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1. 发明授权

US07345290B2 Lens array for electron beam lithography tool 有权
标题翻译：用于电子束光刻工具的透镜阵列
公开(公告)号：US07345290B2
公开(公告)日：2008-03-18
申请号：US09414004
申请日：1999-10-07
申请人： Victor Katsap , Pieter Kruit , Daniel Moonen , Warren Kazmir Waskiewicz
发明人： Victor Katsap , Pieter Kruit , Daniel Moonen , Warren Kazmir Waskiewicz
IPC分类号： G21K5/10
CPC分类号： H01J37/065 , H01J37/12 , H01J2237/1205 , H01J2237/31774
摘要： A method and apparatus for controlling beam emittance by placing a lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The lens array may be one or more mesh grids or a combination of grids and continuous foils. The lens array forms a multitude of microlenses resembling an optical “fly's eye” lens. The lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.
摘要翻译：一种通过将透镜阵列放置在照明系统部件的漂移空间中来控制光束发射的方法和装置。照明系统部件可以是可附接到电子枪的电子枪或衬管或漂移管。透镜阵列可以是一个或多个网状网格或网格和连续箔片的组合。透镜阵列形成大量类似于光学“飞眼”透镜的微透镜。透镜阵列将输入的固体电子束分裂成多个子束，使得输出光束发射不同于入射光束发射，而光束总电流保持不变。该方法和装置允许对束电流和光束发射的独立控制，这在SCALPEL照明系统中是有益的。

2. 发明授权

US06400090B2 Electron emitters for lithography tools 有权
标题翻译：用于光刻工具的电子发射器
公开(公告)号：US06400090B2
公开(公告)日：2002-06-04
申请号：US09818799
申请日：2001-03-27
申请人： Victor Katsap , James Alexander Liddle , Warren Kazmir Waskiewicz
发明人： Victor Katsap , James Alexander Liddle , Warren Kazmir Waskiewicz
IPC分类号： H01J2948
CPC分类号： H01J37/065 , H01J2237/3175 , Y10S430/143
摘要： The specification describes a method and apparatus for electron beam lithography wherein a Wehnelt electron gun is modified to improve the uniformity of the electron beam. A mesh grid is applied to the Wehnelt aperture and the mesh grid functions as a multiple secondary emitter to produce a uniform beam flux over a wide area. The grid voltage of the modified gun is substantially lower than in a conventional Wehnelt gun, i.e. less than 100 volts, which can be switched conveniently and economically using semiconductor drive circuits.
摘要翻译：本说明书描述了一种用于电子束光刻的方法和装置，其中修改了Wehnelt电子枪以改善电子束的均匀性。网格格栅应用于Wehnelt孔径，网格栅格用作多重二次发射器，以在广泛的区域产生均匀的光束通量。修改枪的电网电压基本上低于常规的Wehnelt枪，即小于100伏特，其可以使用半导体驱动电路方便和经济地切换。

3. 发明授权

US06492647B1 Electron guns for lithography tools 有权
标题翻译：电子枪用于光刻工具
公开(公告)号：US06492647B1
公开(公告)日：2002-12-10
申请号：US09310701
申请日：1999-05-07
申请人： Victor Katsap , James Alexander Liddle , Warren Kazmir Waskiewicz
发明人： Victor Katsap , James Alexander Liddle , Warren Kazmir Waskiewicz
IPC分类号： H01J3730
CPC分类号： H01J37/065 , H01J2237/31791
摘要： The specification describes a method and apparatus for electron beam lithography wherein a Wehnelt electron gun is modified to improve the uniformity of the electron beam. The bias on the Wehnelt aperture is reversed from the conventional bias so that it is biased positively with respect to the cathode. The Wehnelt opening is tapered with a disk emitter inserted into the taper. The result of these modifications is an electron beam output with low brightness which is highly uniform over the beam cross section.
摘要翻译：本说明书描述了一种用于电子束光刻的方法和装置，其中修改了Wehnelt电子枪以改善电子束的均匀性。 Wehnelt孔径上的偏置与传统的偏压相反，使得它相对于阴极被正向偏置。 Wehnelt开口呈锥形，盘形发生器插入锥形。这些修改的结果是具有低亮度的电子束输出，其在束横截面上是高度均匀的。

4. 发明授权

US06232040B1 Method of electron beam exposure utilizing emitter with conductive mesh grid 有权
标题翻译：使用具有导电网格的发射体的电子束曝光方法
公开(公告)号：US06232040B1
公开(公告)日：2001-05-15
申请号：US09306287
申请日：1999-05-06
申请人： Victor Katsap , James Alexander Liddle , Warren Kazmir Waskiewicz
发明人： Victor Katsap , James Alexander Liddle , Warren Kazmir Waskiewicz
IPC分类号： G03C500
CPC分类号： H01J37/065 , H01J2237/3175 , Y10S430/143
摘要： The specification describes a method and apparatus for electron beam lithography wherein a Wehnelt electron gun is modified to improve the uniformity of the electron beam. A mesh grid is applied to the Wehnelt aperture and the mesh grid functions as a multiple secondary emitter to produce a uniform beam flux over a wide area. The grid voltage of the modified gun is substantially lower than in a conventional Wehnelt gun, i.e. less than 100 volts, which can be switched conveniently and economically using semiconductor drive circuits.
摘要翻译：本说明书描述了一种用于电子束光刻的方法和装置，其中修改了Wehnelt电子枪以改善电子束的均匀性。网格格栅应用于Wehnelt孔径，网格栅格用作多重二次发射器，以在广泛的区域产生均匀的光束通量。修改枪的电网电压基本上低于常规的Wehnelt枪，即小于100伏特，其可以使用半导体驱动电路方便和经济地切换。

5. 发明授权

US5663568A Apparatus for controlling a charged particle beam and a lithographic process in which the apparatus is used 失效
标题翻译：用于控制带电粒子束的装置和使用该装置的光刻工艺
公开(公告)号：US5663568A
公开(公告)日：1997-09-02
申请号：US546078
申请日：1995-10-20
申请人： Warren Kazmir Waskiewicz
发明人： Warren Kazmir Waskiewicz
IPC分类号： G03F7/20 , H01J37/30 , H01J37/304 , H01J37/305 , H01J37/317 , H01L21/027
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J37/3045 , H01J37/3175 , H01J2237/1505 , H01J2237/3045 , H01J2237/31776
摘要： An apparatus and process in which a particle beam is used to introduce a pattern into an energy sensitive material is disclosed. A coil assembly is used to selectively control both the orientation of the particle beam relative to the substrate on which the energy sensitive material is applied and the magnification or demagnification of the image in the particle beam. The coil assembly comprises at least two coils. The particle beam is projected through the coil assembly. The coil assembly is used to rotate the particle beam to compensate for an observed difference between the actual substrate orientation and the desired substrate orientation. The coils in the coil assembly are excited so that the desired rotation is introduced into the particle beam by the cumulative effects of the magnetic fields generated by the excited coils in the coil assembly. The coils in the coil assembly are calibrated such that the desired amount of beam rotation is provided by the coil assembly without introducing unwanted lens effects into the beam. The coils are also used to introduce a desired lens effect, such as magnification of demagnification, into the particle beam without introducing unwanted rotation into the beam. In another embodiment, the coils are used to introduce a desired lens effect, such as magnification or demagnification, into the particle beam without introducing unwanted rotation into the beam.
摘要翻译：公开了一种使用粒子束将图案引入能量敏感材料的装置和方法。线圈组件用于选择性地控制颗粒束相对于其上施加能量敏感材料的基底的取向，以及粒子束中的图像的放大或缩小。线圈组件包括至少两个线圈。粒子束通过线圈组件突出。线圈组件用于旋转粒子束以补偿实际衬底取向和期望衬底取向之间的观察到的差异。线圈组件中的线圈被激励，使得期望的旋转通过由线圈组件中的受激线圈产生的磁场的累积效应被引入到粒子束中。线圈组件中的线圈被校准，使得所需量的光束旋转由线圈组件提供，而不会将不需要的透镜效应引入到光束中。线圈还用于将不期望的透镜效应（例如放大缩小）引入到粒子束中，而不会将不期望的旋转引入到光束中。在另一个实施例中，线圈用于将期望的透镜效应（例如放大或缩小）引入到颗粒束中，而不会将不期望的旋转引入到光束中。

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