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    • 6. 发明专利
    • Semiconductor device
    • 半导体器件
    • JP2005277122A
    • 2005-10-06
    • JP2004088508
    • 2004-03-25
    • Toyota Central Res & Dev Lab IncToyota Motor Corpトヨタ自動車株式会社株式会社豊田中央研究所
    • SHOJI TOMOYUKIISHIKO MASAYASUUEDA KENJI
    • H01L27/04H01L21/822H01L21/8234H01L27/06H01L27/088H01L29/739H01L29/78
    • PROBLEM TO BE SOLVED: To rapidly turn on the main gate electrode of a semiconductor device in the 'OFF' state on detecting transitional application of an excess voltage to the semiconductor device.
      SOLUTION: The semiconductor device has a trench gate electrode 34 opposing a body region 28 via a gate insulating film 32 and an MOS transistor 40 having a channel opposing region 48 wherein a potential moves up and down in accordance with the potential of the body region 28. An auxiliary source region 44 formed in the MOS transistor 40 is connected to the trench gate electrode via a gate electrode extension region 54. When the potential of the body region 28 rises, the MOS transistor 40 is conductively connected and a voltage (V2) applied to the auxiliary drain region 43 formed in the MOS transistor is applied to the trench gate electrode 34.
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:为了在半导体器件检测到过剩的电压的过渡时,将半导体器件的主栅电极快速导通到“断开”状态。 解决方案:半导体器件具有沟槽栅极电极34,其经由栅极绝缘膜32和具有沟道相对区域48的MOS晶体管40与体区域28相对,其中电位根据电极的电位而上下移动 形成在MOS晶体管40中的辅助源极区域44经由栅电极延伸区域54连接到沟槽栅极电极。当体区域28的电位上升时,MOS晶体管40导通,电压 施加到形成在MOS晶体管中的辅助漏极区域43的(V2)施加到沟槽栅极34上。(C)2006,JPO&NCIPI
    • 9. 发明专利
    • Semiconductor device
    • 半导体器件
    • JP2011159662A
    • 2011-08-18
    • JP2010017870
    • 2010-01-29
    • Toyota Central R&D Labs IncToyota Motor Corpトヨタ自動車株式会社株式会社豊田中央研究所
    • SHOJI TOMOYUKIYAGI YUJIASADA TAKASHIOSADA YUJISUZUKI TOMOKIYO
    • H01L23/36
    • H01L24/33H01L2224/32225H01L2924/13055H01L2924/13091H01L2924/181H01L2924/00
    • PROBLEM TO BE SOLVED: To provide a semiconductor device capable of dissipating heat generated by a semiconductor element through a substrate and more properly inhibiting deterioration of a junction between the semiconductor element and the substrate. SOLUTION: The semiconductor device 10 includes the semiconductor element 11, the junction 12, and a heat sink 15 laminated in order. A direction in which the semiconductor element 11 and the heat sink 15 are laminated is assumed as a thickness direction, and a direction along a plane perpendicular to the thickness direction is assumed as a plane direction. The heat sink 15 includes: a first embedded portion 16 formed in a central region corresponding to a laminate range of the semiconductor element 11, the heat sink having a thermal conductivity in the thickness direction higher than the thermal conductivity in the plane direction and the thermal conductivity of a base material of the heat sink 15; and a second embedded portion 17 formed in a peripheral region, the second embedded portion having a linear expansion coefficient in the plane direction smaller than the linear expansion coefficient in the plane direction of the first embedded portion 16 and the linear expansion coefficient of the base material of the heat sink 15 and having a rigidity in the plane direction higher than the rigidity in the plane direction of the first embedded portion 16 and the rigidity of the base material of the heat sink 15. COPYRIGHT: (C)2011,JPO&INPIT
    • 解决的问题:提供一种半导体器件,其能够通过衬底散发由半导体元件产生的热量,并且更适当地抑制半导体元件和衬底之间的接合的劣化。 解决方案:半导体器件10包括依次层叠的半导体元件11,接合部12和散热片15。 将半导体元件11和散热片15层叠的方向作为厚度方向,将与厚度方向垂直的面的方向作为平面方向。 散热器15包括:形成在对应于半导体元件11的层叠范围的中心区域中的第一嵌入部分16,散热器在厚度方向上的热传导率高于平面方向上的热导率,热量 散热片15的基材的导电性; 以及形成在周边区域中的第二嵌入部分17,第二嵌入部分在平面方向上具有小于第一嵌入部分16的平面方向上的线膨胀系数的线膨胀系数和基材的线膨胀系数 并且具有比第一嵌入部16的平面方向的刚性高的平面方向的刚性和散热片15的基材的刚性。(C)2011年, JPO&INPIT