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1. 发明申请

US20080073563A1 Exposure apparatus that includes a phase change circulation system for movers 审中-公开
标题翻译：包括移动器的相变循环系统的曝光装置
公开(公告)号：US20080073563A1
公开(公告)日：2008-03-27
申请号：US11479628
申请日：2006-07-01
申请人： W. Thomas Novak , Michael Binnard , Alex Ka Tim Poon , Masahiro Totsu , Leonard Wai Fung Kho , Gaurav Keswani
发明人： W. Thomas Novak , Michael Binnard , Alex Ka Tim Poon , Masahiro Totsu , Leonard Wai Fung Kho , Gaurav Keswani
IPC分类号： G01F23/00
CPC分类号： G03F7/70875 , G03F7/70758 , H01L21/67248 , H01L21/68 , H02K9/20 , H02K41/02
摘要： A mover combination (226) for moving and positioning a device (34) includes a mover (328) that defines a fluid passageway (370) and a circulation system (330) having a passageway inlet (374) and a passageway outlet (376). The circulation system (330) directs a circulation fluid (378) into the fluid passageway (370). The circulation system (330) can include a liquid/gas separator (384) that is in fluid communication with the fluid passageway (370). With this design, the plumbing for the liquid (378A) and the gas (378B) can each be optimized. Additionally, the circulation system (330) can include a pressure control device (388) that controls the pressure of the circulation fluid (378) in at least a portion of the fluid passageway (370). With this design, the pressure control device (388) controls the pressure of the circulation fluid (378) near the fluid passageway (370) so that the temperature of the circulation fluid (378) at the passageway outlet (376) is approximately equal to the temperature of the circulation fluid (378) at the passageway inlet (374). Moreover, the circulation system (930) can include a pump assembly (980) that directs the circulation fluid (978) into the passageway inlet (974), and a pressure control device (996) that precisely controls a state of the circulation fluid (978) near the passageway inlet (974). With this design, the phase of the circulation fluid (978) at the passageway inlet (974) can be precisely controlled without restricting the flow of the circulation fluid (978).
摘要翻译：用于移动和定位装置（34）的移动器组合（226）包括限定流体通道（370）的移动器（328）和具有通道入口（374）和通道出口（376）的循环系统（330）。循环系统（330）将循环流体（378）引导到流体通道（370）中。循环系统（330）可以包括与流体通道（370）流体连通的液体/气体分离器（384）。通过这种设计，可以优化液体（378A）和气体（378B）的管道。另外，循环系统（330）可以包括控制流体通道（370）的至少一部分中的循环流体（378）的压力的压力控制装置（388）。通过该设计，压力控制装置（388）控制流体通道（370）附近的循环流体（378）的压力，使得通道出口（376）处的循环流体（378）的温度近似等于通道入口处的循环流体（378）的温度（374）。此外，循环系统（930）可以包括引导循环流体（978）进入通道入口（974）的泵组件（980）和精确地控制循环流体的状态的压力控制装置（996） 978）在通道入口附近（974）。通过这种设计，可以精确地控制在通道入口（974）处的循环流体（978）的相位，而不限制循环流体（978）的流动。

2. 发明申请

US20050057102A1 Holding member, coolant, cooling method and cooling device, linear motor device, stage device, and exposure apparatus 审中-公开
标题翻译：保持构件，冷却剂，冷却方法和冷却装置，线性电动机装置，平台装置和曝光装置
公开(公告)号：US20050057102A1
公开(公告)日：2005-03-17
申请号：US10659401
申请日：2003-09-11
申请人： Masahiro Totsu , Andrew Hazelton , Ed Reynolds , Michael Binnard , Yoichi Arai
发明人： Masahiro Totsu , Andrew Hazelton , Ed Reynolds , Michael Binnard , Yoichi Arai
IPC分类号： B23Q11/14 , G03F7/20 , H01L21/027 , H02K9/19 , H02K9/20 , H02K41/02 , H02K41/00 , H02K9/00
CPC分类号： G03F7/70758 , G03F7/70858 , H02K9/19 , H02K9/20 , H02K41/031
摘要： A coolant cools an object (such as, for example, a coil of a linear motor that drives a stage of an exposure apparatus) while suppressing the generation of a temperature distribution in various parts of the object being cooled by using a coolant that includes a first component and a second component dispersed in the first component, the second component increases in temperature by a lesser amount than the first component when a predetermined amount of heat is absorbed by the first and second components, respectively. The second component may be a substance that changes phase (for example, from a solid to a liquid or from a liquid to a gas) in order to absorb the predetermined amount of heat. The second component may have a higher heat capacity than the first component, and may not change phase when it absorbs heat to cool the object.
摘要翻译：冷却剂冷却物体（例如，驱动曝光装置的阶段的线性电动机的线圈），同时通过使用包括冷却剂的冷却剂来抑制被冷却物体的各个部分中的温度分布的产生第一组分和第二组分分散在第一组分中，当预定量的热分别被第一组分和第二组分吸收时，第二组分的温度比第一组分的量少。第二组分可以是改变相（例如，从固体到液体或从液体到气体）的物质，以便吸收预定量的热量。第二组分可能具有比第一组分更高的热容量，并且当其吸收热量以冷却物体时可能不改变相。

3. 发明授权

US07869000B2 Stage assembly with lightweight fine stage and low transmissibility 有权
标题翻译：舞台装配轻巧细腻，传送率低
公开(公告)号：US07869000B2
公开(公告)日：2011-01-11
申请号：US11048405
申请日：2005-01-31
申请人： Yoichi Arai , Andrew J. Hazelton , Michael Binnard , W. Thomas Novak , Douglas C. Watson , Kirk Lok
发明人： Yoichi Arai , Andrew J. Hazelton , Michael Binnard , W. Thomas Novak , Douglas C. Watson , Kirk Lok
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/70716
摘要： A stage assembly (220) that moves a work piece (200) along a first axis, along a second axis and along a third axis includes a first stage (238), a first mover assembly (242) that moves the first stage (238) along the first axis, a second stage (240) that retains the work piece (200), a second mover assembly (244), and a non-contact bearing (257). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) along the first axis, along the second axis, and along the third axis. The non-contact bearing (257) supports the mass of the second stage (240). Further, the non-contact bearing (257) allows the second stage (240) to move relative to the first stage (238) along the first axis and along the second axis. The second mover assembly (244) can move the second stage (240) with at least four degrees of movement.
摘要翻译：沿着第二轴线沿着第三轴线沿着第一轴线移动工件（200）的台架组件（220）包括第一阶段（238），第一移动器组件（242），其使第一阶段（238）移动），保持所述工件（200）的第二级（240），第二移动器组件（244）和非接触式轴承（257）。第二移动器组件（244）沿着第一轴线沿着第二轴线和第三轴线相对于第一阶段（238）移动第二阶段（240）。非接触轴承（257）支撑第二级（240）的质量。此外，非接触式轴承（257）允许第二级（240）相对于第一级（238）沿着第一轴线并沿着第二轴线移动。第二移动器组件（244）可以以至少四个移动程度移动第二平台（240）。

4. 发明授权

US06963821B2 Stage counter mass system 失效
标题翻译：舞台柜体系
公开(公告)号：US06963821B2
公开(公告)日：2005-11-08
申请号：US10361700
申请日：2003-02-11
申请人： Michael Binnard , W. Thomas Novak , Toshio Ueta , Bausan Yuan
发明人： Michael Binnard , W. Thomas Novak , Toshio Ueta , Bausan Yuan
IPC分类号： B23Q11/00 , G03F7/20 , G01B11/24
CPC分类号： G03F7/70766 , B23Q11/0032 , G03F7/70725
摘要： A wafer stage countermass assembly generally includes a base supporting one or more stages and first and second countermasses. The first and second stages move in one or more degrees of freedom. The countermasses move in at least one degree of freedom and, under ideal conditions, move to counter the movement of the stages in operation and thus preserve the systems center of gravity to avoid unwanted body motion. However, under actual conditions the countermasses may under travel or over travel their ideal trajectory. To more closely track the ideal trajectory, a controller actuates trim motors to apply small forces to the countermasses to push them towards a reference position in the Y direction. A second embodiment also takes into account the X position the stage(s) to cancel torque.
摘要翻译：晶片台反质量组件通常包括支撑一个或多个阶段的基座和第一和第二反作用力。第一和第二阶段以一个或多个自由度移动。反恐怖主义至少有一个自由度，在理想条件下，可以抵抗运行阶段的运动，从而保持系统的重心，避免不必要的身体运动。然而，在实际情况下，反恐怖主义可能在行进或超越其理想轨迹。为了更紧密地跟踪理想轨迹，控制器启动微调电机，以将小的力施加到反作用体上，将其推向Y方向的参考位置。第二实施例还考虑到X位置，以消除扭矩的阶段。

5. 发明授权

US08582080B2 Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage 有权
标题翻译：具有测量系统初始化，振动补偿，低传输性和轻质细阶段的舞台装配
公开(公告)号：US08582080B2
公开(公告)日：2013-11-12
申请号：US12178240
申请日：2008-07-23
申请人： Michael Binnard , Wen-Hou Ma , Toshio Ueta , Pai-Hsueh Yang , Ting-Chien Teng , Bausan Yuan
发明人： Michael Binnard , Wen-Hou Ma , Toshio Ueta , Pai-Hsueh Yang , Ting-Chien Teng , Bausan Yuan
IPC分类号： G03B27/42
CPC分类号： G03F7/70775 , G03F7/70716 , G03F7/709
摘要： A stage assembly (220) that moves a work piece (200) about a first axis and along a first axis includes a first stage (238), a second stage (240) that retains the work piece (200), a second mover assembly (244), a measurement system, and an initialization system (1081A). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) about the first axis. The measurement system (22) monitors the position of the second stage (240) about the first axis when the second stage (240) is positioned within a working range about the first axis. The initialization system (1081A) facilitates movement of the second stage (240) about the first axis when the second stage (240) is rotated about the first axis outside the working range. The second mover assembly (244) can include a mover (255) and a dampener (410) that reduces the transmission of vibration from the first stage (238) to the second stage (240). In addition, the stage assembly (220) can include a control system (24) that directs power to the mover (255) to position the second stage (240) and to compensate for vibration of the first stage (238).
摘要翻译：围绕第一轴线并沿着第一轴线移动工件（200）的平台组件（220）包括：第一阶段（238）;保持工件（200）的第二阶段（240）;第二推动组件（244），测量系统和初始化系统（1081A）。第二移动器组件（244）围绕第一轴线相对于第一阶段（238）移动第二阶段（240）。当第二级（240）位于围绕第一轴的工作范围内时，测量系统（22）监测第二级（240）围绕第一轴的位置。当第二级（240）围绕工作范围外的第一轴线旋转时，初始化系统（1081A）有助于第二级（240）围绕第一轴的移动。第二移动器组件（244）可以包括减小从第一级（238）到第二级（240）的振动传递的移动器（255）和阻尼器（410）。另外，台架组件（220）可以包括控制系统（24），该控制系统（24）将电力引导到动子（255）以定位第二级（240）并补偿第一级（238）的振动。

6. 发明申请

US20080128303A1 Device container assembly with adjustable retainers for a reticle 审中-公开
标题翻译：用于掩模版的带可调节保持器的装置容器组件
公开(公告)号：US20080128303A1
公开(公告)日：2008-06-05
申请号：US11634786
申请日：2006-12-05
申请人： Alton H. Phillips , Douglas C. Watson , Michael Binnard
发明人： Alton H. Phillips , Douglas C. Watson , Michael Binnard
IPC分类号： G03F9/00 , B65D85/38
CPC分类号： G03F7/70741 , G03F1/66
摘要： A device container assembly (30) for storing a reticle (26) includes a first container (246) and a device retainer assembly (248). The first container (246) encircles and encloses the reticle (26). The device retainer assembly (248) selectively couples the reticle to the first container (246). The device retainer assembly (248) can include an adjustable first device retainer (256) having a retainer section (280A) that is movable relative to the first container (246) between an engaged position (281A) in which the retainer section (280A) engages the reticle (26) and a disengaged position (281B) in which the retainer section (280A) does not engage the reticle (26). With this design, the device container assembly (30) can retain the reticle (26) in a secure fashion and the integrity of the reticle (26) is maintained by the device container assembly (30).
摘要翻译：一种用于存储掩模版（26）的装置容器组件（30）包括第一容器（246）和装置保持器组件（248）。第一容器（246）围绕并包围掩模版（26）。装置保持器组件（248）选择性地将掩模版连接到第一容器（246）。装置保持器组件（248）可以包括可调节的第一装置保持器（256），其具有保持器部分（280A），该保持器部分可相对于第一容器（246）移动在接合位置（281A）之间， 280A）接合所述掩模版（26）和所述保持器部分（280A）不接合所述掩模版（26）的分离位置（281B）。通过这种设计，装置容器组件30可以以安全的方式保持掩模版26，并且掩模版26的完整性由装置容器组件30保持。

7. 发明授权

US07372538B2 Apparatus and method for maintaining immerison fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine 有权
标题翻译：在浸没式光刻机中的晶片更换期间，在投影透镜下方的间隙内保持浸泡液的装置和方法
公开(公告)号：US07372538B2
公开(公告)日：2008-05-13
申请号：US11237721
申请日：2005-09-29
申请人： Michael Binnard
发明人： Michael Binnard
IPC分类号： G03B27/52 , G03B27/42 , G03B27/32
CPC分类号： G03F7/70341 , G03B27/52 , G03F7/70716 , G03F7/70725 , G03F7/70733
摘要： An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece table that supports the work piece adjacent to the optical assembly. An environmental system is provided to supply and remove an immersion fluid from the gap between the optical assembly and the work piece on the stage assembly. After exposure of the work piece is complete, an exchange system removes the work piece and replaces it with a second work piece. An immersion fluid containment system maintains the immersion liquid in the gap during removal of the first work piece and replacement with the second work piece.
摘要翻译：在光刻机中的工件更换期间，将浸没流体保持在与投影透镜相邻的间隙中的装置和方法。该装置和方法包括将图像投影到工件上的光学组件和包括支撑邻近光学组件的工件的工件台的台架组件。提供了一种环境系统，用于从台架组件上的光学组件和工件之间的间隙提供和移除浸没流体。工件曝光完成后，交换系统将移除工件，并用第二个工件代替工件。浸没流体容纳系统在移除第一工件并用第二工件更换时将浸没液体保持在间隙中。

8. 发明申请

US20080067968A1 Identifying and compensating force-ripple and side-forces produced by linear actuators 审中-公开
标题翻译：识别和补偿由线性执行器产生的力 - 纹波和侧力
公开(公告)号：US20080067968A1
公开(公告)日：2008-03-20
申请号：US11900916
申请日：2007-09-12
申请人： Michael Binnard , Scott Coakley
发明人： Michael Binnard , Scott Coakley
IPC分类号： H02P6/08 , G05B11/01
CPC分类号： H02P25/06 , H02P25/064
摘要： Methods are disclosed for operating at least one commutated actuator (generally termed a “linear actuator”) while compensating for error-inducing phenomena such as force-ripple and side-force. An exemplary method includes determining a set of commutation equations that substantially provide desired forces for the actuator in one or more directions. A map is generated of actual forces produced by the actuator in the one or more directions in proportion to coefficients of the commutation equations. Corrected commutation coefficients are determined from the desired forces and the map of actual forces. Electrical current is applied to the actuator using the commutation equations with the corrected coefficients. The methods are applicable to actuators having one degree of freedom (DOF) of motion or multi-DOF actuators, and are applicable to actuators that run on single-phase power or multi-phase power.
摘要翻译：公开了用于操作至少一个换向致动器（通常称为“线性致动器”）的方法，同时补偿诸如力波纹和侧向力的误差现象。示例性方法包括确定在一个或多个方向上基本上为致动器提供期望的力的一组换向方程。在一个或多个方向上由致动器产生的实际力产生的映射与换向方程的系数成比例。校正的换向系数由所需的力和实际力的映射确定。使用具有校正系数的换向方程将电流施加到致动器。该方法适用于具有运动或多自由度执行器的一个自由度（DOF）的致动器，并且适用于运行于单相功率或多相功率的致动器。

9. 发明申请

US20060104753A1 Stage assembly with lightweight fine stage and low transmissibility 有权
标题翻译：舞台装配轻巧细腻，传送率低
公开(公告)号：US20060104753A1
公开(公告)日：2006-05-18
申请号：US11048405
申请日：2005-01-31
申请人： Yoichi Arai , Andrew Hazelton , Michael Binnard , W. Novak , Douglas Watson , Kirk Lok
发明人： Yoichi Arai , Andrew Hazelton , Michael Binnard , W. Novak , Douglas Watson , Kirk Lok
IPC分类号： B65H43/08
CPC分类号： G03F7/70716
摘要： A stage assembly (220) that moves a work piece (200) along a first axis, along a second axis and along a third axis includes a first stage (238), a first mover assembly (242) that moves the first stage (238) along the first axis, a second stage (240) that retains the work piece (200), a second mover assembly (244), and a non-contact bearing (257). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) along the first axis, along the second axis, and along the third axis. The non-contact bearing (257) supports the mass of the second stage (240). Further, the non-contact bearing (257) allows the second stage (240) to move relative to the first stage (238) along the first axis and along the second axis. The second mover assembly (244) can move the second stage (240) with at least four degrees of movement.
摘要翻译：沿着第二轴线沿着第三轴线沿着第一轴线移动工件（200）的台架组件（220）包括第一阶段（238），第一移动器组件（242），其使第一阶段（238）移动），保持所述工件（200）的第二级（240），第二移动器组件（244）和非接触式轴承（257）。第二移动器组件（244）沿着第一轴线沿着第二轴线和第三轴线相对于第一阶段（238）移动第二阶段（240）。非接触轴承（257）支撑第二级（240）的质量。此外，非接触式轴承（257）允许第二级（240）相对于第一级（238）沿着第一轴线并沿着第二轴线移动。第二移动器组件（244）可以以至少四个移动程度移动第二平台（240）。

10. 发明申请

US20060049697A1 Split coil linear motor for z force 审中-公开
标题翻译：用于z力的分线圈线性电机
公开(公告)号：US20060049697A1
公开(公告)日：2006-03-09
申请号：US10935995
申请日：2004-09-08
申请人： Michael Binnard
发明人： Michael Binnard
IPC分类号： H02K41/00
CPC分类号： G03F7/70758 , H02K41/03 , H02K2201/18 , H02N15/00
摘要： Methods and apparatus for enabling a coil to be used to provide a net force along more than one axis are disclosed. According to one aspect of the present invention, an actuator includes a magnet assembly and a coil assembly. The coil assembly moves at least partially within the magnet arrangement, and includes a top coil half and a bottom coil half. The top coil half and the bottom coil half are independently controllable such that a first current applied to the top coil half may be independently applied from a second current applied to the bottom coil half.
摘要翻译：公开了一种用于使线圈用于沿多于一个轴提供净力的方法和装置。根据本发明的一个方面，致动器包括磁体组件和线圈组件。线圈组件至少部分地在磁体布置内移动，并且包括顶部线圈半部和底部线圈半部。顶部线圈半部和底部线圈一半可独立控制，使得施加到顶部线圈一半的第一电流可以从施加到底部线圈一半的第二电流独立地施加。

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