会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Vertical light emitting diode (VLED) die having electrode frame and method of fabrication
    • 具有电极框架和制造方法的垂直发光二极管(VLED)芯片
    • US08283652B2
    • 2012-10-09
    • US12845007
    • 2010-07-28
    • Chen-Fu ChuFeng-Hsu FanHao-Chun ChengTrung Tri Doan
    • Chen-Fu ChuFeng-Hsu FanHao-Chun ChengTrung Tri Doan
    • H01L33/04
    • H01L33/38H01L33/32H01L33/405H01L33/44H01L33/641H01L33/647
    • A vertical light emitting diode (VLED) die includes a metal base; a mirror on the metal base; a p-type semiconductor layer on the reflector layer; a multiple quantum well (MQW) layer on the p-type semiconductor layer configured to emit light; and an n-type semiconductor layer on the multiple quantum well (MQW) layer. The vertical light emitting diode (VLED) die also includes an electrode and an electrode frame on the n-type semiconductor layer, and an organic or inorganic material contained within the electrode frame. The electrode and the electrode frame are configured to provide a high current capacity and to spread current from the outer periphery to the center of the n-type semiconductor layer. The vertical light emitting diode (VLED) die can also include a passivation layer formed on the metal base surrounding and electrically insulating the electrode frame, the edges of the mirror, the edges of the p-type semiconductor layer, the edges of the multiple quantum well (MQW) layer and the edges of the n-type semiconductor layer.
    • 垂直发光二极管(VLED)模具包括金属基底; 金属底座上的镜子; 反射层上的p型半导体层; 配置成发光的p型半导体层上的多量子阱(MQW)层; 和多量子阱(MQW)层上的n型半导体层。 垂直发光二极管(VLED)裸片还包括在n型半导体层上的电极和电极框架,以及包含在电极框架内的有机或无机材料。 电极和电极框架被配置为提供高电流容量并且将电流从外周延伸到n型半导体层的中心。 垂直发光二极管(VLED)裸片还可以包括形成在金属基底上的钝化层,该钝化层围绕并电绝缘电极框架,反射镜的边缘,p型半导体层的边缘,多个量子的边缘 (MQW)层和n型半导体层的边缘。
    • 5. 发明申请
    • METHOD OF SEPARATING SEMICONDUCTOR DIES
    • 分离半导体器件的方法
    • US20110217799A1
    • 2011-09-08
    • US13109687
    • 2011-05-17
    • Chen-Fu ChuTrung Tri DoanHao-Chun ChengFeng-Hsu FanFu-Hsien Wang
    • Chen-Fu ChuTrung Tri DoanHao-Chun ChengFeng-Hsu FanFu-Hsien Wang
    • H01L21/786
    • H01L33/0079H01L33/0095
    • A method for the separation of multiple dies during semiconductor fabrication is described. On an upper surface of a semiconductor wafer containing multiple dies, metal layers are deposited everywhere except where a block of stop electroplating material exists. The stop electroplating material is obliterated, and a barrier layer is formed above the entire remaining structure. A sacrificial metal element is added above the barrier layer, and then the substrate is removed. After the semiconductor material between the individual dies is eradicated, any desired bonding pads and patterned circuitry are added to the semiconductor surface opposite the sacrificial metal element, a passivation layer is added to this surface, and then the sacrificial metal element is removed. Tape is added to the now exposed barrier layer, the passivation layer is removed, the resulting structure is flipped over, and the tape is expanded to separate the individual dies.
    • 描述了在半导体制造期间分离多个管芯的方法。 在包含多个模具的半导体晶片的上表面上,除了存在一块停止电镀材料之外,金属层被沉积​​。 停止电镀材料被消除,并且在整个剩余结构上方形成阻挡层。 在阻挡层上方添加牺牲金属元素,然后去除衬底。 在消除各个管芯之间的半导体材料之后,将任何期望的接合焊盘和图案化电路添加到与牺牲金属元件相对的半导体表面,在该表面上添加钝化层,然后去除牺牲金属元件。 将胶带添加到现在暴露的阻挡层中,去除钝化层,将所得结构翻转,并且将带扩展以分离各个模具。
    • 9. 发明授权
    • Semiconductor processing methods of removing conductive material
    • 去除导电材料的半导体加工方法
    • US07367871B2
    • 2008-05-06
    • US11449201
    • 2006-06-05
    • Trung Tri DoanScott G. Meikle
    • Trung Tri DoanScott G. Meikle
    • B24B1/00
    • B24B37/11B23H5/08B24B37/042B24B37/046B24B37/20C25F3/30H01L21/3212H01L21/32125
    • The invention includes a semiconductive processing method of electrochemical-mechanical removing at least some of a conductive material from over a surface of a semiconductor substrate. A cathode is provided at a first location of the wafer, and an anode is provided at a second location of the wafer. The conductive material is polished with the polishing pad polishing surface. The polishing occurs at a region of the conductive material and not at another region. The region where the polishing occurs is defined as a polishing operation location. The polishing operation location is displaced across the surface of the substrate from said second location of the substrate toward said first location of the substrate. The polishing operation location is not displaced from said first location toward said second location when the polishing operation location is between the first and second locations. The invention also includes a semiconductor processing method of removing at least some of a conductive material from over a surface of a semiconductive material wafer. A polishing pad is displaced across an upper surface of the wafer from a central region of the wafer toward a periphery of the wafer, and is not displaced from the periphery to the central region.
    • 本发明包括从半导体衬底的表面上电化学 - 机械去除至少一些导电材料的半导体处理方法。 阴极设置在晶片的第一位置处,并且阳极设置在晶片的第二位置处。 用抛光垫抛光表面抛光导电材料。 抛光发生在导电材料的区域而不是在另一区域。 抛光发生的区域被定义为抛光操作位置。 抛光操作位置从衬底的所述第二位置横跨衬底的表面移动到衬底的所述第一位置。 当抛光操作位置在第一和第二位置之间时,抛光操作位置不会从所述第一位置移动到所述第二位置。 本发明还包括从半导体材料晶片的表面上去除至少一些导电材料的半导体加工方法。 抛光垫从晶片的中心区域朝着晶片的周边跨越晶片的上表面移位,并且不会从周边移动到中心区域。
    • 10. 发明申请
    • METHOD OF SEPARATING SEMICONDUCTOR DIES
    • 分离半导体器件的方法
    • US20070212854A1
    • 2007-09-13
    • US11682814
    • 2007-03-06
    • Chen-Fu ChuTrung Tri DoanHao-Chun ChengFeng-Hsu FanFu-Hsien Wang
    • Chen-Fu ChuTrung Tri DoanHao-Chun ChengFeng-Hsu FanFu-Hsien Wang
    • H01L21/00
    • H01L33/0079H01L33/0095
    • A method for the separation of multiple dies during semiconductor fabrication is described. On an upper surface of a semiconductor wafer containing multiple dies, metal layers are deposited everywhere except where a block of stop electroplating material exists. The stop electroplating material is obliterated, and a barrier layer is formed above the entire remaining structure. A sacrificial metal element is added above the barrier layer, and then the substrate is removed. After the semiconductor material between the individual dies is eradicated, any desired bonding pads and patterned circuitry are added to the semiconductor surface opposite the sacrificial metal element, a passivation layer is added to this surface, and then the sacrificial metal element is removed. Tape is added to the now exposed barrier layer, the passivation layer is removed, the resulting structure is flipped over, and the tape is expanded to separate the individual dies.
    • 描述了在半导体制造期间分离多个管芯的方法。 在包含多个模具的半导体晶片的上表面上,除了存在一块停止电镀材料之外,金属层被沉积​​。 停止电镀材料被消除,并且在整个剩余结构上方形成阻挡层。 在阻挡层上方添加牺牲金属元素,然后去除衬底。 在消除各个管芯之间的半导体材料之后,将任何期望的接合焊盘和图案化电路添加到与牺牲金属元件相对的半导体表面,在该表面上添加钝化层,然后去除牺牲金属元件。 将胶带添加到现在暴露的阻挡层中,去除钝化层,将所得结构翻转,并且将带扩展以分离各个模具。