , Andreas Zimmermann , Ulrike Dellwo , Martin Mennig , Peter W. Oliveira , Helmut Schmidt , Heike Schneider
IPC分类号： C08K9/12
CPC分类号： C08L83/06 , C08K3/013 , C09D183/06 , G02B1/04 , G03H2260/12 , C08L2666/04
摘要： The invention relates to solid or gel-type nanocomposite material which can be polymerised, containing a) 4.9 95.9 wt. % of a soluble polymer; b) 4-95 wt. % of a partially or totally condensed silane selected from the group of epoxyalkoxysilanes, alkoxysilanes and alkylalkoxysilanes, the silane having an inorganic condensation degree of between 33-100% and an organic conversion degree of between 0-95%; c) 0-60 wt. % of an acrylate; d) 0.1-50 wt. % of surface modified nanometric particles selected from the group of oxides, sulphides, selenides, tellurides, halogenides, carbides, arsenides, antimonides, nitrides, phosphides, carbonates, carboxylates, phosphates, sulphates, silicates, titanates, zirconates, aluminates, stannates, plumbates and a mixed oxides; e) 0-50 wt.-% of a plasticizer; f) 0-5 wt. % of a thermal or photochemical cross-linking initiator, sensitizer, auxiliary wetting agent, adhesive agent, antioxidant, stabiliser, coloring agent, photochrome material and thermochrome material in relation to the total weight (dry weight) of the nanocomposite material.
摘要翻译：本发明涉及可以聚合的固体或凝胶型纳米复合材料，其包含a）4.9 95.9wt。％的可溶性聚合物; b）4-95wt。选自环氧烷氧基硅烷，烷氧基硅烷和烷基烷氧基硅烷的部分或全部冷凝的硅烷的％，硅烷的无机缩合度在33-100％之间，有机转化度在0-95％之间; c）0-60wt。％的丙烯酸酯; d）0.1-50wt。选自氧化物，硫化物，硒化物，碲化物，卤化物，碳化物，砷化物，锑化物，氮化物，磷化物，碳酸盐，羧酸盐，磷酸盐，硫酸盐，硅酸盐，钛酸盐，锆酸盐，铝酸盐，锡酸盐，铅酸铅的表面改性纳米颗粒的％和混合氧化物; e）0-50重量％的增塑剂; f）0-5wt。相对于纳米复合材料的总重量（干重），热或光化学交联引发剂，敏化剂，辅助润湿剂，粘合剂，抗氧化剂，稳定剂，着色剂，感光材料和热变色材料的％。

6. 发明授权

US07473521B2 Composite mask for producing a diffuser 有权
标题翻译：用于生产扩散器的复合面罩
公开(公告)号：US07473521B2
公开(公告)日：2009-01-06
申请号：US10497766
申请日：2002-12-06
申请人： Takamasa Harada , Fumio Kita , Andreas Zimmermann , Andreas Altherr , Martin Mennig , Peter W. Oliveira , Helmut Schmidt
发明人： Takamasa Harada , Fumio Kita , Andreas Zimmermann , Andreas Altherr , Martin Mennig , Peter W. Oliveira , Helmut Schmidt
IPC分类号： G02B5/02
CPC分类号： G02B5/0242 , C08K5/0041 , G02B5/0268 , G03C1/015 , G03C5/00 , Y10T428/25 , Y10T428/256 , Y10T428/257 , Y10T428/258
摘要： The invention relates to an alternative composite mask that is substantially composed of a transparent support film coated with a transparent polymer matrix that contains light-absorbing pigment particles or metal particles having an average particle size d50 ranging between 0.5 and 10 μm.
摘要翻译：本发明涉及一种替代的复合掩模，其基本上由涂覆有透明聚合物基质的透明支撑膜构成，该透明聚合物基质含有光吸收颜料颗粒或平均粒径d50在0.5-10μm之间的金属颗粒。

7. 发明授权

US07390532B2 Method for the production of optical elements with gradient structures 有权
标题翻译：用于生产具有梯度结构的光学元件的方法
公开(公告)号：US07390532B2
公开(公告)日：2008-06-24
申请号：US10885618
申请日：2004-07-08
申请人： Ulrike Dellwo , Martin Mennig , Peter W. Oliveira , Helmut Schmidt , Heike Schneider
发明人： Ulrike Dellwo , Martin Mennig , Peter W. Oliveira , Helmut Schmidt , Heike Schneider
IPC分类号： B05D5/06
CPC分类号： G02B6/13 , C08F283/12 , C08F283/124 , C08L51/085 , G02B3/0087 , Y10T428/31507 , C08L2666/02 , C08L2666/14
摘要： A process for producing an optical element having a gradient structure, wherein a potential difference is generated in a nanocomposite material comprising nanoscale particles in a matrix material to cause a directed diffusion of the nanoscale particles in the matrix material and a concentration gradient of the nanoscale particles in the matrix material.
摘要翻译：一种用于制造具有梯度结构的光学元件的方法，其中在纳米复合材料中产生电位差，所述纳米复合材料包含基质材料中的纳米级颗粒，以引起纳米尺度颗粒在基体材料中的定向扩散，以及纳米尺度颗粒的浓度梯度在基质材料中。

8. 发明授权

US06855396B1 Substrate comprising an abrasion-resistant diffusion barrier layer system 有权
标题翻译：基材包括耐磨扩散阻挡层体系
公开(公告)号：US06855396B1
公开(公告)日：2005-02-15
申请号：US10111174
申请日：2000-10-27
申请人： Martin Mennig , Peter W. Oliveira , Helmut Schmidt
发明人： Martin Mennig , Peter W. Oliveira , Helmut Schmidt
IPC分类号： B05D1/36 , B05D3/02 , B05D5/00 , B05D7/00 , B05D7/24 , C08F2/58 , C08L83/05 , C09D5/00 , C09D7/12 , C09D183/02 , C09D183/04 , C09D183/06 , C09D201/00 , G02B1/10 , B32B7/02 , B05D1/22 , B32B27/04
CPC分类号： B82Y30/00 , B05D5/00 , B05D7/546 , B05D7/586 , G02B1/105 , G02B1/14 , Y10T428/24364 , Y10T428/2438 , Y10T428/24942 , Y10T428/2495 , Y10T428/25 , Y10T428/254
摘要： A substrate has an abrasion-resistant diffusion barrier layer system having: a hard base layer including a coating composition based on a polymer containing reactive surface groups; and a nanostructured topcoat obtained by applying a nanoscale composition comprising sol particles and/or particulate solids to the basecoat and then curing it. The system features good abrasion resistance and diffusion barrier effect, and is particularly suitable as a protective coat for plastic substrates.
摘要翻译：基板具有耐磨扩散阻挡层系统，其具有：包含基于含有反应性表面基团的聚合物的涂料组合物的硬质基层; 以及通过将包含溶胶颗粒和/或颗粒固体的纳米级组合物施加到底涂层然后固化而获得的纳米结构面漆。该系统具有良好的耐磨性和扩散阻挡效果，特别适用于塑料基材的保护层。

9. 发明授权

US08119221B2 Composition having a non-Newtonian behavior 有权
标题翻译：具有非牛顿行为的组合
公开(公告)号：US08119221B2
公开(公告)日：2012-02-21
申请号：US11269593
申请日：2005-11-09
申请人： Martin Mennig , Peter W. Oliveira , Helmut Schmidt
发明人： Martin Mennig , Peter W. Oliveira , Helmut Schmidt
IPC分类号： B32B5/00 , B32B9/04
CPC分类号： C08J5/005 , B82Y30/00 , C08K9/02 , C08K9/04 , Y10T428/24355 , Y10T428/24372 , Y10T428/24388 , Y10T428/24479 , Y10T428/24802 , Y10T428/24893 , Y10T428/31663
摘要： A composition with non-Newtonian behaviour which comprises a matrix former and nanoscale solid particles whose surface charge has been increased by reaction with an acid or base, and a process for the preparation thereof. The process is suitable for adjusting the rheology of materials.
摘要翻译：具有非牛顿行为的组合物及其制备方法，其包含基质前体和表面电荷通过与酸或碱反应而增加的纳米级固体颗粒。该方法适用于调节材料的流变性。

10. 发明授权

US06649266B1 Substrates provided with a microstructured surface, methods for the production thereof, and their use 失效
标题翻译：具有微结构表面的基板，其制造方法及其用途
公开(公告)号：US06649266B1
公开(公告)日：2003-11-18
申请号：US09959023
申请日：2001-10-15
申请人： Frank Gross , Martin Mennig , Peter W. Oliveira , Helmut Schmidt , Stefan Sepeur
发明人： Frank Gross , Martin Mennig , Peter W. Oliveira , Helmut Schmidt , Stefan Sepeur
IPC分类号： B32B1700
CPC分类号： C09K3/18 , B05D1/40 , B05D5/08 , B08B17/06 , B08B17/065 , B29C59/026 , B29C2059/023 , Y10T428/31 , Y10T428/315 , Y10T428/31612 , Y10T428/31663
摘要： Substrates provided with a microstructured surface have a surface layer which (a) comprises a composition comprising condensates of one or more hydrolysable compounds of at least one element M from main groups III to V and/or transition groups II to IV of the Periodic Table of the Elements, at least some of these compounds containing not only hydrolysable groups A but also non-hydrolysable, carbon-containing groups B and the total molar ratio of groups A to groups B in the parent monomeric starting compounds being from 10:1 to 1:2, from 0.1 to 100 mol % of the groups B being groups B′ containing on average from 5 to 30 fluorine atoms which are attached to one or more aliphatic carbon atoms distanced from M by at least two atoms, and (b) has a microstructuring of such kind that the contact angle with respect to water or hexadecane is at least 5° higher than the contact angle of a corresponding smooth surface. The substrates provided with a microstructured surface are particularly suitable as transparent or translucent easy-to-clean systems.
摘要翻译：提供有微结构化表面的底物具有表面层，其表面层包含一种组合物，该组合物包含至少一种元素M的主要组III至V的一种或多种可水解化合物的缩合物和/或周期表的转变基团II至IV的组合物元素，这些化合物中的至少一些化合物不仅含有可水解基团A，而且含有不可水解的含碳基团B，并且母体单体起始化合物中基团A与基团B的总摩尔比为10:1至1 2，0.1〜100摩尔％的基团B为含有平均5〜30个氟原子的基团B'，其通过至少两个原子与一个或多个与M离开的一个或多个脂族碳原子连接，（b）具有这种微结构化使得相对于水或十六烷的接触角比相应的光滑表面的接触角高至少5°。具有微结构化表面的基底特别合适作为透明或半透明的易于清洁的系统。

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