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1. 发明授权

US08618298B2 Perylene tetracarboximide derivatives for photovoltaic devices 失效
标题翻译：用于光伏器件的苝四羧酰亚胺衍生物
公开(公告)号：US08618298B2
公开(公告)日：2013-12-31
申请号：US13055939
申请日：2009-07-28
申请人： Ung Chan Yoon , Myung Ho Hyun , Hong-Seok Kim , Sang-Jin Moon , Won Suk Shin , Young In Kim , Ok-Sang Jung
发明人： Ung Chan Yoon , Myung Ho Hyun , Hong-Seok Kim , Sang-Jin Moon , Won Suk Shin , Young In Kim , Ok-Sang Jung
IPC分类号： C07D471/08 , H01L51/00
CPC分类号： C07D409/14 , H01L51/0053 , H01L51/0068 , H01L51/42 , Y02E10/549
摘要： The compounds of the present invention are represented by the following formula (I): wherein M is represented by the following formula: with R1, R2, R3, R4, R5, R6, R7, R8, R10, R11, X1, X2, X3, L, a, b, c, d, e, x, y, and z defined herein.
摘要翻译：本发明化合物由下式（I）表示：其中M由下式表示：其中R1，R2，R3，R4，R5，R6，R7，R8，R10，R11，X1，X2， X3，L，a，b，c，d，e，x，y和z。

2. 发明申请

US20110130566A1 Perylene tetracarboximide derivatives for photovoltaic devices 失效
标题翻译：用于光伏器件的苝四羧酰亚胺衍生物
公开(公告)号：US20110130566A1
公开(公告)日：2011-06-02
申请号：US13055939
申请日：2009-07-28
申请人： Ung Chan Yoon , Myung Ho Hyun , Hong-Seok Kim , Sang-Jin Moon , Won Suk Shin , Young In Kim , Ok-Sang Jung
发明人： Ung Chan Yoon , Myung Ho Hyun , Hong-Seok Kim , Sang-Jin Moon , Won Suk Shin , Young In Kim , Ok-Sang Jung
IPC分类号： C07D471/06
CPC分类号： C07D409/14 , H01L51/0053 , H01L51/0068 , H01L51/42 , Y02E10/549
摘要： The compounds of the present invention are represented by the following formula (I): wherein M is represented by the following formula: with R1, R2, R3, R4, R5, R6, R7, R8, R10, R11, X1, X2, X3, L, a, b, c, d, e, x, y, and z defined herein.
摘要翻译：本发明化合物由下式（I）表示：其中M由下式表示：其中R1，R2，R3，R4，R5，R6，R7，R8，R10，R11，X1，X2， X3，L，a，b，c，d，e，x，y和z。

3. 发明申请

US20090139548A1 Apparatus and method of rinsing and drying semiconductor wafers 审中-公开
标题翻译：冲洗和干燥半导体晶片的装置和方法
公开(公告)号：US20090139548A1
公开(公告)日：2009-06-04
申请号：US12378565
申请日：2008-12-18
申请人： Hong-Seok Kim
发明人： Hong-Seok Kim
IPC分类号： B08B3/00
CPC分类号： H01L21/02052 , H01L21/67028 , H01L21/67754 , H01L21/67757
摘要： An apparatus for rinsing and drying semiconductor wafers includes a rinsing bath, a drying bath and a drying chamber. The rinsing bath and drying bath are connected by a tunnel unit which prevents semiconductor wafers from being exposed to air while being transferred from the rinsing bath to the drying bath. Thus watermarks are prevented from being formed on the semiconductor wafers. A method for rinsing and drying semiconductor wafers includes rinsing the wafers in a rinsing bath, transferring the wafers to a drying bath through a tunnel unit that prevents the semiconductor wafers from the being exposed to air, and after processing the wafers in the drying bath, transferring the wafers to a drying chamber.
摘要翻译：用于冲洗和干燥半导体晶片的装置包括漂洗槽，干燥槽和干燥室。冲洗浴和干燥浴通过隧道单元连接，防止半导体晶片暴露于空气，同时从冲洗槽转移到干燥槽。因此防止在半导体晶片上形成水印。一种用于冲洗和干燥半导体晶片的方法包括在漂洗槽中漂洗晶片，将晶片通过隧道单元转移到干燥槽中，隧道单元防止半导体晶片暴露于空气中，并且在干燥槽中处理晶片之后，将晶片转移到干燥室。

4. 发明授权

US07492969B2 Method for magnifying image by interpolation based on edge and corner 有权
标题翻译：基于边和边的插值放大图像的方法
公开(公告)号：US07492969B2
公开(公告)日：2009-02-17
申请号：US11305644
申请日：2005-12-15
申请人： Hong-Seok Kim , Chang-Joon Park , Sung-Eun Kim , In-Ho Lee , Hyun-Bin Kim
发明人： Hong-Seok Kim , Chang-Joon Park , Sung-Eun Kim , In-Ho Lee , Hyun-Bin Kim
IPC分类号： G06K9/32 , G06K9/40
CPC分类号： G06T3/403
摘要： Provided is a method for magnifying an image by interpolation. The method including: a) setting m×m local windows and calculating a direction of each m×m local window; b) when a linear direction exists in an m×m local window, considering an edge exists; c) when a linear direction does not exist in the m×m local window, dividing the m×m local window into m/2×m/2 sub windows and calculating directions of the m/2×m/2 sub windows; d) when the directions of the m/2×m/2 sub windows exists toward the center of the m×m local window, considering a corner exists in the m×m local window; and e) selecting pixels located in a virtual line that goes along in the linear direction or in the directions to calculate a new pixel value by using the pixels.
摘要翻译：提供了一种通过插值来放大图像的方法。该方法包括：a）设置mxm局部窗口并计算每个mxm局部窗口的方向; b）当在mxm局部窗口中存在线性方向时，考虑到边缘存在; c）当mxm局部窗口中不存在线性方向时，将mxm本地窗口划分为m / 2xm / 2子窗口并计算m / 2xm / 2子窗口的方向; d）当m / 2xm / 2子窗口的方向存在于mxm局部窗口的中心时，考虑到mxm局部窗口中存在一个角; 以及e）选择位于沿着线性方向或方向的虚拟线中的像素，以通过使用像素来计算新的像素值。

5. 发明申请

US20080120493A1 Profiler for optimizing processor architecture and application 有权
标题翻译： Profiler用于优化处理器架构和应用
公开(公告)号：US20080120493A1
公开(公告)日：2008-05-22
申请号：US11730170
申请日：2007-03-29
申请人： Dong-Hoon Yoo , Soo Jung Ryu , Jeong-Wook Kim , Hong-Seok Kim , Hee Seok Kim
发明人： Dong-Hoon Yoo , Soo Jung Ryu , Jeong-Wook Kim , Hong-Seok Kim , Hee Seok Kim
IPC分类号： G06F7/38
CPC分类号： G06F8/443 , G06F17/5045 , G06F2217/68
摘要： A profiler which provides information to optimize an application specific architecture processor and a program for the processor is provided. The profiler includes: an architecture analyzer which analyzes an architecture description, and generates architecture analysis information, the architecture description describing an architecture of an application specific architecture processor which comprises a plurality of processing elements; a static analyzer which analyzes program static information that describes static information of a program, and generates static analysis information; a dynamic analyzer which analyzes program dynamic information that describes dynamic information of the program, and generates dynamic analysis information, the dynamic information of the program being generated by simulating the program; and a cross profiling analyzer which generates information for optimizing the application specific architecture processor to implement the program based on at least one of the architecture analysis information, the static analysis information, and the dynamic analysis information.
摘要翻译：提供了一种提供信息以优化特定于应用的架构处理器和用于处理器的程序的分析器。分析器包括：架构分析器，其分析架构描述并生成架构分析信息，描述包括多个处理元件的应用特定架构处理器的架构的架构描述; 静态分析器，分析程序静态信息，描述程序的静态信息，并生成静态分析信息; 动态分析器，其分析描述所述程序的动态信息的程序动态信息，并且生成动态分析信息，所述程序的动态信息是通过模拟所述程序而产生的; 以及交叉分析分析器，其基于所述架构分析信息，所述静态分析信息和所述动态分析信息中的至少一个，生成用于优化所述应用专用架构处理器以实现所述程序的信息。

6. 发明申请

US20050224102A1 Apparatus and method of rinsing and drying semiconductor wafers 审中-公开
标题翻译：冲洗和干燥半导体晶片的装置和方法
公开(公告)号：US20050224102A1
公开(公告)日：2005-10-13
申请号：US11101799
申请日：2005-04-07
申请人： Hong-Seok Kim
发明人： Hong-Seok Kim
IPC分类号： H01L21/304 , B08B3/00 , C23G1/00 , H01L21/00 , H01L21/02 , H01L21/302
CPC分类号： H01L21/02052 , H01L21/67028 , H01L21/67754 , H01L21/67757
摘要： An apparatus for rinsing and drying semiconductor wafers includes a rinsing bath, a drying bath and a drying chamber. The rinsing bath and drying bath are connected by a tunnel unit which prevents semiconductor wafers from being exposed to air while being transferred from the rinsing bath to the drying bath. Thus watermarks are prevented from being formed on the semiconductor wafers. A method for rinsing and drying semiconductor wafers includes rinsing the wafers in a rinsing bath, transferring the wafers to a drying bath through a tunnel unit that prevents the semiconductor wafers from the being exposed to air, and after processing the wafers in the drying bath, transferring the wafers to a drying chamber.
摘要翻译：用于冲洗和干燥半导体晶片的装置包括漂洗槽，干燥槽和干燥室。冲洗浴和干燥浴通过隧道单元连接，防止半导体晶片暴露于空气，同时从冲洗槽转移到干燥槽。因此防止在半导体晶片上形成水印。一种用于冲洗和干燥半导体晶片的方法包括在漂洗槽中漂洗晶片，将晶片通过隧道单元转移到干燥槽中，隧道单元防止半导体晶片暴露于空气中，并且在干燥槽中处理晶片之后，将晶片转移到干燥室。

7. 发明授权

US08443174B2 Processor and method of performing speculative load operations of the processor 有权
标题翻译：处理器和执行处理器的推测加载操作的方法
公开(公告)号：US08443174B2
公开(公告)日：2013-05-14
申请号：US11838488
申请日：2007-08-14
申请人： Hong-Seok Kim , Hee Seok Kim , Jeongwook Kim , Suk Jin Kim
发明人： Hong-Seok Kim , Hee Seok Kim , Jeongwook Kim , Suk Jin Kim
IPC分类号： G06F9/30 , G06F9/312
CPC分类号： G06F9/3842
摘要： Provided is a processor and method of performing speculative load instructions of the processor in which a load instruction is performed only in the case where the load instruction substantially accesses a memory. A load instruction for canceling operations is performed in other cases except the above case, so that problems occurring by accessing an input/output (I/O) mapped memory area and the like at the time of performing speculative load instructions can be prevented using only a software-like method, thereby improving the performance of a processor.
摘要翻译：提供了一种执行处理器的推测性加载指令的处理器和方法，其中仅在加载指令基本访问存储器的情况下执行加载指令。在除了上述情况之外的其他情况下执行用于取消操作的加载指令，使得仅在执行推测性加载指令时访问输入/输出（I / O）映射存储区等而出现的问题可以仅被使用一种类似软件的方法，从而提高处理器的性能。

8. 发明授权

US07590831B2 Loop accelerator and data processing system having the same 有权
标题翻译：循环加速器和数据处理系统具有相同的功能
公开(公告)号：US07590831B2
公开(公告)日：2009-09-15
申请号：US11514889
申请日：2006-09-05
申请人： Soo-jung Ryu , Jeong-wook Kim , Suk-jin Kim , Hong-Seok Kim , Jun-jin Kong
发明人： Soo-jung Ryu , Jeong-wook Kim , Suk-jin Kim , Hong-Seok Kim , Jun-jin Kong
IPC分类号： G06F9/44
CPC分类号： G06F9/3836 , G06F9/3877 , G06F9/3897 , G06F15/7867 , Y02D10/12 , Y02D10/13
摘要： Provided are a loop accelerator and a data processing system having the loop accelerator. The data processing system includes a loop accelerator which executes a loop part of a program, a processor core which processes a remaining part of the program except the loop part, and a central register file which transmits data between the processor core and the loop accelerator. The loop accelerator includes a plurality of processing elements (PEs) each of which performs an operation on each word to execute the program, a configuration memory which stores configuration bits indicating operations, states, etc. of the PEs, and a plurality of context memories, installed in a column or row direction of the PEs, which transmit the configuration bits along a direction toward which the PEs are arrayed. Thus, a connection structure between the configuration memory and the PEs can be simplified to easily modify a structure of the loop accelerator so as to extend the loop accelerator.
摘要翻译：提供了一种环路加速器和具有环路加速器的数据处理系统。数据处理系统包括执行程序的循环部分的循环加速器，处理除循环部分之外的程序的剩余部分的处理器核心以及在处理器核心和循环加速器之间传送数据的中央寄存器文件。环路加速器包括多个处理元件（PE），每个处理元件（PE）对每个字执行操作以执行程序;配置存储器，其存储指示PE的操作，状态等的配置位，以及多个上下文存储器安装在PE的列或行方向上，其沿着PE排列的方向传送配置位。因此，可以简化配置存储器和PE之间的连接结构，以容易地修改循环加速器的结构，以便扩展循环加速器。

9. 发明申请

US20080141220A1 Robot Control Software Framework in Open Distributed Process Architecture 有权
标题翻译：开放分布式流程架构中的机器人控制软件框架
公开(公告)号：US20080141220A1
公开(公告)日：2008-06-12
申请号：US11596311
申请日：2005-05-12
申请人： Hong-Ryeol Kim , Dae-Won Kim , Hong-Seong Park , Hong-Seok Kim , Ho-Gil Lee
发明人： Hong-Ryeol Kim , Dae-Won Kim , Hong-Seong Park , Hong-Seok Kim , Ho-Gil Lee
IPC分类号： G06F9/44
CPC分类号： B25J9/1661 , G05B2219/32142 , G05B2219/39252 , G05B2219/40304
摘要： An open distributed processing structured robot control software architecture is enclosed, which makes it possible to manufacture a user-oriented robot through combination of independent heterogeneous functional modules. The invention involves an open software framework for integrated operation and production of distributed software of the modules, and an autonomous robot control architecture suitable for distributed environments. The software framework indicates underlying software components for robot control and service creation. The invention makes it possible to mass-produce autonomous robots in units of interoperable functional modules. It is also possible to meet various demands of consumers, achieve specialization, and accelerate technology development since the development procedures are specialized in an independent manner and are suitable for manufacturing a wide variety of robot products in small quantities.
摘要翻译：封闭开放的分布式处理结构化机器人控制软件架构，通过独立的异构功能模块的组合，可以制造面向用户的机器人。本发明涉及用于模块的分布式软件的集成操作和生产的开放软件框架，以及适用于分布式环境的自主机器人控制架构。软件框架指示用于机器人控制和服务创建的底层软件组件。本发明使得可以以可互操作的功能模块为单位批量生产自主机器人。开发过程独立自主，适合少量生产各种机器人产品，也可满足消费者的各种需求，实现专业化，加快技术开发。

10. 发明申请

US20060120592A1 Apparatus for recovering background in image sequence and method thereof 有权
公开(公告)号：US20060120592A1
公开(公告)日：2006-06-08
申请号：US11283118
申请日：2005-11-18
申请人： Chang-Joon Park , Hong-Seok Kim , Sung-Eun Kim , In-Ho Lee , Hyun-Bin Kim
发明人： Chang-Joon Park , Hong-Seok Kim , Sung-Eun Kim , In-Ho Lee , Hyun-Bin Kim
IPC分类号： G06K9/00 , G06K9/34
CPC分类号： G06T15/20 , G06T11/60
摘要： Provided is a background recovering apparatus for deleting an object of an arbitrary region and recovering a background covered with the object. The apparatus includes a storing block for storing the input image sequence, and storing the three dimensional (3D) position and posture information, and focal length information; a geometric information extracting block for extracting 3D with respect to the background; a background image generating block for generating the background image; and a background image inserting block for recovering the background by inserting the background image into an arbitrary region of a first view point.

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